JP2002351081A5 - - Google Patents
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- Publication number
- JP2002351081A5 JP2002351081A5 JP2002074337A JP2002074337A JP2002351081A5 JP 2002351081 A5 JP2002351081 A5 JP 2002351081A5 JP 2002074337 A JP2002074337 A JP 2002074337A JP 2002074337 A JP2002074337 A JP 2002074337A JP 2002351081 A5 JP2002351081 A5 JP 2002351081A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- hydrogen atom
- resist composition
- positive resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000000217 alkyl group Chemical group 0.000 claims 13
- 125000001424 substituent group Chemical group 0.000 claims 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 12
- 125000000753 cycloalkyl group Chemical group 0.000 claims 10
- 125000003118 aryl group Chemical group 0.000 claims 8
- 125000003710 aryl alkyl group Chemical group 0.000 claims 7
- 125000004093 cyano group Chemical group *C#N 0.000 claims 7
- 125000005843 halogen group Chemical group 0.000 claims 7
- 239000002253 acid Substances 0.000 claims 6
- 150000001875 compounds Chemical class 0.000 claims 5
- 125000001188 haloalkyl group Chemical group 0.000 claims 5
- 125000003342 alkenyl group Chemical group 0.000 claims 4
- 125000004450 alkenylene group Chemical group 0.000 claims 4
- 125000002947 alkylene group Chemical group 0.000 claims 4
- 125000000732 arylene group Chemical group 0.000 claims 4
- 125000002993 cycloalkylene group Chemical group 0.000 claims 4
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims 4
- 239000011347 resin Substances 0.000 claims 4
- 229920005989 resin Polymers 0.000 claims 4
- 125000002252 acyl group Chemical group 0.000 claims 3
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 125000003368 amide group Chemical group 0.000 claims 2
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 125000004185 ester group Chemical group 0.000 claims 2
- 125000001033 ether group Chemical group 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 125000002950 monocyclic group Chemical group 0.000 claims 2
- 125000005460 perfluorocycloalkyl group Chemical group 0.000 claims 2
- 125000003367 polycyclic group Chemical group 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 125000000547 substituted alkyl group Chemical group 0.000 claims 2
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims 1
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000005079 alkoxycarbonylmethyl group Chemical group 0.000 claims 1
- 125000000304 alkynyl group Chemical group 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 claims 1
- 239000003112 inhibitor Substances 0.000 claims 1
- -1 iodonium salt compounds Chemical class 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002074337A JP3907179B2 (ja) | 2001-03-19 | 2002-03-18 | ポジ型レジスト組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001-79184 | 2001-03-19 | ||
| JP2001079184 | 2001-03-19 | ||
| JP2002074337A JP3907179B2 (ja) | 2001-03-19 | 2002-03-18 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002351081A JP2002351081A (ja) | 2002-12-04 |
| JP2002351081A5 true JP2002351081A5 (enExample) | 2005-04-07 |
| JP3907179B2 JP3907179B2 (ja) | 2007-04-18 |
Family
ID=26611587
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002074337A Expired - Fee Related JP3907179B2 (ja) | 2001-03-19 | 2002-03-18 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3907179B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4639062B2 (ja) * | 2003-11-21 | 2011-02-23 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法 |
| JP4617112B2 (ja) * | 2004-08-03 | 2011-01-19 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法 |
| JP2007025394A (ja) * | 2005-07-19 | 2007-02-01 | Fujifilm Holdings Corp | パターン形成方法 |
| JP7445467B2 (ja) * | 2019-03-15 | 2024-03-07 | 住友化学株式会社 | 樹脂、レジスト組成物及びレジストパターンの製造方法 |
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2002
- 2002-03-18 JP JP2002074337A patent/JP3907179B2/ja not_active Expired - Fee Related