JP5378261B2 - Adhesive for connecting circuit members - Google Patents
Adhesive for connecting circuit members Download PDFInfo
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- JP5378261B2 JP5378261B2 JP2010030417A JP2010030417A JP5378261B2 JP 5378261 B2 JP5378261 B2 JP 5378261B2 JP 2010030417 A JP2010030417 A JP 2010030417A JP 2010030417 A JP2010030417 A JP 2010030417A JP 5378261 B2 JP5378261 B2 JP 5378261B2
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Abstract
Description
本発明は、例えばフリップチップ実装方式により半導体チップを基板と接着剤で接着固定すると共に両者の電極同士を電気的に接続するために使用される回路部材接続用接着剤に関する。 The present invention relates to an adhesive for connecting a circuit member, which is used for bonding and fixing a semiconductor chip to a substrate with an adhesive by, for example, a flip chip mounting method and electrically connecting both electrodes.
半導体実装分野では、低コスト化・高精化に対応した新しい実装形態としてＩＣチップを直接プリント基板やフレキシブル配線板に搭載するフリップチップ実装が注目されている。フリップチップ実装方式としては、チップの端子にはんだバンプを設け、はんだ接続を行う方式や導電性接着剤を介して電気的接続を行う方式が知られている。これらの方式では、接続するチップと基板の熱膨張係数差に基づくストレスが、各種環境下に曝した場合、接続界面で発生し接続信頼性が低下するという問題がある。このため、接続界面のストレスを緩和する目的で一般にエポキシ樹脂系のアンダフィル材をチップ／基板の間隙に注入する方式が検討されている。しかし、このアンダフィルの注入工程は、プロセスを煩雑化し、生産性、コストの面で不利になるという問題がある。このような問題を解決すべく最近では、異方導電性と封止機能を有する異方導電性接着剤を用いたフリップチップ実装が、プロセス簡易性という観点から注目されている。 In the field of semiconductor mounting, flip chip mounting, in which an IC chip is directly mounted on a printed circuit board or a flexible wiring board, has attracted attention as a new mounting form corresponding to cost reduction and high precision. As the flip chip mounting method, there are known a method in which solder bumps are provided on the terminals of the chip and solder connection is made, and a method in which electrical connection is made through a conductive adhesive. In these methods, there is a problem that when the stress based on the difference in thermal expansion coefficient between the chip to be connected and the substrate is exposed to various environments, it is generated at the connection interface and connection reliability is lowered. For this reason, a method of injecting an epoxy resin-based underfill material into the gap between the chip and the substrate is generally studied for the purpose of alleviating the stress at the connection interface. However, the underfill injection process complicates the process and is disadvantageous in terms of productivity and cost. Recently, flip-chip mounting using an anisotropic conductive adhesive having anisotropic conductivity and a sealing function has attracted attention from the viewpoint of process simplicity in order to solve such problems.
しかしながら、チップを異方導電接着剤を介して直接基板に搭載する場合、温度サイクル試験下ではチップと基板の熱膨張係数差に基づくストレスが接続部において生じ、熱衝撃試験、ＰＣＴ試験、はんだバス浸漬試験などの信頼性試験を行うと接続抵抗の増大や接着剤の剥離が生じるという問題がある。また、チップの接続端子に突起電極が形成されている場合では、信頼性試験においてチップと基板の熱膨張係数差に基づくストレスが突起電極とチップ界面に集中し、突起電極がチップ電極界面から剥離し、導通不良が生じるという問題がある。本発明は、接続部での接続抵抗の増大や接着剤の剥離がなく、接続信頼性が大幅に向上する回路板を提供するものである。 However, when the chip is directly mounted on the substrate via the anisotropic conductive adhesive, stress based on the difference in thermal expansion coefficient between the chip and the substrate is generated in the connection portion under the temperature cycle test, and thermal shock test, PCT test, solder bath When a reliability test such as an immersion test is performed, there is a problem that an increase in connection resistance or peeling of the adhesive occurs. In addition, when a protruding electrode is formed on the connection terminal of the chip, stress based on the difference in thermal expansion coefficient between the chip and the substrate is concentrated in the reliability test, and the protruding electrode is peeled off from the chip electrode interface. However, there is a problem that poor conduction occurs. The present invention provides a circuit board that does not increase connection resistance at the connection portion and does not peel off the adhesive, and greatly improves connection reliability.
本発明の接着剤は、相対向する回路電極間に介在され、相対向する回路電極を加圧し加圧方向の電極間を電気的に接続する回路部材接続用接着剤であって、接着樹脂組成物に無機質充填材が含有され、前記接着剤の硬化後の１１０〜１３０℃での平均熱膨張係数が２００ｐｐｍ以下であることを特徴とする回路部材接続用接着剤である。 The adhesive of the present invention is an adhesive for circuit member connection that is interposed between circuit electrodes facing each other, pressurizes the circuit electrodes facing each other, and electrically connects the electrodes in the pressurizing direction. An inorganic filler is contained in the product, and an average coefficient of thermal expansion at 110 to 130 ° C. after curing of the adhesive is 200 ppm or less.
