JP2003205427A5 - - Google Patents
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- Publication number
- JP2003205427A5 JP2003205427A5 JP2002000838A JP2002000838A JP2003205427A5 JP 2003205427 A5 JP2003205427 A5 JP 2003205427A5 JP 2002000838 A JP2002000838 A JP 2002000838A JP 2002000838 A JP2002000838 A JP 2002000838A JP 2003205427 A5 JP2003205427 A5 JP 2003205427A5
- Authority
- JP
- Japan
- Prior art keywords
- ruthenium film
- electrode
- processing
- processing electrode
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 20
- 229910052707 ruthenium Inorganic materials 0.000 claims 20
- 239000007788 liquid Substances 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 6
- 150000002500 ions Chemical class 0.000 claims 4
- 238000003672 processing method Methods 0.000 claims 4
- 230000002378 acidificating effect Effects 0.000 claims 2
- 238000005349 anion exchange Methods 0.000 claims 2
- 238000005341 cation exchange Methods 0.000 claims 2
- 229910021642 ultra pure water Inorganic materials 0.000 claims 2
- 239000012498 ultrapure water Substances 0.000 claims 2
- 239000008151 electrolyte solution Substances 0.000 claims 1
- 239000006193 liquid solution Substances 0.000 claims 1
- 238000003754 machining Methods 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002000838A JP3960803B2 (ja) | 2002-01-07 | 2002-01-07 | 電解加工方法及び装置 |
| US10/337,357 US7101465B2 (en) | 2001-06-18 | 2003-01-07 | Electrolytic processing device and substrate processing apparatus |
| US10/669,468 US7638030B2 (en) | 2001-06-18 | 2003-09-25 | Electrolytic processing apparatus and electrolytic processing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002000838A JP3960803B2 (ja) | 2002-01-07 | 2002-01-07 | 電解加工方法及び装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003205427A JP2003205427A (ja) | 2003-07-22 |
| JP2003205427A5 true JP2003205427A5 (https=) | 2005-08-04 |
| JP3960803B2 JP3960803B2 (ja) | 2007-08-15 |
Family
ID=27641116
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002000838A Expired - Fee Related JP3960803B2 (ja) | 2001-06-18 | 2002-01-07 | 電解加工方法及び装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3960803B2 (https=) |
-
2002
- 2002-01-07 JP JP2002000838A patent/JP3960803B2/ja not_active Expired - Fee Related
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