JP3835583B2 - Electronic component equipment - Google Patents

Electronic component equipment Download PDF

Info

Publication number
JP3835583B2
JP3835583B2 JP02010498A JP2010498A JP3835583B2 JP 3835583 B2 JP3835583 B2 JP 3835583B2 JP 02010498 A JP02010498 A JP 02010498A JP 2010498 A JP2010498 A JP 2010498A JP 3835583 B2 JP3835583 B2 JP 3835583B2
Authority
JP
Japan
Prior art keywords
connection terminal
connection
adhesive
electronic component
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP02010498A
Other languages
Japanese (ja)
Other versions
JPH11219979A (en
Inventor
伊津夫 渡辺
賢三 竹村
義之 ▲つる▼
直之 浦崎
靖 島田
昭士 中祖
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Showa Denko Materials Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP02010498A priority Critical patent/JP3835583B2/en
Publication of JPH11219979A publication Critical patent/JPH11219979A/en
Application granted granted Critical
Publication of JP3835583B2 publication Critical patent/JP3835583B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
  • Wire Bonding (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、例えばフェイスダウン方式により半導体チップを基板と異方導電性接着フィルムで接着固定すると共に両者の電極どうしを電気的に接続することにより得られる電子部品装置に関する。
【0002】
【従来の技術】
異方導電性接着フィルムは、金属粒子等の導電粒子を所定量含有した接着剤からなるもので、この異方導電性接着フィルムを電子部品と電極や回路の間に設け、加圧または加熱加圧手段を構じることによって、両者の電極同士が電気的に接続されると共に、隣接電極間の絶縁性を付与して、電子部品と回路とが接着固定されるものである。
異方導電性接着フィルムの接続信頼性を向上するための基本的な考えは、導電粒子の粒径を隣接電極間のスペース部分よりも小さくすることで隣接電極間の絶縁性を確保し、併せて導電粒子の含有量をこの導電粒子が接触しない程度とし、かつ電極上に確実に存在させることにより接続部分における電気的な接続を得ることである。
【0003】
【発明が解決しようとする課題】
本発明は、例えば半導体チップを基板と異方導電性接着フィルム等で接着固定すると共に両者の電極どうしを電気的に接続することにより得られる回路板のように、接続端子を有する回路部材どうしを優れた接続信頼性で接続した電子部品装置を提供するものである。
【0004】
【課題を解決するための手段】
本発明の電子部品装置は、第一の接続端子を有する電子部品と、絶縁基板の表面に形成された第二の接続端子を備える実装用基板とを、第一の接続端子と第二の接続端子を対向して配置し、前記対向配置した第一の接続端子と第二の接続端子の間に、接続後の40℃での弾性率が100〜1500MPaである異方導電性接着剤を介在させ、加圧して前記対向配置した第一の接続端子と第二の接続端子を電気的に接続させた電子部品装置であって、第二の接続端子が形成される実装用基板の絶縁層の最外層となる絶縁基板面には、150℃での弾性率が1〜500MPaで絶縁層にガラスクロスを含まない樹脂フィルムの絶縁材層が形成されており、第一の接続端子と対向配置し加圧され電気的に接続された第二の接続端子は、接続前と比較した変位が10〜50μmであることを特徴とするものである。第二の接続端子が形成される実装用基板の絶縁基板面には、150℃での弾性率が1〜500MPaの絶縁材層、さらには150℃での弾性率が1〜500MPaかつ25℃での弾性率が50〜3500MPaの絶縁材層が形成されているものが好ましい。また、接着剤には、異方導電性接着剤が使用され、電子部品としては半導体チップが好ましい。
【0005】
【発明の実施の形態】
本発明において、電子部品としては半導体チップ、トランジスタ、ダイオ−ド、サイリスタ等の能動素子、コンデンサ、抵抗体、コイル等の受動素子等のチップ部品、プリント基板等の基板等が用いられる。
電子部品を実装用基板に加熱加圧することにより、対向配置した接続端子どうしは、直接接触により又は異方導電性接着剤の導電粒子を介して電気的に接続する。
【0006】
本発明における実装用基板は、絶縁層の最外層となる絶縁層にガラスクロスを含まない樹脂フィルムを用いることもできる。
この樹脂フィルムはエポキシ樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、変成ポリフェニレンエーテル樹脂、フェノキシ樹脂、アミドエポキシ樹脂、フェノール樹脂やこれらの混合物、共重合物等が使用できる。またポリサルフォン、ポリエーテルサルフォン、ポリエーテルエーテルケトン、全芳香族液晶ポリエステル、フッ素系樹脂などの耐熱性熱可塑性エンジニヤリングプラスチックのフィルムも使用できる。
前記樹脂フィルム中に有機もしくは無機のフィラーを含むものが使用できる。
【0007】
本発明において用いられる接着剤としては、フィルム状、液状を用いることができるが、フィルム状は、液状のように塗付または印刷法で基板に形成するのではなく、配置するだけで接着工程に入ることができ取扱性が容易であるだけでなく、接続端子の高さを考慮した膜厚の制御が容易であるという特徴を有しており好適である。接着剤としては、熱可塑性高分子や熱、電子線、光などのエネルギによって硬化する架橋型高分子が好ましく、中でもエポキシ系樹脂、シアネートエステル樹脂、イミド系樹脂が好ましい。また、これらの樹脂に可とう性、フィルム形成性を付与する目的で熱可塑性高分子を混合することができる。接着は、加圧、加熱によって行われるので、加熱時の接着剤の溶融粘度が高すぎると接着剤が排除されず、電気的導通を確保できないので、接着剤の接着加熱温度における溶融粘度は1000ポイズ以下にするのが好ましい。
【0008】
本発明における接着剤は、チップと基板の熱膨張係数の違いに基づく応力を緩和する目的で接着後の40℃での弾性率が100〜4000MPaが好ましく、特に100〜1500MPaであれば特に好ましい。例えば、接着剤として、エポキシ樹脂とイミダゾール系、ヒドラジド系、三フッ化ホウ素-アミン錯体、スルホニウム塩、アミンイミド、ポリアミンの塩、ジシアンジアミド等の潜在性硬化剤の混合物に、接着後の40℃での弾性率が100〜1500MPaになるようにアクリルゴムを配合した接着剤があげられる。接着フィルム硬化物の弾性率は、例えば、レオロジ(株)製レオスペクトラDVE−4(引っぱりモード、周波数10Hz、5℃/minで昇温)を使用して測定できる。
【0009】
本発明で用いるアクリルゴムとしては、アクリル酸、アクリル酸エステル、メタクリル酸エステルまたはアクリロニトリルのうち少なくともひとつをモノマー成分とした重合体または共重合体があげられ、中でもグリシジルエーテル基を含有するグリシジルアクリレートやグリシジルメタクリレートを含む共重合体系アクリルゴムが好適に用いられる。これらアクリルゴムの分子量は、接着剤の凝集力を高める点から20万以上が好ましい。アクリルゴムの接着剤中の配合量は、15wt%以下であると接着後の40℃での弾性率が1500MPaを越えてしまい、また40wt%以上になると低弾性率化は図れるが接続時の溶融粘度が高くなり接続電極界間、または接続電極と導電粒子界面の溶融接着剤の排除性が低下するため、接続電極間または接続電極と導電粒子間の電気的導通を確保できなくなる。このため、アクリル配合量としては15〜40wt%が好ましい。接着剤に配合されたこれらのアクリルゴムは、ゴム成分に起因する誘電正接のピーク温度が40〜60℃付近にあるため、接着剤の低弾性率化を図ることができる。
【0010】
本発明に用いられる接着剤には、チップのバンプや回路電極の高さばらつきを吸収するために、異方導電性を積極的に付与する目的で導電粒子を分散することもできる。本発明において導電粒子は例えばAu、Ni、Ag、Cu、Wやはんだなどの金属粒子またはこれらの金属粒子表面に金やパラジウムなどの薄膜をめっきや蒸着によって形成した金属粒子であり、ポリスチレン等の高分子の球状の核材にNi、Cu、Au、はんだ等の導電層を設けた導電粒子を用いることができる。
【0011】
粒径は基板の電極の最小の間隔よりも小さいことが必要で、電極の高さばらつきがある場合、高さばらつきよりも大きいことが好ましく、1μm〜10μmが好ましい。また、接着剤に分散される導電粒子量は、0.1〜30体積%であり、好ましくは0.2〜15体積%である。
【0012】
本発明における半導体チップの接続電極には、金、ニッケル、ハンダ等をめっきし突起電極としためっきバンプ、また 金、アルミニウム等の金属ワイヤの先端を熱エネルギによりボール状としこのボールを接続端子が構成される半導体チップの電極パッド上に圧着した後前記金属ワイヤを切断して構成された突起電極であるボールバンプ、はんだボール、溶融はんだ成形バンプ、カラムの半田付け等による突起電極が使用できる。
【0013】
【実施例】
実施例
金ワイヤから作製したワイヤバンプ(直径:50μmΦ、スペース30μm、高さ:30μm、バンプ数288)付きチップ(10mm x10mm、厚み:0.5mm)を半導体チップとして用いた。