本発明の接着剤によれば、従来の接着剤のように熱膨張係数が大きくないため、チップとＡＣＦ界面でのストレスを緩和できる他、さらに接着樹脂組成物として４０℃での弾性率が３０〜１５００ＭＰａである場合にはさらに接着樹脂組成物によって熱衝撃、ＰＣＴやはんだバス浸漬試験などの信頼性試験において生じるストレスを吸収できるため、信頼性試験後においても接続部での接続抵抗の増大や接着剤の剥離がなく、接続信頼性が大幅に向上する。また、本発明の接着剤は、熱膨張係数が小さくチップとＡＣＦ界面でのストレスを緩和できることから、チップと基板を接着剤を介して接続する際にチップの電極パッドに突起電極を設けた場合、温度サイクル試験下での突起電極の電極パッドからの剥離を大幅に低減できる。したがって、本発明の接着剤は、ＬＣＤパネルとＴＡＢ、ＴＡＢとフレキシブル回路基板、ＬＣＤパネルとＩＣチップ、ＩＣチップとプリント基板とを接続時の加圧方向にのみ電気的に接続するために好適に用いられる。 According to the adhesive of the present invention, since the coefficient of thermal expansion is not as large as that of the conventional adhesive, the stress at the interface between the chip and the ACF can be relieved, and the elastic modulus at 40 ° C. is 30 as an adhesive resin composition. In the case of ˜1500 MPa, the adhesive resin composition can further absorb the stress generated in reliability tests such as thermal shock, PCT and solder bath immersion test, so that the connection resistance at the connection portion can be increased even after the reliability test. There is no peeling of the adhesive, and connection reliability is greatly improved. In addition, since the adhesive of the present invention has a small coefficient of thermal expansion and can relieve stress at the interface between the chip and the ACF, when a protruding electrode is provided on the electrode pad of the chip when connecting the chip and the substrate via the adhesive The peeling of the protruding electrode from the electrode pad under the temperature cycle test can be greatly reduced. Therefore, the adhesive of the present invention is suitable for electrically connecting the LCD panel and TAB, TAB and flexible circuit board, LCD panel and IC chip, and IC chip and printed board only in the pressurizing direction at the time of connection. Used.
本発明において用いられる回路部材として半導体チップ、プリント基板、ポリイミドやポリエステルを基材としたフレキシル配線板があげられる。半導体チップや基板の電極パッド上には、めっきで形成されるバンプや金ワイヤの先端をトーチ等により溶融させ、金ボールを形成し、このボールを電極パッド上に圧着した後、ワイヤを切断して得られるワイヤバンプなどの突起電極を設け、接続端子として用いることができる。 Examples of the circuit member used in the present invention include a semiconductor chip, a printed circuit board, and a flexible wiring board based on polyimide or polyester. On the electrode pad of the semiconductor chip or substrate, the bump formed by plating or the tip of the gold wire is melted with a torch or the like to form a gold ball, and after the ball is pressed onto the electrode pad, the wire is cut. Protruding electrodes such as wire bumps obtained in this way can be provided and used as connection terminals.
本発明において用いられる接着剤樹脂組成物としては、エポキシ樹脂とイミダゾール系、ヒドラジド系、三フッ化ホウ素−アミン錯体、スルホニウム塩、アミンイミド、ポリアミンの塩、ジシアンジアミド等の潜在性硬化剤の混合物が用いられ、回路部材の熱膨張係数差に基づくストレスを緩和するためには、接着後の４０℃での弾性率が３０〜１５００ＭＰａの接着剤樹脂組成物が好ましい。例えば、接続時の良好な流動性や高接続信頼性を得られる接着剤樹脂組成物として、エポキシ樹脂とイミダゾール系、ヒドラジド系、三フッ化ホウ素−アミン錯体、スルホニウム塩、アミンイミド、ポリアミンの塩、ジシアンジアミド等の潜在性硬化剤の混合物に、接着後の４０℃での弾性率が３０〜１５００ＭＰａになるようにアクリルゴムを配合した接着剤があげられる。接着フィルム硬化物の弾性率は、例えば、レオロジ（株）製レオスペクトラＤＶＥ−４（引っぱりモード、周波数１０Ｈｚ、５℃／ｍｉｎで昇温）を使用して測定できる。 As the adhesive resin composition used in the present invention, a mixture of an epoxy resin and an imidazole-based, hydrazide-based, boron trifluoride-amine complex, sulfonium salt, amine imide, polyamine salt, dicyandiamide or the like is used. In order to relieve stress based on the difference in thermal expansion coefficient of the circuit member, an adhesive resin composition having an elastic modulus at 40 ° C. of 30 to 1500 MPa after bonding is preferable. For example, as an adhesive resin composition that can obtain good fluidity and high connection reliability at the time of connection, epoxy resin and imidazole, hydrazide, boron trifluoride-amine complex, sulfonium salt, amine imide, polyamine salt, Examples of the adhesive include a mixture of latent curing agents such as dicyandiamide and an acrylic rubber blended so that the elastic modulus at 40 ° C. after bonding is 30 to 1500 MPa. The elastic modulus of the cured adhesive film can be measured by using, for example, Rheospectra DVE-4 manufactured by Rheology Co., Ltd. (pull mode, temperature rising at 10 Hz, 5 ° C./min).
