JP3720830B2 - Manufacturing method of multilayer wiring board whose insulating layer contains organic resin - Google Patents

Manufacturing method of multilayer wiring board whose insulating layer contains organic resin Download PDF

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JP3720830B2
JP3720830B2 JP2004123224A JP2004123224A JP3720830B2 JP 3720830 B2 JP3720830 B2 JP 3720830B2 JP 2004123224 A JP2004123224 A JP 2004123224A JP 2004123224 A JP2004123224 A JP 2004123224A JP 3720830 B2 JP3720830 B2 JP 3720830B2
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insulating layer
wiring board
multilayer wiring
conductor circuit
manufacturing
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JP2004214702A (en
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桂 林
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Kyocera Corp
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Description

本発明は絶縁層が有機樹脂を含む多層配線基板の製造方法に関するものである。 The present invention relates to a method for manufacturing a multilayer wiring board whose insulating layer contains an organic resin .

従来より、紙に樹脂を含浸させた絶縁性基板表面に銅箔を接着した後、これをエッチングして微細な回路を形成し、しかるのちにこの基板を積層して多層化したプリント配線板が提案されている。また、このようなプリント配線板においては、その強度を高めるため
に、有機樹脂に対して、球状あるいは繊維状の無機質フィラーを分散させた基板も提案されており、これらの複合材料からなる絶縁基板上に多数の半導体素子を搭載したマルチチップモジュール(MCM)等への適用も検討されている。
Conventionally, after bonding a copper foil to the surface of an insulating substrate impregnated with resin in paper, this is etched to form a fine circuit, and then this substrate is laminated to form a multilayer printed wiring board. Proposed. In addition, in such a printed wiring board, in order to increase its strength, a substrate in which a spherical or fibrous inorganic filler is dispersed in an organic resin has been proposed, and an insulating substrate made of these composite materials Application to a multichip module (MCM) or the like on which a large number of semiconductor elements are mounted is also being studied.

最近、通信関連などの用途において使用周波数も高周波に移行しつつあり、また、通信機器内部に配設される配線基板にも低誘電率や低誘電損失などの優れた特性が求められている。また、配線基板に対しても大電流化も要求されている。しかも、電子機器の小型化、軽量化のためにこの様な傾向が益々増大する傾向にある。
特開昭58−121698号公報 特開平05−283865号公報 特開昭61−210691号公報 特開昭63−274199号公報
Recently, the frequency used in communication-related applications is shifting to a high frequency, and a wiring board disposed in a communication device is required to have excellent characteristics such as a low dielectric constant and a low dielectric loss. Also, a large current is required for the wiring board. In addition, such a tendency tends to increase more and more in order to reduce the size and weight of electronic devices.
JP 58-121698 A JP 05-283865 A JP-A-61-210691 JP-A 63-274199

しかしながら、このような配線基板において、導体回路と、絶縁層やビアホール内の導体との間に空隙が発生するという問題があり、特に、導体回路を絶縁層内に何ら空隙の発生なく、埋設することは困難である。また、配線層を複数積層する場合には、空隙による回路の断線や変形による精度の劣化が問題となっている。また、導体回路により、配線基板に凸凹が発生するなどの問題がある。そのため、導体回路の厚みを大きくすることができず、大電流を流すような回路として適用することができない。   However, in such a wiring board, there is a problem that a gap is generated between the conductor circuit and the conductor in the insulating layer or via hole. In particular, the conductor circuit is embedded in the insulating layer without any gap. It is difficult. In addition, when a plurality of wiring layers are stacked, there is a problem of deterioration in accuracy due to circuit disconnection or deformation due to air gaps. In addition, there are problems such as unevenness in the wiring board due to the conductor circuit. Therefore, the thickness of the conductor circuit cannot be increased, and it cannot be applied as a circuit that allows a large current to flow.