ガラスクロス・エポキシ樹脂両面銅張り積層板であるMCL−E−679(日立化成工業株式会社製、商品名)の表面銅はくを既存のサブトラクト法で内層回路加工、内層接着処理を施す。
次に、該内層回路表面に先にドリル穴加工を施したガラスクロスを有さない銅はく付エポキシ接着フィルムMCF−3000E(日立化成工業株式会社製、商品名)を170℃、40kgf/cm2、60分プレス積層接着し、スルホール穴あけ、無電解銅めっき、サブトラクト法による外層回路加工及び無電解ニッケル/金めっきを施し実装基板を得た。
ニッケル粒子(直径:5μm)を2vol%分散したエポキシ系接着フィルムからなる異方導電フィルム(厚み:50ミクロン)を実装基板に80℃、10kgf/cm2で貼りつけた後、半導体チップのバンプと実装基板(厚み:0.8mm)の位置あわせを行った。ついで、180℃、30g/バンプ、20秒の条件でチップ上方から加熱、加圧を行い、本接続を行った。本接続後、半導体チップのバンプと電気的に接続された実装基板の電極は、接続前に比較し、15〜20ミクロン絶縁層中に埋設していた。本接続後の接続抵抗は、1バンプあたり最高で6mΩ、平均で2mΩ、絶縁抵抗は108Ω以上であり、これらの値は−55〜125℃の熱衝撃試験1000サイクル処理、PCT試験(121℃、2気圧)200時間、260℃のはんだバス浸漬10秒後においても変化がなく、良好な接続信頼
性を示した。
【0014】
【発明の効果】
本発明により、半導体チップ等の電子部品と実装基板との接続信頼性に優れる半導体装置等の電子部品装置を得ることができる。
本発明によれば、実装基板の電極が接続後基板中に埋没するため、半導体チップのバンプや実装基板電極のばらつきを吸収できるとともにチップと実装基板の熱膨張係数差に基づく応力を低弾性率の実装基板表層によって緩和できるため、熱衝撃、PCTやはんだバス浸漬試験などの信頼性試験後においても接続部での接続抵抗の増大や接着剤の剥離がなく、回路板の接続信頼性が大幅に向上する。
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an electronic component device obtained by bonding and fixing a semiconductor chip to a substrate with an anisotropic conductive adhesive film by, for example, a face-down method and electrically connecting both electrodes.
[0002]
[Prior art]
An anisotropic conductive adhesive film is made of an adhesive containing a predetermined amount of conductive particles such as metal particles. This anisotropic conductive adhesive film is provided between an electronic component and an electrode or circuit and is pressurized or heated. By constructing the pressure means, both electrodes are electrically connected to each other, and insulation between adjacent electrodes is imparted so that the electronic component and the circuit are bonded and fixed.
The basic idea for improving the connection reliability of anisotropic conductive adhesive films is to ensure the insulation between adjacent electrodes by making the particle size of the conductive particles smaller than the space between adjacent electrodes. In other words, the electrical connection in the connection portion is obtained by making the content of the conductive particles not to contact the conductive particles and reliably present on the electrodes.
[0003]
[Problems to be solved by the invention]
In the present invention, for example, circuit members having connection terminals are connected to each other, such as a circuit board obtained by bonding and fixing a semiconductor chip to a substrate with an anisotropic conductive adhesive film or the like and electrically connecting both electrodes. The present invention provides an electronic component device connected with excellent connection reliability.
[0004]
[Means for Solving the Problems]
The electronic component device of the present invention includes an electronic component having a first connection terminal, and a mounting substrate having a second connection terminal formed on the surface of the insulating substrate, the first connection terminal and the second connection. An anisotropic conductive adhesive having an elastic modulus at 40 ° C. after connection of 100 to 1500 MPa between the first connection terminal and the second connection terminal that are arranged to face each other. An electronic component device in which the first connection terminal and the second connection terminal, which are disposed and pressed to be opposed to each other, are electrically connected to each other, and the insulating layer of the mounting substrate on which the second connection terminal is formed An insulating layer of a resin film having an elastic modulus at 150 ° C. of 1 to 500 MPa and containing no glass cloth is formed on the surface of the insulating substrate that is the outermost layer, and is disposed opposite to the first connection terminal. The second connection terminal that is pressed and electrically connected is The displacement is characterized in that a 10 to 50 [mu] m. On the insulating substrate surface of the mounting substrate on which the second connection terminal is formed, an insulating material layer having an elastic modulus at 150 ° C. of 1 to 500 MPa, and further an elastic modulus at 150 ° C. of 1 to 500 MPa and 25 ° C. It is preferable that an insulating material layer having an elastic modulus of 50 to 3500 MPa is formed. An anisotropic conductive adhesive is used as the adhesive, and a semiconductor chip is preferable as the electronic component.
[0005]
DETAILED DESCRIPTION OF THE INVENTION