本発明で用いるアクリルゴムとしては、アクリル酸、アクリル酸エステル、メタクリル酸エステルまたはアクリロニトリルのうち少なくともひとつをモノマー成分とした重合体または共重合体があげられ、中でもグリシジルエーテル基を含有するグリシジルアクリレートやグリシジルメタクリレートを含む共重合体系アクリルゴムが好適に用いられる。これらアクリルゴムの分子量は、接着剤の凝集力を高める点から２０万以上が好ましい。アクリルゴムの接着剤中の配合量は、１５ｗｔ％以下であると接着後の４０℃での弾性率が１５００ＭＰａを越えてしまい、また４０ｗｔ％以上になると低弾性率化は図れるが接続時の溶融粘度が高くなり接続電極界間、または接続電極と導電粒子界面の溶融接着剤の排除性が低下するため、接続電極間または接続電極と導電粒子間の電気的導通を確保できなくなる。このため、アクリル配合量としては１５〜４０ｗｔ％が好ましい。接着剤に配合されたこれらのアクリルゴムは、ゴム成分に起因する誘電正接のピーク温度が４０〜６０℃付近にあるため、接着剤の低弾性率化を図ることができる。また、接着剤にはフィルム形成性をより容易にするためにフェノキシ樹脂などの熱可塑性樹脂を配合することもできる。特に、フェノキシ樹脂は、エポキシ樹脂と構造が類似しているため、エポキシ樹脂との相溶性、接着性に優れるなどの特徴を有するので好ましい。フィルム形成は、これら少なくともエポキシ樹脂、アクリルゴム、フェノキシ樹脂、潜在性硬化剤からなる接着組成物と導電粒子を有機溶剤に溶解あるいは分散により液状化して、剥離性基材上に塗布し、硬化剤の活性温度以下で溶剤を除去することにより行われる。この時用いる溶剤は、芳香族炭化水素系と含酸素系の混合溶剤が材料の溶解性を向上させるため好ましい。 Examples of the acrylic rubber used in the present invention include polymers or copolymers having at least one of acrylic acid, acrylic acid ester, methacrylic acid ester or acrylonitrile as a monomer component. Among them, glycidyl acrylate containing glycidyl ether group or A copolymer acrylic rubber containing glycidyl methacrylate is preferably used. The molecular weight of these acrylic rubbers is preferably 200,000 or more from the viewpoint of increasing the cohesive strength of the adhesive. If the blending amount of acrylic rubber in the adhesive is 15 wt% or less, the elastic modulus at 40 ° C. after bonding exceeds 1500 MPa, and if it exceeds 40 wt%, the elastic modulus can be reduced, but melting at the time of connection Since the viscosity increases and the exclusion of the molten adhesive between the connection electrode boundaries or at the interface between the connection electrode and the conductive particles is reduced, it becomes impossible to ensure electrical continuity between the connection electrodes or between the connection electrodes and the conductive particles. For this reason, as an acrylic compounding quantity, 15-40 wt% is preferable. Since these acrylic rubbers blended in the adhesive have a peak temperature of dielectric loss tangent due to the rubber component in the vicinity of 40 to 60 ° C., the elastic modulus of the adhesive can be reduced. In addition, a thermoplastic resin such as a phenoxy resin can be blended in the adhesive in order to make film forming easier. In particular, the phenoxy resin is preferable because it has a similar structure to the epoxy resin and has characteristics such as excellent compatibility with the epoxy resin and excellent adhesion. For film formation, an adhesive composition composed of at least an epoxy resin, an acrylic rubber, a phenoxy resin, and a latent curing agent and a conductive particle are liquefied by dissolving or dispersing in an organic solvent, and applied onto a peelable substrate, and then a curing agent. This is done by removing the solvent below the activation temperature. The solvent used at this time is preferably an aromatic hydrocarbon-based and oxygen-containing mixed solvent because the solubility of the material is improved.
本発明に用いられる無機質充填材としては、特に限定するものではなく、例えば、溶融シリカ、結晶質シリカ、ケイ酸カルシウム、アルミナ、炭酸カルシウム等の粉体があげられる。無機充填材の配合量は、接着剤樹脂組成物１００重量部に対して１０〜２００重量部好ましく、熱膨張係数を低下させるには配合量が大きいほど効果的であるが、多量に配合すると接着性や接続部での接着剤の排除性低下に基づく導通不良が発生し、配合量が小さいと熱膨張係数を充分低下できないため、２０〜９０重量部が特に好ましい。また、その平均粒径は、接続部での導通不良を防止する目的で３ミクロン以下にするのが好ましい。また接続時の樹脂の流動性の低下及びチップのパッシベーション膜のダメージを防ぐ目的で球状フィラを用いることが望ましい。 The inorganic filler used in the present invention is not particularly limited, and examples thereof include powders such as fused silica, crystalline silica, calcium silicate, alumina, and calcium carbonate. The blending amount of the inorganic filler is preferably 10 to 200 parts by weight with respect to 100 parts by weight of the adhesive resin composition, and the larger the blending amount, the more effective it is to reduce the thermal expansion coefficient. In particular, 20 to 90 parts by weight is particularly preferable because a poor conduction due to a decrease in adhesiveness and the elimination of the adhesive at the connection part occurs and the thermal expansion coefficient cannot be lowered sufficiently if the blending amount is small. The average particle size is preferably 3 microns or less for the purpose of preventing poor conduction at the connection. Further, it is desirable to use a spherical filler for the purpose of preventing a decrease in resin fluidity at the time of connection and damage to the passivation film of the chip.
本発明の接着剤には、チップのバンプや回路電極の高さばらつきを吸収するために、異方導電性を積極的に付与する目的で導電粒子を分散することもできる。本発明において導電粒子は例えばＡｕ、Ｎｉ、Ａｇ、Ｃｕ、Ｗやはんだなどの金属粒子またはこれらの金属粒子表面に金やパラジウムなどの薄膜をめっきや蒸着によって形成した金属粒子であり、ポリスチレン等の高分子の球状の核材にＮｉ、Ｃｕ、Ａｕ、はんだ等の導電層を設けた導電粒子を用いることができる。粒径は基板の電極の最小の間隔よりも小さいことが必要で、電極の高さばらつきがある場合、高さばらつきよりも大きいことが好ましく、かつ無機質充填材の平均粒径より大きいことが好ましく、１μｍ〜１０μｍが好ましい。また、接着剤に分散される導電粒子量は、０．１〜３０体積％であり、好ましくは０．２〜１５体積％である。本発明のフィルム状接着剤の膜厚は、特に限定するものではないが、第一及び第二の回路部材間のギャップに比べ、厚いほうが好ましく、一般にはギャップに対して５μｍ以上厚い膜厚が望ましい。 In the adhesive of the present invention, conductive particles can be dispersed for the purpose of positively imparting anisotropic conductivity in order to absorb the height variation of the bumps of the chip and the circuit electrodes. In the present invention, the conductive particles are, for example, metal particles such as Au, Ni, Ag, Cu, W and solder or metal particles formed by plating or vapor deposition of a thin film such as gold or palladium on the surface of these metal particles, such as polystyrene. Conductive particles in which a polymer spherical core material is provided with a conductive layer such as Ni, Cu, Au, or solder can be used. The particle size needs to be smaller than the minimum distance between the electrodes on the substrate, and when there is a variation in the height of the electrodes, it is preferably larger than the variation in height, and preferably larger than the average particle size of the inorganic filler. 1 μm to 10 μm is preferable. The amount of conductive particles dispersed in the adhesive is 0.1 to 30% by volume, preferably 0.2 to 15% by volume. Although the film thickness of the film adhesive of the present invention is not particularly limited, it is preferably thicker than the gap between the first and second circuit members, and generally has a thickness of 5 μm or more with respect to the gap. desirable.
