JP3790833B2 - 投影露光方法及び装置 - Google Patents

投影露光方法及び装置 Download PDF

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Publication number
JP3790833B2
JP3790833B2 JP20826096A JP20826096A JP3790833B2 JP 3790833 B2 JP3790833 B2 JP 3790833B2 JP 20826096 A JP20826096 A JP 20826096A JP 20826096 A JP20826096 A JP 20826096A JP 3790833 B2 JP3790833 B2 JP 3790833B2
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JP
Japan
Prior art keywords
illumination
light
optical system
illumination light
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP20826096A
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English (en)
Japanese (ja)
Other versions
JPH1050585A5 (enExample
JPH1050585A (ja
Inventor
純夫 橋本
孝司 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP20826096A priority Critical patent/JP3790833B2/ja
Priority to EP19970113696 priority patent/EP0823662A2/en
Publication of JPH1050585A publication Critical patent/JPH1050585A/ja
Publication of JPH1050585A5 publication Critical patent/JPH1050585A5/ja
Application granted granted Critical
Publication of JP3790833B2 publication Critical patent/JP3790833B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP20826096A 1996-08-07 1996-08-07 投影露光方法及び装置 Expired - Fee Related JP3790833B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP20826096A JP3790833B2 (ja) 1996-08-07 1996-08-07 投影露光方法及び装置
EP19970113696 EP0823662A2 (en) 1996-08-07 1997-08-07 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20826096A JP3790833B2 (ja) 1996-08-07 1996-08-07 投影露光方法及び装置

Publications (3)

Publication Number Publication Date
JPH1050585A JPH1050585A (ja) 1998-02-20
JPH1050585A5 JPH1050585A5 (enExample) 2004-11-04
JP3790833B2 true JP3790833B2 (ja) 2006-06-28

Family

ID=16553300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20826096A Expired - Fee Related JP3790833B2 (ja) 1996-08-07 1996-08-07 投影露光方法及び装置

Country Status (1)

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JP (1) JP3790833B2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4307620B2 (ja) 1999-03-30 2009-08-05 株式会社サトー ラベル貼付機におけるロール状ラベルの巻芯保持装置
JP3548464B2 (ja) 1999-09-01 2004-07-28 キヤノン株式会社 露光方法及び走査型露光装置
DE10000191B8 (de) * 2000-01-05 2005-10-06 Carl Zeiss Smt Ag Projektbelichtungsanlage der Mikrolithographie
AU2001257191A1 (en) * 2000-04-25 2001-11-07 Silicon Valley Group Inc Optical reduction system with elimination of reticle diffraction induced bias
EP1670041A4 (en) 2003-08-28 2007-10-17 Nikon Corp METHOD AND APPARATUS FOR EXPOSURE, AND METHOD FOR MANUFACTURING ASSOCIATED DEVICE
KR101328356B1 (ko) 2004-02-13 2013-11-11 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
US20080204682A1 (en) * 2005-06-28 2008-08-28 Nikon Corporation Exposure method and exposure apparatus, and device manufacturing method
JP5414968B2 (ja) * 2005-11-14 2014-02-12 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学撮像システムの測定装置および操作方法
US7511799B2 (en) * 2006-01-27 2009-03-31 Asml Netherlands B.V. Lithographic projection apparatus and a device manufacturing method
JP5329520B2 (ja) 2007-03-27 2013-10-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 低角度で入射する補正光を用いる補正光学素子
JP2009010131A (ja) 2007-06-27 2009-01-15 Canon Inc 露光装置及びデバイス製造方法
EP2048540A1 (en) * 2007-10-09 2009-04-15 Carl Zeiss SMT AG Microlithographic projection exposure apparatus
JP5346985B2 (ja) * 2011-05-10 2013-11-20 キヤノン株式会社 計測装置、露光装置、デバイスの製造方法及び計測方法
JP7062716B2 (ja) 2020-03-27 2022-05-06 キヤノン株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
JPH1050585A (ja) 1998-02-20

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