JPH10226769A - Film adhesive and method for connection - Google Patents
Film adhesive and method for connectionInfo
- Publication number
- JPH10226769A JPH10226769A JP3200397A JP3200397A JPH10226769A JP H10226769 A JPH10226769 A JP H10226769A JP 3200397 A JP3200397 A JP 3200397A JP 3200397 A JP3200397 A JP 3200397A JP H10226769 A JPH10226769 A JP H10226769A
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- film
- resin composition
- adhesive layer
- connection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
Landscapes
- Wire Bonding (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、例えばフリップチ
ップ実装方式により半導体チップを基板と接着剤で接着
固定すると共に両者の電極同士を電気的に接続するため
に使用されるフィルム状接着剤及び回路部材の接続方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a film-like adhesive and a circuit used for fixing a semiconductor chip to a substrate with an adhesive and electrically connecting both electrodes by, for example, a flip chip mounting method. The present invention relates to a method for connecting members.
【0002】[0002]
【従来の技術】半導体実装分野では、低コスト化・高精
化に対応した新しい実装形態としてICチップを直接プ
リント基板やフレキシブル配線板に搭載するフリップチ
ップ実装が注目されている。フリップチップ実装方式と
しては、チップの端子にはんだバンプを設け、はんだ接
続を行う方式や導電性接着剤を介して電気的接続を行う
方式が知られている。これらの方式では、接続するチッ
プと基板の熱膨張係数差に基づくストレスが、各種環境
下に曝した場合、接続界面で発生し接続信頼性が低下す
るという問題がある。このため、接続界面のストレスを
緩和する目的で一般にエポキシ樹脂系のアンダフィル材
をチップ/基板の間隙に注入する方式が検討されてい
る。しかし、このアンダフィルの注入工程は、プロセス
を煩雑化し、生産性、コストの面で不利になるという問
題がある。このような問題を解決すべく最近では、異方
導電性と封止機能を有する異方導電性接着剤を用いたフ
リップチップ実装が、プロセス簡易性という観点から注
目されている。2. Description of the Related Art In the field of semiconductor mounting, flip chip mounting, in which an IC chip is directly mounted on a printed circuit board or a flexible wiring board, has attracted attention as a new mounting mode corresponding to cost reduction and high precision. As a flip-chip mounting method, a method of providing a solder bump on a terminal of a chip and performing solder connection or a method of performing electrical connection via a conductive adhesive is known. In these methods, there is a problem in that when exposed to various environments, stress based on the difference in thermal expansion coefficient between the chip to be connected and the substrate is generated at the connection interface and connection reliability is reduced. For this reason, a method of injecting an epoxy resin-based underfill material into a gap between a chip and a substrate is generally studied for the purpose of reducing stress at a connection interface. However, there is a problem that the underfill injection step complicates the process and is disadvantageous in terms of productivity and cost. In order to solve such a problem, flip-chip mounting using an anisotropic conductive adhesive having anisotropic conductivity and a sealing function has recently attracted attention from the viewpoint of process simplicity.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、チップ
を異方導電接着剤を介して直接基板に搭載する場合、温
度サイクル試験下ではチップと基板の熱膨張係数差に基
づくストレスが接続部において生じ、熱衝撃試験、PC
T試験、はんだバス浸漬試験などの信頼性試験を行うと
接続抵抗の増大や接着剤の剥離が生じるという問題があ
る。また、チップの接続端子に突起電極が形成されてい
る場合では、信頼性試験においてチップと基板の熱膨張
係数差に基づくストレスが突起電極とチップ界面に集中
し、突起電極がチップ電極界面から剥離し、導通不良が
生じるという問題がある。本発明は、接続部での接続抵
抗の増大や接着剤の剥離がなく、接続信頼性が大幅に向
上する回路板を提供するものである。However, when a chip is directly mounted on a substrate via an anisotropic conductive adhesive, a stress based on a difference in thermal expansion coefficient between the chip and the substrate occurs in a connection portion under a temperature cycle test. Thermal shock test, PC
When a reliability test such as a T test or a solder bath immersion test is performed, there is a problem that the connection resistance increases and the adhesive is peeled off. In the case where a protruding electrode is formed on the connection terminal of the chip, stress based on the difference in thermal expansion coefficient between the chip and the substrate is concentrated on the interface between the protruding electrode and the chip in the reliability test, and the protruding electrode is separated from the interface of the chip electrode. However, there is a problem that conduction failure occurs. An object of the present invention is to provide a circuit board which does not increase the connection resistance at the connection portion or peels off the adhesive, and greatly improves connection reliability.
【0004】[0004]
【課題を解決するための手段】本発明のフィルム状接着
剤は、相対向する回路電極間に介在され、相対向する回
路電極を加圧し加圧方向の電極間を電気的に接続する回
路接続用フィルム状接着剤であって、接着剤樹脂組成物
100重量部に無機質充填材を10〜200重量部含有
してなる接着剤層1と接着剤樹脂組成物を主成分として
なる接着剤層2を備えた多層構成であることを特徴とす
るものである。The film adhesive of the present invention is interposed between opposing circuit electrodes, presses the opposing circuit electrodes, and electrically connects the electrodes in the pressing direction. Adhesive 1 comprising an adhesive resin composition containing 10 to 200 parts by weight of an inorganic filler per 100 parts by weight of an adhesive resin composition, and an adhesive layer 2 containing an adhesive resin composition as a main component And a multi-layer structure having the following.
【0005】本発明の接着方法は、第一の接続端子を有
する第一の回路部材と、第一の回路部材より熱膨張係数
が大きい第二の接続端子を有する第二の回路部材とを、
第一の接続端子と第二の接続端子を対向して配置し、前
記対向配置した第一の接続端子と第二の接続端子の間に
請求項1記載の接着剤を接着剤層1が第一の回路部材側
に、接着剤層2が第二の回路部材に対向するように介在
させ、加熱加圧して前記対向配置した第一の接続端子と
第二の接続端子を電気的に接続させることを特徴とする
ものである。According to the bonding method of the present invention, a first circuit member having a first connection terminal and a second circuit member having a second connection terminal having a larger thermal expansion coefficient than the first circuit member are provided.
The adhesive layer 1 according to claim 1, wherein the first connection terminal and the second connection terminal are arranged to face each other, and the adhesive according to claim 1 is interposed between the first connection terminal and the second connection terminal arranged opposite to each other. On one circuit member side, the adhesive layer 2 is interposed so as to face the second circuit member, and is heated and pressurized to electrically connect the first connection terminal and the second connection terminal arranged opposite to each other. It is characterized by the following.
