JP3708423B2 - Phenolic curing agent for epoxy resin and epoxy resin composition using the same - Google Patents

Phenolic curing agent for epoxy resin and epoxy resin composition using the same Download PDF

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Publication number
JP3708423B2
JP3708423B2 JP2000320792A JP2000320792A JP3708423B2 JP 3708423 B2 JP3708423 B2 JP 3708423B2 JP 2000320792 A JP2000320792 A JP 2000320792A JP 2000320792 A JP2000320792 A JP 2000320792A JP 3708423 B2 JP3708423 B2 JP 3708423B2
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Prior art keywords
epoxy resin
curing agent
phenolic curing
resin composition
silane coupling
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JP2002128867A (en
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克之 土田
正志 熊谷
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Nippon Mining Holdings Inc
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Nikko Materials Co Ltd
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Priority to TW90117504A priority patent/TW572926B/en
Priority to KR10-2001-0048238A priority patent/KR100456348B1/en
Priority to CNB011252227A priority patent/CN1175037C/en
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Description

【0001】
【発明の属する技術分野】
本発明は、金属や無機材料との密着性に優れるエポキシ樹脂用フェノール系硬化剤及びそれを用いたエポキシ樹脂組成物に関するものであり、それらは電子材料、塗料、プライマー、接着剤等の分野に使用できる。このうち、特に電子材料に使用されている封止材、積層板、マウンティング材に適している。
【0002】
【従来の技術】
近年電子材料分野では、材料の軽薄短小化の流れとともに、環境汚染を防止するために材料のハロゲンフリー化やアンチモンフリー化、鉛フリー半田化等の流れがある。そのため電子材料に用いられる封止材、積層材、マウンティング材等には、それらの流れに沿ってさらなる特性向上が必要とされているのが現状である。
【0003】
例えば、半導体用封止樹脂には従来ノボラックエポキシ樹脂をフェノールノボラック樹脂で硬化させるエポキシ樹脂組成物が用いられてきた。しかしながら、半導体は高集積化に対応するため、パッケージの小型化及び薄型化がより厳しく要求されている。一方で環境問題への配慮から鉛フリー半田へ移行する流れにも対応する必要があり、さらにリードフレームのPPF(プリプレーティッドフレーム)の開発等にも対応しなければならない。これらの理由により、封止樹脂の各種特性に対する要求は年々厳しいものとなってきており、従来のエポキシ樹脂組成物では機械的強度等に由来する、信頼性の確保が困難になってきている。具体的な要求特性としては半導体チップやリードフレームとのより高い密着性が挙げられ、特に、吸湿させた後に半田に浸漬してもクラックや界面はくり等が封止樹脂に生じないことが要求されている。
【0004】
また、プリント配線板の絶縁材料は、ガラス基材エポキシ積層板が最も多く使用されている。積層板エポキシ樹脂としては、ジシアンジアミドを硬化剤とする樹脂が一般的に用いられてきたが、鉛フリー半田等を用いた場合の耐熱性の要求から、フェノールノボラック樹脂を硬化剤に用いる方法が注目されるようになってきた。しかしながら、フェノールノボラック樹脂を硬化剤として使用すると銅箔との接着性、特に多層板における内層銅箔との接着性が、ジシアンジアミド系に比べて大幅に劣るという欠点がある。