また、フリップチップ方式の実装に適した高精度な表面平坦度を有する多層配線基板を得ることや、多層配線基板を集積化することができず、配線の微細化や、基板の寸法精度を向上させることができない。   In addition, it is impossible to obtain a multilayer wiring board with high-precision surface flatness suitable for flip chip mounting, and the multilayer wiring board cannot be integrated, so that the wiring is miniaturized and the dimensional accuracy of the board is improved. I can't let you.

従って、本発明は、空隙の発生や回路の断線が抑制され、平滑性に優れた多層配線基板を作製できる絶縁層が有機樹脂を含む多層配線基板の製造方法を提供するものである。 Therefore, the present invention provides a method for producing a multilayer wiring board in which an insulating layer containing an organic resin is capable of producing a multilayer wiring board excellent in smoothness, in which generation of voids and circuit disconnection are suppressed.

本発明の絶縁層が有機樹脂を含む多層配線基板の製造方法は、転写シートの表面に金属箔からなる導体回路を形成する工程と、少なくとも有機樹脂を含有する軟質状態の絶縁層にバイアホールを形成し、該バイアホールに導体を形成する工程と、前記導体を具備する前記絶縁層に、前記転写シートに形成された前記導体回路を積層圧接して、前記導体と前記導体回路とが接続されるように前記導体回路を前記絶縁層に転写埋設させる工程と、前記導体回路が転写埋設された前記絶縁層から前記転写シートを剥がし、絶縁層の表面に導体回路が埋設された配線層を作製する工程と、を具備することを特徴とする。 The method for producing a multilayer wiring board in which the insulating layer of the present invention contains an organic resin includes a step of forming a conductor circuit made of a metal foil on the surface of a transfer sheet, and a via hole in a soft insulating layer containing at least an organic resin. Forming a conductor in the via hole, and laminating and pressing the conductor circuit formed on the transfer sheet to the insulating layer having the conductor, thereby connecting the conductor and the conductor circuit. A step of transferring and embedding the conductor circuit in the insulating layer, and peeling off the transfer sheet from the insulating layer in which the conductor circuit is imprinted and producing a wiring layer in which the conductor circuit is embedded in the surface of the insulating layer you wherein comprising the steps of, a.

また、本発明の絶縁層が有機樹脂を含む多層配線基板の製造方法は、前記配線層を複数作製し、それらを積層して一体化する工程を具備することが望ましい。 Moreover, it is preferable that the method for manufacturing a multilayer wiring board in which the insulating layer of the present invention contains an organic resin includes a step of producing a plurality of the wiring layers and stacking and integrating them.

また、本発明の絶縁層が有機樹脂を含む多層配線基板の製造方法は、前記バイアホールがレーザー加工により形成されたことが望ましい。 In the method for manufacturing a multilayer wiring board in which the insulating layer of the present invention contains an organic resin , the via hole is preferably formed by laser processing.

また、本発明の絶縁層が有機樹脂を含む多層配線基板の製造方法は、前記導体が前記バイアホールに導体ペーストを充填して形成されたことが望ましい。 In the method for manufacturing a multilayer wiring board in which the insulating layer of the present invention contains an organic resin , the conductor is preferably formed by filling the via hole with a conductor paste.

また、本発明の絶縁層が有機樹脂を含む多層配線基板の製造方法は、前記導体ペーストがCu−Ag合金粉末を含む銅ペーストであることが望ましい。 Moreover, as for the manufacturing method of the multilayer wiring board in which the insulating layer of this invention contains organic resin, it is desirable that the said conductor paste is a copper paste containing Cu-Ag alloy powder.

また、本発明の絶縁層が有機樹脂を含む多層配線基板の製造方法は、前記有機樹脂が、ポリイミド樹脂、ポリエステル樹脂のいずれか1種からなることが望ましい。 Moreover, as for the manufacturing method of the multilayer wiring board in which the insulating layer of this invention contains organic resin, it is desirable for the said organic resin to consist of either 1 type of a polyimide resin or a polyester resin.

