JP4080723B2 - レジスト用モノマーの製造方法 - Google Patents

レジスト用モノマーの製造方法 Download PDF

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Publication number
JP4080723B2
JP4080723B2 JP2001332995A JP2001332995A JP4080723B2 JP 4080723 B2 JP4080723 B2 JP 4080723B2 JP 2001332995 A JP2001332995 A JP 2001332995A JP 2001332995 A JP2001332995 A JP 2001332995A JP 4080723 B2 JP4080723 B2 JP 4080723B2
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JP
Japan
Prior art keywords
formula
monomer
resist
meth
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2001332995A
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English (en)
Japanese (ja)
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JP2003137839A5 (enExample
JP2003137839A (ja
Inventor
公夫 田村
直志 村田
康一 吉田
求 大北
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
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Application filed by Mitsubishi Chemical Corp, Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Chemical Corp
Priority to JP2001332995A priority Critical patent/JP4080723B2/ja
Publication of JP2003137839A publication Critical patent/JP2003137839A/ja
Publication of JP2003137839A5 publication Critical patent/JP2003137839A5/ja
Application granted granted Critical
Publication of JP4080723B2 publication Critical patent/JP4080723B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Materials For Photolithography (AREA)
  • Furan Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2001332995A 2001-10-30 2001-10-30 レジスト用モノマーの製造方法 Expired - Lifetime JP4080723B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001332995A JP4080723B2 (ja) 2001-10-30 2001-10-30 レジスト用モノマーの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001332995A JP4080723B2 (ja) 2001-10-30 2001-10-30 レジスト用モノマーの製造方法

Publications (3)

Publication Number Publication Date
JP2003137839A JP2003137839A (ja) 2003-05-14
JP2003137839A5 JP2003137839A5 (enExample) 2005-06-30
JP4080723B2 true JP4080723B2 (ja) 2008-04-23

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ID=19148335

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JP2001332995A Expired - Lifetime JP4080723B2 (ja) 2001-10-30 2001-10-30 レジスト用モノマーの製造方法

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JP (1) JP4080723B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008106084A (ja) 2006-10-23 2008-05-08 Maruzen Petrochem Co Ltd 半導体リソグラフィー用共重合体、組成物並びに該共重合体の製造方法
JP5430857B2 (ja) * 2008-02-01 2014-03-05 株式会社ダイセル 有機化合物の精製方法
JP5939009B2 (ja) * 2012-04-17 2016-06-22 三菱レイヨン株式会社 （メタ）アクリル酸エステルの評価方法及びリソグラフィー用共重合体の製造方法
EP3419958B1 (en) 2016-02-25 2020-04-29 3M Innovative Properties Company Methods of making (alk)acrylic esters in flow reactors

Also Published As

Publication number Publication date
JP2003137839A (ja) 2003-05-14

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