JP4176366B2 - 半導体装置の作製方法 - Google Patents

半導体装置の作製方法 Download PDF

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Publication number
JP4176366B2
JP4176366B2 JP2002086968A JP2002086968A JP4176366B2 JP 4176366 B2 JP4176366 B2 JP 4176366B2 JP 2002086968 A JP2002086968 A JP 2002086968A JP 2002086968 A JP2002086968 A JP 2002086968A JP 4176366 B2 JP4176366 B2 JP 4176366B2
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silicon film
film
rare gas
gas element
crystal structure
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Expired - Fee Related
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JP2002086968A
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English (en)
Japanese (ja)
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JP2002359196A (ja
JP2002359196A5 (enrdf_load_stackoverflow
Inventor
舜平 山崎
亨 三津木
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2002086968A priority Critical patent/JP4176366B2/ja
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Publication of JP2002359196A5 publication Critical patent/JP2002359196A5/ja
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  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Recrystallisation Techniques (AREA)
JP2002086968A 2001-03-26 2002-03-26 半導体装置の作製方法 Expired - Fee Related JP4176366B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002086968A JP4176366B2 (ja) 2001-03-26 2002-03-26 半導体装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001-88613 2001-03-26
JP2001088613 2001-03-26
JP2002086968A JP4176366B2 (ja) 2001-03-26 2002-03-26 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2002359196A JP2002359196A (ja) 2002-12-13
JP2002359196A5 JP2002359196A5 (enrdf_load_stackoverflow) 2005-07-21
JP4176366B2 true JP4176366B2 (ja) 2008-11-05

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JP2002086968A Expired - Fee Related JP4176366B2 (ja) 2001-03-26 2002-03-26 半導体装置の作製方法

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JP (1) JP4176366B2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI291310B (en) * 2005-12-01 2007-12-11 Au Optronics Corp Organic light emitting diode (OLED) display panel and method of forming polysilicon channel layer thereof

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Publication number Publication date
JP2002359196A (ja) 2002-12-13

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