以上詳述したとおり、本発明の絶縁層が有機樹脂を含む多層配線基板の製造方法によれば、一層の配線層における導体回路による凹凸が全くなく、接着の際生じていた空隙による導体回路と絶縁層やビアホール内の導体との断線や変形による精度の劣化を防止することができる。これにより、高周波での使用に適し、今後の半導体の主要な実装形式と考えられているフリップチップ方式の実装に適した高精度な表面平坦度を有する高密度多層配線基板が得られる。 As described in detail above, according to the method for manufacturing a multilayer wiring board in which the insulating layer of the present invention contains an organic resin, there is no unevenness due to the conductor circuit in one wiring layer, and the conductor circuit due to the gap generated at the time of bonding It is possible to prevent deterioration in accuracy due to disconnection or deformation with an insulating layer or a conductor in a via hole. As a result, it is possible to obtain a high-density multilayer wiring board having high-precision surface flatness that is suitable for use at high frequencies and suitable for flip-chip mounting, which is considered to be a major semiconductor mounting format in the future.

以下、本発明を図面をもとに説明する。図1に示すように、まず、転写シート1の表面に導体回路を形成する。この導体回路は、銅、アルミニウム、金、銀の群から選ばれる少なくとも1種、または2種以上の合金からなることが望ましく、特に、銅、または銅を含む合金が最も望ましい。場合によっては、回路の抵抗調整のためにNi−Cr合金などの高抵抗の金属を混合または合金化してもよい。   The present invention will be described below with reference to the drawings. As shown in FIG. 1, first, a conductor circuit is formed on the surface of the transfer sheet 1. The conductor circuit is preferably made of at least one selected from the group consisting of copper, aluminum, gold, and silver, or two or more alloys, and most preferably copper or an alloy containing copper. In some cases, a high resistance metal such as a Ni—Cr alloy may be mixed or alloyed for adjusting the resistance of the circuit.

この導体回路は、所望の金属箔をエッチング法またはレーザー加工して形成したり、メッキ法によっても形成できる。例えば、エッチング法では、図1(a)に示すように、前記転写シート1の表面に上記導体回路形成金属からなる金属箔2を一面に接着した後、図1(b)に示すように金属箔上にフォトレジスト、スクリーン印刷等の方法で導体回路状にレジスト3を形成した後、不要な部分をエッチング除去することで図1(c)に示すような所望の導体回路4を得る。   This conductor circuit can be formed by etching or laser processing a desired metal foil, or by plating. For example, in the etching method, as shown in FIG. 1A, after the metal foil 2 made of the above-mentioned conductor circuit forming metal is bonded to the surface of the transfer sheet 1, the metal is formed as shown in FIG. After a resist 3 is formed in a conductor circuit shape on the foil by a method such as photoresist or screen printing, unnecessary portions are etched away to obtain a desired conductor circuit 4 as shown in FIG.

この時、上記レジスト3は、一般には、金属箔の不要部分をエッチング除去した後にレジスト除去液等により取り除き、洗浄する工程が必要であるが、上記レジスト3を後述する絶縁層を形成する材料を含有するか、類似の材料で構成すれば、レジストの除去等を行う必要がないため、工程の簡略化を図ることができる上で有利である。   At this time, the resist 3 generally requires a step of removing an unnecessary portion of the metal foil by etching and then removing it with a resist removing solution and washing. However, the resist 3 is made of a material for forming an insulating layer to be described later. If it is contained or made of a similar material, it is not necessary to remove the resist, which is advantageous in that the process can be simplified.

図2によれば、まず、図2(a)に示すように、導体回路22が形成された転写シート21と、軟質状態の絶縁層23を準備する。この導体回路22は、所望の金属箔をエッチング法またはレーザー加工して形成したり、メッキ法によっても形成される。図2(a)はエッチング法によるもので、この場合には、転写シート21の表面に金属箔を一面に形成した後、導体回路パターンにレジストを塗布した後にエッチング処理しその後、レジストを除去洗浄して導体回路22が形成される。なお、この図ではレジストを除去しているが、レジストは、後述する絶縁層と同様な材質によって構成すれば、レジストの除去、洗浄を行う必要はなく、残してもよい。   According to FIG. 2, first, as shown in FIG. 2A, a transfer sheet 21 on which a conductor circuit 22 is formed and a soft insulating layer 23 are prepared. The conductor circuit 22 is formed by etching or laser processing a desired metal foil, or by plating. FIG. 2A shows an etching method. In this case, after forming a metal foil on the entire surface of the transfer sheet 21, a resist is applied to the conductor circuit pattern, and then an etching process is performed, and then the resist is removed and washed. Thus, the conductor circuit 22 is formed. In this figure, the resist is removed. However, if the resist is made of the same material as the insulating layer described later, the resist need not be removed and washed, but may be left.