In the present invention, active components such as semiconductor chips, transistors, diodes, and thyristors, chip components such as passive devices such as capacitors, resistors, and coils, and substrates such as printed boards are used as electronic components.
By heating and pressurizing the electronic component to the mounting substrate, the connection terminals arranged opposite to each other are electrically connected by direct contact or through conductive particles of an anisotropic conductive adhesive.
[0006]
The mounting substrate in the present invention can also use a resin film that does not contain glass cloth in the insulating layer that is the outermost layer of the insulating layer.
As this resin film, an epoxy resin, a polyimide resin, a polyamideimide resin, a modified polyphenylene ether resin, a phenoxy resin, an amide epoxy resin, a phenol resin, a mixture thereof, a copolymer, or the like can be used. In addition, films of heat-resistant thermoplastic engineering plastics such as polysulfone, polyethersulfone, polyetheretherketone, wholly aromatic liquid crystal polyester, and fluorine resin can be used.
A resin film containing an organic or inorganic filler can be used.
[0007]
As the adhesive used in the present invention, a film or a liquid can be used. However, the film is not formed on the substrate by a coating or printing method like a liquid, but is simply disposed and used in the bonding process. In addition to being easy to handle and easy to handle, the film thickness is easily controlled in consideration of the height of the connection terminal, which is preferable. The adhesive is preferably a thermoplastic polymer or a cross-linked polymer that is cured by energy such as heat, electron beam, or light, and among them, an epoxy resin, a cyanate ester resin, and an imide resin are preferable. Moreover, a thermoplastic polymer can be mixed for the purpose of imparting flexibility and film-forming properties to these resins. Adhesion is performed by pressurization and heating. Therefore, if the melt viscosity of the adhesive at the time of heating is too high, the adhesive is not excluded, and electrical conduction cannot be ensured. Therefore, the melt viscosity at the adhesive heating temperature of the adhesive is 1000 It is preferable to make it below the poise.
[0008]
The adhesive in the present invention preferably has an elastic modulus at 40 ° C. after bonding of 100 to 4000 MPa, and particularly preferably 100 to 1500 MPa for the purpose of relieving stress based on the difference in thermal expansion coefficient between the chip and the substrate. For example, as an adhesive, a mixture of an epoxy resin and a latent curing agent such as imidazole, hydrazide, boron trifluoride-amine complex, sulfonium salt, amine imide, polyamine salt, dicyandiamide, etc. at 40 ° C. after bonding. The adhesive which mix | blended acrylic rubber so that an elasticity modulus may be set to 100-1500 Mpa is mention | raise | lifted. The elastic modulus of the cured adhesive film can be measured by using, for example, Rheospectra DVE-4 manufactured by Rheology Co., Ltd. (pull mode, temperature rising at 10 Hz, 5 ° C./min).
[0009]
Examples of the acrylic rubber used in the present invention include a polymer or copolymer having at least one of acrylic acid, acrylic acid ester, methacrylic acid ester or acrylonitrile as a monomer component. Among them, glycidyl acrylate containing a glycidyl ether group, A copolymer acrylic rubber containing glycidyl methacrylate is preferably used. The molecular weight of these acrylic rubbers is preferably 200,000 or more from the viewpoint of increasing the cohesive strength of the adhesive. If the blending amount of acrylic rubber in the adhesive is 15 wt% or less, the elastic modulus at 40 ° C. after bonding exceeds 1500 MPa, and if it exceeds 40 wt%, the elastic modulus can be reduced, but melting at the time of connection Since the viscosity increases and the exclusion of the molten adhesive between the connection electrode boundaries or at the interface between the connection electrode and the conductive particles is reduced, it becomes impossible to ensure electrical continuity between the connection electrodes or between the connection electrodes and the conductive particles. For this reason, as an acrylic compounding quantity, 15-40 wt% is preferable. Since these acrylic rubbers blended in the adhesive have a peak temperature of dielectric loss tangent due to the rubber component in the vicinity of 40 to 60 ° C., the elastic modulus of the adhesive can be reduced.