【0006】接着剤層1及び/又は接着剤層2の接着剤
樹脂組成物の硬化後の40℃での弾性率は30〜150
0MPaであるのが好ましく、接着剤層1及び/又は接
着剤層2の接着剤樹脂組成物はエポキシ樹脂、アクリル
ゴム、潜在性硬化剤を含有しているものが使用される。
アクリルゴムは、その分子中にグリシジルエーテル基を
含有しているものが好ましい。無機質充填材の平均粒径
は3ミクロン以下が好ましく、接着剤層2の接着剤樹脂
組成物には導電粒子を0.2〜20体積%含有しても良
く、接着剤層2の接着剤組成物に含有されている導電粒
子の平均粒径が無機充填材の平均粒径に比べて大きいこ
とが好ましい。The elastic modulus at 40 ° C. after curing of the adhesive resin composition of the adhesive layer 1 and / or the adhesive layer 2 is 30 to 150.
The pressure is preferably 0 MPa, and the adhesive resin composition of the adhesive layer 1 and / or the adhesive layer 2 contains an epoxy resin, an acrylic rubber, and a latent curing agent.
The acrylic rubber preferably has a glycidyl ether group in its molecule. The average particle diameter of the inorganic filler is preferably 3 μm or less, and the adhesive resin composition of the adhesive layer 2 may contain 0.2 to 20% by volume of conductive particles. It is preferable that the average particle size of the conductive particles contained in the material is larger than the average particle size of the inorganic filler.
【0007】[0007]
【発明の実施の形態】本発明において用いられる回路部
材として半導体チップ、プリント基板、ポリイミドやポ
リエステルを基材としたフレキシル配線板があげられ
る。半導体チップや基板の電極パッド上には、めっきで
形成されるバンプや金ワイヤの先端をトーチ等により溶
融させ、金ボールを形成し、このボールを電極パッド上
に圧着した後、ワイヤを切断して得られるワイヤバンプ
などの突起電極を設け、接続端子として用いることがで
きる。DESCRIPTION OF THE PREFERRED EMBODIMENTS Circuit members used in the present invention include a semiconductor chip, a printed circuit board, and a flexible wiring board based on polyimide or polyester. On the electrode pads of the semiconductor chip and the substrate, the bumps formed by plating and the tips of the gold wires are melted with a torch or the like to form gold balls, and the balls are pressed on the electrode pads, and then the wires are cut. A protruding electrode such as a wire bump obtained by the above method can be provided and used as a connection terminal.
【0008】本発明において用いられる接着剤樹脂組成
物としては、エポキシ樹脂とイミダゾール系、ヒドラジ
ド系、三フッ化ホウ素−アミン錯体、スルホニウム塩、
アミンイミド、ポリアミンの塩、ジシアンジアミド等の
潜在性硬化剤の混合物が用いられ、回路部材の熱膨張係
数差に基づくストレスを緩和するためには、接着後の4
0℃での弾性率が30〜1500MPaの接着剤樹脂組
成物が好ましい。例えば、接続時の良好な流動性や高接
続信頼性を得られる接着剤樹脂組成物として、エポキシ
樹脂とイミダゾール系、ヒドラジド系、三フッ化ホウ素
−アミン錯体、スルホニウム塩、アミンイミド、ポリア
ミンの塩、ジシアンジアミド等の潜在性硬化剤の混合物
に、接着後の40℃での弾性率が30〜1500MPa
になるようにアクリルゴムを配合した接着剤があげられ
る。接着フィルム硬化物の弾性率は、例えば、レオロジ
(株)製レオスペクトラDVE−4(引っぱりモード、
周波数10Hz、5℃/minで昇温)を使用して測定
できる。The adhesive resin composition used in the present invention includes epoxy resin and imidazole, hydrazide, boron trifluoride-amine complex, sulfonium salt,
A mixture of a latent curing agent such as an amine imide, a polyamine salt, and dicyandiamide is used.
An adhesive resin composition having an elastic modulus at 0 ° C. of 30 to 1500 MPa is preferred. For example, as an adhesive resin composition that can obtain good fluidity and high connection reliability at the time of connection, epoxy resin and imidazole, hydrazide, boron trifluoride-amine complex, sulfonium salt, amine imide, salt of polyamine, A mixture of a latent curing agent such as dicyandiamide has an elastic modulus at 40 ° C. after bonding of 30 to 1500 MPa.
An adhesive containing an acrylic rubber so that The elastic modulus of the adhesive film cured product is, for example, Rheology Co., Ltd. Rheospectra DVE-4 (pulling mode,
It can be measured using a frequency of 10 Hz and a temperature rise at 5 ° C./min).
【0009】本発明で用いるアクリルゴムとしては、ア
クリル酸、アクリル酸エステル、メタクリル酸エステル
またはアクリロニトリルのうち少なくともひとつをモノ
マー成分とした重合体または共重合体があげられ、中で
もグリシジルエーテル基を含有するグリシジルアクリレ
ートやグリシジルメタクリレートを含む共重合体系アク
リルゴムが好適に用いられる。これらアクリルゴムの分
子量は、接着剤の凝集力を高める点から20万以上が好
ましい。アクリルゴムの接着剤中の配合量は、15wt
%以下であると接着後の40℃での弾性率が1500M
Paを越えてしまい、また40wt%以上になると低弾
性率化は図れるが接続時の溶融粘度が高くなり接続電極
界間、または接続電極と導電粒子界面の溶融接着剤の排
除性が低下するため、接続電極間または接続電極と導電
粒子間の電気的導通を確保できなくなる。このため、ア
クリル配合量としては15〜40wt%が好ましい。接
着剤に配合されたこれらのアクリルゴムは、ゴム成分に
起因する誘電正接のピーク温度が40〜60℃付近にあ
るため、接着剤の低弾性率化を図ることができる。ま
た、接着剤にはフィルム形成性をより容易にするために
フェノキシ樹脂などの熱可塑性樹脂を配合することもで
きる。特に、フェノキシ樹脂は、エポキシ樹脂と構造が
類似しているため、エポキシ樹脂との相溶性、接着性に
優れるなどの特徴を有するので好ましい。フィルム形成
は、これら少なくともエポキシ樹脂、アクリルゴム、フ
ェノキシ樹脂、潜在性硬化剤からなる接着組成物と導電
粒子を有機溶剤に溶解あるいは分散により液状化して、
剥離性基材上に塗布し、硬化剤の活性温度以下で溶剤を
除去することにより行われる。この時用いる溶剤は、芳
香族炭化水素系と含酸素系の混合溶剤が材料の溶解性を
向上させるため好ましい。The acrylic rubber used in the present invention is a polymer or copolymer containing at least one of acrylic acid, acrylic acid ester, methacrylic acid ester and acrylonitrile as a monomer component. Among them, it contains a glycidyl ether group. A copolymer acrylic rubber containing glycidyl acrylate or glycidyl methacrylate is preferably used. The molecular weight of these acrylic rubbers is preferably 200,000 or more from the viewpoint of increasing the cohesive strength of the adhesive. The amount of acrylic rubber in the adhesive is 15 wt.