一方、絶縁層23は、最終的には、多層配線基板の絶縁層を構成するものであるため、絶縁層として好適な材料からなることが望まれる。具体的には、少なくとも有機樹脂を含む絶縁材料からなるもので、有機樹脂としては有機樹脂としては、例えば、ポリイミド樹脂、ポリエステル樹脂、PTFE(フッ素樹脂)、PPE(ポリフェニレンエーテル)、BTレジン(ビスマレイミドトリアジン)、エポキシ樹脂、ポリイミド樹脂、フッ素樹脂、フェノール樹脂等の樹脂が望ましい。なお、熱硬化性樹脂を含む場合には、半硬化状態であるのがよい。また、絶縁層23には、予め周知の方法によってバイアホール24を形成し導体を充填している。   On the other hand, since the insulating layer 23 finally constitutes the insulating layer of the multilayer wiring board, it is desired to be made of a material suitable as the insulating layer. Specifically, it is made of an insulating material containing at least an organic resin. As the organic resin, for example, polyimide resin, polyester resin, PTFE (fluorine resin), PPE (polyphenylene ether), BT resin (bis resin) Maleimide triazine), epoxy resin, polyimide resin, fluororesin, phenol resin and the like are desirable. In addition, when a thermosetting resin is included, it is good that it is a semi-hardened state. The insulating layer 23 is filled with a conductor by forming a via hole 24 in advance by a well-known method.

次に、図2(b)に示すように、前記導体回路22が形成された転写シート21と軟質状態の絶縁層23とを積層し、これを圧接、望ましくは10kg/cm以上の圧力を付与することによって導体回路22を絶縁層23中に埋設する。 Next, as shown in FIG. 2B, a transfer sheet 21 on which the conductor circuit 22 is formed and an insulating layer 23 in a soft state are laminated, and these are pressed together, preferably a pressure of 10 kg / cm 2 or more. By applying, the conductor circuit 22 is embedded in the insulating layer 23.

この時の絶縁層23は、先端が半球状で直径300μmの針を100gの加重で侵入させた時の針侵入深さが10μm以上、特に30μm、さらに50μm以上であることが望ましい。この軟質性は、溶剤や可塑剤の添加量等によって任意に制御できる。   The insulating layer 23 at this time desirably has a needle penetration depth of 10 μm or more, particularly 30 μm, more preferably 50 μm or more when a needle having a hemispherical tip and a diameter of 300 μm is entered with a weight of 100 g. This softness can be arbitrarily controlled by the amount of solvent or plasticizer added.

次に、図2(c)に示すように、前記(b)によって作製された積層物から転写シート21を剥がすことによって、導体回路22の表面と絶縁層23の表面とが同一平面となる平滑性に優れた単層の配線層25を作製することができる。   Next, as shown in FIG. 2C, the surface of the conductor circuit 22 and the surface of the insulating layer 23 are flush with each other by peeling off the transfer sheet 21 from the laminate produced in the step (b). A single-layer wiring layer 25 having excellent properties can be manufactured.

かかる態様において、レジストを除去した場合、導体回路22と絶縁層23との密着強度を高める上では、導体回路形成箇所における導体回路22の表面粗さが0.1μm以上である銅箔を用いるか或いはエッチング等の表面粗化を行うのが良い。表面粗さは特に0.3μm〜3μm、最適には0.3〜1.5μmであるのがよい。   In such an embodiment, when the resist is removed, in order to increase the adhesion strength between the conductor circuit 22 and the insulating layer 23, is a copper foil having a surface roughness of the conductor circuit 22 at the conductor circuit formation portion of 0.1 μm or more used? Alternatively, surface roughening such as etching may be performed. The surface roughness is particularly preferably 0.3 μm to 3 μm, optimally 0.3 to 1.5 μm.