実施例１
フェノキシ樹脂５０ｇと、ブチルアクリレート（４０部）、エチルアクリレート（３０部）、アクリロニトリル（３０部）及びグリシジルメタクリレート（３部）を共重合したアクリルゴム（分子量：８５万）１２５ｇを酢酸エチル４００ｇに溶解し、３０％溶液を得た。ついで、マイクロカプセル型潜在性硬化剤を含有する液状エポキシ（エポキシ当量１８５）３２５ｇをこの溶液に加え、撹拌し、溶融シリカ（平均粒子径：０．５μｍ）を接着剤樹脂組成物１００重量部に対して４０重量、さらにニッケル粒子（直径：５μｍ）を２ｖｏｌ％分散してフィルム塗工用溶液を得た。この溶液をセパレータ（シリコーン処理したポリエチレンテレフタレートフィルム、厚み４０μｍ）にロールコータで塗布し、１００℃１０分乾燥し厚み４５μｍの接着フィルム１を作製した。なお、この接着フィルム１の溶融シリカ及びニッケル粒子を除いた接着剤樹脂組成物のみの動的粘弾性測定器で測定した４０℃の弾性率は、８００ＭＰａであった。また、接着フィルム１のＴＭＡ法で測定した１１０〜１３０℃の平均熱膨張係数は１１５ｐｐｍであった。次に作製した接着フィルム１を用いて金バンプ（面積：８０μｍｘ８０μｍ、スペース３０μｍ、高さ：１５μｍ、バンプ数２８８）付きチップ（１０ｍｍｘ１０ｍｍ、厚み：０．５ｍｍ）とＮｉ／ＡｕめっきＣｕ回路プリント基板の接続を以下に示すように行った。接着フィルム（１２ｍｍｘ１２ｍｍ）をＮｉ／ＡｕめっきＣｕ回路プリント基板（電極高さ：２０μｍ、厚み：０．８ｍｍ）に８０℃、１０ｋｇｆ／ｃｍ２で貼りつけた後、セパレータを剥離し、チップのバンプとＮｉ／ＡｕめっきＣｕ回路プリント基板（厚み：０．８ｍｍ）の位置あわせを行った。ついで、１８０℃、３０ｇ／バンプ、２０秒の条件でチップ上方から加熱、加圧を行い、本接続を行った。本接続後の接続抵抗は、１バンプあたり最高で６ｍΩ、平均で２ｍΩ、絶縁抵抗は１０８Ω以上であり、これらの値は−５５〜１２５℃の熱衝撃試験１０００サイクル処理、ＰＣＴ試験（１２１℃、２気圧）２００時間、２６０℃のはんだバス浸漬１０秒後においても変化がなく、良好な接続信頼性を示した。
Example 1
50 g of phenoxy resin and 125 g of acrylic rubber (molecular weight: 850,000) copolymerized with butyl acrylate (40 parts), ethyl acrylate (30 parts), acrylonitrile (30 parts) and glycidyl methacrylate (3 parts) are dissolved in 400 g of ethyl acetate. To obtain a 30% solution. Next, 325 g of a liquid epoxy (epoxy equivalent 185) containing a microcapsule type latent curing agent is added to this solution and stirred, and fused silica (average particle size: 0.5 μm) is added to 100 parts by weight of the adhesive resin composition. On the other hand, 40% by weight and further 2 vol% of nickel particles (diameter: 5 μm) were dispersed to obtain a film coating solution. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) with a roll coater and dried at 100 ° C. for 10 minutes to produce an adhesive film 1 having a thickness of 45 μm. In addition, the 40 degreeC elastic modulus measured with the dynamic viscoelasticity measuring device only of the adhesive resin composition except the fused silica and nickel particle of this adhesive film 1 was 800 MPa. Moreover, the average thermal expansion coefficient of 110-130 degreeC measured by TMA method of the adhesive film 1 was 115 ppm. Next, using the produced adhesive film 1, a chip (10 mm × 10 mm, thickness: 0.5 mm) with gold bumps (area: 80 μm × 80 μm, space 30 μm, height: 15 μm, number of bumps 288) and Ni / Au plated Cu circuit printed circuit board Connections were made as shown below. An adhesive film (12 mm × 12 mm) was attached to a Ni / Au plated Cu circuit printed circuit board (electrode height: 20 μm, thickness: 0.8 mm) at 80 ° C. and 10 kgf / cm 2 , and then the separator was peeled off to form a chip bump. The Ni / Au plated Cu circuit printed circuit board (thickness: 0.8 mm) was aligned. Next, the main connection was performed by heating and pressing from above the chip under the conditions of 180 ° C., 30 g / bump, and 20 seconds. The connection resistance after this connection is a maximum of 6 mΩ per bump, an average of 2 mΩ, and an insulation resistance of 10 8 Ω or more. These values are from the thermal shock test at −55 to 125 ° C., 1000 cycle treatment, PCT test (121 No change even after 10 seconds of immersion in a solder bath at 260 ° C. for 200 hours at 2 ° C., and good connection reliability was exhibited.
