JP3960803B2 - 電解加工方法及び装置 - Google Patents
電解加工方法及び装置 Download PDFInfo
- Publication number
- JP3960803B2 JP3960803B2 JP2002000838A JP2002000838A JP3960803B2 JP 3960803 B2 JP3960803 B2 JP 3960803B2 JP 2002000838 A JP2002000838 A JP 2002000838A JP 2002000838 A JP2002000838 A JP 2002000838A JP 3960803 B2 JP3960803 B2 JP 3960803B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- electrode
- ruthenium film
- processing
- electrolytic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000003754 machining Methods 0.000 title description 23
- 238000000034 method Methods 0.000 title description 12
- 239000000758 substrate Substances 0.000 claims description 161
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 105
- 229910052707 ruthenium Inorganic materials 0.000 claims description 105
- 150000002500 ions Chemical class 0.000 claims description 53
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 48
- 239000012498 ultrapure water Substances 0.000 claims description 48
- 230000002093 peripheral effect Effects 0.000 claims description 30
- 239000007788 liquid Substances 0.000 claims description 25
- 239000008151 electrolyte solution Substances 0.000 claims description 20
- 238000005341 cation exchange Methods 0.000 claims description 18
- 238000003672 processing method Methods 0.000 claims description 15
- 230000002378 acidificating effect Effects 0.000 claims description 10
- 238000005349 anion exchange Methods 0.000 claims description 9
- 230000007246 mechanism Effects 0.000 claims description 4
- 239000006193 liquid solution Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 32
- 238000005530 etching Methods 0.000 description 13
- 239000002253 acid Substances 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 239000003792 electrolyte Substances 0.000 description 8
- -1 hydrogen ions Chemical class 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 6
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000033001 locomotion Effects 0.000 description 6
- 230000008929 regeneration Effects 0.000 description 6
- 238000011069 regeneration method Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000000835 fiber Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000004745 nonwoven fabric Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010559 graft polymerization reaction Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000005342 ion exchange Methods 0.000 description 3
- 239000001103 potassium chloride Substances 0.000 description 3
- 235000011164 potassium chloride Nutrition 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 239000007832 Na2SO4 Substances 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 229940021013 electrolyte solution Drugs 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910001361 White metal Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000003011 anion exchange membrane Substances 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000003014 ion exchange membrane Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000010969 white metal Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Images
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- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002000838A JP3960803B2 (ja) | 2002-01-07 | 2002-01-07 | 電解加工方法及び装置 |
| US10/337,357 US7101465B2 (en) | 2001-06-18 | 2003-01-07 | Electrolytic processing device and substrate processing apparatus |
| US10/669,468 US7638030B2 (en) | 2001-06-18 | 2003-09-25 | Electrolytic processing apparatus and electrolytic processing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002000838A JP3960803B2 (ja) | 2002-01-07 | 2002-01-07 | 電解加工方法及び装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003205427A JP2003205427A (ja) | 2003-07-22 |
| JP2003205427A5 JP2003205427A5 (https=) | 2005-08-04 |
| JP3960803B2 true JP3960803B2 (ja) | 2007-08-15 |
Family
ID=27641116
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002000838A Expired - Fee Related JP3960803B2 (ja) | 2001-06-18 | 2002-01-07 | 電解加工方法及び装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3960803B2 (https=) |
-
2002
- 2002-01-07 JP JP2002000838A patent/JP3960803B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003205427A (ja) | 2003-07-22 |
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