JP3907179B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP3907179B2
JP3907179B2 JP2002074337A JP2002074337A JP3907179B2 JP 3907179 B2 JP3907179 B2 JP 3907179B2 JP 2002074337 A JP2002074337 A JP 2002074337A JP 2002074337 A JP2002074337 A JP 2002074337A JP 3907179 B2 JP3907179 B2 JP 3907179B2
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JP
Japan
Prior art keywords
group
substituent
alkyl
hydrogen atom
resist composition
Prior art date
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Expired - Fee Related
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JP2002074337A
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English (en)
Japanese (ja)
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JP2002351081A (ja
JP2002351081A5 (enExample
Inventor
利明 青合
一良 水谷
慎一 漢那
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Priority to JP2002074337A priority Critical patent/JP3907179B2/ja
Publication of JP2002351081A publication Critical patent/JP2002351081A/ja
Publication of JP2002351081A5 publication Critical patent/JP2002351081A5/ja
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Publication of JP3907179B2 publication Critical patent/JP3907179B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2002074337A 2001-03-19 2002-03-18 ポジ型レジスト組成物 Expired - Fee Related JP3907179B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002074337A JP3907179B2 (ja) 2001-03-19 2002-03-18 ポジ型レジスト組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001-79184 2001-03-19
JP2001079184 2001-03-19
JP2002074337A JP3907179B2 (ja) 2001-03-19 2002-03-18 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2002351081A JP2002351081A (ja) 2002-12-04
JP2002351081A5 JP2002351081A5 (enExample) 2005-04-07
JP3907179B2 true JP3907179B2 (ja) 2007-04-18

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ID=26611587

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002074337A Expired - Fee Related JP3907179B2 (ja) 2001-03-19 2002-03-18 ポジ型レジスト組成物

Country Status (1)

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JP (1) JP3907179B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4639062B2 (ja) * 2003-11-21 2011-02-23 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
JP4617112B2 (ja) * 2004-08-03 2011-01-19 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
JP2007025394A (ja) * 2005-07-19 2007-02-01 Fujifilm Holdings Corp パターン形成方法
JP7445467B2 (ja) * 2019-03-15 2024-03-07 住友化学株式会社 樹脂、レジスト組成物及びレジストパターンの製造方法

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Publication number Publication date
JP2002351081A (ja) 2002-12-04

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