JP3890375B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP3890375B2
JP3890375B2 JP14543797A JP14543797A JP3890375B2 JP 3890375 B2 JP3890375 B2 JP 3890375B2 JP 14543797 A JP14543797 A JP 14543797A JP 14543797 A JP14543797 A JP 14543797A JP 3890375 B2 JP3890375 B2 JP 3890375B2
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JP
Japan
Prior art keywords
group
acid
groups
compound
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP14543797A
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English (en)
Japanese (ja)
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JPH10333326A5 (cg-RX-API-DMAC7.html
JPH10333326A (ja
Inventor
邦彦 児玉
利明 青合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP14543797A priority Critical patent/JP3890375B2/ja
Publication of JPH10333326A publication Critical patent/JPH10333326A/ja
Publication of JPH10333326A5 publication Critical patent/JPH10333326A5/ja
Application granted granted Critical
Publication of JP3890375B2 publication Critical patent/JP3890375B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP14543797A 1997-06-03 1997-06-03 ポジ型感光性組成物 Expired - Lifetime JP3890375B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14543797A JP3890375B2 (ja) 1997-06-03 1997-06-03 ポジ型感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14543797A JP3890375B2 (ja) 1997-06-03 1997-06-03 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JPH10333326A JPH10333326A (ja) 1998-12-18
JPH10333326A5 JPH10333326A5 (cg-RX-API-DMAC7.html) 2004-10-14
JP3890375B2 true JP3890375B2 (ja) 2007-03-07

Family

ID=15385230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14543797A Expired - Lifetime JP3890375B2 (ja) 1997-06-03 1997-06-03 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JP3890375B2 (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2328864A1 (en) * 2008-09-26 2011-06-08 FUJIFILM Corporation Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3281612B2 (ja) 1999-03-05 2002-05-13 松下電器産業株式会社 パターン形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2328864A1 (en) * 2008-09-26 2011-06-08 FUJIFILM Corporation Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition

Also Published As

Publication number Publication date
JPH10333326A (ja) 1998-12-18

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