JP4028864B2 - パターン欠陥検査方法および検査装置 - Google Patents

パターン欠陥検査方法および検査装置 Download PDF

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Publication number
JP4028864B2
JP4028864B2 JP2004289636A JP2004289636A JP4028864B2 JP 4028864 B2 JP4028864 B2 JP 4028864B2 JP 2004289636 A JP2004289636 A JP 2004289636A JP 2004289636 A JP2004289636 A JP 2004289636A JP 4028864 B2 JP4028864 B2 JP 4028864B2
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Japan
Prior art keywords
image
electron beam
sample
defect inspection
defect
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JP2004289636A
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Japanese (ja)
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JP2005101619A (ja
JP2005101619A5 (enExample
Inventor
博之 品田
裕介 矢島
久弥 村越
正樹 長谷川
真理 野副
敦子 ▲高▼藤
勝也 杉山
勝廣 黒田
馨 梅村
康継 宇佐美
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Hitachi Ltd
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Hitachi Ltd
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Priority to JP2004289636A priority Critical patent/JP4028864B2/ja
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Publication of JP2005101619A5 publication Critical patent/JP2005101619A5/ja
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Publication of JP4028864B2 publication Critical patent/JP4028864B2/ja
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  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Input (AREA)
  • Facsimile Scanning Arrangements (AREA)
  • Image Analysis (AREA)
JP2004289636A 2004-10-01 2004-10-01 パターン欠陥検査方法および検査装置 Expired - Lifetime JP4028864B2 (ja)

Priority Applications (1)

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JP2004289636A JP4028864B2 (ja) 2004-10-01 2004-10-01 パターン欠陥検査方法および検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004289636A JP4028864B2 (ja) 2004-10-01 2004-10-01 パターン欠陥検査方法および検査装置

Related Parent Applications (1)

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JP2003432567A Division JP2004151119A (ja) 2003-12-26 2003-12-26 パターン欠陥検査方法および検査装置

Publications (3)

Publication Number Publication Date
JP2005101619A JP2005101619A (ja) 2005-04-14
JP2005101619A5 JP2005101619A5 (enExample) 2006-10-05
JP4028864B2 true JP4028864B2 (ja) 2007-12-26

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JP2004289636A Expired - Lifetime JP4028864B2 (ja) 2004-10-01 2004-10-01 パターン欠陥検査方法および検査装置

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JP (1) JP4028864B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4870450B2 (ja) * 2006-02-27 2012-02-08 株式会社日立ハイテクノロジーズ 検査装置、および検査方法
JP4903469B2 (ja) * 2006-03-28 2012-03-28 富士通セミコンダクター株式会社 欠陥検出方法
JP2009294022A (ja) * 2008-06-04 2009-12-17 Hitachi Ltd 検査方法および装置
JP5542095B2 (ja) * 2011-06-21 2014-07-09 株式会社日立ハイテクノロジーズ 検査装置
JP6604751B2 (ja) * 2015-06-18 2019-11-13 株式会社ホロン 電子を用いた超高速検査装置および電子を用いた超高速検査方法
JP6803440B2 (ja) * 2019-10-15 2020-12-23 株式会社ホロン 電子を用いた超高速検査装置
CN115793353B (zh) * 2022-11-13 2025-12-19 无锡奥特维科技股份有限公司 一种光路限定元件及使用该元件的检测方法、装置
EP4474805A1 (en) * 2023-05-15 2024-12-11 Jeol Ltd. Analysis device and analysis method

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JP2005101619A (ja) 2005-04-14

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