JP3955489B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP3955489B2
JP3955489B2 JP2002086459A JP2002086459A JP3955489B2 JP 3955489 B2 JP3955489 B2 JP 3955489B2 JP 2002086459 A JP2002086459 A JP 2002086459A JP 2002086459 A JP2002086459 A JP 2002086459A JP 3955489 B2 JP3955489 B2 JP 3955489B2
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JP
Japan
Prior art keywords
group
acid
fluorine
atom
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002086459A
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English (en)
Japanese (ja)
Other versions
JP2003280205A5 (enExample
JP2003280205A (ja
Inventor
一良 水谷
慎一 漢那
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002086459A priority Critical patent/JP3955489B2/ja
Publication of JP2003280205A publication Critical patent/JP2003280205A/ja
Publication of JP2003280205A5 publication Critical patent/JP2003280205A5/ja
Application granted granted Critical
Publication of JP3955489B2 publication Critical patent/JP3955489B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2002086459A 2002-03-26 2002-03-26 ポジ型レジスト組成物 Expired - Fee Related JP3955489B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002086459A JP3955489B2 (ja) 2002-03-26 2002-03-26 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002086459A JP3955489B2 (ja) 2002-03-26 2002-03-26 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2003280205A JP2003280205A (ja) 2003-10-02
JP2003280205A5 JP2003280205A5 (enExample) 2005-04-07
JP3955489B2 true JP3955489B2 (ja) 2007-08-08

Family

ID=29233052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002086459A Expired - Fee Related JP3955489B2 (ja) 2002-03-26 2002-03-26 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP3955489B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004013126A (ja) * 2002-06-11 2004-01-15 Jsr Corp 感放射線性樹脂組成物
EP1574497B1 (en) * 2002-12-11 2014-07-16 Asahi Glass Company, Limited Fluorinated adamantane derivatives
US7488847B2 (en) 2002-12-11 2009-02-10 Asahi Glass Company, Limited Fluorinated adamantane and its derivatives
JPWO2005123653A1 (ja) 2004-06-16 2008-04-10 旭硝子株式会社 フルオロアダマンタン誘導体

Also Published As

Publication number Publication date
JP2003280205A (ja) 2003-10-02

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