JP4136590B2 - 配向膜、配向膜を利用した磁気記録媒体、及び磁気記録再生装置 - Google Patents

配向膜、配向膜を利用した磁気記録媒体、及び磁気記録再生装置 Download PDF

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Publication number
JP4136590B2
JP4136590B2 JP2002308367A JP2002308367A JP4136590B2 JP 4136590 B2 JP4136590 B2 JP 4136590B2 JP 2002308367 A JP2002308367 A JP 2002308367A JP 2002308367 A JP2002308367 A JP 2002308367A JP 4136590 B2 JP4136590 B2 JP 4136590B2
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JP
Japan
Prior art keywords
layer
film
noble metal
magnetic recording
alignment film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002308367A
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English (en)
Japanese (ja)
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JP2004145946A5 (enExample
JP2004145946A (ja
Inventor
伸浩 安居
透 田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2002308367A priority Critical patent/JP4136590B2/ja
Priority to PCT/JP2003/013471 priority patent/WO2004038702A1/en
Priority to AU2003274736A priority patent/AU2003274736A1/en
Priority to US10/532,232 priority patent/US7510780B2/en
Publication of JP2004145946A publication Critical patent/JP2004145946A/ja
Publication of JP2004145946A5 publication Critical patent/JP2004145946A5/ja
Application granted granted Critical
Publication of JP4136590B2 publication Critical patent/JP4136590B2/ja
Priority to US12/401,677 priority patent/US8003238B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7369—Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/11—Magnetic recording head
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12861—Group VIII or IB metal-base component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP2002308367A 2002-10-23 2002-10-23 配向膜、配向膜を利用した磁気記録媒体、及び磁気記録再生装置 Expired - Fee Related JP4136590B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2002308367A JP4136590B2 (ja) 2002-10-23 2002-10-23 配向膜、配向膜を利用した磁気記録媒体、及び磁気記録再生装置
PCT/JP2003/013471 WO2004038702A1 (en) 2002-10-23 2003-10-22 Structured material, magnetic recording medium utilizing the same, and magnetic recording/reproducing apparatus
AU2003274736A AU2003274736A1 (en) 2002-10-23 2003-10-22 Structured material, magnetic recording medium utilizing the same, and magnetic recording/reproducing apparatus
US10/532,232 US7510780B2 (en) 2002-10-23 2003-10-22 Structured material, magnetic recording medium utilizing the same, and magnetic recording/reproducing apparatus
US12/401,677 US8003238B2 (en) 2002-10-23 2009-03-11 Structured material, magnetic recording medium utilizing the same, and magnetic recording/reproducing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002308367A JP4136590B2 (ja) 2002-10-23 2002-10-23 配向膜、配向膜を利用した磁気記録媒体、及び磁気記録再生装置

Publications (3)

Publication Number Publication Date
JP2004145946A JP2004145946A (ja) 2004-05-20
JP2004145946A5 JP2004145946A5 (enExample) 2007-11-08
JP4136590B2 true JP4136590B2 (ja) 2008-08-20

Family

ID=32170972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002308367A Expired - Fee Related JP4136590B2 (ja) 2002-10-23 2002-10-23 配向膜、配向膜を利用した磁気記録媒体、及び磁気記録再生装置

Country Status (4)

Country Link
US (2) US7510780B2 (enExample)
JP (1) JP4136590B2 (enExample)
AU (1) AU2003274736A1 (enExample)
WO (1) WO2004038702A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3897688B2 (ja) 2002-12-11 2007-03-28 キヤノン株式会社 光電融合配線基板
US7713389B2 (en) 2005-12-21 2010-05-11 Hitachi Global Storage Technologies Netherlands B.V. Perpendicular magnetic recording disk with ultrathin nucleation film for improved corrosion resistance and method for making the disk
JP4405485B2 (ja) 2006-08-02 2010-01-27 株式会社東芝 磁性体膜および磁性体膜の製造方法
US20080057350A1 (en) * 2006-09-01 2008-03-06 Heraeus, Inc. Magnetic media and sputter targets with compositions of high anisotropy alloys and oxide compounds
JP2008159141A (ja) * 2006-12-22 2008-07-10 Canon Inc 磁気記録再生装置及び情報処理装置
US7892664B2 (en) * 2007-11-28 2011-02-22 Seagate Technology Llc Magnetic recording media having a chemically ordered magnetic layer
CN103534757B (zh) * 2011-05-17 2016-08-17 昭和电工株式会社 磁记录介质及其制造方法以及磁记录再生装置
US8609263B1 (en) * 2011-05-20 2013-12-17 WD Media, LLC Systems and methods for forming magnetic media with an underlayer

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19531372A1 (de) 1995-08-25 1997-02-27 Siemens Ag Chipkarte
US6248416B1 (en) * 1997-11-10 2001-06-19 Carnegie Mellon University Highly oriented magnetic thin films, recording media, transducers, devices made therefrom and methods of making
JP3220116B2 (ja) * 1999-07-06 2001-10-22 株式会社日立製作所 垂直磁気記録媒体および磁気記憶装置
JP3637883B2 (ja) * 2000-08-31 2005-04-13 住友電気工業株式会社 表面被覆窒化硼素焼結体工具
KR100374794B1 (ko) * 2001-01-04 2003-03-04 삼성전자주식회사 수직 자기 기록 매체
JP4416408B2 (ja) * 2002-08-26 2010-02-17 株式会社日立グローバルストレージテクノロジーズ 垂直磁気記録媒体

Also Published As

Publication number Publication date
AU2003274736A1 (en) 2004-05-13
US20060040118A1 (en) 2006-02-23
WO2004038702A1 (en) 2004-05-06
US7510780B2 (en) 2009-03-31
US8003238B2 (en) 2011-08-23
JP2004145946A (ja) 2004-05-20
US20090176128A1 (en) 2009-07-09

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