JP4083708B2 - 支持器具、リソグラフィ投影装置および支持器具を使用したデバイス製造方法および支持器具内で使用するよう配置構成された位置制御システム - Google Patents
支持器具、リソグラフィ投影装置および支持器具を使用したデバイス製造方法および支持器具内で使用するよう配置構成された位置制御システム Download PDFInfo
- Publication number
- JP4083708B2 JP4083708B2 JP2004173318A JP2004173318A JP4083708B2 JP 4083708 B2 JP4083708 B2 JP 4083708B2 JP 2004173318 A JP2004173318 A JP 2004173318A JP 2004173318 A JP2004173318 A JP 2004173318A JP 4083708 B2 JP4083708 B2 JP 4083708B2
- Authority
- JP
- Japan
- Prior art keywords
- support
- spring
- support device
- lithographic projection
- projection apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Environmental & Geological Engineering (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Acoustics & Sound (AREA)
- Aviation & Aerospace Engineering (AREA)
- Mechanical Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Vibration Prevention Devices (AREA)
Description
Claims (10)
- リソグラフィ投影装置内で、支持部品に対して被支持部品を支持する支持器具(53)で、
リソグラフィ投影装置の支持部品上で係合する第1部品(69)と、
リソグラフィ投影装置の被支持部品上で係合する第2部品(71)と、
第1部品と第2部品間の支持ばねシステム(73)と、
被支持部品の位置を制御する位置制御システムとを備え、
位置制御システムが、
支持部品に対して移動可能な少なくとも1つの支持ばねシステムより質量の小さな基準物体(200)と、
基準支持器具(201)とを備え、基準支持器具が第1部品に対して基準物体を支持し、前記基準物体と基準支持器具とが支持ばねシステムより低い固有周波数を有する基準質量ばねシステムを形成し、
さらに、基準物体の少なくとも1つに対する第2部品の位置の少なくとも1つの特性を感知する少なくとも1つの位置センサ(202)を備え、
位置センサが、前記特性の少なくとも1つを表す位置信号を出力するセンサ出力を有し、
位置制御システムがさらに、位置信号に応答して、第1部品に対する第2 部品の位置を調節するため、前記位置センサに連絡可能状態で接続するアクチュエータ(203)を備え支持器具。 - 基準質量ばねシステムが、支持ばねシステムとは異なるタイプである、請求項1に記載の支持器具(53)。
- 支持ばねシステム(73)が気体ばねを備え、基準支持器具が、機械的ばね(210)、静電ばね(213〜216)または磁気ばね(211)の少なくとも1つの非気体ばねを備える、請求項1または2に記載の支持器具(53)。
- 位置制御システムが、
第2部品(71)が第1部品(69)に対して移動可能な異なる方向で、基準物体(200)の少なくとも1つに対する第2部品の位置の少なくとも1つの特性をそれぞれが感知する少なくとも2つの位置センサ(202)を備える、請求項1から3のいずれか1項に記載の支持器具(53)。 - アクチュエータ(203)が少なくとも1つのローレンツ力アクチュエータを備える、請求項1から4のいずれか1項に記載の支持器具(53)。
- 少なくとも2つの基準支持器具(210)を備え、少なくとも1つの第1基準支持器具が、第1方向で基準物体(200)を支持し、少なくとも1つの第2基準支持器具が、第1方向とは異なる第2方向で基準物体を支持する、請求項1から5のいずれか1項に記載の支持器具(53)。
- 位置制御システムが、支持ばねシステム(73)の固有周波数より高い制御周波数で第2部品(71)の位置を制御することができる、請求項1から6のいずれか1項に記載の支持器具(53)。
- リソグラフィ投影装置で、
基板(27)を保持する基板テーブル(3)と、
所望の模様に従い模様付けされた放射線の模様付けしたビームを基板の目標部分に投影する投影システム(5)と、
少なくとも投影システムを支持する支持構造(39)と、
請求項1から7のいずれか1項に記載の少なくとも1つの支持器具(53)によって支持構造を支持するベース(37)とを備えるリソグラフィ投影装置。 - デバイス製造方法で、
少なくとも部分的に放射線感光材料の層で覆われた基板(27)を設けるステップと、
放射線システムを使用して放射線の投影ビームを提供するステップと、
投影ビームの断面に模様を与えるため、模様付け手段を使用するステップと、
放射線感光材料の層の目標部分に模様付けした放射線ビームを投影するステップとを備え、
ベース(37)に対して少なくとも模様付け手段を支持する支持構造(39)の位置を制御するため、請求項1から9いずれか1項に記載の支持器具(53)を使用することを特徴とするデバイス製造方法。 - 基準支持器具(201)によって支持器具に接続可能な少なくとも1つの基準物体(200)を備え、
前記基準物体および基準支持器具が基準質量ばねシステムを形成し、さらに、
基準物体の少なくとも1つに対して被支持部品の位置の特性を感知する少なくとも1つの位置センサ(202)を備え、位置センサが、感知した位置の特性を表す位置信号を提供するためにセンサ出力を有し、さらに、
位置信号に応答して、被支持部品の位置を調節するため、センサ出力に通信可能な状態で接続されたアクチュエータ(203)を備える、請求項1から8のいずれか1項に記載の支持器具(53)に使用するよう配置構成された位置制御システム。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03076923A EP1486825A1 (en) | 2003-06-13 | 2003-06-13 | Supporting device, lithographic projection apparatus and device manufacturing method using a supporting device and a position control system arranged for use in a supporting device |
EP03077540 | 2003-08-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005294790A JP2005294790A (ja) | 2005-10-20 |
JP4083708B2 true JP4083708B2 (ja) | 2008-04-30 |
Family
ID=34081819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004173318A Expired - Fee Related JP4083708B2 (ja) | 2003-06-13 | 2004-06-11 | 支持器具、リソグラフィ投影装置および支持器具を使用したデバイス製造方法および支持器具内で使用するよう配置構成された位置制御システム |
Country Status (2)
Country | Link |
---|---|
US (1) | US7084956B2 (ja) |
JP (1) | JP4083708B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2447776A2 (en) | 2010-10-29 | 2012-05-02 | Canon Kabushiki Kaisha | Vibration control apparatus, lithography apparatus, and method of manufacturing article |