[0010]
In the adhesive used in the present invention, conductive particles can be dispersed for the purpose of positively imparting anisotropic conductivity in order to absorb variations in the height of the bumps of the chip and the circuit electrodes. In the present invention, the conductive particles are, for example, metal particles such as Au, Ni, Ag, Cu, W and solder or metal particles formed by plating or vapor deposition of a thin film such as gold or palladium on the surface of these metal particles, such as polystyrene. Conductive particles in which a polymer spherical core material is provided with a conductive layer such as Ni, Cu, Au, or solder can be used.
[0011]
The particle size needs to be smaller than the minimum distance between the electrodes of the substrate, and when there is a variation in the height of the electrodes, it is preferably larger than the variation in height, and preferably 1 μm to 10 μm. The amount of conductive particles dispersed in the adhesive is 0.1 to 30% by volume, preferably 0.2 to 15% by volume.
[0012]
The connection electrodes of the semiconductor chip in the present invention are plated bumps that are plated with gold, nickel, solder, etc., and the tips of metal wires such as gold, aluminum are formed into a ball shape by heat energy. Ball bumps, solder balls, molten solder formed bumps, and bump electrodes formed by soldering a column, which are bump electrodes formed by cutting the metal wire after being crimped onto the electrode pads of the semiconductor chip, can be used.
[0013]
【Example】
Example A chip (10 mm × 10 mm, thickness: 0.5 mm) with wire bumps (diameter: 50 μmΦ, space 30 μm, height: 30 μm, number of bumps 288) produced from a gold wire was used as a semiconductor chip.
The surface copper foil of MCL-E-679 (trade name, manufactured by Hitachi Chemical Co., Ltd.), which is a glass cloth / epoxy resin double-sided copper-clad laminate, is subjected to inner layer circuit processing and inner layer adhesion treatment by the existing subtract method.
Next, a copper-bonded epoxy adhesive film MCF-3000E (trade name, manufactured by Hitachi Chemical Co., Ltd.) that does not have a glass cloth that has been previously drilled on the inner layer circuit surface is 170 ° C., 40 kgf / cm. 2. For 60 minutes, press lamination bonding was performed, through-hole drilling, electroless copper plating, outer layer circuit processing by subtracting method and electroless nickel / gold plating were performed to obtain a mounting substrate.
An anisotropic conductive film (thickness: 50 microns) made of an epoxy-based adhesive film in which nickel particles (diameter: 5 μm) are dispersed at 2 vol% is affixed to a mounting substrate at 80 ° C. and 10 kgf / cm 2. The mounting substrate (thickness: 0.8 mm) was aligned. Next, the main connection was performed by heating and pressing from above the chip under the conditions of 180 ° C., 30 g / bump, and 20 seconds. After this connection, the electrodes of the mounting substrate electrically connected to the bumps of the semiconductor chip were embedded in an insulating layer of 15 to 20 microns compared to before connection. The connection resistance after this connection is a maximum of 6 mΩ per bump, an average of 2 mΩ, and an insulation resistance of 10 8 Ω or more. These values are from the thermal shock test at −55 to 125 ° C. for 1000 cycles, the PCT test (121 No change even after 10 seconds of immersion in a solder bath at 260 ° C. for 200 hours at 2 ° C., and good connection reliability was exhibited.
[0014]
【The invention's effect】
According to the present invention, an electronic component device such as a semiconductor device having excellent connection reliability between an electronic component such as a semiconductor chip and a mounting substrate can be obtained.
According to the present invention, since the electrodes of the mounting substrate are buried in the substrate after connection, it is possible to absorb variations in bumps of the semiconductor chip and mounting substrate electrodes, and to reduce stress based on the difference in thermal expansion coefficient between the chip and the mounting substrate. Because it can be mitigated by the surface layer of the mounting board, there is no increase in connection resistance or peeling of the adhesive even after reliability tests such as thermal shock, PCT or solder bath immersion test, and the connection reliability of the circuit board is greatly increased To improve.

