JP3982958B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP3982958B2
JP3982958B2 JP24334699A JP24334699A JP3982958B2 JP 3982958 B2 JP3982958 B2 JP 3982958B2 JP 24334699 A JP24334699 A JP 24334699A JP 24334699 A JP24334699 A JP 24334699A JP 3982958 B2 JP3982958 B2 JP 3982958B2
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Japan
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group
acid
groups
branched
resin
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Expired - Fee Related
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JP24334699A
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English (en)
Japanese (ja)
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JP2001066779A5 (enExample
JP2001066779A (ja
Inventor
亨 藤森
史郎 丹
慎一 漢那
邦彦 児玉
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP24334699A priority Critical patent/JP3982958B2/ja
Publication of JP2001066779A publication Critical patent/JP2001066779A/ja
Publication of JP2001066779A5 publication Critical patent/JP2001066779A5/ja
Application granted granted Critical
Publication of JP3982958B2 publication Critical patent/JP3982958B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP24334699A 1999-08-30 1999-08-30 ポジ型感光性組成物 Expired - Fee Related JP3982958B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24334699A JP3982958B2 (ja) 1999-08-30 1999-08-30 ポジ型感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24334699A JP3982958B2 (ja) 1999-08-30 1999-08-30 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JP2001066779A JP2001066779A (ja) 2001-03-16
JP2001066779A5 JP2001066779A5 (enExample) 2005-07-07
JP3982958B2 true JP3982958B2 (ja) 2007-09-26

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ID=17102473

Family Applications (1)

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JP24334699A Expired - Fee Related JP3982958B2 (ja) 1999-08-30 1999-08-30 ポジ型感光性組成物

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JP (1) JP3982958B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4092083B2 (ja) * 2001-03-21 2008-05-28 富士フイルム株式会社 電子線又はｘ線用ネガ型レジスト組成物
US7192681B2 (en) * 2001-07-05 2007-03-20 Fuji Photo Film Co., Ltd. Positive photosensitive composition
US6773474B2 (en) 2002-04-19 2004-08-10 3M Innovative Properties Company Coated abrasive article
KR101036501B1 (ko) 2002-11-22 2011-05-24 후지필름 가부시키가이샤 포지티브형 레지스트 조성물 및 그것을 사용한 패턴형성방법
JP4414721B2 (ja) * 2002-11-22 2010-02-10 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4115309B2 (ja) 2003-03-24 2008-07-09 富士フイルム株式会社 ポジ型レジスト組成物
US7449573B2 (en) 2004-02-16 2008-11-11 Fujifilm Corporation Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
JP4491335B2 (ja) * 2004-02-16 2010-06-30 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
JP2011095623A (ja) * 2009-10-30 2011-05-12 Jsr Corp 液浸露光用感放射線性樹脂組成物及びパターン形成方法
JP5504080B2 (ja) * 2010-07-13 2014-05-28 富士フイルム株式会社 ビニルエーテル化合物の製造方法

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Publication number Publication date
JP2001066779A (ja) 2001-03-16

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