JP4030313B2 - アダマンタン誘導体の製造方法 - Google Patents

アダマンタン誘導体の製造方法 Download PDF

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Publication number
JP4030313B2
JP4030313B2 JP2002010155A JP2002010155A JP4030313B2 JP 4030313 B2 JP4030313 B2 JP 4030313B2 JP 2002010155 A JP2002010155 A JP 2002010155A JP 2002010155 A JP2002010155 A JP 2002010155A JP 4030313 B2 JP4030313 B2 JP 4030313B2
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Japan
Prior art keywords
chloride
group
acid
formula
reaction
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JP2002010155A
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Japanese (ja)
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JP2003212823A (ja
JP2003212823A5 (enExample
Inventor
竜一 安齋
克明 菊池
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
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  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2002010155A 2002-01-18 2002-01-18 アダマンタン誘導体の製造方法 Expired - Lifetime JP4030313B2 (ja)

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JP2002010155A JP4030313B2 (ja) 2002-01-18 2002-01-18 アダマンタン誘導体の製造方法

Applications Claiming Priority (1)

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JP2002010155A JP4030313B2 (ja) 2002-01-18 2002-01-18 アダマンタン誘導体の製造方法

Related Child Applications (1)

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JP2007203922A Division JP4635031B2 (ja) 2007-08-06 2007-08-06 アダマンタン誘導体の製造方法

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JP2003212823A JP2003212823A (ja) 2003-07-30
JP2003212823A5 JP2003212823A5 (enExample) 2005-08-04
JP4030313B2 true JP4030313B2 (ja) 2008-01-09

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1486480A1 (en) * 2003-06-09 2004-12-15 Idemitsu Petrochemical Co., Ltd. Adamantyl vinyl ether compound and production process for the same
JP5461472B2 (ja) * 2004-02-20 2014-04-02 東京応化工業株式会社 高分子化合物、該高分子化合物を含有するフォトレジスト組成物、およびレジストパターン形成方法
JP4866237B2 (ja) * 2004-05-18 2012-02-01 出光興産株式会社 アダマンタン誘導体、その製造方法及びフォトレジスト用感光材料
JP4539250B2 (ja) * 2004-09-14 2010-09-08 東亞合成株式会社 芳香族エステル化合物の製造方法
JP4191150B2 (ja) * 2005-02-16 2008-12-03 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP4754265B2 (ja) * 2005-05-17 2011-08-24 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
CN101243028B (zh) 2005-08-17 2012-03-28 出光兴产株式会社 含氟金刚烷衍生物、含有聚合性基团的含氟金刚烷衍生物以及含有它们的树脂组合物
JP4927568B2 (ja) * 2007-01-10 2012-05-09 ユニマテック株式会社 カルボン酸誘導体組成物の製造方法
JP4635031B2 (ja) * 2007-08-06 2011-02-16 三菱レイヨン株式会社 アダマンタン誘導体の製造方法
JP5586898B2 (ja) * 2009-08-24 2014-09-10 株式会社ダイセル 不飽和カルボン酸ヘミアセタールエステル、高分子化合物及びフォトレジスト用樹脂組成物
JP6739733B2 (ja) * 2015-03-10 2020-08-12 国立研究開発法人産業技術総合研究所 アシロキシシラン類の製造方法、それにより得られるアシロキシシラン類、およびその用途

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