JP3750263B2 - 除振装置及び露光装置 - Google Patents

除振装置及び露光装置 Download PDF

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Publication number
JP3750263B2
JP3750263B2 JP07777697A JP7777697A JP3750263B2 JP 3750263 B2 JP3750263 B2 JP 3750263B2 JP 07777697 A JP07777697 A JP 07777697A JP 7777697 A JP7777697 A JP 7777697A JP 3750263 B2 JP3750263 B2 JP 3750263B2
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Japan
Prior art keywords
substrate
stage
vibration isolation
displacement
vibration
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Expired - Fee Related
Application number
JP07777697A
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English (en)
Japanese (ja)
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JPH10275756A5 (enExample
JPH10275756A (ja
Inventor
正人 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
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Nikon Corp
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Priority to JP07777697A priority Critical patent/JP3750263B2/ja
Publication of JPH10275756A publication Critical patent/JPH10275756A/ja
Publication of JPH10275756A5 publication Critical patent/JPH10275756A5/ja
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Publication of JP3750263B2 publication Critical patent/JP3750263B2/ja
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Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
JP07777697A 1997-03-28 1997-03-28 除振装置及び露光装置 Expired - Fee Related JP3750263B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP07777697A JP3750263B2 (ja) 1997-03-28 1997-03-28 除振装置及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07777697A JP3750263B2 (ja) 1997-03-28 1997-03-28 除振装置及び露光装置

Publications (3)

Publication Number Publication Date
JPH10275756A JPH10275756A (ja) 1998-10-13
JPH10275756A5 JPH10275756A5 (enExample) 2005-07-21
JP3750263B2 true JP3750263B2 (ja) 2006-03-01

Family

ID=13643370

Family Applications (1)

Application Number Title Priority Date Filing Date
JP07777697A Expired - Fee Related JP3750263B2 (ja) 1997-03-28 1997-03-28 除振装置及び露光装置

Country Status (1)

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JP (1) JP3750263B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7817243B2 (en) 2004-04-12 2010-10-19 Asml Netherlands B.V. Vibration isolation system

Also Published As

Publication number Publication date
JPH10275756A (ja) 1998-10-13

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