JP3981048B2 - 光投影システム、光多重化装置およびレーザによって放出される光の空間的コヒーレンスを変化させずにレーザビームから放出される光を拡大する方法 - Google Patents

光投影システム、光多重化装置およびレーザによって放出される光の空間的コヒーレンスを変化させずにレーザビームから放出される光を拡大する方法 Download PDF

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JP3981048B2
JP3981048B2 JP2003203218A JP2003203218A JP3981048B2 JP 3981048 B2 JP3981048 B2 JP 3981048B2 JP 2003203218 A JP2003203218 A JP 2003203218A JP 2003203218 A JP2003203218 A JP 2003203218A JP 3981048 B2 JP3981048 B2 JP 3981048B2
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Prior art keywords
light
beam splitter
reflector
mirror
distance
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Japanese (ja)
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JP2004128477A (ja
JP2004128477A5 (enExample
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クレマー アレクサンダー
ダブリュー ドラツキエヴィチ スタンレー
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ASML Holding NV
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ASML Holding NV
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0977—Reflective elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • G02B27/102—Beam splitting or combining systems for splitting or combining different wavelengths for generating a colour image from monochromatic image signal sources
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/106—Beam splitting or combining systems for splitting or combining a plurality of identical beams or images, e.g. image replication
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1073—Beam splitting or combining systems characterized by manufacturing or alignment methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/48—Laser speckle optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lasers (AREA)
JP2003203218A 2002-07-31 2003-07-29 光投影システム、光多重化装置およびレーザによって放出される光の空間的コヒーレンスを変化させずにレーザビームから放出される光を拡大する方法 Expired - Fee Related JP3981048B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/208,046 US6801299B2 (en) 2002-07-31 2002-07-31 System for laser beam expansion without expanding spatial coherence

Publications (3)

Publication Number Publication Date
JP2004128477A JP2004128477A (ja) 2004-04-22
JP2004128477A5 JP2004128477A5 (enExample) 2005-06-02
JP3981048B2 true JP3981048B2 (ja) 2007-09-26

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JP2003203218A Expired - Fee Related JP3981048B2 (ja) 2002-07-31 2003-07-29 光投影システム、光多重化装置およびレーザによって放出される光の空間的コヒーレンスを変化させずにレーザビームから放出される光を拡大する方法

Country Status (8)

Country Link
US (2) US6801299B2 (enExample)
EP (2) EP1992991A3 (enExample)
JP (1) JP3981048B2 (enExample)
KR (1) KR100634918B1 (enExample)
CN (1) CN100524025C (enExample)
DE (1) DE60323303D1 (enExample)
SG (1) SG108927A1 (enExample)
TW (1) TWI324843B (enExample)

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US6819402B2 (en) 2001-10-18 2004-11-16 Asml Holding N.V. System and method for laser beam expansion
US6801299B2 (en) * 2002-07-31 2004-10-05 Asml Holding N.V. System for laser beam expansion without expanding spatial coherence
US7156522B2 (en) * 2003-07-16 2007-01-02 Plut William J Projection-type display devices with reduced weight and size
US7281807B2 (en) 2003-07-16 2007-10-16 Honeywood Technologies, Llc Positionable projection display devices
GB0425419D0 (en) * 2004-11-18 2004-12-22 Sira Ltd Interference apparatus and method and probe
US7244028B2 (en) * 2004-12-14 2007-07-17 Coherent, Inc. Laser illuminated projection displays
US7355657B2 (en) * 2004-12-14 2008-04-08 Coherent, Inc. Laser illuminated projection displays
GB0428185D0 (en) * 2004-12-23 2005-01-26 Micromass Ltd Mass spectrometer
US7413311B2 (en) * 2005-09-29 2008-08-19 Coherent, Inc. Speckle reduction in laser illuminated projection displays having a one-dimensional spatial light modulator
USD559258S1 (en) * 2006-02-10 2008-01-08 Matsushita Electric Industrial Co., Ltd. User interface for computer display
US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
KR100860018B1 (ko) * 2007-07-04 2008-09-25 한국광기술원 레이저 반점 감소장치
KR100911738B1 (ko) * 2007-08-30 2009-08-10 한국광기술원 조립식 레이저 반점 감소장치
CN101394061B (zh) * 2008-09-23 2010-06-02 福州高意通讯有限公司 一种增加倍频激光器输出线宽的方法及其结构
KR101001338B1 (ko) * 2009-08-24 2010-12-14 씨엠아이텍주식회사 신원 확인 장치
EP2548060A4 (en) * 2010-03-19 2017-08-30 Hewlett-Packard Enterprise Development LP Optical star coupler
KR102267532B1 (ko) * 2014-06-06 2021-06-18 트럼프 레이저시스템즈 포 세미컨덕터 매뉴팩처링 게엠베하 레이저 빔을 모니터링하는 디바이스 및 방법
JP6601098B2 (ja) * 2015-09-29 2019-11-06 株式会社Ｊｖｃケンウッド 光源装置及び画像投射装置
US10078049B2 (en) * 2016-05-18 2018-09-18 The Boeing Company Apparatus, system, and method for non-destructive testing of an object using a laser beam directed out of a plurality of apertures
JP6795811B2 (ja) * 2017-02-16 2020-12-02 国立大学法人埼玉大学 剥離基板製造方法
CN111766711A (zh) * 2020-07-16 2020-10-13 华中科技大学 基于平行平板的等能量激光平行分束装置、方法及系统

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JPS6019101A (ja) * 1983-07-13 1985-01-31 Hoya Corp ビ−ムスプリツタ
JPS60150016A (ja) * 1984-01-17 1985-08-07 Ricoh Co Ltd レンズ系調整組立装置
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Also Published As

Publication number Publication date
EP1992991A3 (en) 2008-11-26
EP1387218B1 (en) 2008-09-03
SG108927A1 (en) 2005-02-28
US20050036125A1 (en) 2005-02-17
JP2004128477A (ja) 2004-04-22
DE60323303D1 (de) 2008-10-16
US7027129B2 (en) 2006-04-11
US20040021842A1 (en) 2004-02-05
TWI324843B (en) 2010-05-11
EP1992991A2 (en) 2008-11-19
KR20040012544A (ko) 2004-02-11
EP1387218A1 (en) 2004-02-04
KR100634918B1 (ko) 2006-10-17
CN100524025C (zh) 2009-08-05
CN1487364A (zh) 2004-04-07
US6801299B2 (en) 2004-10-05
TW200402917A (en) 2004-02-16

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