場合によっては、図2(c)によって形成された配線層25に対して、それらを複数層積層圧着して図2(d)に示すような多層配線基板26を作製することができる。   In some cases, a multilayer wiring board 26 as shown in FIG. 2 (d) can be produced by laminating a plurality of layers to the wiring layer 25 formed in FIG. 2 (c).

このように、本発明の絶縁層が有機樹脂を含む多層配線基板の製造方法によれば、1層毎の配線層において導体回路の表面と絶縁層との表面が同一平面に存在するか、または導体回路が絶縁層内に何ら空隙の発生なく完全に埋設されるために、従来のような導体回路による凹凸の発生がなく、従来、配線層の積層時に生じていた空隙による回路の断線や変形による精度の劣化を防止することができる。これにより、多層配線基板においても導体回路の厚みを大きくすることが可能となり、大電流を流すような回路としても適用できる。 Thus, according to the method for manufacturing a multilayer wiring board in which the insulating layer of the present invention contains an organic resin, the surface of the conductor circuit and the surface of the insulating layer are present in the same plane in each wiring layer, or Since the conductor circuit is completely embedded in the insulating layer without any gaps, there are no irregularities due to the conductor circuit as in the past. It is possible to prevent the deterioration of accuracy due to. As a result, the thickness of the conductor circuit can be increased even in a multilayer wiring board, and the circuit can be applied as a circuit in which a large current flows.

よって、今後の半導体の動作周波数が高くなった場合にも使用することが可能であり、これによって主要な実装形式と考えられているフリップチップ方式の実装に適した高精度な表面平坦度を有する高密度多層配線基板が得られる。多層配線基板がさらに集積化され、絶縁層の薄層化、配線の微細化または基板の寸法精度が要求される場合に好適である。   Therefore, it can be used even when the operating frequency of semiconductors in the future increases, and it has high-precision surface flatness suitable for flip-chip mounting, which is considered to be the main mounting format. A high-density multilayer wiring board is obtained. This is suitable when a multilayer wiring board is further integrated and a thin insulating layer, fine wiring, or dimensional accuracy of the board is required.

ポリエチレンテレフタレート(PET)樹脂からなる転写シートの表面に接着剤を塗布して粘着性をもたせ、厚さ9μm、表面粗化面の表面粗さ0.6μmの銅箔の表面粗さの少ない面を一面に接着した。その後、感光性樹脂からなるレジストを導体回路に形成した後、露光現像を行い、これを塩化第二鉄溶液中に浸漬して非パターン部をエッチング除去し、その後、残ったレジストを除去した。なお、作製した回路は、導体回路の線幅が75μm、配線と配線との間隔が75μm以下の微細なパターンである。 Adhesive is applied to the surface of a transfer sheet made of polyethylene terephthalate (PET) resin to make it sticky. Glued to one side. Then, after forming a resist made of a photosensitive resin on the conductor circuit, exposure and development were performed, and this was immersed in a ferric chloride solution to remove the non-patterned portion by etching, and then the remaining resist was removed. Note that the fabricated circuit is a fine pattern in which the line width of the conductor circuit is 75 μm and the distance between the wirings is 75 μm or less.

一方、絶縁性スラリーとして、ポリイミド樹脂にトルエンとメチルエチルケトンからなる溶媒を加えて混合機によって十分に混合して粘度500ポイズのスラリーを調製した。そして、このスラリーをドクターブレード法により100μmの厚みで成形した後、40℃で30分処理してスラリーを半乾燥させて針侵入度が70μmの軟質状態の絶縁層を形成した。   On the other hand, a slurry having a viscosity of 500 poise was prepared by adding a solvent composed of toluene and methyl ethyl ketone to the polyimide resin as an insulating slurry and thoroughly mixing with a mixer. Then, this slurry was molded to a thickness of 100 μm by the doctor blade method, and then treated at 40 ° C. for 30 minutes to semi-dry the slurry to form a soft insulating layer having a needle penetration degree of 70 μm.