実施例２
フェノキシ樹脂５０ｇと、ブチルアクリレート（４０部）、エチルアクリレート（３０部）、アクリロニトリル（３０部）及びグリシジルメタクリレート（３部）を共重合したアクリルゴム（分子量：８５万）１７５ｇを酢酸エチル５２５ｇに溶解し、３０％溶液を得た。ついで、、マイクロカプセル型潜在性硬化剤を含有する液状エポキシ（エポキシ当量１８５）２７５ｇをこの溶液に加え、撹拌し、溶融シリカ（平均粒子径：０．５μｍ）を接着剤樹脂組成物１００重量部に対して６０重量、さらにニッケル粒子（直径：３μｍ）を２ｖｏｌ％分散してフィルム塗工用溶液を得た。この溶液をセパレータ（シリコーン処理したポリエチレンテレフタレートフィルム、厚み４０μｍ）にロールコータで塗布し、１００℃、１０分乾燥し厚み４５μｍの接着フィルム２を作製した。この接着フィルム２の溶融シリカ及びニッケル粒子を除いた接着剤樹脂組成物のみの動的粘弾性測定器で測定した４０℃の弾性率は、４００ＭＰａであった。また、接着フィルム２のＴＭＡ法で測定した１１０〜１３０℃の平均熱膨張係数は１００ｐｐｍであった。次に作製した接着フィルム２を用いて金バンプ（面積：８０μｍｘ８０μｍ、スペース３０μｍ、高さ：１５μｍ、バンプ数２８８）付きチップ（１０ｍｍｘ１０ｍｍ）とＮｉ／ＡｕめっきＣｕ回路プリント基板（電極高さ：２０μｍ、厚み：０．８ｍｍ）の接続を以下に示すように行った。接着フィルム（１２ｍｍｘ１２ｍｍ）をＮｉ／ＡｕめっきＣｕ回路プリント基板に８０℃、１０ｋｇｆ／ｃｍ２で貼りつけた後、セパレータを剥離し、チップのバンプとＮｉ／ＡｕめっきＣｕ回路プリント基板の位置あわせを行った。ついで、１７０℃、３０ｇ／バンプ、２０秒の条件でチップ上方から加熱、加圧を行い、本接続を行った。本接続後の接続抵抗は、１バンプあたり最高で１８ｍΩ、平均で８ｍΩ、絶縁抵抗は１０８Ω以上であり、これらの値は−５５〜１２５℃の熱衝撃試験１０００サイクル処理、ＰＣＴ試験（１２１℃、２気圧）２００時間、２６０℃のはんだバス浸漬１０秒後においても変化がなく、良好な接続信頼性を示した。
Example 2
50 g of phenoxy resin and 175 g of acrylic rubber (molecular weight: 850,000) copolymerized with butyl acrylate (40 parts), ethyl acrylate (30 parts), acrylonitrile (30 parts) and glycidyl methacrylate (3 parts) are dissolved in 525 g of ethyl acetate. To obtain a 30% solution. Next, 275 g of a liquid epoxy (epoxy equivalent 185) containing a microcapsule-type latent curing agent is added to this solution and stirred, and 100 parts by weight of the adhesive resin composition is added with fused silica (average particle size: 0.5 μm). 60% by weight, and further 2 vol% of nickel particles (diameter: 3 μm) were dispersed to obtain a film coating solution. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) with a roll coater, and dried at 100 ° C. for 10 minutes to produce an adhesive film 2 having a thickness of 45 μm. The elastic modulus at 40 ° C. measured by a dynamic viscoelasticity measuring instrument using only the adhesive resin composition excluding fused silica and nickel particles of the adhesive film 2 was 400 MPa. Moreover, the average thermal expansion coefficient of 110-130 degreeC measured with the TMA method of the adhesive film 2 was 100 ppm. Next, using the produced adhesive film 2, a chip (10 mm × 10 mm) with a gold bump (area: 80 μm × 80 μm, space 30 μm, height: 15 μm, number of bumps 288) and a Ni / Au plated Cu circuit printed board (electrode height: 20 μm, The connection of (thickness: 0.8 mm) was performed as shown below. An adhesive film (12 mm x 12 mm) was attached to a Ni / Au plated Cu circuit printed circuit board at 80 ° C. and 10 kgf / cm 2 , and then the separator was peeled off to align the chip bumps with the Ni / Au plated Cu circuit printed circuit board. It was. Next, the main connection was made by heating and pressing from above the chip under the conditions of 170 ° C., 30 g / bump, and 20 seconds. The connection resistance after this connection is 18 mΩ at the maximum per bump, the average is 8 mΩ, and the insulation resistance is 10 8 Ω or more. These values are the thermal shock test at −55 to 125 ° C., 1000 cycle treatment, PCT test (121 No change even after 10 seconds of immersion in a solder bath at 260 ° C. for 200 hours at 2 ° C., and good connection reliability was exhibited.
