JP3907164B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP3907164B2
JP3907164B2 JP2001337884A JP2001337884A JP3907164B2 JP 3907164 B2 JP3907164 B2 JP 3907164B2 JP 2001337884 A JP2001337884 A JP 2001337884A JP 2001337884 A JP2001337884 A JP 2001337884A JP 3907164 B2 JP3907164 B2 JP 3907164B2
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JP
Japan
Prior art keywords
group
acid
examples
atom
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2001337884A
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English (en)
Japanese (ja)
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JP2003140344A5 (enrdf_load_stackoverflow
JP2003140344A (ja
Inventor
邦彦 児玉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Priority to JP2001337884A priority Critical patent/JP3907164B2/ja
Publication of JP2003140344A publication Critical patent/JP2003140344A/ja
Publication of JP2003140344A5 publication Critical patent/JP2003140344A5/ja
Application granted granted Critical
Publication of JP3907164B2 publication Critical patent/JP3907164B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2001337884A 2001-11-02 2001-11-02 ポジ型感光性組成物 Expired - Lifetime JP3907164B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001337884A JP3907164B2 (ja) 2001-11-02 2001-11-02 ポジ型感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001337884A JP3907164B2 (ja) 2001-11-02 2001-11-02 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JP2003140344A JP2003140344A (ja) 2003-05-14
JP2003140344A5 JP2003140344A5 (enrdf_load_stackoverflow) 2005-04-07
JP3907164B2 true JP3907164B2 (ja) 2007-04-18

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ID=19152457

Family Applications (1)

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JP2001337884A Expired - Lifetime JP3907164B2 (ja) 2001-11-02 2001-11-02 ポジ型感光性組成物

Country Status (1)

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JP (1) JP3907164B2 (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7358408B2 (en) * 2003-05-16 2008-04-15 Az Electronic Materials Usa Corp. Photoactive compounds
JP4491335B2 (ja) * 2004-02-16 2010-06-30 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
US7449573B2 (en) 2004-02-16 2008-11-11 Fujifilm Corporation Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
JP4420226B2 (ja) 2005-02-18 2010-02-24 信越化学工業株式会社 化学増幅ポジ型レジスト材料及びパターン形成方法
JP4579019B2 (ja) * 2005-03-17 2010-11-10 富士フイルム株式会社 ポジ型レジスト組成物及び該レジスト組成物を用いたパターン形成方法
JP5039345B2 (ja) * 2006-09-11 2012-10-03 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP2011095623A (ja) * 2009-10-30 2011-05-12 Jsr Corp 液浸露光用感放射線性樹脂組成物及びパターン形成方法
WO2016181722A1 (ja) * 2015-05-14 2016-11-17 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、及び、感活性光線性又は感放射線性樹脂組成物

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Publication number Publication date
JP2003140344A (ja) 2003-05-14

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