【0005】
このような金属や無機物と樹脂との接着性を改善させる手段としては、シランカップリング剤による表面処理を行うか、又は、シランカップリング剤を樹脂へ添加する方法がとられるのが一般的である。エポキシ系やアミノ系の市販のシランカップリング剤は、そのような接着性向上に効果があり長年使用されていたが、上述したような近年の環境問題や軽薄短小化に対応するには、要求特性を満足出来ない場合が増えてきている現状にある。そこで、本発明者らは、イミダゾール基やジメチルアミノ基を有するシランカップリング剤を開発した(例えば、特開平05−186479、特開平09−012683、特開平09−295988)。このシランカップリング剤は、市販のものに比べて、金属や無機物と樹脂との密着性を大幅に向上できることが確認された。
【0006】
【発明が解決しようとする課題】
しかしながら、上記のイミダゾール基やジメチルアミノ基を有するシランカップリング剤は、粘性が高いことと加水分解の速度が速いことにより、インテグラルブレンドの際に取り扱いにくいという欠点があった。また、ケトン系等の溶剤への溶解性が乏しいものもあり、ワニスに用いた場合にそのポットライフが短いという欠点もあり、使用方法に制限があった。
【0007】
そこで、本発明は、第一に金属や無機材料との密着性に優れたエポキシ樹脂組成物を製造するためのエポキシ樹脂用硬化剤、及び、そのようなエポキシ樹脂組成物や硬化物を提供することを目的とする。さらに、取り扱いが容易で、ケトン系溶剤への溶解性が高く、ワニスを含む様々な用途に好適に用いられるエポキシ樹脂用硬化剤、及び、そのような硬化剤を用いたエポキシ樹脂組成物や硬化物を提供することを目的とする。
【0008】
【課題を解決するための手段】
本発明者らは、上記の目的を達成するため、鋭意検討した結果、一般的なフェノール系硬化剤と3級以上のアミノ基を有するシランカップリング剤とを混合することにより、その混合物又は反応物を硬化剤として用いると、金属や無機材料とエポキシ樹脂との密着性が大きく改善されることを見いだした。さらに、この硬化剤は、3級以上のアミノ基を有するシランカップリング剤を使用しているにもかかわらず、取り扱いも容易であり、また一般的に使用されているどの溶剤へも問題なく溶解することが分かった。
【0009】
すなわち、本発明によれば、エポキシ樹脂用フェノール系硬化剤であって、
フェノール系硬化剤を溶融し、その中にイミダゾール基又はジメチルアミノ基又はそれらの塩である3級以上のアミノ基を有するシランカップリング剤を攪拌混合して得られた変性フェノール系硬化剤であることを特徴とするエポキシ樹脂用フェノール系硬化剤が提供される。
【0010】
金属や無機材料と本発明の硬化剤を用いた樹脂との接着力が向上する機構は、硬化剤に含まれるフェノール系硬化剤の水酸基と3級以上のアミノ基を有するシランカップリング剤のアルコキシシリル基とが反応し、硬化剤と硬化促進剤の機能が一分子中に複合化されることによって、エポキシ樹脂の硬化反応がスムーズに進行するためと推定される。
【0011】
本発明で用いるフェノール系硬化剤は、1分子中に2個以上のフェノール性水酸基を有するものであればどのようなものでもよいが、例えば、ビスフェノールA、ビスフェノールF、ポリビニルフェノール、フェノールノボラック樹脂、クレゾールノボラック樹脂、ビスフェノールAノボラック樹脂、ビスフェノールFノボラック樹脂、アラルキルフェノール樹脂等が挙げられる。これらのうち特に好ましいものはフェノール樹脂系硬化剤である。
【0012】
3級以上のアミノ基を有するシランカップリング剤は、硬化促進剤として効果のあるイミダゾール基又はジメチルアミノ基またはそれらの塩を有するシランカップリング剤が好適であり、例えば特開平05−186479、特開平09−295988、特開平05−039295、特開平06−279458、特開平09−296135、特開平09−295989、特開平09−295992、特開平10−273492、特開平11−092482、特開平12−226757、特開平11−108246等に記載されているもの、さらには、それらのイミダゾール基またはジメチルアミノ基を有するシランカップリング剤に酢酸等の有機酸塩を添加して塩にしたタイプが挙げられる。
【0013】
上記のシランカップリング剤のうち、以下のものは特に好ましい。第一には、特開平05−186479に開示されている3種のイミダゾールシラン化合物及びそれらの混合物である。これらのイミダゾールシラン化合物は、同文献に開示されているようにイミダゾール化合物と3‐グリシドキシプロピルシラン化合物を80〜200℃で反応させることによって、3種の混合物として得られる(以下、この混合物を単にイミダゾールシランと称する)。第二には、特開平09−296135に開示されている表面処理剤の有効成分である、ジメチルアミノ基を有する有機ケイ素化合物である(以下、この化合物を単にジメチルアミノシランと称する)。このジメチルアミノシランは、同文献に開示されているように、ジメチルアミンとエポキシシランを20〜80℃に加熱した後、未反応のジメチルアミンを除去することにより得られる。
