JP2003214984A5 - - Google Patents

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Publication number
JP2003214984A5
JP2003214984A5 JP2002013853A JP2002013853A JP2003214984A5 JP 2003214984 A5 JP2003214984 A5 JP 2003214984A5 JP 2002013853 A JP2002013853 A JP 2002013853A JP 2002013853 A JP2002013853 A JP 2002013853A JP 2003214984 A5 JP2003214984 A5 JP 2003214984A5
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JP
Japan
Prior art keywords
optical
light
optical system
light receiving
mask
Prior art date
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Application number
JP2002013853A
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English (en)
Japanese (ja)
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JP2003214984A (ja
JP3904110B2 (ja
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Priority to JP2002013853A priority Critical patent/JP3904110B2/ja
Priority claimed from JP2002013853A external-priority patent/JP3904110B2/ja
Publication of JP2003214984A publication Critical patent/JP2003214984A/ja
Publication of JP2003214984A5 publication Critical patent/JP2003214984A5/ja
Application granted granted Critical
Publication of JP3904110B2 publication Critical patent/JP3904110B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2002013853A 2002-01-23 2002-01-23 光学特性測定方法及び光学特性測定装置、光学系の調整方法、並びに露光装置 Expired - Lifetime JP3904110B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002013853A JP3904110B2 (ja) 2002-01-23 2002-01-23 光学特性測定方法及び光学特性測定装置、光学系の調整方法、並びに露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002013853A JP3904110B2 (ja) 2002-01-23 2002-01-23 光学特性測定方法及び光学特性測定装置、光学系の調整方法、並びに露光装置

Publications (3)

Publication Number Publication Date
JP2003214984A JP2003214984A (ja) 2003-07-30
JP2003214984A5 true JP2003214984A5 (https=) 2005-08-11
JP3904110B2 JP3904110B2 (ja) 2007-04-11

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ID=27650703

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002013853A Expired - Lifetime JP3904110B2 (ja) 2002-01-23 2002-01-23 光学特性測定方法及び光学特性測定装置、光学系の調整方法、並びに露光装置

Country Status (1)

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JP (1) JP3904110B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4600047B2 (ja) * 2005-01-13 2010-12-15 株式会社ニコン 波面収差測定方法、波面収差測定装置、投影露光装置、投影光学系の製造方法
US20070081138A1 (en) * 2005-10-11 2007-04-12 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing methods and mask for use in a device manufacturing method
JP4798489B2 (ja) * 2006-01-23 2011-10-19 株式会社ニコン 光学特性計測方法及び装置、並びに露光装置
JP5452032B2 (ja) * 2009-02-13 2014-03-26 株式会社日立製作所 波面収差測定方法及びその装置
KR102425181B1 (ko) * 2020-08-10 2022-07-29 (주)프로옵틱스 광학계 해상력 측정장치

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