JP3907135B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP3907135B2
JP3907135B2 JP10952697A JP10952697A JP3907135B2 JP 3907135 B2 JP3907135 B2 JP 3907135B2 JP 10952697 A JP10952697 A JP 10952697A JP 10952697 A JP10952697 A JP 10952697A JP 3907135 B2 JP3907135 B2 JP 3907135B2
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JP
Japan
Prior art keywords
group
substituted
unsubstituted
acid
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP10952697A
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English (en)
Japanese (ja)
Other versions
JPH112901A (ja
JPH112901A5 (https=
Inventor
邦彦 児玉
利明 青合
一也 上西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP10952697A priority Critical patent/JP3907135B2/ja
Publication of JPH112901A publication Critical patent/JPH112901A/ja
Publication of JPH112901A5 publication Critical patent/JPH112901A5/ja
Application granted granted Critical
Publication of JP3907135B2 publication Critical patent/JP3907135B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP10952697A 1996-04-25 1997-04-25 ポジ型感光性組成物 Expired - Fee Related JP3907135B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10952697A JP3907135B2 (ja) 1996-04-25 1997-04-25 ポジ型感光性組成物

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP10563596 1996-04-25
JP8-105635 1996-04-25
JP8-171327 1996-07-01
JP17132796 1996-07-01
JP10192497 1997-04-18
JP9-101924 1997-04-18
JP10952697A JP3907135B2 (ja) 1996-04-25 1997-04-25 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JPH112901A JPH112901A (ja) 1999-01-06
JPH112901A5 JPH112901A5 (https=) 2004-10-07
JP3907135B2 true JP3907135B2 (ja) 2007-04-18

Family

ID=27468966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10952697A Expired - Fee Related JP3907135B2 (ja) 1996-04-25 1997-04-25 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JP3907135B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3285086B2 (ja) 1999-05-20 2002-05-27 日本電気株式会社 化学増幅型レジスト組成物
JP4557115B2 (ja) * 2000-03-07 2010-10-06 信越化学工業株式会社 化学増幅ポジ型レジスト材料
KR100840635B1 (ko) 2001-11-30 2008-06-24 와코 쥰야꾸 고교 가부시키가이샤 비스이미드 화합물, 이것을 이용한 산 발생제 및 레지스트조성물 및 해당 조성물을 이용한 패턴 형성 방법
WO2015146053A1 (ja) * 2014-03-24 2015-10-01 サンアプロ株式会社 イミドスルホネート化合物、光酸発生剤及びフォトリソグラフィー用樹脂組成物

Also Published As

Publication number Publication date
JPH112901A (ja) 1999-01-06

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