JP3894260B2 - ポジ型フォトレジスト組成物 - Google Patents

ポジ型フォトレジスト組成物 Download PDF

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Publication number
JP3894260B2
JP3894260B2 JP16586299A JP16586299A JP3894260B2 JP 3894260 B2 JP3894260 B2 JP 3894260B2 JP 16586299 A JP16586299 A JP 16586299A JP 16586299 A JP16586299 A JP 16586299A JP 3894260 B2 JP3894260 B2 JP 3894260B2
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JP
Japan
Prior art keywords
group
acid
compound
general formula
alkali
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP16586299A
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English (en)
Japanese (ja)
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JP2000352822A5 (enrdf_load_stackoverflow
JP2000352822A (ja
Inventor
亨 藤森
史郎 丹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP16586299A priority Critical patent/JP3894260B2/ja
Publication of JP2000352822A publication Critical patent/JP2000352822A/ja
Publication of JP2000352822A5 publication Critical patent/JP2000352822A5/ja
Application granted granted Critical
Publication of JP3894260B2 publication Critical patent/JP3894260B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP16586299A 1999-06-11 1999-06-11 ポジ型フォトレジスト組成物 Expired - Fee Related JP3894260B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16586299A JP3894260B2 (ja) 1999-06-11 1999-06-11 ポジ型フォトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16586299A JP3894260B2 (ja) 1999-06-11 1999-06-11 ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2000352822A JP2000352822A (ja) 2000-12-19
JP2000352822A5 JP2000352822A5 (enrdf_load_stackoverflow) 2005-07-07
JP3894260B2 true JP3894260B2 (ja) 2007-03-14

Family

ID=15820410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16586299A Expired - Fee Related JP3894260B2 (ja) 1999-06-11 1999-06-11 ポジ型フォトレジスト組成物

Country Status (1)

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JP (1) JP3894260B2 (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101036501B1 (ko) 2002-11-22 2011-05-24 후지필름 가부시키가이샤 포지티브형 레지스트 조성물 및 그것을 사용한 패턴형성방법
JP4414721B2 (ja) * 2002-11-22 2010-02-10 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
US8043786B2 (en) * 2003-03-05 2011-10-25 Jsr Corporation Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
JP2004307387A (ja) * 2003-04-07 2004-11-04 Tosoh F-Tech Inc ２−（ビシクロ［２．２．１］ヘプト−２−イル）−１，１−ジフルオロエチルスルフィン酸塩または２−（ビシクロ［２．２．１］ヘプト−２−イル）−１，１−ジフルオロエチルスルホン酸塩およびそれらの製造方法
CN100354257C (zh) 2003-07-18 2007-12-12 住友化学工业株式会社 磺酸盐和光刻胶组合物
US8182975B2 (en) 2007-03-28 2012-05-22 Fujifilm Corporation Positive resist composition and pattern forming method using the same
US7498116B2 (en) 2007-03-30 2009-03-03 Fujifilm Corporation Resist composition and pattern formation method using the same
JP5039493B2 (ja) 2007-09-28 2012-10-03 富士フイルム株式会社 ポジ型レジスト組成物およびこれを用いたパターン形成方法
JP5039492B2 (ja) 2007-09-28 2012-10-03 富士フイルム株式会社 ポジ型レジスト組成物およびこれを用いたパターン形成方法
JP5537920B2 (ja) 2009-03-26 2014-07-02 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、これを用いたレジスト膜、及び、パターン形成方法
KR102230622B1 (ko) * 2017-11-24 2021-03-22 주식회사 엘지화학 포토레지스트 조성물 및 이를 이용한 포토레지스트 필름

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Publication number Publication date
JP2000352822A (ja) 2000-12-19

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