実施例３
フェノキシ樹脂５０ｇ、ブチルアクリレート（４０部）、エチルアクリレート（３０部）、アクリロニトリル（３０部）及びグリシジルメタクリレート（３部）を共重合したアクリルゴム（分子量：８５万）１００ｇを酢酸エチル３５０ｇに溶解し、３０％溶液を得た。ついで、マイクロカプセル型潜在性硬化剤を含有する液状エポキシ（エポキシ当量１８５）３５０ｇをこの溶液に加え、撹拌し、溶融シリカ（平均粒子径：０．５μｍ）を接着剤樹脂組成物１００重量部に対して６０重量、さらにポリスチレン系核体（直径：５μｍ）の表面にＡｕ層を形成した導電粒子を５ｖｏｌ％分散してフィルム塗工用溶液を得た。この溶液をセパレータ（シリコーン処理したポリエチレンテレフタレートフィルム、厚み４０μｍ）にロールコータで塗布し、１００℃１０分乾燥し厚み４５μｍの接着フィルム３を作製した。この接着フィルム３の溶融シリカ及びニッケル粒子を除いた接着樹脂組成物のみの動的粘弾性測定器で測定した４０℃の弾性率は、１０００ＭＰａであった。また、接着フィルム３のＴＭＡ法で測定した１１０〜１３０℃の平均熱膨張係数は９８ｐｐｍであった。次に作製した接着フィルム３を用いて金バンプ（面積：８０μｍｘ８０μｍ、スペース３０μｍ、高さ：１５μｍ、バンプ数２８８）付きチップ（１０ｍｍｘ１０ｍｍ、厚み：０．５ｍｍ）とＮｉ／ＡｕめっきＣｕ回路プリント基板（電極高さ：２０μｍ、厚み：０．８ｍｍ）の接続を以下に示すように行った。接着フィルム３（１２ｍｍｘ１２ｍｍ）をＮｉ／ＡｕめっきＣｕ回路プリント基板に８０℃、１０ｋｇｆ／ｃｍ２で貼りつけた後、セパレータを剥離し、チップのバンプとＮｉ／ＡｕめっきＣｕ回路プリント基板の位置あわせを行った。ついで、１７０℃、３０ｇ／バンプ、２０秒の条件でチップ上方から加熱、加圧を行い、本接続を行った。接続抵抗は、１バンプあたり最高で５ｍΩ、平均で１．５ｍΩ、絶縁抵抗は１０８Ω以上であり、これらの値は−５５〜１２５℃の熱衝撃試験１０００サイクル処理、ＰＣＴ試験（１２１℃、２気圧）２００時間、２６０℃のはんだバス浸漬１０秒後においても変化がなく、良好な接続信頼性を示した。
Example 3
50 g of phenoxy resin, 100 g of acrylic rubber (molecular weight: 850,000) copolymerized with butyl acrylate (40 parts), ethyl acrylate (30 parts), acrylonitrile (30 parts) and glycidyl methacrylate (3 parts) were dissolved in 350 g of ethyl acetate. A 30% solution was obtained. Next, 350 g of a liquid epoxy (epoxy equivalent 185) containing a microcapsule type latent curing agent is added to this solution and stirred, and fused silica (average particle size: 0.5 μm) is added to 100 parts by weight of the adhesive resin composition. On the other hand, a conductive solution having an Au layer formed on the surface of a polystyrene core (diameter: 5 μm) was dispersed in an amount of 60 vol. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) with a roll coater and dried at 100 ° C. for 10 minutes to produce an adhesive film 3 having a thickness of 45 μm. The elastic modulus at 40 ° C. measured by a dynamic viscoelasticity measuring device using only the adhesive resin composition excluding fused silica and nickel particles of the adhesive film 3 was 1000 MPa. Moreover, the average thermal expansion coefficient of 110-130 degreeC measured by TMA method of the adhesive film 3 was 98 ppm. Next, using the produced adhesive film 3, a chip (10 mm × 10 mm, thickness: 0.5 mm) with a gold bump (area: 80 μm × 80 μm, space 30 μm, height: 15 μm, number of bumps 288) and a Ni / Au plated Cu circuit printed circuit board ( The connection of electrode height: 20 μm and thickness: 0.8 mm was performed as shown below. Adhesive film 3 (12 mm x 12 mm) was attached to a Ni / Au plated Cu circuit printed board at 80 ° C. and 10 kgf / cm 2 , and then the separator was peeled off to align the chip bumps with the Ni / Au plated Cu circuit printed board. went. Next, the main connection was made by heating and pressing from above the chip under the conditions of 170 ° C., 30 g / bump, and 20 seconds. The connection resistance is 5 mΩ at the maximum per bump, 1.5 mΩ on average, and the insulation resistance is 10 8 Ω or more. These values are the thermal shock test 1000 cycle treatment at −55 to 125 ° C., the PCT test (121 ° C., 2 atmospheres) No change even after 200 seconds of immersion in a solder bath at 260 ° C. for 200 hours, showing good connection reliability.