US9671704B2 (en) | 2013-11-29 | 2017-06-06 | Canon Kabushiki Kaisha | Vibration reduction apparatus, lithography apparatus and method of manufacturing article |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE602004030259D1 (de) | 2003-09-05 | 2011-01-05 | Koninkl Philips Electronics Nv | Stellgliedanordnung für aktive schwingungsisolierung mit einer trägheitsbezugsmasse |
US7492441B2 (en) * | 2005-12-22 | 2009-02-17 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method incorporating a pressure shield |
US8027023B2 (en) * | 2006-05-19 | 2011-09-27 | Carl Zeiss Smt Gmbh | Optical imaging device and method for reducing dynamic fluctuations in pressure difference |
DE102006023876A1 (de) * | 2006-05-19 | 2007-11-22 | Carl Zeiss Smt Ag | Optische Abbildungseinrichtung |
EP1895189B1 (de) * | 2006-08-31 | 2009-03-04 | Integrated Dynamics Engineering GmbH | Aktives Schwingungsisolationssystem mittels hysteresefreier pneumatischer Lagerung |
JP5036259B2 (ja) * | 2006-09-14 | 2012-09-26 | キヤノン株式会社 | 除振装置、露光装置及びデバイス製造方法 |
JP2008166497A (ja) * | 2006-12-28 | 2008-07-17 | Canon Inc | 露光装置およびそれを用いたデバイス製造方法 |
TW200846838A (en) * | 2007-01-26 | 2008-12-01 | Nikon Corp | Support structure and exposure apparatus |
US7969550B2 (en) * | 2007-04-19 | 2011-06-28 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20090153832A1 (en) * | 2007-12-18 | 2009-06-18 | Yosuke Tatsuzaki | Apparatus and method for isolating vibrations in a lithography machine using two active control units |
EP2075484A1 (en) * | 2007-12-31 | 2009-07-01 | Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO | An active vibration isolation system having an inertial reference mass |
NL1036568A1 (nl) * | 2008-03-18 | 2009-09-21 | Asml Netherlands Bv | Actuator system, lithographic apparatus, and device manufacturing method. |
EP2469340B1 (en) | 2010-12-21 | 2021-01-06 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN103062283B (zh) | 2012-12-19 | 2014-10-29 | 哈尔滨工业大学 | 气浮球轴承角度解耦的零刚度隔振器与隔振系统 |
CN103047341B (zh) | 2012-12-19 | 2014-06-11 | 哈尔滨工业大学 | 气浮球轴承角度解耦与磁悬浮平面驱动定位的隔振器 |
CN103047344B (zh) * | 2012-12-19 | 2015-07-08 | 哈尔滨工业大学 | 双层气浮正交解耦与滚动关节轴承角度解耦的磁浮隔振器 |
CN103047346B (zh) | 2012-12-19 | 2014-06-11 | 哈尔滨工业大学 | 滚动关节轴承角度解耦的磁浮零刚度隔振器与隔振系统 |
CN103047342B (zh) * | 2012-12-19 | 2015-03-25 | 哈尔滨工业大学 | 共面气浮正交解耦与柔性膜角度解耦的磁悬浮平面驱动定位隔振器 |
CN103062285B (zh) * | 2012-12-19 | 2015-04-22 | 哈尔滨工业大学 | 共面气浮正交解耦与柔性膜角度解耦的零刚度隔振器 |
CN105159034B (zh) * | 2015-09-21 | 2017-08-25 | 中国科学院长春光学精密机械与物理研究所 | 光刻投影物镜容错控制装置 |
US10782620B2 (en) | 2015-11-23 | 2020-09-22 | Asml Netherlands B.V. | Vibration isolation device, lithographic apparatus and method to tune a vibration isolation device |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW318255B (ja) * | 1995-05-30 | 1997-10-21 | Philips Electronics Nv | |
EP1341044A3 (en) * | 1995-05-30 | 2003-10-29 | ASML Netherlands B.V. | Positioning device with a reference frame for a measuring system |
JP3696928B2 (ja) * | 1995-05-30 | 2005-09-21 | キヤノン株式会社 | 能動除振装置および半導体露光装置 |
US6144442A (en) * | 1997-10-23 | 2000-11-07 | U.S. Philips Corp | Pneumatic support device with a controlled gas supply, and lithographic device provided with such a support device |
JP3630964B2 (ja) * | 1997-12-26 | 2005-03-23 | キヤノン株式会社 | ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法 |
WO2000014779A1 (fr) * | 1998-09-03 | 2000-03-16 | Nikon Corporation | Appareil et procede d'exposition, dispositif et procede de production dudit appareil |
JP2001264008A (ja) * | 2000-03-14 | 2001-09-26 | Kyocera Corp | レーザー干渉測長システム及び露光装置 |
JP2001267226A (ja) * | 2000-03-21 | 2001-09-28 | Nikon Corp | 駆動装置及び露光装置、並びにデバイス及びその製造方法 |
EP1321822A1 (en) * | 2001-12-21 | 2003-06-25 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2004