Claims (1)

第一の接続端子を有する電子部品と、
絶縁基板の表面に形成された第二の接続端子を備える実装用基板とを、
第一の接続端子と第二の接続端子を対向して配置し、
前記対向配置した第一の接続端子と第二の接続端子の間に、接続後の40℃での弾性率が100〜1500MPaである異方導電性接着剤を介在させ、加圧して前記対向配置した第一の接続端子と第二の接続端子を電気的に接続させた電子部品装置であって、
第二の接続端子が形成される実装用基板の絶縁層の最外層となる絶縁基板面には、150℃での弾性率が1〜500MPaで絶縁層にガラスクロスを含まない樹脂フィルムの絶縁材層が形成されており、第一の接続端子と対向配置し加圧され電気的に接続された第二の接続端子は、接続前と比較した変位が10〜50μmであることを特徴とする電子部品装置。
An electronic component having a first connection terminal;
A mounting substrate having a second connection terminal formed on the surface of the insulating substrate;
The first connection terminal and the second connection terminal are arranged to face each other,
An anisotropic conductive adhesive having an elastic modulus at 40 ° C. of 100 to 1500 MPa after connection is interposed between the first connection terminal and the second connection terminal that are arranged to face each other, and is pressed against the opposite. An electronic component device in which the arranged first connection terminal and second connection terminal are electrically connected,
The insulating substrate surface that is the outermost layer of the insulating layer of the mounting substrate on which the second connection terminals are formed has an elastic modulus at 150 ° C. of 1 to 500 MPa and an insulating material for a resin film that does not include glass cloth in the insulating layer The second connection terminal formed with a layer and opposed to the first connection terminal and pressed and electrically connected has a displacement of 10 to 50 μm compared to that before connection. Parts device.
JP02010498A 1998-02-02 1998-02-02 Electronic component equipment Expired - Fee Related JP3835583B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02010498A JP3835583B2 (en) 1998-02-02 1998-02-02 Electronic component equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02010498A JP3835583B2 (en) 1998-02-02 1998-02-02 Electronic component equipment

