JP4029558B2 - Ｎ−スルホニルオキシイミド化合物およびそれを用いた感放射線性樹脂組成物 - Google Patents

Ｎ−スルホニルオキシイミド化合物およびそれを用いた感放射線性樹脂組成物 Download PDF

Info

Publication number
JP4029558B2
JP4029558B2 JP2000336666A JP2000336666A JP4029558B2 JP 4029558 B2 JP4029558 B2 JP 4029558B2 JP 2000336666 A JP2000336666 A JP 2000336666A JP 2000336666 A JP2000336666 A JP 2000336666A JP 4029558 B2 JP4029558 B2 JP 4029558B2
Authority
JP
Japan
Prior art keywords
group
resin
acid
radiation
alkali
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000336666A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001199955A (ja
JP2001199955A5 (enrdf_load_stackoverflow
Inventor
勇 王
英一 小林
正昭 宮路
淳 沼田
努 下川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Priority to JP2000336666A priority Critical patent/JP4029558B2/ja
Publication of JP2001199955A publication Critical patent/JP2001199955A/ja
Publication of JP2001199955A5 publication Critical patent/JP2001199955A5/ja
Application granted granted Critical
Publication of JP4029558B2 publication Critical patent/JP4029558B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Materials For Photolithography (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Pyrrole Compounds (AREA)
  • Indole Compounds (AREA)
JP2000336666A 1999-11-09 2000-11-02 Ｎ−スルホニルオキシイミド化合物およびそれを用いた感放射線性樹脂組成物 Expired - Fee Related JP4029558B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000336666A JP4029558B2 (ja) 1999-11-09 2000-11-02 Ｎ−スルホニルオキシイミド化合物およびそれを用いた感放射線性樹脂組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11-317652 1999-11-09
JP31765299 1999-11-09
JP2000336666A JP4029558B2 (ja) 1999-11-09 2000-11-02 Ｎ−スルホニルオキシイミド化合物およびそれを用いた感放射線性樹脂組成物

Publications (3)

Publication Number Publication Date
JP2001199955A JP2001199955A (ja) 2001-07-24
JP2001199955A5 JP2001199955A5 (enrdf_load_stackoverflow) 2004-08-19
JP4029558B2 true JP4029558B2 (ja) 2008-01-09

Family

ID=26569092

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000336666A Expired - Fee Related JP4029558B2 (ja) 1999-11-09 2000-11-02 Ｎ−スルホニルオキシイミド化合物およびそれを用いた感放射線性樹脂組成物

Country Status (1)

Country Link
JP (1) JP4029558B2 (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
DE60233675D1 (de) 2001-11-30 2009-10-22 Panasonic Corp Bisimidinverbindung, säuregenerator und schutzlackzusammensetzung, die jeweils diese verbindung enthalten, und verfahren zur ausbildung von mustern aus der zusammensetzung
JP4123920B2 (ja) * 2001-12-20 2008-07-23 Ｊｓｒ株式会社 共重合体、重合体混合物および感放射線性樹脂組成物
US6916591B2 (en) 2002-03-22 2005-07-12 Shin-Etsu Chemical Co., Ltd. Photoacid generators, chemically amplified resist compositions, and patterning process
US8043786B2 (en) * 2003-03-05 2011-10-25 Jsr Corporation Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
JP2004307387A (ja) * 2003-04-07 2004-11-04 Tosoh F-Tech Inc ２−（ビシクロ［２．２．１］ヘプト−２−イル）−１，１−ジフルオロエチルスルフィン酸塩または２−（ビシクロ［２．２．１］ヘプト−２−イル）−１，１−ジフルオロエチルスルホン酸塩およびそれらの製造方法
KR100574495B1 (ko) 2004-12-15 2006-04-27 주식회사 하이닉스반도체 광산발생제 중합체, 그 제조방법 및 이를 함유하는상부반사방지막 조성물
EP2060949A4 (en) * 2006-09-08 2011-05-04 Jsr Corp RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING A LOW-MOLECULAR COMPOUND FOR USE THEREIN
US8283106B2 (en) 2007-11-01 2012-10-09 Central Glass Company, Limited Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent
JP4577354B2 (ja) * 2007-12-18 2010-11-10 Ｊｓｒ株式会社 ポジ型感放射線性樹脂組成物およびネガ型感放射線性樹脂組成物
JP6843515B2 (ja) * 2015-03-31 2021-03-17 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法

Also Published As

Publication number Publication date
JP2001199955A (ja) 2001-07-24

Similar Documents

Publication Publication Date Title
JP3116751B2 (ja) 感放射線性樹脂組成物
JPH05232706A (ja) 感放射線性樹脂組成物
JP2001215689A (ja) 感放射線性樹脂組成物
JP4281152B2 (ja) スルホン酸オニウム塩化合物および感放射線性樹脂組成物
JPH06199770A (ja) 新規オニウム塩およびそれを含有する感放射線性樹脂 組成物
KR100673500B1 (ko) Ｎ-술포닐옥시이미드 화합물 및 이를 이용하는 감방사선성수지 조성물
JP3988517B2 (ja) 感放射線性樹脂組成物
JP4665810B2 (ja) ポジ型感放射線性樹脂組成物
JP4029558B2 (ja) Ｎ−スルホニルオキシイミド化合物およびそれを用いた感放射線性樹脂組成物
JP3937996B2 (ja) 感放射性樹脂組成物
JP4715058B2 (ja) 感放射性樹脂組成物
JP4135276B2 (ja) 感放射線性樹脂組成物
JP4019403B2 (ja) レジストパターンの形成方法
JP4135277B2 (ja) 感放射線性樹脂組成物
JP3521710B2 (ja) 感放射線性樹脂組成物
JP3988580B2 (ja) スルホニルオキシム化合物、それを使用する感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物
JP4710193B2 (ja) 感放射線性樹脂組成物
JP4178645B2 (ja) 感放射線性樹脂組成物
JP4951827B2 (ja) スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物
JP4120437B2 (ja) スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物
JPH08184965A (ja) 感放射線性樹脂組成物
JP3861679B2 (ja) 感放射線性樹脂組成物
JP2003327560A (ja) 新規アントラセン誘導体および感放射線性樹脂組成物
JP2005234377A (ja) 感放射線性樹脂組成物
JP3541525B2 (ja) 感放射線性樹脂組成物

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070614

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070619

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070820

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20070925

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20071008

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 4029558

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101026

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101026

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101026

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111026

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111026

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121026

Year of fee payment: 5

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121026

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131026

Year of fee payment: 6

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees