JP3874152B2 - 加熱装置及び加熱方法 - Google Patents

加熱装置及び加熱方法 Download PDF

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JP3874152B2
JP3874152B2 JP13235499A JP13235499A JP3874152B2 JP 3874152 B2 JP3874152 B2 JP 3874152B2 JP 13235499 A JP13235499 A JP 13235499A JP 13235499 A JP13235499 A JP 13235499A JP 3874152 B2 JP3874152 B2 JP 3874152B2
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container
gap
vessel
reaction vessel
water
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JP2000323419A5 (enrdf_load_stackoverflow
JP2000323419A (ja
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淳 芳之内
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石川島播磨重工業株式会社
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JP13235499A 1999-05-13 1999-05-13 加熱装置及び加熱方法 Expired - Fee Related JP3874152B2 (ja)

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JP13235499A JP3874152B2 (ja) 1999-05-13 1999-05-13 加熱装置及び加熱方法

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JP13235499A JP3874152B2 (ja) 1999-05-13 1999-05-13 加熱装置及び加熱方法

Publications (3)

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JP2000323419A JP2000323419A (ja) 2000-11-24
JP2000323419A5 JP2000323419A5 (enrdf_load_stackoverflow) 2005-10-27
JP3874152B2 true JP3874152B2 (ja) 2007-01-31

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JP13235499A Expired - Fee Related JP3874152B2 (ja) 1999-05-13 1999-05-13 加熱装置及び加熱方法

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006165304A (ja) * 2004-12-08 2006-06-22 Ishikawajima Harima Heavy Ind Co Ltd 水蒸気アニール装置とこの装置における水蒸気導入方法
JP5024645B2 (ja) * 2005-07-07 2012-09-12 株式会社Ｉｈｉ 水蒸気アニール用治具
JP4683332B2 (ja) * 2005-12-28 2011-05-18 株式会社Ihi 熱処理装置
JP2010021558A (ja) * 2009-07-23 2010-01-28 Kyoshin Engineering:Kk 高精度高圧アニール装置

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JP2000323419A (ja) 2000-11-24

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