【0014】
本発明のエポキシ樹脂用フェノール系硬化剤は単に混合物としても用いられるが、上記のようなフェノール系硬化剤を溶融し、その中に上記3級以上のアミノ基を有するシランカップリング剤を撹拌混合して得られた変性フェノール系硬化剤であっても効果的である。
【0015】
また、本発明によれば、(a)エポキシ樹脂、及び、(b)本発明のエポキシ樹脂用フェノール系硬化剤を含むエポキシ樹脂組成物が提供される。
【0016】
本発明のエポキシ樹脂組成物に用いるエポキシ樹脂は、エポキシ樹脂であればどのようなものでもよいが、封止材や積層板用途で汎用に使われているものが好ましい。例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビフェニル骨格を有するエポキシ樹脂、ナフタレン骨格を有するエポキシ樹脂、トリフェニルメタン骨格を有するエポキシ樹脂、およびこれらのエポキシ樹脂構造中の水素原子の一部をハロゲン化したエポキシ樹脂等が挙げられる。また、本発明のエポキシ樹脂組成物に含まれる、これらのエポキシ樹脂とエポキシ樹脂用フェノール系硬化剤の混合比(水酸基/エポキシ基)は、0.2〜1.2の範囲となる量が好ましい。
【0017】
本発明のエポキシ樹脂組成物は、さらに、無機充填材を含んでいてもよい。無機質充填剤は、封止材に一般に使用されているものであればどのようなものでもよいが、不純物濃度が低く、平均粒径30μm以下のシリカ粉末が好ましい。無機質充填剤の配合割合は、全体の樹脂組成物に対して25〜90重量%含有するように配合するのが好ましい。
【0018】
本発明のエポキシ樹脂組成物は、必要に応じて、天然ワックス、合成ワックス類、直鎖脂肪酸の金属塩、酸アミド、エステル類、パラフィン等の離型剤、三酸化アンチモン等の難燃剤、カーボンブラック等の着色剤、シランカップリング剤、種々の硬化促進剤、ゴム系やシリコーン系の低応力付与剤等を適宜添加配合することが出来る。
【0019】
本発明のエポキシ樹脂組成物は、積層板用ワニスに好適に用いられる。また、本発明のエポキシ樹脂組成物は、これを基材に含浸させプリプレグとして、さらにこのプリプレグを積層形成してなる積層板として用いることもできる。またさらに、本発明のエポキシ樹脂組成物は、金属粉末と混練して半導体チップマウンティング材料としても好適に用いられ、このように様々な用途に用いることができる。
【0020】
本発明のエポキシ樹脂組成物は、加熱することにより、エポキシ樹脂硬化物として提供することもできる。この硬化物は、半導体チップがこれによって封止されてなる半導体封止装置に、好適に用いられる。
【0021】
本発明の別の態様によれば、エポキシ樹脂用フェノール系硬化剤の製造方法であって、
フェノール系硬化剤を溶融し、
その中に3級以上のアミノ基を有するシランカップリング剤を撹拌混合し、変性フェノール系硬化剤を得ることを特徴とするエポキシ樹脂用フェノール系硬化剤の製造方法が提供される。
【0022】
本発明のエポキシ樹脂用フェノール系硬化剤の製造方法において、フェノール系硬化剤と3級以上のアミノ基を有するシランカップリング剤の重量比は、フェノール系硬化剤1に対して、3級以上のアミノ基を有するシランカップリング剤0.001〜1が好ましい。この混合比は、さらに好ましくは、0.01〜0.5である。3級以上のアミノ基を有するシランカップリング剤が多すぎるとゲル化してしまい、また少なすぎると接着向上の効果が得られない。
【0023】
フェノール系硬化剤とシランカップリング剤の混合方法は、フェノール系硬化剤が固体の場合には、あらかじめ溶融させ、十分撹拌しながら3級以上のアミノ基を有するシランカップリング剤を徐々に添加していくのが好ましい。この際、フェノール樹脂の水酸基とシラン剤のアルコキシシリル基が反応してアルコールが生じる。
【0024】
【発明の実施の形態】
以下に本発明を実施例を用いて具体的に説明するが、本発明はこれらの実施例によって限定されない。まず、本発明のエポキシ樹脂用フェノール系硬化剤の製造に先立って、イミダゾールシラン及びジメチルアミノシランを製造し、それぞれ合成例1及び合成例2として以下に記載した。なお、実施例で記載した配合割合の単位は、重量部とする。
【0025】
(合成例1)
特開平05−186479の実施例に従って、次のようにイミダゾールシランを製造した。イミダゾール3.4g(0.05mol)を95℃で溶解し、アルゴン雰囲気下で撹拌しながら、3‐グリシドキシプロピルメトキシシラン11.8g(0.05mol)を30分間かけて滴下した。滴下終了後、さらに95度の温度で1時間反応させた。得られたイミダゾールシランは、3種類の成分の混合物であった。
【0026】
(合成例2)