% Or less, the elastic modulus at 40 ° C. after bonding is 1500M.
If it exceeds Pa, and if it exceeds 40 wt%, the modulus of elasticity can be reduced, but the melt viscosity at the time of connection increases, and the removability of the molten adhesive between the connection electrode boundaries or at the interface between the connection electrode and the conductive particles decreases. As a result, it becomes impossible to secure electrical continuity between the connection electrodes or between the connection electrodes and the conductive particles. Therefore, the acrylic compounding amount is preferably 15 to 40% by weight. These acrylic rubbers compounded in the adhesive have a peak temperature of dielectric loss tangent due to the rubber component in the vicinity of 40 to 60 ° C., so that the elastic modulus of the adhesive can be reduced. In addition, a thermoplastic resin such as a phenoxy resin can be blended with the adhesive in order to make the film formability easier. In particular, the phenoxy resin is preferable because it has a similar structure to the epoxy resin, and has characteristics such as excellent compatibility with the epoxy resin and excellent adhesiveness. Film formation, at least these epoxy resin, acrylic rubber, phenoxy resin, an adhesive composition comprising a latent curing agent and conductive particles are liquefied by dissolution or dispersion in an organic solvent,
It is performed by applying the composition on a peelable substrate and removing the solvent at a temperature lower than the activation temperature of the curing agent. As the solvent used at this time, a mixed solvent of an aromatic hydrocarbon type and an oxygen-containing type is preferable because the solubility of the material is improved.
【0010】本発明に用いられる無機質充填材として
は、特に限定するものではなく、例えば、溶融シリカ、
結晶質シリカ、ケイ酸カルシウム、アルミナ、炭酸カル
シウム等の粉体があげられる。無機充填材の配合量は、
接着剤樹脂組成物100重量部に対して10〜200重
量部であり、熱膨張係数を低下させるには配合量が大き
いほど効果的であるが、多量に配合すると接着性や接続
部での接着剤の排除性低下に基づく導通不良が発生し、
配合量が小さいと熱膨張係数を充分低下できないため、
20〜90重量部が好ましい。また、その平均粒径は、
接続部での導通不良を防止する目的で3ミクロン以下に
するのが好ましい。また接続時の樹脂の流動性の低下及
びチップのパッシベーション膜のダメージを防ぐ目的で
球状フィラを用いることが望ましい。[0010] The inorganic filler used in the present invention is not particularly limited. For example, fused silica,
Powders such as crystalline silica, calcium silicate, alumina, calcium carbonate and the like can be mentioned. The compounding amount of the inorganic filler is
It is 10 to 200 parts by weight with respect to 100 parts by weight of the adhesive resin composition. The larger the amount is, the more effective the lowering of the coefficient of thermal expansion is. Conduction failure based on the decrease in the exclusion of the agent
If the compounding amount is small, the thermal expansion coefficient cannot be sufficiently reduced,
20 to 90 parts by weight are preferred. The average particle size is
It is preferable that the thickness be 3 μm or less for the purpose of preventing conduction failure at the connection portion. In addition, it is desirable to use a spherical filler for the purpose of preventing a decrease in the fluidity of the resin at the time of connection and damage to the passivation film of the chip.
【0011】本発明の接着剤には、チップのバンプや回
路電極の高さばらつきを吸収するために、異方導電性を
積極的に付与する目的で導電粒子を分散することもでき
る。本発明において導電粒子は例えばAu、Ni、A
g、Cu、Wやはんだなどの金属粒子またはこれらの金
属粒子表面に金やパラジウムなどの薄膜をめっきや蒸着
によって形成した金属粒子であり、ポリスチレン等の高
分子の球状の核材にNi、Cu、Au、はんだ等の導電
層を設けた導電粒子を用いることができる。粒径は基板
の電極の最小の間隔よりも小さいことが必要で、電極の
高さばらつきがある場合、高さばらつきよりも大きいこ
とが好ましく、かつ無機質充填材の平均粒径より大きい
ことが好ましく、1μm〜10μmが好ましい。また、
接着剤に分散される導電粒子量は、0.1〜30体積%
であり、好ましくは0.2〜15体積%である。本発明
のフィルム状接着剤の膜厚は、特に限定するものではな
いが、第一及び第二の回路部材間のギャップに比べ、厚
いほうが好ましく、一般にはギャップに対して5μm以
上厚い膜厚が望ましい。In the adhesive of the present invention, conductive particles can be dispersed for the purpose of positively imparting anisotropic conductivity in order to absorb variations in the height of chip bumps and circuit electrodes. In the present invention, the conductive particles are, for example, Au, Ni, A
g, Cu, W or metal particles such as solder or metal particles formed by plating or depositing a thin film of gold or palladium on the surface of these metal particles. Conductive particles provided with a conductive layer of Au, solder, or the like can be used. It is necessary that the particle size is smaller than the minimum distance between the electrodes of the substrate, and if there is a height variation of the electrodes, it is preferably larger than the height variation, and preferably larger than the average particle size of the inorganic filler. And 1 μm to 10 μm are preferred. Also,
The amount of conductive particles dispersed in the adhesive is 0.1 to 30% by volume.
And preferably 0.2 to 15% by volume. Although the film thickness of the film adhesive of the present invention is not particularly limited, it is preferable that the film adhesive is thicker than the gap between the first and second circuit members. desirable.
【0012】[0012]
実施例1 フェノキシ樹脂50gと、ブチルアクリレート(40
部)、エチルアクリレート(30部)、アクリロニトリ
ル(30部)及びグリシジルメタクリレート(3部)を
共重合したアクリルゴム(分子量:85万)125gを
酢酸エチル400gに溶解し、30%溶液を得た。つい
で、マイクロカプセル型潜在性硬化剤を含有する液状エ
ポキシ(エポキシ当量185)325gをこの溶液に加
え、撹拌し、溶融シリカ(平均粒子径:0.5μm)を
樹脂剤接着剤組成物100重量部に対して40重量部を
分散してフィルム塗工用溶液を得た。この溶液をセパレ
ータ(シリコーン処理したポリエチレンテレフタレート
フィルム、厚み40μm)にロールコータで塗布し、1
00℃10分乾燥し厚み25μmの接着フィルム1を作
製した。なお、この接着フィルム1の溶融シリカを除い
た接着剤樹脂組成物のみの動的粘弾性測定器で測定した
40℃の弾性率は、800MPaであった。接着フィル
ム1の作成において溶融シリカを分散する代わりにニッ
ケル粒子(直径:3μm)を2vol%分散する以外
は、同様な方法で厚み25μmの接着フィルム2を作製
した。次に作製した接着フィルム1と接着フィルム2を
ラミネートしてフィルム状接着剤を得た。このフィルム
状接着剤を用いて金バンプ(面積:80μmx80μ
m、スペース30μm、高さ:15μm、バンプ数28
8)付きチップ(10mmx10mm、厚み:0.5m
m)とNi/AuめっきCu回路プリント基板の接続を
以下に示すように行った。このフィルム状接着剤の接着
フィルム2(12mmx12mm)をNi/Auめっき
Cu回路プリント基板(電極高さ:20μm、厚み:
0.8mm)に80℃、10kgf/cm2で貼りつけ
た後、セパレータを剥離し、接着フィルム1側にチップ
を対向し、チップのバンプとNi/AuめっきCu回路
プリント基板(厚み:0.8mm)の位置あわせを行っ
た。ついで、180℃、50g/バンプ、20秒の条件
でチップ上方から加熱、加圧を行い、本接続を行った。
本接続後の接続抵抗は、1バンプあたり最高で6mΩ、
平均で2mΩ、絶縁抵抗は108Ω以上であり、これら
の値は−55〜125℃の熱衝撃試験1000サイクル
処理、PCT試験(121℃、2気圧)200時間、2
60℃のはんだバス浸漬10秒後においても変化がな
く、良好な接続信頼性を示した。Example 1 50 g of a phenoxy resin and butyl acrylate (40
Parts), 125 g of an acrylic rubber (molecular weight: 850,000) obtained by copolymerizing ethyl acrylate (30 parts), acrylonitrile (30 parts) and glycidyl methacrylate (3 parts) was dissolved in 400 g of ethyl acetate to obtain a 30% solution. Next, 325 g of a liquid epoxy (epoxy equivalent: 185) containing a microcapsule-type latent curing agent was added to the solution, and the mixture was stirred, and fused silica (average particle diameter: 0.5 μm) was added to 100 parts by weight of the resin adhesive composition. Was dispersed in an amount of 40 parts by weight to obtain a film coating solution. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) using a roll coater.
It was dried at 00 ° C. for 10 minutes to produce an adhesive film 1 having a thickness of 25 μm. The elastic modulus of this adhesive film 1 at 40 ° C. measured with a dynamic viscoelasticity measuring device of only the adhesive resin composition excluding the fused silica was 800 MPa. An adhesive film 2 having a thickness of 25 μm was produced in the same manner as in the production of the adhesive film 1 except that nickel particles (diameter: 3 μm) were dispersed at 2 vol% instead of dispersing the fused silica. Next, the produced adhesive film 1 and adhesive film 2 were laminated to obtain a film adhesive. Using this film adhesive, a gold bump (area: 80 μm × 80 μm)
m, space 30 μm, height: 15 μm, number of bumps 28
8) With tip (10mm x 10mm, thickness: 0.5m)
m) and the connection of the Ni / Au-plated Cu circuit printed circuit board were performed as follows. An adhesive film 2 (12 mm × 12 mm) of this film adhesive is coated on a Ni / Au-plated Cu circuit printed board (electrode height: 20 μm, thickness:
0.8 mm) at 80 ° C. and 10 kgf / cm 2 , the separator was peeled off, the chip was opposed to the adhesive film 1 side, and the bumps of the chip and the Ni / Au plated Cu circuit printed circuit board (thickness: 0. 8 mm). Then, heating and pressurization were performed from above the chip under the conditions of 180 ° C., 50 g / bump, and 20 seconds, and the actual connection was performed.
The connection resistance after this connection is up to 6 mΩ per bump,
The average is 2 mΩ and the insulation resistance is 10 8 Ω or more. These values are 1000 cycles of thermal shock test at −55 to 125 ° C., PCT test (121 ° C., 2 atm) for 200 hours,
There was no change even after 10 seconds of immersion in the solder bath at 60 ° C., indicating good connection reliability.
【0013】実施例2 フェノキシ樹脂50gと、ブチルアクリレート(40
部)、エチルアクリレート(30部)、アクリロニトリ
ル(30部)及びグリシジルメタクリレート(3部)を
共重合したアクリルゴム(分子量:85万)175gを
酢酸エチル525gに溶解し、30%溶液を得た。つい
で、、マイクロカプセル型潜在性硬化剤を含有する液状
エポキシ(エポキシ当量185)275gをこの溶液に
加え、撹拌し、溶融シリカ(平均粒子径:1μm)を接
着剤樹脂組成物100重量部に対し60重量部分散して
フィルム塗工用溶液を得た。この溶液をセパレータ(シ
リコーン処理したポリエチレンテレフタレートフィル
ム、厚み40μm)にロールコータで塗布し、100
℃、10分乾燥し厚み20μmの接着フィルム1を作製
した。この接着フィル1の溶融シリカを除いた接着剤樹
脂組成物のみの動的粘弾性測定器で測定した40℃の弾
性率は、400MPaであった。接着フィルム1の作成
において溶融シリカを分散する代わりにニッケル粒子
(直径:5μm)を2vol%分散する以外は、同様な
方法で厚み20μmの接着フィルム2を作製した。次に
作製した接着フィルム1と接着フィルム2をラミネート
してフィルム状接着剤を得た。このフィルム状接着剤を
用いて金バンプ(面積:80μmx80μm、スペース
30μm、高さ:15μm、バンプ数288)付きチッ
プ(10mmx10mm、厚み:0.5mm)とNi/
AuめっきCu回路プリント基板の接続を以下に示すよ
うに行った。このフィルム状接着剤の接着フィルム2
(12mmx12mm)をNi/AuめっきCu回路プ
リント基板(電極高さ:20μm、厚み:0.8mm)
に80℃、10kgf/cm2で貼りつけた後、セパレ
ータを剥離し、接着フィルム1側にチップを対向し、チ
ップのバンプとNi/AuめっきCu回路プリント基板
(厚み:0.8mm)の位置あわせを行った。ついで、
180℃、50g/バンプ、20秒の条件でチップ上方
から加熱、加圧を行い、本接続を行った。本接続後の接
続抵抗は、1バンプあたり最高で18mΩ、平均で8m
Ω、絶縁抵抗は108Ω以上であり、これらの値は−5
5〜125℃の熱衝撃試験1000サイクル処理、PC
T試験(121℃、2気圧)200時間、260℃のは
んだバス浸漬10秒後においても変化がなく、良好な接
続信頼性を示した。EXAMPLE 2 50 g of a phenoxy resin and butyl acrylate (40
Parts), ethyl acrylate (30 parts), 175 g of an acrylic rubber (molecular weight: 850,000) copolymerized with acrylonitrile (30 parts) and glycidyl methacrylate (3 parts) was dissolved in 525 g of ethyl acetate to obtain a 30% solution. Next, 275 g of a liquid epoxy (epoxy equivalent: 185) containing a microcapsule-type latent curing agent was added to this solution, and the mixture was stirred, and fused silica (average particle diameter: 1 μm) was added to 100 parts by weight of the adhesive resin composition. 60 parts by weight were dispersed to obtain a film coating solution. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) using a roll coater.
The resultant was dried at a temperature of 10 ° C. for 10 minutes to prepare an adhesive film 1 having a thickness of 20 μm. The modulus of elasticity at 40 ° C. of this adhesive fill 1 measured at 40 ° C. by a dynamic viscoelasticity measuring instrument using only the adhesive resin composition excluding the fused silica was 400 MPa. An adhesive film 2 having a thickness of 20 μm was produced in the same manner as in the production of the adhesive film 1 except that nickel particles (diameter: 5 μm) were dispersed at 2 vol% instead of dispersing the fused silica. Next, the produced adhesive film 1 and adhesive film 2 were laminated to obtain a film adhesive. Using this film adhesive, a chip (10 mm × 10 mm, thickness: 0.5 mm) with gold bumps (area: 80 μm × 80 μm, space 30 μm, height: 15 μm, number of bumps: 288) and Ni /
The connection of the Au plating Cu circuit printed circuit board was performed as shown below. Adhesive film 2 of this film adhesive
(12 mm x 12 mm) Ni / Au plated Cu circuit printed circuit board (electrode height: 20 μm, thickness: 0.8 mm)
After adhering at 80 ° C. and 10 kgf / cm 2 , the separator was peeled off, the chip was opposed to the adhesive film 1 side, and the bump of the chip and the position of the Ni / Au plated Cu circuit printed circuit board (thickness: 0.8 mm) I made a match. Then
The main connection was performed by heating and pressing from above the chip under the conditions of 180 ° C., 50 g / bump, and 20 seconds. The connection resistance after this connection is up to 18mΩ per bump and 8m on average
Ω, insulation resistance is 10 8 Ω or more, and these values are −5
1000 cycles of thermal shock test at 5-125 ° C, PC
There was no change even after a T test (121 ° C., 2 atm) for 200 hours and a solder bath immersion at 260 ° C. for 10 seconds, showing good connection reliability.
【0014】実施例3 フェェノキシ樹脂50g、ブチルアクリレート(40
部)、エチルアクリレート(30部)、アクリロニトリ
ル(30部)及びグリシジルメタクリレート(3部)を
共重合したアクリルゴム(分子量:85万)100gを
酢酸エチル350gに溶解し、30%溶液を得た。つい
で、、マイクロカプセル型潜在性硬化剤を含有する液状
エポキシ(エポキシ当量185)350gをこの溶液に
加え、撹拌し、溶融シリカ(平均粒子径:0.5μm)
を接着剤樹脂組成物100重量部に対し60重量部を分
散してフィルム塗工用溶液を得た。この溶液をセパレー
タ(シリコーン処理したポリエチレンテレフタレートフ
ィルム、厚み40μm)にロールコータで塗布し、10
0℃10分乾燥し厚み25μmの接着フィルム1を作製
した。この接着フィルム1の溶融シリカを除いた接着剤
樹脂組成物のみの動的粘弾性測定器で測定した40℃の
弾性率は、1000MPaであった。接着フィルム1の
作成において溶融シリカを分散する代わりにポリスチレ
ン系核体(直径:5μm)の表面にAu層を形成した導
電粒子を5vol%分散する以外は、同様な方法で厚み
25μmの接着フィルム2を作製した。次に作製した接
着フィルム1と接着フィルム2をラミネートしてフィル
ム状接着剤を得た。このフィルム状接着剤を用いて金バ
ンプ(面積:80μmx80μm、スペース30μm、
高さ:15μm、バンプ数288)付きチップ(10m
mx10mm、厚み:0.5mm)とNi/Auめっき
Cu回路プリント基板の接続を以下に示すように行っ
た。このフィルム状接着剤の接着フィルム2(12mm
x12mm)をNi/AuめっきCu回路プリント基板
(電極高さ:20μm、厚み:0.8mm)に80℃、
10kgf/cm2で貼りつけた後、セパレータを剥離
し、接着フィルム1側にチップを対向し、チップのバン
プとNi/AuめっきCu回路プリント基板(厚み:
0.8mm)の位置あわせを行った。ついで、180
℃、50g/バンプ、20秒の条件でチップ上方から加
熱、加圧を行い、本接続を行った。接続抵抗は、1バン
プあたり最高で5mΩ、平均で1.5mΩ、絶縁抵抗は
108Ω以上であり、これらの値は−55〜125℃の
熱衝撃試験1000サイクル処理、PCT試験(121
℃、2気圧)200時間、260℃のはんだバス浸漬1
0秒後においても変化がなく、良好な接続信頼性を示し
た。Example 3 50 g of a phenoxy resin, butyl acrylate (40
Parts), ethyl acrylate (30 parts), acrylonitrile (30 parts), and 100 g of an acrylic rubber (molecular weight: 850,000) copolymerized with glycidyl methacrylate (3 parts) were dissolved in 350 g of ethyl acetate to obtain a 30% solution. Next, 350 g of a liquid epoxy (epoxy equivalent: 185) containing a microcapsule-type latent curing agent was added to this solution, and the mixture was stirred and fused silica (average particle diameter: 0.5 μm)
Was dispersed in 60 parts by weight based on 100 parts by weight of the adhesive resin composition to obtain a film coating solution. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) using a roll coater.
