JP4029181B2 - 投影露光装置 - Google Patents

投影露光装置 Download PDF

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Publication number
JP4029181B2
JP4029181B2 JP33284596A JP33284596A JP4029181B2 JP 4029181 B2 JP4029181 B2 JP 4029181B2 JP 33284596 A JP33284596 A JP 33284596A JP 33284596 A JP33284596 A JP 33284596A JP 4029181 B2 JP4029181 B2 JP 4029181B2
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JP
Japan
Prior art keywords
stage
wafer
substrate
exposure
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP33284596A
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English (en)
Japanese (ja)
Other versions
JPH10163098A5 (enrdf_load_stackoverflow
JPH10163098A (ja
Inventor
健爾 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP33284596A priority Critical patent/JP4029181B2/ja
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to CNB971811172A priority patent/CN1144263C/zh
Priority to EP08005700A priority patent/EP1944654A3/en
Priority to SG200103143A priority patent/SG102627A1/en
Priority to DE69738910T priority patent/DE69738910D1/de
Priority to CNB011216425A priority patent/CN1244020C/zh
Priority to IL13013797A priority patent/IL130137A/xx
Priority to HK00103393.7A priority patent/HK1024104B/xx
Priority to PCT/JP1997/004350 priority patent/WO1998024115A1/ja
Priority to SG200103141A priority patent/SG88823A1/en
Priority to SG200005339A priority patent/SG93267A1/en
Priority to SG200103142A priority patent/SG88824A1/en
Priority to CNB011216433A priority patent/CN1244021C/zh
Priority to KR1020017006773A priority patent/KR20030096435A/ko
Priority to AT97913467T priority patent/ATE404906T1/de
Priority to CNB011176652A priority patent/CN1244018C/zh
Priority to EP97913467A priority patent/EP0951054B1/en
Priority to AU50678/98A priority patent/AU5067898A/en
Priority to CNB011176660A priority patent/CN1244019C/zh
Publication of JPH10163098A publication Critical patent/JPH10163098A/ja
Priority to KR1019997004747A priority patent/KR100315249B1/ko
Priority to KR1019997004939A priority patent/KR100314557B1/ko
Priority to US09/666,407 priority patent/US6400441B1/en
Priority to US09/714,620 priority patent/US6549269B1/en
Priority to US09/714,943 priority patent/US6341007B1/en
Priority to US09/716,405 priority patent/US6590634B1/en
Priority to KR1020017006771A priority patent/KR100315250B1/ko
Priority to KR1020017006772A priority patent/KR100315251B1/ko
Priority to US10/024,147 priority patent/US6798491B2/en
Priority to KR1020020072335A priority patent/KR20060086496A/ko
Priority to KR1020020072333A priority patent/KR20060086495A/ko
Priority to US10/879,144 priority patent/US7177008B2/en
Publication of JPH10163098A5 publication Critical patent/JPH10163098A5/ja
Priority to US11/647,492 priority patent/US7256869B2/en
Application granted granted Critical
Publication of JP4029181B2 publication Critical patent/JP4029181B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP33284596A 1996-11-28 1996-11-28 投影露光装置 Expired - Lifetime JP4029181B2 (ja)

Priority Applications (32)

