JP4065684B2 - 重合体、化学増幅型レジスト組成物、および、パターン形成方法 - Google Patents

重合体、化学増幅型レジスト組成物、および、パターン形成方法 Download PDF

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Publication number
JP4065684B2
JP4065684B2 JP2001368904A JP2001368904A JP4065684B2 JP 4065684 B2 JP4065684 B2 JP 4065684B2 JP 2001368904 A JP2001368904 A JP 2001368904A JP 2001368904 A JP2001368904 A JP 2001368904A JP 4065684 B2 JP4065684 B2 JP 4065684B2
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JP
Japan
Prior art keywords
group
polymer
methyl
parts
decan
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2001368904A
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English (en)
Japanese (ja)
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JP2002275215A5 (enExample
JP2002275215A (ja
Inventor
良啓 加門
匡之 藤原
英昭 桑野
陽 百瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority to JP2001368904A priority Critical patent/JP4065684B2/ja
Application filed by Mitsubishi Chemical Corp, Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Chemical Corp
Priority to DE60136100T priority patent/DE60136100D1/de
Priority to KR10-2003-7007625A priority patent/KR100531535B1/ko
Priority to PCT/JP2001/010628 priority patent/WO2002046179A1/ja
Priority to US10/433,570 priority patent/US7041838B2/en
Priority to EP01999568A priority patent/EP1352904B1/en
Priority to TW090130267A priority patent/TW583182B/zh
Publication of JP2002275215A publication Critical patent/JP2002275215A/ja
Priority to US10/974,876 priority patent/US7339014B2/en
Publication of JP2002275215A5 publication Critical patent/JP2002275215A5/ja
Application granted granted Critical
Publication of JP4065684B2 publication Critical patent/JP4065684B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2001368904A 2000-12-06 2001-12-03 重合体、化学増幅型レジスト組成物、および、パターン形成方法 Expired - Lifetime JP4065684B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2001368904A JP4065684B2 (ja) 2001-01-09 2001-12-03 重合体、化学増幅型レジスト組成物、および、パターン形成方法
KR10-2003-7007625A KR100531535B1 (ko) 2000-12-06 2001-12-05 (메트)아크릴산 에스테르, 그 원료 알콜, 이들의 제조방법, 이 (메트)아크릴산 에스테르를 중합하여 수득되는중합체, 화학 증폭형 레지스트 조성물, 및 패턴 형성 방법
PCT/JP2001/010628 WO2002046179A1 (en) 2000-12-06 2001-12-05 (meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns
US10/433,570 US7041838B2 (en) 2000-12-06 2001-12-05 (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns
DE60136100T DE60136100D1 (de) 2000-12-06 2001-12-05 (meth)acrylatester, alkohol-ausgangsverbindungen für deren herstellung, verfahren zur herstellung dieser beiden verbindungen, polymere der ester, chemisch amplifizierbare schutzlackzusammensetzungen und verfahren zur bildung von mustern
EP01999568A EP1352904B1 (en) 2000-12-06 2001-12-05 (meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns
TW090130267A TW583182B (en) 2000-12-06 2001-12-06 (Meth)acrylic ester, its raw alcohol, its method of preparation, polymer made by polymerization of said (meth)acrylic ester, chemical amplified resist composition, and method for forming pattern
US10/974,876 US7339014B2 (en) 2000-12-06 2004-10-28 (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001001728 2001-01-09
JP2001-1728 2001-01-09
JP2001368904A JP4065684B2 (ja) 2001-01-09 2001-12-03 重合体、化学増幅型レジスト組成物、および、パターン形成方法

Publications (3)

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JP2002275215A JP2002275215A (ja) 2002-09-25
JP2002275215A5 JP2002275215A5 (enExample) 2005-04-07
JP4065684B2 true JP4065684B2 (ja) 2008-03-26

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JP2001368904A Expired - Lifetime JP4065684B2 (ja) 2000-12-06 2001-12-03 重合体、化学増幅型レジスト組成物、および、パターン形成方法

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JP (1) JP4065684B2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004067592A1 (ja) * 2003-01-31 2004-08-12 Mitsubishi Rayon Co., Ltd. レジスト用重合体およびレジスト組成物
JP2005010488A (ja) * 2003-06-19 2005-01-13 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物
JP2005029527A (ja) 2003-07-09 2005-02-03 Central Glass Co Ltd フッ素系環状化合物、フッ素系重合性単量体、フッ素系高分子化合物、並びにそれを用いたレジスト材料及びパターン形成方法
JP2005171093A (ja) * 2003-12-11 2005-06-30 Maruzen Petrochem Co Ltd 半導体リソグラフィー用共重合体の製造方法及び該方法により得られる半導体リソグラフィー用共重合体
JP4669745B2 (ja) * 2004-06-28 2011-04-13 富士フイルム株式会社 感光性組成物及びそれを用いたパターン形成方法
JP2006169147A (ja) * 2004-12-14 2006-06-29 Daicel Chem Ind Ltd 重合性不飽和カルボン酸エステル、高分子化合物、フォトレジスト用樹脂組成物及び半導体の製造法
JP2010285424A (ja) * 2009-05-11 2010-12-24 Mitsubishi Rayon Co Ltd ラクトン環を有する化合物およびこれを用いた重合体
JP5572127B2 (ja) * 2011-06-08 2014-08-13 株式会社ダイセル 脂環式骨格を有する高分子化合物
CN105061454B (zh) 2011-06-14 2019-09-27 三菱化学株式会社 醇化合物的制造方法、（甲基）丙烯酸酯的制造方法
US9994538B2 (en) 2015-02-02 2018-06-12 Basf Se Latent acids and their use
KR102077500B1 (ko) * 2015-05-14 2020-02-14 후지필름 가부시키가이샤 패턴 형성 방법, 전자 디바이스의 제조 방법, 및 감활성광선성 또는 감방사선성 수지 조성물
JP6705286B2 (ja) * 2016-05-24 2020-06-03 三菱ケミカル株式会社 重合性単量体の製造方法、リソグラフィー用重合体の製造方法およびレジスト組成物の製造方法

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