JP4176366B2 - 半導体装置の作製方法 - Google Patents
半導体装置の作製方法 Download PDFInfo
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- JP4176366B2 JP4176366B2 JP2002086968A JP2002086968A JP4176366B2 JP 4176366 B2 JP4176366 B2 JP 4176366B2 JP 2002086968 A JP2002086968 A JP 2002086968A JP 2002086968 A JP2002086968 A JP 2002086968A JP 4176366 B2 JP4176366 B2 JP 4176366B2
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- silicon film
- film
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- 229910052698 phosphorus Inorganic materials 0.000 description 14
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- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
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- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
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- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
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- 235000018734 Sambucus australis Nutrition 0.000 description 1
- 244000180577 Sambucus australis Species 0.000 description 1
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- 229910017604 nitric acid Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- AHLBNYSZXLDEJQ-FWEHEUNISA-N orlistat Chemical compound CCCCCCCCCCC[C@H](OC(=O)[C@H](CC(C)C)NC=O)C[C@@H]1OC(=O)[C@H]1CCCCCC AHLBNYSZXLDEJQ-FWEHEUNISA-N 0.000 description 1
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- 239000010980 sapphire Substances 0.000 description 1
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- 238000004626 scanning electron microscopy Methods 0.000 description 1
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
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- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
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- 229910052715 tantalum Inorganic materials 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical class [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- OYQCBJZGELKKPM-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O-2].[Zn+2].[O-2].[In+3] OYQCBJZGELKKPM-UHFFFAOYSA-N 0.000 description 1
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- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2002086968A JP4176366B2 (ja) | 2001-03-26 | 2002-03-26 | 半導体装置の作製方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2001-88613 | 2001-03-26 | ||
JP2001088613 | 2001-03-26 | ||
JP2002086968A JP4176366B2 (ja) | 2001-03-26 | 2002-03-26 | 半導体装置の作製方法 |
Publications (3)
Publication Number | Publication Date |
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JP2002359196A JP2002359196A (ja) | 2002-12-13 |
JP2002359196A5 JP2002359196A5 (enrdf_load_stackoverflow) | 2005-07-21 |
JP4176366B2 true JP4176366B2 (ja) | 2008-11-05 |
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JP2002086968A Expired - Fee Related JP4176366B2 (ja) | 2001-03-26 | 2002-03-26 | 半導体装置の作製方法 |
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JP (1) | JP4176366B2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI291310B (en) * | 2005-12-01 | 2007-12-11 | Au Optronics Corp | Organic light emitting diode (OLED) display panel and method of forming polysilicon channel layer thereof |
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- 2002-03-26 JP JP2002086968A patent/JP4176366B2/ja not_active Expired - Fee Related
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