JP2005043819A5 - - Google Patents
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- Publication number
- JP2005043819A5 JP2005043819A5 JP2003280237A JP2003280237A JP2005043819A5 JP 2005043819 A5 JP2005043819 A5 JP 2005043819A5 JP 2003280237 A JP2003280237 A JP 2003280237A JP 2003280237 A JP2003280237 A JP 2003280237A JP 2005043819 A5 JP2005043819 A5 JP 2005043819A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- fluorine atom
- formula
- positive resist
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052731 fluorine Inorganic materials 0.000 claims 10
- 125000001153 fluoro group Chemical group F* 0.000 claims 10
- 150000001875 compounds Chemical class 0.000 claims 8
- 125000000217 alkyl group Chemical group 0.000 claims 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims 5
- 239000002253 acid Substances 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 150000007933 aliphatic carboxylic acids Chemical group 0.000 claims 2
- 125000001931 aliphatic group Chemical group 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical group OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 125000002950 monocyclic group Chemical group 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 125000003367 polycyclic group Chemical group 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003280237A JP4377174B2 (ja) | 2003-07-25 | 2003-07-25 | ポジ型レジスト組成物 |
| US10/897,122 US7157206B2 (en) | 2003-07-25 | 2004-07-23 | Positive resist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003280237A JP4377174B2 (ja) | 2003-07-25 | 2003-07-25 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005043819A JP2005043819A (ja) | 2005-02-17 |
| JP2005043819A5 true JP2005043819A5 (enExample) | 2006-07-06 |
| JP4377174B2 JP4377174B2 (ja) | 2009-12-02 |
Family
ID=34100853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003280237A Expired - Lifetime JP4377174B2 (ja) | 2003-07-25 | 2003-07-25 | ポジ型レジスト組成物 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7157206B2 (enExample) |
| JP (1) | JP4377174B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005055697A (ja) * | 2003-08-05 | 2005-03-03 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| US7906268B2 (en) | 2004-03-18 | 2011-03-15 | Fujifilm Corporation | Positive resist composition for immersion exposure and pattern-forming method using the same |
| JP4506968B2 (ja) * | 2005-02-04 | 2010-07-21 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| US8741537B2 (en) * | 2005-03-04 | 2014-06-03 | Fujifilm Corporation | Positive resist composition and pattern-forming method using the same |
| EP3537217B1 (en) | 2005-12-09 | 2022-08-31 | FUJIFILM Corporation | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition |
| JP5675664B2 (ja) * | 2012-01-24 | 2015-02-25 | 信越化学工業株式会社 | パターン形成方法 |
| EP3169791A1 (en) | 2014-07-14 | 2017-05-24 | Danmarks Tekniske Universitet | Processes for the production of hydroxycinnamic acids using polypeptides having tyrosine ammonia lyase activity |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040004403A (ko) | 2000-10-18 | 2004-01-13 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 마이크로리소그래피용 조성물 |
| US6686429B2 (en) | 2001-05-11 | 2004-02-03 | Clariant Finance (Bvi) Limited | Polymer suitable for photoresist compositions |
| EP1319981B1 (en) * | 2001-12-13 | 2012-10-24 | FUJIFILM Corporation | Positive resist composition |
| KR100955006B1 (ko) * | 2002-04-26 | 2010-04-27 | 후지필름 가부시키가이샤 | 포지티브 레지스트 조성물 |
| KR100955454B1 (ko) * | 2002-05-31 | 2010-04-29 | 후지필름 가부시키가이샤 | 포지티브 레지스트 조성물 |
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2003
- 2003-07-25 JP JP2003280237A patent/JP4377174B2/ja not_active Expired - Lifetime
-
2004
- 2004-07-23 US US10/897,122 patent/US7157206B2/en not_active Expired - Lifetime