- 2004-06-10 US US10/864,806 patent/US7084956B2/en active Active
- 2004-06-11 JP JP2004173318A patent/JP4083708B2/ja not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2447776A2 (en) | 2010-10-29 | 2012-05-02 | Canon Kabushiki Kaisha | Vibration control apparatus, lithography apparatus, and method of manufacturing article |
JP2012097786A (ja) * | 2010-10-29 | 2012-05-24 | Canon Inc | 振動制御装置、リソグラフィー装置、および、物品の製造方法 |
US9671704B2 (en) | 2013-11-29 | 2017-06-06 | Canon Kabushiki Kaisha | Vibration reduction apparatus, lithography apparatus and method of manufacturing article |
Also Published As
Publication number | Publication date |
---|---|
JP2005294790A (ja) | 2005-10-20 |
US20050018160A1 (en) | 2005-01-27 |
US7084956B2 (en) | 2006-08-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4083708B2 (ja) | 支持器具、リソグラフィ投影装置および支持器具を使用したデバイス製造方法および支持器具内で使用するよう配置構成された位置制御システム | |
JP4512081B2 (ja) | リソグラフィ投影装置、支持アセンブリ、およびデバイス製造方法 | |
US6337484B1 (en) | Positioning device and lithographic projection apparatus comprising such a device | |
KR100574208B1 (ko) | 주사형 노광장치 및 그의 제조방법, 및 디바이스 제조방법 | |
TWI474124B (zh) | 微影裝置,投影組件及主動阻尼 | |
TWI411889B (zh) | 移動體裝置及曝光裝置 | |
JP5238678B2 (ja) | オブジェクトを制動させるための方法、アクティブダンピングシステムおよびリソグラフィ装置 | |
EP1001512A2 (en) | Actuator and transducer | |
US6710353B1 (en) | Actuator and transducer | |
KR20020062201A (ko) | 리소그래피 장치, 디바이스 제조방법 및 그 디바이스 | |
US20020093637A1 (en) | Reaction mass for a stage device | |
KR20120019404A (ko) | 대상물 테이블을 위치시키는 스테이지 장치, 리소그래피 장치 및 방법 | |
JP6741739B2 (ja) | 粒子ビーム装置 | |
JP5036259B2 (ja) | 除振装置、露光装置及びデバイス製造方法 | |
US7110083B2 (en) | Lithographic apparatus and device manufacturing method | |
JP2007240396A (ja) | 振動検出センサ、防振装置、及び露光装置 | |
US6774981B1 (en) | Modular exposure apparatus with removable optical device and improved isolation of the optical device | |
EP1486825A1 (en) | Supporting device, lithographic projection apparatus and device manufacturing method using a supporting device and a position control system arranged for use in a supporting device | |
KR20120031075A (ko) | 노광 장치 및 디바이스 제조 방법 | |
KR100597034B1 (ko) | 압전식으로 제어되는 자기 액추에이터 | |
US20110069291A1 (en) | Physical sensor for autofocus system | |
US20040119964A1 (en) | Double isolation fine stage | |
US8619361B2 (en) | Direct derivative feedforward vibration compensation system | |
US20070115451A1 (en) | Lithographic System with Separated Isolation Structures | |
US6980279B2 (en) | Interferometer system for measuring a height of wafer stage |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD01 | Notification of change of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7421 Effective date: 20060919 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061127 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070620 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070626 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20070925 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20070928 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20071226 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080205 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080213 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4083708 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110222 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110222 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120222 Year of fee payment: 4 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130222 Year of fee payment: 5 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130222 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140222 Year of fee payment: 6 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |