JP4110606B2 - 走査型露光装置および露光方法 - Google Patents

走査型露光装置および露光方法 Download PDF

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Publication number
JP4110606B2
JP4110606B2 JP04620398A JP4620398A JP4110606B2 JP 4110606 B2 JP4110606 B2 JP 4110606B2 JP 04620398 A JP04620398 A JP 04620398A JP 4620398 A JP4620398 A JP 4620398A JP 4110606 B2 JP4110606 B2 JP 4110606B2
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Japan
Prior art keywords
exposure
optical system
mask
photosensitive substrate
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP04620398A
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English (en)
Japanese (ja)
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JPH11231549A5 (enExample
JPH11231549A (ja
Inventor
宗泰 横田
貴和 武藤
忠明 篠崎
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Nikon Corp
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Nikon Corp
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Publication date
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Priority to JP04620398A priority Critical patent/JP4110606B2/ja
Publication of JPH11231549A publication Critical patent/JPH11231549A/ja
Publication of JPH11231549A5 publication Critical patent/JPH11231549A5/ja
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Publication of JP4110606B2 publication Critical patent/JP4110606B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP04620398A 1998-02-12 1998-02-12 走査型露光装置および露光方法 Expired - Lifetime JP4110606B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04620398A JP4110606B2 (ja) 1998-02-12 1998-02-12 走査型露光装置および露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04620398A JP4110606B2 (ja) 1998-02-12 1998-02-12 走査型露光装置および露光方法

Publications (3)

Publication Number Publication Date
JPH11231549A JPH11231549A (ja) 1999-08-27
JPH11231549A5 JPH11231549A5 (enExample) 2005-11-10
JP4110606B2 true JP4110606B2 (ja) 2008-07-02

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ID=12740537

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Application Number Title Priority Date Filing Date
JP04620398A Expired - Lifetime JP4110606B2 (ja) 1998-02-12 1998-02-12 走査型露光装置および露光方法

Country Status (1)

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JP (1) JP4110606B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4211252B2 (ja) * 2001-11-05 2009-01-21 株式会社日立製作所 パターン露光方法及びその装置
CN101385123B (zh) 2006-02-16 2010-12-15 株式会社尼康 投影光学系统、曝光装置及方法、光罩及显示器的制造方法
TWI452437B (zh) * 2006-11-27 2014-09-11 尼康股份有限公司 An exposure method, a pattern forming method, and an exposure apparatus, and an element manufacturing method
TW202316204A (zh) * 2015-03-31 2023-04-16 日商尼康股份有限公司 曝光裝置、平面顯示器之製造方法、元件製造方法、及曝光方法
JP6701597B2 (ja) * 2015-03-31 2020-05-27 株式会社ニコン 露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法

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Publication number Publication date
JPH11231549A (ja) 1999-08-27

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