JP4049236B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4049236B2
JP4049236B2 JP28576199A JP28576199A JP4049236B2 JP 4049236 B2 JP4049236 B2 JP 4049236B2 JP 28576199 A JP28576199 A JP 28576199A JP 28576199 A JP28576199 A JP 28576199A JP 4049236 B2 JP4049236 B2 JP 4049236B2
Authority
JP
Japan
Prior art keywords
group
alkyl group
alicyclic hydrocarbon
carbon atoms
branched alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP28576199A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001109153A5 (enrdf_load_stackoverflow
JP2001109153A (ja
Inventor
健一郎 佐藤
邦彦 児玉
利明 青合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP28576199A priority Critical patent/JP4049236B2/ja
Priority to TW089120779A priority patent/TWI227377B/zh
Priority to KR1020000058916A priority patent/KR100707769B1/ko
Priority to EP00121277A priority patent/EP1091248B1/en
Priority to US09/684,888 priority patent/US6602646B1/en
Publication of JP2001109153A publication Critical patent/JP2001109153A/ja
Priority to US10/022,363 priority patent/US6670095B2/en
Publication of JP2001109153A5 publication Critical patent/JP2001109153A5/ja
Application granted granted Critical
Publication of JP4049236B2 publication Critical patent/JP4049236B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
JP28576199A 1999-10-06 1999-10-06 ポジ型レジスト組成物 Expired - Lifetime JP4049236B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP28576199A JP4049236B2 (ja) 1999-10-06 1999-10-06 ポジ型レジスト組成物
TW089120779A TWI227377B (en) 1999-10-06 2000-10-05 Positive-type resist composition
EP00121277A EP1091248B1 (en) 1999-10-06 2000-10-06 Postive-working resist composition
US09/684,888 US6602646B1 (en) 1999-10-06 2000-10-06 Positive-working resist composition
KR1020000058916A KR100707769B1 (ko) 1999-10-06 2000-10-06 포지티브 레지스트 조성물
US10/022,363 US6670095B2 (en) 1999-10-06 2001-12-20 Positive-working resist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28576199A JP4049236B2 (ja) 1999-10-06 1999-10-06 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2001109153A JP2001109153A (ja) 2001-04-20
JP2001109153A5 JP2001109153A5 (enrdf_load_stackoverflow) 2005-07-07
JP4049236B2 true JP4049236B2 (ja) 2008-02-20

Family

ID=17695719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28576199A Expired - Lifetime JP4049236B2 (ja) 1999-10-06 1999-10-06 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4049236B2 (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI349831B (en) 2003-02-20 2011-10-01 Maruzen Petrochem Co Ltd Resist polymer and method for producing the polymer
JP5062943B2 (ja) * 2003-08-21 2012-10-31 三菱レイヨン株式会社 レジスト用共重合体およびその製造方法、レジスト組成物、ならびにパターン形成方法
JP3759526B2 (ja) 2003-10-30 2006-03-29 丸善石油化学株式会社 半導体リソグラフィー用共重合体の製造方法
US7910282B2 (en) 2004-04-30 2011-03-22 Maruzen Petrochemical Co., Ltd. Copolymer for semiconductor lithography and producing method thereof, and composition
JP4796811B2 (ja) * 2005-09-22 2011-10-19 富士フイルム株式会社 ポジ型レジスト組成物およびそれを用いたパターン形成方法
JP2007051299A (ja) * 2006-10-04 2007-03-01 Daicel Chem Ind Ltd フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物
JP5433268B2 (ja) * 2009-03-19 2014-03-05 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法
JP2012042837A (ja) * 2010-08-20 2012-03-01 Fujifilm Corp ポジ型感光性組成物、硬化膜の形成方法、硬化膜、液晶表示装置、及び、有機ｅｌ表示装置
JP6299076B2 (ja) * 2013-04-05 2018-03-28 三菱ケミカル株式会社 リソグラフィー用重合体の製造方法、レジスト組成物の製造方法、およびパターンが形成された基板の製造方法
JP6131910B2 (ja) * 2014-05-28 2017-05-24 信越化学工業株式会社 レジスト組成物及びパターン形成方法
JP2022135799A (ja) * 2021-03-05 2022-09-15 富士フイルム株式会社 レジスト組成物用樹脂溶液、レジスト組成物用樹脂溶液の製造方法、レジスト組成物、レジスト組成物の製造方法、パターン形成方法、電子デバイスの製造方法、及びレジスト組成物用樹脂溶液の保管方法
CN115185160B (zh) * 2022-09-09 2023-06-27 之江实验室 基于纤维素衍生物的激光直写光刻胶组合物及图案化方法

Also Published As

Publication number Publication date
JP2001109153A (ja) 2001-04-20

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