JP3724419B2 - 真空表示素子 - Google Patents
真空表示素子 Download PDFInfo
- Publication number
- JP3724419B2 JP3724419B2 JP2001383224A JP2001383224A JP3724419B2 JP 3724419 B2 JP3724419 B2 JP 3724419B2 JP 2001383224 A JP2001383224 A JP 2001383224A JP 2001383224 A JP2001383224 A JP 2001383224A JP 3724419 B2 JP3724419 B2 JP 3724419B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- anode
- light emitting
- electrode
- control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 claims description 172
- 239000011521 glass Substances 0.000 claims description 35
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- 239000010408 film Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- 238000005192 partition Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 8
- 230000002265 prevention Effects 0.000 description 7
- 230000005684 electric field Effects 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 5
- 230000003405 preventing effect Effects 0.000 description 5
- 239000005361 soda-lime glass Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Landscapes
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001383224A JP3724419B2 (ja) | 2001-12-17 | 2001-12-17 | 真空表示素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001383224A JP3724419B2 (ja) | 2001-12-17 | 2001-12-17 | 真空表示素子 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003187723A JP2003187723A (ja) | 2003-07-04 |
| JP2003187723A5 JP2003187723A5 (https=) | 2005-07-21 |
| JP3724419B2 true JP3724419B2 (ja) | 2005-12-07 |
Family
ID=27593339
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001383224A Expired - Fee Related JP3724419B2 (ja) | 2001-12-17 | 2001-12-17 | 真空表示素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3724419B2 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108447753A (zh) * | 2018-03-26 | 2018-08-24 | 东南大学 | 用于降低电子截获的场发射高精度双栅结构及其安装方法 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100989420B1 (ko) * | 2003-11-28 | 2010-10-26 | 삼성에스디아이 주식회사 | 전계 방출 표시장치 |
| JP4750576B2 (ja) * | 2006-02-22 | 2011-08-17 | 株式会社ピュアロンジャパン | 電界放出型光源 |
| JP6377027B2 (ja) * | 2015-08-03 | 2018-08-22 | 株式会社ノリタケカンパニーリミテド | 真空管 |
| JP6473258B2 (ja) * | 2018-04-27 | 2019-02-20 | 株式会社ノリタケカンパニーリミテド | アナログ増幅用真空管 |
| KR102586724B1 (ko) * | 2019-08-09 | 2023-10-10 | 에프이아이 컴파니 | 공진 rf 캐비티의 유전체 삽입체 상의 코팅물 |
-
2001
- 2001-12-17 JP JP2001383224A patent/JP3724419B2/ja not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108447753A (zh) * | 2018-03-26 | 2018-08-24 | 东南大学 | 用于降低电子截获的场发射高精度双栅结构及其安装方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003187723A (ja) | 2003-07-04 |
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