JP4030313B2 - アダマンタン誘導体の製造方法 - Google Patents

アダマンタン誘導体の製造方法 Download PDF

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Publication number
JP4030313B2
JP4030313B2 JP2002010155A JP2002010155A JP4030313B2 JP 4030313 B2 JP4030313 B2 JP 4030313B2 JP 2002010155 A JP2002010155 A JP 2002010155A JP 2002010155 A JP2002010155 A JP 2002010155A JP 4030313 B2 JP4030313 B2 JP 4030313B2
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chloride
group
acid
formula
reaction
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JP2002010155A
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Japanese (ja)
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JP2003212823A (ja
JP2003212823A5 (https=
Inventor
竜一 安齋
克明 菊池
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
JP2002010155A 2002-01-18 2002-01-18 アダマンタン誘導体の製造方法 Expired - Lifetime JP4030313B2 (ja)

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JP2002010155A JP4030313B2 (ja) 2002-01-18 2002-01-18 アダマンタン誘導体の製造方法

Applications Claiming Priority (1)

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JP2002010155A JP4030313B2 (ja) 2002-01-18 2002-01-18 アダマンタン誘導体の製造方法

Related Child Applications (1)

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JP2007203922A Division JP4635031B2 (ja) 2007-08-06 2007-08-06 アダマンタン誘導体の製造方法

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JP2003212823A JP2003212823A (ja) 2003-07-30
JP2003212823A5 JP2003212823A5 (https=) 2005-08-04
JP4030313B2 true JP4030313B2 (ja) 2008-01-09

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1486480A1 (en) * 2003-06-09 2004-12-15 Idemitsu Petrochemical Co., Ltd. Adamantyl vinyl ether compound and production process for the same
JP5778985B2 (ja) * 2004-02-20 2015-09-16 東京応化工業株式会社 高分子化合物、該高分子化合物を含有するフォトレジスト組成物、およびレジストパターン形成方法
WO2005111097A1 (ja) * 2004-05-18 2005-11-24 Idemitsu Kosan Co., Ltd. アダマンタン誘導体、その製造方法及びフォトレジスト用感光材料
JP4539250B2 (ja) * 2004-09-14 2010-09-08 東亞合成株式会社 芳香族エステル化合物の製造方法
JP4191150B2 (ja) 2005-02-16 2008-12-03 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP4754265B2 (ja) * 2005-05-17 2011-08-24 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP5042835B2 (ja) 2005-08-17 2012-10-03 出光興産株式会社 含フッ素アダマンタン誘導体、重合性基含有含フッ素アダマンタン誘導体及びそれを含有する樹脂組成物
JP4927568B2 (ja) * 2007-01-10 2012-05-09 ユニマテック株式会社 カルボン酸誘導体組成物の製造方法
JP4635031B2 (ja) * 2007-08-06 2011-02-16 三菱レイヨン株式会社 アダマンタン誘導体の製造方法
JP5586898B2 (ja) * 2009-08-24 2014-09-10 株式会社ダイセル 不飽和カルボン酸ヘミアセタールエステル、高分子化合物及びフォトレジスト用樹脂組成物
JP6739733B2 (ja) * 2015-03-10 2020-08-12 国立研究開発法人産業技術総合研究所 アシロキシシラン類の製造方法、それにより得られるアシロキシシラン類、およびその用途

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JP2003212823A (ja) 2003-07-30

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