そして、この絶縁層に対してバイアホールをCOレーザーで形成し、そのホール内にCu−Ag合金粉末を含む銅ペーストを充填して単層の絶縁層を形成した。 A via hole was formed in the insulating layer with a CO 2 laser, and a copper paste containing Cu—Ag alloy powder was filled in the hole to form a single insulating layer.

その後、この軟質の絶縁層を先の導体回路が形成された転写シートとを積層して真空中で80℃に加熱しつつ50kg/cmの圧力を印加して加熱圧着させた後、転写シートを剥離した。その結果、銅からなる導体回路が絶縁層内に埋設された配線層を得ることができた。 After that, this soft insulating layer is laminated with the transfer sheet on which the previous conductor circuit is formed, and is heated and pressure-bonded by applying a pressure of 50 kg / cm 2 while heating at 80 ° C. in a vacuum, and then the transfer sheet. Was peeled off. As a result, it was possible to obtain a wiring layer in which a conductor circuit made of copper was embedded in an insulating layer.

上記と同様にして8層の配線層を作製し、それらを位置合わせして積層した後、最表面には絶縁層を積層して50kg/cm程度の圧力で圧着して200℃で5時間加熱処理して完全硬化させて多層配線基板を作製した。 In the same manner as described above, eight wiring layers were prepared, aligned, and laminated, and then an insulating layer was laminated on the outermost surface and pressure-bonded at a pressure of about 50 kg / cm 2 for 5 hours at 200 ° C. A multilayer wiring board was produced by heat treatment and complete curing.

得られた多層配線基板に対して、断面における導体回路形成付近を観察した結果、空隙は全く認められず、また、各配線の導通テストを行った結果、何ら配線の断線は認められなかった。   As a result of observing the vicinity of the conductor circuit formation in the cross section of the obtained multilayer wiring board, no voids were observed. As a result of conducting a continuity test of each wiring, no disconnection of the wiring was recognized.

比較例Comparative example

ポリイミド樹脂の表面に厚さ70μm、表面粗さ3.0μmの銅箔を接着剤で接着した。その後、光硬化樹脂からなるレジストを導体回路に形成した後、これを塩化第二鉄溶液中に浸漬して非パターン部をエッチング除去した。さらに、残留レジストをレジスト剥離液で除去して洗浄して回路を形成した。なお、作製した導体回路は、線幅が150μm、配線と配線との間隔が150μmのパターンである。 A copper foil having a thickness of 70 μm and a surface roughness of 3.0 μm was bonded to the surface of the polyimide resin with an adhesive. Then, after forming the resist which consists of photocuring resin in a conductor circuit, this was immersed in the ferric chloride solution, and the non-pattern part was etched away. Further, the residual resist was removed with a resist stripper and washed to form a circuit. The produced conductor circuit has a pattern with a line width of 150 μm and a distance between the lines of 150 μm.

同様にして厚さ200μmからなる6枚の配線層を作製した後、それぞれ接着剤を塗布し位置合わせして積層し50kg/cmの圧力で圧着して200℃で加熱処理して完全硬化させて多層配線基板を作製した。 Similarly, after preparing six wiring layers each having a thickness of 200 μm, each was coated with an adhesive, aligned, laminated, pressure-bonded at a pressure of 50 kg / cm 2 and heat-treated at 200 ° C. to be completely cured. Thus, a multilayer wiring board was produced.

得られた多層配線基板に対して、断面における導体回路形成付近を観察した結果、導体回路の両側に5μmの大きさの空隙が認められ、また、配線の伝送特性を調査した結果、高周波での伝送特性が劣っていることが確認された。   As a result of observing the vicinity of the conductor circuit formation in the cross section of the obtained multilayer wiring board, a gap of 5 μm in size was observed on both sides of the conductor circuit, and as a result of investigating the transmission characteristics of the wiring, It was confirmed that the transmission characteristics were inferior.