After drying at 0 ° C. for 10 minutes, an adhesive film 1 having a thickness of 25 μm was prepared. The modulus of elasticity at 40 ° C. of this adhesive film 1 measured by a dynamic viscoelasticity measuring instrument using only the adhesive resin composition excluding the fused silica was 1000 MPa. An adhesive film 2 having a thickness of 25 μm was prepared in the same manner except that 5 vol% of conductive particles having an Au layer formed on the surface of a polystyrene core (diameter: 5 μm) was dispersed instead of dispersing fused silica in the preparation of the adhesive film 1. Was prepared. Next, the produced adhesive film 1 and adhesive film 2 were laminated to obtain a film adhesive. Using this film adhesive, a gold bump (area: 80 μm × 80 μm, space 30 μm,
Height: 15 μm, chip with bump number 288) (10 m
mx 10 mm, thickness: 0.5 mm) and a Ni / Au plated Cu circuit printed circuit board were connected as shown below. The adhesive film 2 of this film adhesive (12 mm
x12 mm) on a Ni / Au plated Cu circuit printed circuit board (electrode height: 20 μm, thickness: 0.8 mm) at 80 ° C.
After sticking at 10 kgf / cm 2 , the separator was peeled off, the chip was opposed to the adhesive film 1 side, and the bump of the chip and a Ni / Au plated Cu circuit printed board (thickness:
0.8 mm). Then, 180
The main connection was performed by heating and pressing from above the chip under the conditions of 50 ° C., 50 g / bump, and 20 seconds. The connection resistance is 5 mΩ at maximum per bump, 1.5 mΩ on average, and the insulation resistance is 10 8 Ω or more. These values are 1000 cycles of thermal shock test at −55 to 125 ° C., PCT test (121
200 ° C, 260 ° C solder bath immersion 1
There was no change even after 0 seconds, indicating good connection reliability.
【0015】実施例4 フェノキシ樹脂50gと、ブチルアクリレート(40
部)、エチルアクリレート(30部)、アクリロニトリ
ル(30部)及びグリシジルメタクリレート(3部)を
共重合したアクリルゴム(分子量:85万)125gを
酢酸エチル400gに溶解し、30%溶液を得た。つい
で、、マイクロカプセル型潜在性硬化剤を含有する液状
エポキシ(エポキシ当量185)325gをこの溶液に
加え、撹拌し、溶融シリカ(平均粒子径:0.5μm)
を接着剤樹脂組成物100重量部に60重量部を分散し
てフィルム塗工用溶液を得た。この溶液をセパレータ
(シリコーン処理したポリエチレンテレフタレートフィ
ルム、厚み25μm)にロールコータで塗布し、100
℃10分乾燥し厚み25μmの接着フィルム5を作製し
た。この接着フィルム4の溶融シリカを除いた接着剤樹
脂組成物のみの動的粘弾性測定器で測定した40℃の弾
性率は、800MPaであった。接着フィルム1の作成
において溶融シリカを分散する代わりにニッケル粒子
(直径:3μm)を2vol%分散する以外は、同様な
方法で厚み25μmの接着フィルム2を作製した。次に
作製した接着フィルム1と接着フィルム2をラミネート
してフィルム状接着剤を得た。このフィルム状接着剤を
用いてバンプレスチップ(10mmx10mm、厚み:
0.5mm、パッド電極:Al、パッド径:120μ
m)と回路上にNi/AuめっきCuバンプ(直径:1
00μm、スペース50μm、高さ:15μm、バンプ
数200)を形成したNi/AuめっきCu回路プリン
ト基板の接続を以下に示すように行った。このフィルム
状接着剤の接着フィルム2(12mmx12mm)をN
i/AuめっきCuバンプ(直径:100μm、スペー
ス50μm、高さ:15μm、バンプ数200)を形成
したNi/AuめっきCu回路プリント基板(電極高
さ:20μm、厚み:0.8mm)に80℃、10kg
f/cm2で貼りつけた後、セパレータを剥離し、接着
フィルム1側にチップを対向し、チップのバンプとNi
/AuめっきCu回路プリント基板(厚み:0.8m
m)の位置あわせを行った。ついで、180℃、50g
/バンプ、20秒の条件でチップ上方から加熱、加圧を
行い、本接続を行った。本接続後の接続抵抗は、1バン
プあたり最高で8mΩ、平均で4mΩ、絶縁抵抗は10
8Ω以上であり、これらの値は−55〜125℃の熱衝
撃試験1000サイクル処理、PCT試験(121℃、
2気圧)200時間、260℃のはんだバス浸漬10秒
後においても変化がなく、良好な接続信頼性を示した。EXAMPLE 4 50 g of a phenoxy resin and butyl acrylate (40
Parts), 125 g of an acrylic rubber (molecular weight: 850,000) obtained by copolymerizing ethyl acrylate (30 parts), acrylonitrile (30 parts) and glycidyl methacrylate (3 parts) was dissolved in 400 g of ethyl acetate to obtain a 30% solution. Next, 325 g of a liquid epoxy (epoxy equivalent: 185) containing a microcapsule-type latent curing agent was added to this solution, and the mixture was stirred and fused silica (average particle diameter: 0.5 μm)
Was dispersed in 100 parts by weight of the adhesive resin composition to obtain a film coating solution. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 25 μm) using a roll coater.