Application Number Priority Date Filing Date Title
JP33284596A JP4029181B2 (ja) 1996-11-28 1996-11-28 投影露光装置
IL13013797A IL130137A (en) 1996-11-28 1997-11-28 Exposure apparatus and an exposure method
SG200103143A SG102627A1 (en) 1996-11-28 1997-11-28 Lithographic device
DE69738910T DE69738910D1 (de) 1996-11-28 1997-11-28 Ausrichtvorrichtung und belichtungsverfahren
CNB011216425A CN1244020C (zh) 1996-11-28 1997-11-28 曝光装置
AU50678/98A AU5067898A (en) 1996-11-28 1997-11-28 Aligner and method for exposure
HK00103393.7A HK1024104B (en) 1996-11-28 1997-11-28 Aligner and method for exposure
PCT/JP1997/004350 WO1998024115A1 (fr) 1996-11-28 1997-11-28 Dispositif d'alignement et procede d'exposition
SG200103141A SG88823A1 (en) 1996-11-28 1997-11-28 Projection exposure apparatus
SG200005339A SG93267A1 (en) 1996-11-28 1997-11-28 An exposure apparatus and an exposure method
SG200103142A SG88824A1 (en) 1996-11-28 1997-11-28 Projection exposure method
CNB011216433A CN1244021C (zh) 1996-11-28 1997-11-28 光刻装置和曝光方法
KR1020017006773A KR20030096435A (ko) 1996-11-28 1997-11-28 노광장치 및 노광방법
EP08005700A EP1944654A3 (en) 1996-11-28 1997-11-28 An exposure apparatus and an exposure method
CNB011176652A CN1244018C (zh) 1996-11-28 1997-11-28 曝光方法和曝光装置
EP97913467A EP0951054B1 (en) 1996-11-28 1997-11-28 Aligner and method for exposure
CNB971811172A CN1144263C (zh) 1996-11-28 1997-11-28 曝光装置以及曝光方法
CNB011176660A CN1244019C (zh) 1996-11-28 1997-11-28 曝光装置以及曝光方法
AT97913467T ATE404906T1 (de) 1996-11-28 1997-11-28 Ausrichtvorrichtung und belichtungsverfahren
KR1019997004747A KR100315249B1 (ko) 1996-11-28 1999-05-28 노광장치 및 노광방법
KR1019997004939A KR100314557B1 (ko) 1996-11-28 1999-06-03 노광장치 및 노광방법
US09/666,407 US6400441B1 (en) 1996-11-28 2000-09-20 Projection exposure apparatus and method
US09/714,620 US6549269B1 (en) 1996-11-28 2000-11-17 Exposure apparatus and an exposure method
US09/714,943 US6341007B1 (en) 1996-11-28 2000-11-20 Exposure apparatus and method
US09/716,405 US6590634B1 (en) 1996-11-28 2000-11-21 Exposure apparatus and method
KR1020017006771A KR100315250B1 (ko) 1996-11-28 2001-05-30 노광장치 및 노광방법
KR1020017006772A KR100315251B1 (ko) 1996-11-28 2001-05-30 노광장치 및 노광방법
US10/024,147 US6798491B2 (en) 1996-11-28 2001-12-21 Exposure apparatus and an exposure method
KR1020020072335A KR20060086496A (ko) 1996-11-28 2002-11-20 노광장치 및 노광방법
KR1020020072333A KR20060086495A (ko) 1996-11-28 2002-11-20 노광장치 및 노광방법
US10/879,144 US7177008B2 (en) 1996-11-28 2004-06-30 Exposure apparatus and method
US11/647,492 US7256869B2 (en) 1996-11-28 2006-12-29 Exposure apparatus and an exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33284596A JP4029181B2 (ja) 1996-11-28 1996-11-28 投影露光装置

Publications (3)

Publication Number Publication Date
JPH10163098A JPH10163098A (ja) 1998-06-19
JPH10163098A5 JPH10163098A5 (enrdf_load_stackoverflow) 2005-08-11
JP4029181B2 true JP4029181B2 (ja) 2008-01-09

Family

ID=18259443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33284596A Expired - Lifetime JP4029181B2 (ja) 1996-11-28 1996-11-28 投影露光装置

Country Status (1)

Country Link
JP (1) JP4029181B2 (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001023935A1 (fr) 1999-09-29 2001-04-05 Nikon Corporation Procede et dispositif d'exposition par projection, et systeme optique de projection
WO2001023933A1 (fr) 1999-09-29 2001-04-05 Nikon Corporation Systeme optique de projection
TWI223734B (en) * 1999-12-21 2004-11-11 Asml Netherlands Bv Crash prevention in positioning apparatus for use in lithographic projection apparatus
US6836093B1 (en) 1999-12-21 2004-12-28 Nikon Corporation Exposure method and apparatus
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
JP2002287023A (ja) 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
JP3966211B2 (ja) 2002-05-08 2007-08-29 株式会社ニコン 露光方法、露光装置及びデバイス製造方法
SG2012031209A (en) 2003-04-11 2015-07-30 Nippon Kogaku Kk Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
JP4315420B2 (ja) 2003-04-18 2009-08-19 キヤノン株式会社 露光装置及び露光方法
WO2004114380A1 (ja) * 2003-06-19 2004-12-29 Nikon Corporation 露光装置及びデバイス製造方法
KR101181684B1 (ko) 2003-08-07 2012-09-19 가부시키가이샤 니콘 노광 방법 및 노광 장치, 스테이지 장치, 그리고 디바이스제조 방법
US7193722B2 (en) * 2003-12-30 2007-03-20 Asml Netherlands B.V. Lithographic apparatus with disturbance correction system and device manufacturing method
US7589822B2 (en) * 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
US20090153824A1 (en) * 2007-12-17 2009-06-18 Kla-Tencor Corporation Multiple chuck scanning stage
US8610878B2 (en) * 2010-03-04 2013-12-17 Asml Netherlands B.V. Lithographic apparatus and method
JP6278833B2 (ja) * 2014-05-21 2018-02-14 キヤノン株式会社 リソグラフィ装置、および物品の製造方法
TWI743845B (zh) * 2015-03-31 2021-10-21 日商尼康股份有限公司 曝光裝置、平面顯示器之製造方法、元件製造方法、及曝光方法

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Publication number Publication date
JPH10163098A (ja) 1998-06-19

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