JP4030313B2 - アダマンタン誘導体の製造方法 - Google Patents

アダマンタン誘導体の製造方法 Download PDF

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Publication number
JP4030313B2
JP4030313B2 JP2002010155A JP2002010155A JP4030313B2 JP 4030313 B2 JP4030313 B2 JP 4030313B2 JP 2002010155 A JP2002010155 A JP 2002010155A JP 2002010155 A JP2002010155 A JP 2002010155A JP 4030313 B2 JP4030313 B2 JP 4030313B2
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chloride
group
acid
formula
reaction
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Japanese (ja)
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JP2003212823A5 (https=
JP2003212823A (ja
Inventor
竜一 安齋
克明 菊池
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
JP2002010155A 2002-01-18 2002-01-18 アダマンタン誘導体の製造方法 Expired - Lifetime JP4030313B2 (ja)

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JP2002010155A JP4030313B2 (ja) 2002-01-18 2002-01-18 アダマンタン誘導体の製造方法

Applications Claiming Priority (1)

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JP2002010155A JP4030313B2 (ja) 2002-01-18 2002-01-18 アダマンタン誘導体の製造方法

Related Child Applications (1)

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JP2007203922A Division JP4635031B2 (ja) 2007-08-06 2007-08-06 アダマンタン誘導体の製造方法

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JP2003212823A JP2003212823A (ja) 2003-07-30
JP2003212823A5 JP2003212823A5 (https=) 2005-08-04
JP4030313B2 true JP4030313B2 (ja) 2008-01-09

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200503988A (en) * 2003-06-09 2005-02-01 Idemitsu Petrochemical Co Adamantyl vinyl ether compound and production process for the same
JP5778985B2 (ja) * 2004-02-20 2015-09-16 東京応化工業株式会社 高分子化合物、該高分子化合物を含有するフォトレジスト組成物、およびレジストパターン形成方法
WO2005111097A1 (ja) * 2004-05-18 2005-11-24 Idemitsu Kosan Co., Ltd. アダマンタン誘導体、その製造方法及びフォトレジスト用感光材料
JP4539250B2 (ja) * 2004-09-14 2010-09-08 東亞合成株式会社 芳香族エステル化合物の製造方法
JP4191150B2 (ja) 2005-02-16 2008-12-03 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP4754265B2 (ja) * 2005-05-17 2011-08-24 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
US7939682B2 (en) 2005-08-17 2011-05-10 Idemitsu Kosan Co., Ltd. Fluorine-containing adamantane derivative, fluorine-containing adamantane derivative having polymerizable group, and resin composition containing same
JP4927568B2 (ja) * 2007-01-10 2012-05-09 ユニマテック株式会社 カルボン酸誘導体組成物の製造方法
JP4635031B2 (ja) * 2007-08-06 2011-02-16 三菱レイヨン株式会社 アダマンタン誘導体の製造方法
JP5586898B2 (ja) * 2009-08-24 2014-09-10 株式会社ダイセル 不飽和カルボン酸ヘミアセタールエステル、高分子化合物及びフォトレジスト用樹脂組成物
US10316046B2 (en) * 2015-03-10 2019-06-11 National Institute Of Advanced Industrial Science And Technology Method for producing acyloxysilanes, acyloxysilanes obtained thereby, and use of same

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JP2003212823A (ja) 2003-07-30

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