After drying at 10 ° C. for 10 minutes, an adhesive film 5 having a thickness of 25 μm was prepared. The modulus of elasticity at 40 ° C. of this adhesive film 4 measured by a dynamic viscoelasticity measuring instrument using only the adhesive resin composition excluding the fused silica was 800 MPa. An adhesive film 2 having a thickness of 25 μm was produced in the same manner as in the production of the adhesive film 1 except that nickel particles (diameter: 3 μm) were dispersed at 2 vol% instead of dispersing the fused silica. Next, the produced adhesive film 1 and adhesive film 2 were laminated to obtain a film adhesive. Using this film adhesive, a bumpless chip (10 mm × 10 mm, thickness:
0.5mm, pad electrode: Al, pad diameter: 120μ
m) and Ni / Au plated Cu bumps on the circuit (diameter: 1)
The connection of the Ni / Au-plated Cu circuit printed circuit board having 00 μm, the space 50 μm, the height: 15 μm, and the number of bumps 200) was performed as shown below. The adhesive film 2 (12 mm × 12 mm) of this film adhesive is
80 ° C. on Ni / Au plated Cu circuit printed circuit board (electrode height: 20 μm, thickness: 0.8 mm) formed with i / Au plated Cu bumps (diameter: 100 μm, space: 50 μm, height: 15 μm, number of bumps: 200) , 10kg
After adhering at f / cm 2 , the separator was peeled off, the chip was opposed to the adhesive film 1 side, and the bump of the chip was
/ Au plating Cu circuit printed circuit board (Thickness: 0.8m
m) was performed. Then, 180 ℃, 50g
Heating and pressurization were performed from above the chip under the conditions of / bump and 20 seconds to make the actual connection. The connection resistance after this connection is up to 8 mΩ per bump, 4 mΩ on average, and the insulation resistance is 10 mΩ.
8 Ω or more, and these values are 1000 cycles of thermal shock test at −55 to 125 ° C., PCT test (121 ° C.,
There was no change even after immersion in a solder bath at 260 ° C. for 2 hours for 200 hours and good connection reliability was exhibited.
【0016】[0016]
【発明の効果】本発明のフィルム状接着剤を使用した回
路板によれば、従来の回路板のようにチップなどの熱膨
張係数が小さい接続部材側に接着剤の熱膨張係数が小さ
い無機質充填材含有接着層1が、プリント基板などの熱
膨張係数が大きい回路部材側には接着組成物を主成分と
する接着層2が配置されているため、温度サイクル、P
CT、IRリフロー試験などの信頼性試験において生じ
る回路部材間の熱膨張係数差に基づくストレスを吸収で
きるため、信頼性試験後においても接続部での接続抵抗
の増大や接着剤の剥離がなく、接続信頼性が大幅に向上
する。According to the circuit board using the film-like adhesive of the present invention, like the conventional circuit board, an inorganic filler having a small coefficient of thermal expansion of the adhesive is provided on the connecting member side having a small coefficient of thermal expansion such as a chip. Since the material-containing adhesive layer 1 has the adhesive layer 2 mainly composed of an adhesive composition disposed on the side of a circuit member such as a printed circuit board having a large thermal expansion coefficient, the temperature cycle, P
Since it is possible to absorb the stress based on the difference in thermal expansion coefficient between circuit members that occurs in reliability tests such as CT and IR reflow tests, there is no increase in connection resistance at the connection part or peeling of the adhesive even after the reliability test. Connection reliability is greatly improved.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 井坂 和博 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内 (72)発明者 渡辺 治 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内 (72)発明者 小島 和良 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Kazuhiro Isaka 48 Wadai, Tsukuba, Ibaraki Prefecture, Hitachi Chemical Co., Ltd.Tsukuba R & D Co., Ltd. Within the Research Laboratory (72) Inventor Kazuyoshi Kojima 48 Wadai, Tsukuba, Ibaraki Prefecture Within Tsukuba Development Laboratory, Hitachi Chemical Co., Ltd.
Claims (8)
向する回路電極を加圧し加圧方向の電極間を電気的に接
続する回路接続用フィルム状接着剤であって、接着剤樹
脂組成物100重量部に無機質充填材を10〜200重
量部含有してなる接着剤層1と接着剤樹脂組成物を主成
分としてなる接着剤層2を備えた多層構成であることを
特徴とするフィルム状接着剤。1. A film-like adhesive for circuit connection which is interposed between opposed circuit electrodes and presses the opposed circuit electrodes to electrically connect the electrodes in the pressure direction, comprising an adhesive resin composition. A film having a multilayer structure comprising an adhesive layer 1 containing 10 to 200 parts by weight of an inorganic filler per 100 parts by weight of a substance and an adhesive layer 2 mainly containing an adhesive resin composition. Glue.
剤樹脂組成物の硬化後の40℃での弾性率が30〜15
00MPaである請求項1記載のフィルム状接着剤。2. The elastic modulus at 40 ° C. after curing of the adhesive resin composition of the adhesive layer 1 and / or the adhesive layer 2 is 30 to 15.
The film adhesive according to claim 1, which has a pressure of 00 MPa.
剤樹脂組成物がエポキシ樹脂、アクリルゴム、潜在性硬
化剤を含有している請求項2記載のフィルム状接着剤。3. The film adhesive according to claim 2, wherein the adhesive resin composition of the adhesive layer 1 and / or the adhesive layer 2 contains an epoxy resin, an acrylic rubber, and a latent curing agent.
ルエーテル基を含有している請求項3記載のフィルム状
接着剤。4. The film adhesive according to claim 3, wherein the acrylic rubber contains a glycidyl ether group in its molecule.
下である請求項1〜4各項記載のフィルム状接着剤。5. The film adhesive according to claim 1, wherein the average particle size of the inorganic filler is 3 μm or less.
子が0.1〜30体積%含有されている請求項1〜5各
項記載のフィルム状接着剤。6. The film adhesive according to claim 1, wherein the adhesive resin composition of the adhesive layer 2 contains 0.1 to 30% by volume of conductive particles.
いる導電粒子の平均粒径が無機充填材の平均粒径に比べ
て大きい請求項6記載のフィルム状接着剤。7. The film adhesive according to claim 6, wherein the average particle size of the conductive particles contained in the adhesive composition of the adhesive layer 2 is larger than the average particle size of the inorganic filler.