実施例４
フェノキシ樹脂５０ｇと、ブチルアクリレート（４０部）、エチルアクリレート（３０部）、アクリロニトリル（３０部）及びグリシジルメタクリレート（３部）を共重合したアクリルゴム（分子量：８５万）１００ｇを酢酸エチル３５０ｇに溶解し、３０％溶液を得た。ついで、マイクロカプセル型潜在性硬化剤を含有する液状エポキシ（エポキシ当量１８５）３５０ｇ部をこの溶液に加え、撹拌し、溶融シリカ（平均粒子径：０．５μｍ）を接着剤樹脂組成物１００重量部に対して４０重量、さらにポリスチレン系核体（直径：５μｍ）の表面にＡｕ層を形成した導電粒子を５ｖｏｌ％分散してフィルム塗工用溶液を得た。この溶液をセパレータ（シリコーン処理したポリエチレンテレフタレートフィルム、厚み４０μｍ）にロールコータで塗布し、１００℃１０分乾燥し厚み４５μｍの接着フィルム４を作製した。この接着フィルム４の溶融シリカ及びニッケル粒子を除いた接着剤樹脂組成物のみの動的粘弾性測定器で測定した４０℃の弾性率は、１０００ＭＰａであった。また、接着フィルム４のＴＭＡ法で測定した１１０〜１３０℃の平均熱膨張係数は１１１ｐｐｍであった。次に作製した接着フィルム４を用いて金バンプ（面積：５０μｍｘ５０μｍ、３６２バンプ、スペース：２０μｍ、高さ：１５μｍ）付きチップ（１．７ｍｍｘ１７ｍｍ、厚み：０．５ｍｍ）とＩＴＯ回路付ガラス基板（厚み：１．１ｍｍ）の接続を以下に示すように行った。接着フィルム４（１２ｍｍｘ１２ｍｍ）をＩＴＯ回路付ガラス基板に８０℃、１０ｋｇｆ／ｃｍ２で貼りつけた後、セパレータを剥離し、チップのバンプとＩＴＯ回路付ガラス基板の位置あわせを行った。ついで、１８０℃、４０ｇ／バンプ、２０秒の条件でチップ上方から加熱、加圧を行い、本接続を行った。接続抵抗は、１バンプあたり最高で１５０ｍΩ、平均で８０ｍΩ、絶縁抵抗は１０８Ω以上であり、これらの値は−４０〜１００℃の熱衝撃試験１０００サイクル処理、ＰＣＴ試験（１０５℃、１．２気圧）１００時間においても変化がなく、良好な接続信頼性を示した。
Example 4
50 g of phenoxy resin and 100 g of acrylic rubber (molecular weight: 850,000) copolymerized with butyl acrylate (40 parts), ethyl acrylate (30 parts), acrylonitrile (30 parts) and glycidyl methacrylate (3 parts) are dissolved in 350 g of ethyl acetate. To obtain a 30% solution. Next, 350 g of a liquid epoxy (epoxy equivalent 185) containing a microcapsule-type latent curing agent is added to this solution, and stirred, and fused silica (average particle size: 0.5 μm) is added to 100 parts by weight of the adhesive resin composition. The conductive particles having an Au layer formed on the surface of a polystyrene core (diameter: 5 μm) were dispersed in an amount of 40 vol. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) with a roll coater and dried at 100 ° C. for 10 minutes to produce an adhesive film 4 having a thickness of 45 μm. The elastic modulus at 40 ° C. measured by a dynamic viscoelasticity measuring device using only the adhesive resin composition excluding fused silica and nickel particles of the adhesive film 4 was 1000 MPa. Moreover, the average thermal expansion coefficient of 110-130 degreeC measured by TMA method of the adhesive film 4 was 111 ppm. Next, using the produced adhesive film 4, a chip (1.7 mm × 17 mm, thickness: 0.5 mm) with gold bumps (area: 50 μm × 50 μm, 362 bumps, space: 20 μm, height: 15 μm) and a glass substrate with ITO circuit (thickness) : 1.1 mm) was performed as shown below. The adhesive film 4 (12 mm × 12 mm) was attached to a glass substrate with an ITO circuit at 80 ° C. and 10 kgf / cm 2 , and then the separator was peeled off to align the chip bump with the glass substrate with the ITO circuit. Next, the main connection was made by heating and pressing from above the chip under the conditions of 180 ° C., 40 g / bump, and 20 seconds. The connection resistance is a maximum of 150 mΩ per bump, an average of 80 mΩ, and an insulation resistance of 10 8 Ω or more. These values are the thermal shock test 1000 cycle treatment at −40 to 100 ° C., the PCT test (105 ° C., 1.. Even at 100 atm (2 atm), there was no change and good connection reliability was shown.
実施例５
フェノキシ樹脂５０ｇと、ブチルアクリレート（４０部）、エチルアクリレート（３０部）、アクリロニトリル（３０部）及びグリシジルメタクリレート（３部）を共重合したアクリルゴム（分子量：８５万）１２５ｇを酢酸エチル４００ｇに溶解し、３０％溶液を得た。ついで、、マイクロカプセル型潜在性硬化剤を含有する液状エポキシ（エポキシ当量１８５）３２５ｇをこの溶液に加え、撹拌し、溶融シリカ（平均粒子径：０．５μｍ）を接着剤樹脂組成物１００重量部に対して６０重量、さらにニッケル粒子（直径：３μｍ）を２ｖｏｌ％分散してフィルム塗工用溶液を得た。この溶液をセパレータ（シリコーン処理したポリエチレンテレフタレートフィルム、厚み４０μｍ）にロールコータで塗布し、１００℃１０分乾燥し厚み４５μｍの接着フィルム５を作製した。この接着フィルム５の溶融シリカ及びニッケル粒子を除いた接着剤樹脂組成物のみの動的粘弾性測定器で測定した４０℃の弾性率は、８００ＭＰａであった。また、接着フィルム５のＴＭＡ法で測定した１１０〜１３０℃の平均熱膨張係数は１０２ｐｐｍであった。次に作製した接着フィルム５を用いてバンプレスチップ（１０ｍｍｘ１０ｍｍ、厚み：０．５ｍｍ、パッド電極：Ａｌ、パッド径：１２０μｍ）と回路上にＮｉ／ＡｕめっきＣｕバンプ（直径：１００μｍ、スペース５０μｍ、高さ：１５μｍ、バンプ数２００）を形成したＮｉ／ＡｕめっきＣｕ回路プリント基板の接続を以下に示すように行った。接着フィルム５（１２ｍｍｘ１２ｍｍ）をＮｉ／ＡｕめっきＣｕ回路プリント基板（電極高さ：２０μｍ、厚み：０．８ｍｍ）に８０℃、１０ｋｇｆ／ｃｍ２で貼りつけた後、セパレータを剥離し、チップのＡｌパッドとＮｉ／ＡｕめっきＣｕバンプ付Ｎｉ／ＡｕめっきＣｕ回路プリント基板（厚み：０．８ｍｍ）の位置あわせを行った。ついで、１８０℃、３０ｇ／バンプ、２０秒の条件でチップ上方から加熱、加圧を行い、本接続を行った。本接続後の接続抵抗は、１バンプあたり最高で８ｍΩ、平均で４ｍΩ、絶縁抵抗は１０８Ω以上であり、これらの値は−５５〜１２５℃の熱衝撃試験１０００サイクル処理、ＰＣＴ試験（１２１℃、２気圧）２００時間、２６０℃のはんだバス浸漬１０秒後においても変化がなく、良好な接続信頼性を示した。
Example 5
