JP3904110B2 - 光学特性測定方法及び光学特性測定装置、光学系の調整方法、並びに露光装置 - Google Patents

光学特性測定方法及び光学特性測定装置、光学系の調整方法、並びに露光装置 Download PDF

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JP3904110B2
JP3904110B2 JP2002013853A JP2002013853A JP3904110B2 JP 3904110 B2 JP3904110 B2 JP 3904110B2 JP 2002013853 A JP2002013853 A JP 2002013853A JP 2002013853 A JP2002013853 A JP 2002013853A JP 3904110 B2 JP3904110 B2 JP 3904110B2
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optical system
optical
light
pattern
wavefront
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JP2003214984A5 (https=
JP2003214984A (ja
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藤井　　透
隆博 正田
淳 向後
恭志 水野
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Nikon Corp
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  • Testing Of Optical Devices Or Fibers (AREA)
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JP2002013853A 2002-01-23 2002-01-23 光学特性測定方法及び光学特性測定装置、光学系の調整方法、並びに露光装置 Expired - Lifetime JP3904110B2 (ja)

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JP2002013853A JP3904110B2 (ja) 2002-01-23 2002-01-23 光学特性測定方法及び光学特性測定装置、光学系の調整方法、並びに露光装置

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JP2002013853A JP3904110B2 (ja) 2002-01-23 2002-01-23 光学特性測定方法及び光学特性測定装置、光学系の調整方法、並びに露光装置

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JP2003214984A JP2003214984A (ja) 2003-07-30
JP2003214984A5 JP2003214984A5 (https=) 2005-08-11
JP3904110B2 true JP3904110B2 (ja) 2007-04-11

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4600047B2 (ja) * 2005-01-13 2010-12-15 株式会社ニコン 波面収差測定方法、波面収差測定装置、投影露光装置、投影光学系の製造方法
US20070081138A1 (en) * 2005-10-11 2007-04-12 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing methods and mask for use in a device manufacturing method
JP4798489B2 (ja) * 2006-01-23 2011-10-19 株式会社ニコン 光学特性計測方法及び装置、並びに露光装置
JP5452032B2 (ja) * 2009-02-13 2014-03-26 株式会社日立製作所 波面収差測定方法及びその装置
KR102425181B1 (ko) * 2020-08-10 2022-07-29 (주)프로옵틱스 광학계 해상력 측정장치

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