と、第一の回路部材より熱膨張係数が大きい第二の接続
端子を有する第二の回路部材とを、第一の接続端子と第
二の接続端子を対向して配置し、前記対向配置した第一
の接続端子と第二の接続端子の間に請求項1記載の接着
剤を接着剤層1が第一の回路部材側に、接着剤層2が第
二の回路部材に対向するように介在させ、加熱加圧して
前記対向配置した第一の接続端子と第二の接続端子を電
気的に接続させることを特徴とする接続方法。8. A first connection member comprising: a first circuit member having a first connection terminal; and a second circuit member having a second connection terminal having a larger thermal expansion coefficient than the first circuit member. And the second connection terminal are opposed to each other, and the adhesive according to claim 1 is disposed between the first connection terminal and the second connection terminal which are opposed to each other. The adhesive layer 2 is interposed so as to be opposed to the second circuit member, and the first connection terminal and the second connection terminal arranged opposite to each other are electrically connected by applying heat and pressure. Connection method.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3200397A JPH10226769A (en) | 1997-02-17 | 1997-02-17 | Film adhesive and method for connection |
US12/549,909 US20090314533A1 (en) | 1997-02-14 | 2009-08-28 | Adhesive for bonding circuit members, circuit board and process for its production |
US13/166,591 US8273458B2 (en) | 1997-02-14 | 2011-06-22 | Adhesive for bonding circuit members, circuit board and process for its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3200397A JPH10226769A (en) | 1997-02-17 | 1997-02-17 | Film adhesive and method for connection |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006307141A Division JP2007107008A (en) | 2006-11-13 | 2006-11-13 | Film-shaped adhesive and method for producing laminate |
Publications (1)
Publication Number | Publication Date |
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JPH10226769A true JPH10226769A (en) | 1998-08-25 |
Family
ID=12346731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3200397A Pending JPH10226769A (en) | 1997-02-14 | 1997-02-17 | Film adhesive and method for connection |
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JP (1) | JPH10226769A (en) |
Cited By (12)
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WO2000078887A1 (en) * | 1999-06-18 | 2000-12-28 | Hitachi Chemical Company, Ltd. | Adhesive, adhesive member, circuit substrate for semiconductor mounting having adhesive member, and semiconductor device containing the same |
JP2001064619A (en) * | 1999-09-01 | 2001-03-13 | Hitachi Chem Co Ltd | Film-like adhesive for connection to circuit |
JP2001152107A (en) * | 1999-11-25 | 2001-06-05 | Hitachi Chem Co Ltd | Laminated adhesive film, substrate for mounting semiconductor chip and semiconductor device |
JP2002226807A (en) * | 2001-01-31 | 2002-08-14 | Hitachi Chem Co Ltd | Adhesive for connecting circuit, method for connecting circuit by using the same, and connecting structure |
JP2002226808A (en) * | 2001-01-31 | 2002-08-14 | Hitachi Chem Co Ltd | Adhesive for connecting circuit |
JP2003096426A (en) * | 2001-09-26 | 2003-04-03 | Hitachi Chem Co Ltd | Adhesive member |
JP2007123203A (en) * | 2005-10-31 | 2007-05-17 | Matsushita Electric Works Ltd | Micro-relay |
JP2007134140A (en) * | 2005-11-09 | 2007-05-31 | Matsushita Electric Works Ltd | Attachment structure of electronic component |
JP2008024941A (en) * | 1999-02-18 | 2008-02-07 | Seiko Epson Corp | Semiconductor device |
KR100844383B1 (en) * | 2007-03-13 | 2008-07-07 | 도레이새한 주식회사 | Adhesive film for stacking semiconductor chip |
JP2010074050A (en) * | 2008-09-22 | 2010-04-02 | Hitachi Kasei Polymer Co Ltd | Adhesive composition for flexible printed wiring board and adhesive film using the adhesive composition |
US7879445B2 (en) | 1998-08-13 | 2011-02-01 | Hitachi Chemical Company, Ltd. | Adhesive for bonding circuit members, circuit board and process for its production |
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1997
- 1997-02-17 JP JP3200397A patent/JPH10226769A/en active Pending
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
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US8273458B2 (en) | 1997-02-14 | 2012-09-25 | Hitachi Chemical Company, Ltd. | Adhesive for bonding circuit members, circuit board and process for its production |
US8273457B2 (en) | 1998-08-13 | 2012-09-25 | Hitachi Chemical Company, Ltd. | Adhesive for bonding circuit members, circuit board and process for its production |
US8252419B2 (en) | 1998-08-13 | 2012-08-28 | Hitachi Chemical Company, Ltd. | Adhesive for bonding circuit members, circuit board and process for its production |
US7879445B2 (en) | 1998-08-13 | 2011-02-01 | Hitachi Chemical Company, Ltd. | Adhesive for bonding circuit members, circuit board and process for its production |
JP2008024941A (en) * | 1999-02-18 | 2008-02-07 | Seiko Epson Corp | Semiconductor device |
WO2000078887A1 (en) * | 1999-06-18 | 2000-12-28 | Hitachi Chemical Company, Ltd. | Adhesive, adhesive member, circuit substrate for semiconductor mounting having adhesive member, and semiconductor device containing the same |
US6838170B2 (en) | 1999-06-18 | 2005-01-04 | Hitachi Chemical Company, Ltd. | Adhesive, adhesive member, interconnecting substrate for semiconductor mounting having adhesive member, and semiconductor device containing the same |
JP2001064619A (en) * | 1999-09-01 | 2001-03-13 | Hitachi Chem Co Ltd | Film-like adhesive for connection to circuit |
JP2001152107A (en) * | 1999-11-25 | 2001-06-05 | Hitachi Chem Co Ltd | Laminated adhesive film, substrate for mounting semiconductor chip and semiconductor device |
JP2002226808A (en) * | 2001-01-31 | 2002-08-14 | Hitachi Chem Co Ltd | Adhesive for connecting circuit |
JP2002226807A (en) * | 2001-01-31 | 2002-08-14 | Hitachi Chem Co Ltd | Adhesive for connecting circuit, method for connecting circuit by using the same, and connecting structure |
JP2003096426A (en) * | 2001-09-26 | 2003-04-03 | Hitachi Chem Co Ltd | Adhesive member |
JP2007123203A (en) * | 2005-10-31 | 2007-05-17 | Matsushita Electric Works Ltd | Micro-relay |
JP2007134140A (en) * | 2005-11-09 | 2007-05-31 | Matsushita Electric Works Ltd | Attachment structure of electronic component |
KR100844383B1 (en) * | 2007-03-13 | 2008-07-07 | 도레이새한 주식회사 | Adhesive film for stacking semiconductor chip |
JP2010074050A (en) * | 2008-09-22 | 2010-04-02 | Hitachi Kasei Polymer Co Ltd | Adhesive composition for flexible printed wiring board and adhesive film using the adhesive composition |
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