50 g of phenoxy resin and 125 g of acrylic rubber (molecular weight: 850,000) copolymerized with butyl acrylate (40 parts), ethyl acrylate (30 parts), acrylonitrile (30 parts) and glycidyl methacrylate (3 parts) are dissolved in 400 g of ethyl acetate. To obtain a 30% solution. Next, 325 g of liquid epoxy (epoxy equivalent 185) containing a microcapsule-type latent curing agent is added to this solution, and stirred, and fused silica (average particle size: 0.5 μm) is added to 100 parts by weight of the adhesive resin composition. 60% by weight, and further 2 vol% of nickel particles (diameter: 3 μm) were dispersed to obtain a film coating solution. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) with a roll coater and dried at 100 ° C. for 10 minutes to produce an adhesive film 5 having a thickness of 45 μm. The elastic modulus at 40 ° C. measured by a dynamic viscoelasticity measuring device using only the adhesive resin composition excluding fused silica and nickel particles of the adhesive film 5 was 800 MPa. Moreover, the average thermal expansion coefficient of 110-130 degreeC measured by TMA method of the adhesive film 5 was 102 ppm. Next, a bumpless chip (10 mm × 10 mm, thickness: 0.5 mm, pad electrode: Al, pad diameter: 120 μm) and Ni / Au plated Cu bump (diameter: 100 μm, space 50 μm) on the circuit using the produced adhesive film 5 The Ni / Au plated Cu circuit printed circuit board on which the height: 15 μm and the number of bumps 200) were formed was connected as shown below. Adhesive film 5 (12 mm × 12 mm) was attached to a Ni / Au plated Cu circuit printed circuit board (electrode height: 20 μm, thickness: 0.8 mm) at 80 ° C. and 10 kgf / cm 2 , the separator was peeled off, and the chip Al The pad and the Ni / Au plated Cu circuit printed board (thickness: 0.8 mm) with Ni / Au plated Cu bumps were aligned. Next, the main connection was performed by heating and pressing from above the chip under the conditions of 180 ° C., 30 g / bump, and 20 seconds. The connection resistance after this connection is a maximum of 8 mΩ per bump, an average of 4 mΩ, and an insulation resistance of 10 8 Ω or more, and these values are the thermal shock test at −55 to 125 ° C., 1000 cycle treatment, PCT test (121 No change even after 10 seconds of immersion in a solder bath at 260 ° C. for 200 hours at 2 ° C., and good connection reliability was exhibited.
Claims (8)
接着剤樹脂組成物に無機質充填材が含有され、
前記無機質充填材が溶融シリカ又は結晶質シリカからなり、
前記接着剤の硬化後の１１０〜１３０℃での平均熱膨張係数が２００ｐｐｍ以下であることを特徴とする回路部材接続用接着剤。 A circuit member connecting adhesive interposed between opposing circuit electrodes, pressurizing the opposing circuit electrodes and electrically connecting the electrodes in the pressurizing direction,
The adhesive resin composition contains an inorganic filler,
The inorganic filler is made of fused silica or crystalline silica,
An adhesive for connecting circuit members, wherein an average coefficient of thermal expansion at 110 to 130 ° C. after curing of the adhesive is 200 ppm or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010030417A JP5378261B2 (en) | 1997-02-14 | 2010-02-15 | Adhesive for connecting circuit members |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1997030985 | 1997-02-14 | ||
| JP3098597 | 1997-02-14 | ||
| JP2010030417A JP5378261B2 (en) | 1997-02-14 | 2010-02-15 | Adhesive for connecting circuit members |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03200697A Division JP4514840B2 (en) | 1997-02-14 | 1997-02-17 | Adhesive for connecting circuit members |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010157753A JP2010157753A (en) | 2010-07-15 |
| JP5378261B2 true JP5378261B2 (en) | 2013-12-25 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010030417A Expired - Lifetime JP5378261B2 (en) | 1997-02-14 | 2010-02-15 | Adhesive for connecting circuit members |
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| JP (1) | JP5378261B2 (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0623349B2 (en) * | 1986-01-30 | 1994-03-30 | 富士高分子工業株式会社 | Anisotropic conductive adhesive |
| JPH02206670A (en) * | 1989-02-06 | 1990-08-16 | Hitachi Chem Co Ltd | Heat conductive adhesive composition for connecting circuit and heat conductive bonding film having anisotropic electric conductivity |
| JPH03223380A (en) * | 1990-01-30 | 1991-10-02 | Oki Electric Ind Co Ltd | Anisotropic conductive adhesive |
| JP3408301B2 (en) * | 1993-12-16 | 2003-05-19 | ミネソタ マイニング アンド マニュファクチャリング カンパニー | Anisotropic conductive film |
| JP3724606B2 (en) * | 1995-05-22 | 2005-12-07 | 日立化成工業株式会社 | Semiconductor chip connection structure and wiring board used therefor |
| KR100290993B1 (en) * | 1995-06-13 | 2001-08-07 | 이사오 우치가사키 | Semiconductor device, wiring board for mounting semiconductor and method of production of semiconductor device |
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| JP2010157753A (en) | 2010-07-15 |
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