転写シートに導体回路を形成する工程を説明するための図である。It is a figure for demonstrating the process of forming a conductor circuit in a transfer sheet. 本発明の製造方法の工程を説明するための図である。It is a figure for demonstrating the process of the manufacturing method of this invention.

符号の説明Explanation of symbols

1、21 転写シート
2 金属箔
3 レジスト
4、22 導体回路
23 絶縁層
24 バイアホール
25 配線層
26 多層配線基板
DESCRIPTION OF SYMBOLS 1, 21 Transfer sheet 2 Metal foil 3 Resist 4, 22 Conductor circuit 23 Insulating layer 24 Via hole 25 Wiring layer 26 Multilayer wiring board

Claims (6)

転写シートの表面に金属箔からなる導体回路を形成する工程と、少なくとも有機樹脂を含有する軟質状態の絶縁層にバイアホールを形成し、該バイアホールに導体を形成する工程と、前記導体を具備する前記絶縁層に、前記転写シートに形成された前記導体回路を積層圧接して、前記導体と前記導体回路とが接続されるように前記導体回路を前記絶縁層に転写埋設させる工程と、前記導体回路が転写埋設された前記絶縁層から前記転写シートを剥がし、絶縁層の表面に導体回路が埋設された配線層を作製する工程と、を具備することを特徴とする絶縁層が有機樹脂を含む多層配線基板の製造方法。 A step of forming a conductor circuit made of a metal foil on the surface of the transfer sheet, a step of forming a via hole in a soft insulating layer containing at least an organic resin, and forming a conductor in the via hole; A step of laminating and pressing the conductor circuit formed on the transfer sheet to the insulating layer and transferring and embedding the conductor circuit in the insulating layer so that the conductor and the conductor circuit are connected; A step of peeling the transfer sheet from the insulating layer in which the conductor circuit is transferred and embedded to produce a wiring layer in which the conductor circuit is embedded on the surface of the insulating layer, and the insulating layer is made of an organic resin. A method for manufacturing a multilayer wiring board. 前記配線層を複数作製し、それらを積層して一体化する工程を具備することを特徴とする請求項1に記載の絶縁層が有機樹脂を含む多層配線基板の製造方法。 The manufacturing method of the multilayer wiring board in which the insulating layer of Claim 1 which comprises producing | generating multiple said wiring layers and laminating | stacking and integrating them comprises an organic resin . 前記バイアホールがレーザー加工により形成されたことを特徴とする請求項1又は2に記載の絶縁層が有機樹脂を含む多層配線基板の製造方法。 3. The method of manufacturing a multilayer wiring board according to claim 1 or 2, wherein the via hole is formed by laser processing. 前記導体が前記バイアホールに導体ペーストを充填して形成されたことを特徴とする請求項1乃至3のうちいずれかに記載の絶縁層が有機樹脂を含む多層配線基板の製造方法。 4. The method for manufacturing a multilayer wiring board according to claim 1, wherein the conductor is formed by filling the via hole with a conductor paste. 前記導体ペーストがCu−Ag合金粉末を含む銅ペーストであることを特徴とする請求項1乃至4のうちいずれかに記載の絶縁層が有機樹脂を含む多層配線基板の製造方法。 5. The method for producing a multilayer wiring board according to claim 1, wherein the conductive paste is a copper paste containing Cu-Ag alloy powder. 前記有機樹脂が、ポリイミド樹脂、ポリエステル樹脂のいずれか1種からなることを特徴とする請求項1乃至5のうちいずれかに記載の絶縁層が有機樹脂を含む多層配線基板の製造方法。 6. The method for manufacturing a multilayer wiring board according to claim 1, wherein the organic resin is made of any one of a polyimide resin and a polyester resin.
JP2004123224A 2004-04-19 2004-04-19 Manufacturing method of multilayer wiring board whose insulating layer contains organic resin Expired - Fee Related JP3720830B2 (en)

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