Publications (2)

Publication Number Publication Date
JPH11219979A JPH11219979A (en) 1999-08-10
JP3835583B2 true JP3835583B2 (en) 2006-10-18

Family

ID=12017815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02010498A Expired - Fee Related JP3835583B2 (en) 1998-02-02 1998-02-02 Electronic component equipment

Country Status (1)

Country Link
JP (1) JP3835583B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005020018A (en) * 2004-07-30 2005-01-20 Sony Chem Corp Adhesive and electrical device

Also Published As

Publication number Publication date
JPH11219979A (en) 1999-08-10

Similar Documents

Publication Publication Date Title
JP3342703B2 (en) Film adhesive for circuit connection and circuit board
KR100338264B1 (en) Electronic parts device
US7879445B2 (en) Adhesive for bonding circuit members, circuit board and process for its production
JPH1150032A (en) Connection member for circuit and circuit board
JP4178565B2 (en) Adhesive for connecting circuit members
JP3581618B2 (en) Conductive fine particles, anisotropic conductive adhesive, and conductive connection structure
JP4928378B2 (en) Adhesive for connecting circuit members
JP4631984B2 (en) Circuit member connecting adhesive, circuit board, and manufacturing method thereof
JP4631979B2 (en) Circuit member connecting adhesive, circuit board and manufacturing method thereof
JP2007113012A (en) Adhesive for connecting circuit part
JP4440352B2 (en) Adhesive for connecting circuit members
JP4514840B2 (en) Adhesive for connecting circuit members
JP3835583B2 (en) Electronic component equipment
JP3835584B2 (en) Electronic component equipment
JP4815648B2 (en) Film adhesive for circuit connection
JPH10163254A (en) Circuit board
JP3801341B2 (en) Electronic component equipment
JP4631998B1 (en) Circuit member connecting adhesive, circuit board, and manufacturing method thereof
JP3882967B2 (en) Circuit board manufacturing method
JP4492692B2 (en) Adhesive film for connecting circuit members
JP4123544B2 (en) Circuit board
JP3925746B2 (en) Circuit board
JP5378261B2 (en) Adhesive for connecting circuit members
JP2007107008A (en) Film-shaped adhesive and method for producing laminate
JP4725568B2 (en) Film adhesive for circuit connection

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050202

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20060120

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060126

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060324

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060412

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060612

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060706

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060719

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090804

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100804

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110804

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110804

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120804

Year of fee payment: 6

LAPS Cancellation because of no payment of annual fees