特開平09−296135の実施例に従って、次のようにジメチルアミノシランを製造した。ジメチルアミン13.5g(0.3mol)と3‐グリシドキシプロピルトリメトキシシラン17.3g(0.07mol)を窒素雰囲気にしたオートクレーブ中に入れ、150℃で1時間加熱し、反応させた。反応後、反応混合物中の過剰のジメチルアミンをエバポレーターにより除去し、ジメチルアミノシラン19.9gを得た。
【0027】
(実施例1)
合成例1のイミダゾールシランを用いて、本発明のエポキシ樹脂用フェノール系硬化剤を、次のように製造した。フェノールノボラック樹脂35g(水酸基当量:104)を100℃に加熱し、溶融した。その中に上記合成例1のイミダゾールシラン1gを徐々に添加し、添加後5分間撹拌し、冷却した。冷却後、粉砕し、エポキシ樹脂用フェノール系硬化剤であるイミダゾールシラン変性フェノールノボラック樹脂(硬化剤1)を得た。
【0028】
(実施例2)
実施例1のイミダゾールシラン1gに替えて、上記合成例2のジメチルアミノシラン1gにした以外は、実施例1と同様の操作を行い、エポキシ樹脂用フェノール系硬化剤であるジメチルアミノシラン変性フェノールノボラック樹脂(硬化剤2)を得た。
【0029】
(実施例3)〜(実施例14)
実施例3〜14では、上記実施例1の硬化剤1又は実施例2の硬化剤2を用いて、以下のようにエポキシ樹脂組成物を製造した。オルソクレゾールノボラック型エポキシ樹脂(エポキシ当量:210)をはじめとする材料を、後述する表1に示した割合で常温で混合した。表1に示すように、溶融シリカ粉末(平均粒子径14μm)、2‐エチル−4‐メチルイミダゾール、3‐グリシドキシプロピルトリメトキシシラン等を適宜添加剤として加えた。この混合物を、さらに90〜100℃で混練冷却した後、粉砕しエポキシ樹脂組成物を得た。
【0030】
上述のようにして得られたエポキシ樹脂組成物を用いて、銅合金板(C‐7025、サイズ:50mm×25mm)2枚を図1に示すように接着し、樹脂組成物を硬化させた。このときの硬化条件は、175℃で8時間とした。図1の構造のものを試験片とし、これを引張試験機により矢印の方向に引っ張り、せん断強度を測定した。このときの引張速度は1mm/minとした。その結果を後述する表2に示す。
【0031】
(比較例1)〜(比較例3)
比較例1〜3では、本発明のエポキシ樹脂用フェノール系硬化剤の替わりに、フェノールノボラック樹脂を硬化剤として用いた。すなわち、表1に示した材料と混合割合を用いた以外は、実施例3〜14と同様にして、エポキシ樹脂組成物を製造した。また、得られたエポキシ樹脂組成物を用いて、上記実施例3〜14と同様のせん断強度測定を行った。測定結果は、後述する表2に示す。
【0032】
【表1】

Figure 0003708423
【0033】
【表2】
Figure 0003708423
【0034】
本発明の硬化剤を用いた実施例3〜14は、いずれも十分なせん断接着強度を示した。これらのうち、実施例3、6、9及び12は、添加剤として溶融シリカ粉末を含んでいない場合であって、80Kg/cm2以上の高いせん断接着強度を示した。これに対し、本発明の硬化剤を用いず、溶融シリカ粉末を含まない比較例1では、強度は60Kg/cm2と不十分であった。一方、実施例4、5、7、8、10、11、13及び14は、溶融シリカ粉末を含んでおり、32Kg/cm2以上のせん断接着強度を示した。これに対し、本発明の硬化剤を用いず、溶融シリカ粉末を同様に含む比較例2及び3では、25Kg/cm2と低い強度を示すか、凝集物の生成によって接着できない結果となった。
【0035】
(実施例15)及び(実施例16)
実施例15及び16では、実施例1の硬化剤1を用いてワニスを製造し、それを用いてプリプレグ及び銅張積層板を得た。まず、ブロム化ビスフェノールA型エポキシ樹脂(Br含有率:21.5%、エポキシ当量:480)、オルソクレゾールノボラック型エポキシ樹脂(エポキシ当量:210)、実施例1の硬化剤1であるイミダゾールシラン変性ノボラック樹脂、及び、その他後述する表3に示した材料を表3の割合で混合した。この混合物に、アセトンを加え、ワニスを調製した。
【0036】
次に、仕様7628タイプのガラス織布基材(積層板用無アルカリ平織ガラスクロス)に各ワニスを樹脂含量がおよそ50%になるように含浸させ、乾燥させ、プリプレグを得た。このプリプレグを8枚重ねることにより、また、銅箔(厚み:35μm)を使用し片側に重ね、これを175℃、40kg/cm2の加熱加圧条件で90分間プレスすることによって銅張積層板を得た。この銅張積層板の接着性評価として、ピール強度を回路幅1cmで測定した。その結果を後述する表4に示す。
【0037】
(比較例4)及び(比較例5)
比較例4及び5では、本発明の硬化剤の替わりにフェノールノボラック樹脂(水酸基等量:104)を用い、その他表3に示した材料を表3の混合比で用いた。それ以外は、実施例15及び16と同様にして、銅張積層板を得、そのピール強度を測定した。測定結果は、後述する表4に示す。
【0038】
(比較例6)
本比較例では、本発明の硬化剤を用いず、表3に示した材料を表3の混合比で用いた。ワニスを調製する際に上記実施例ではアセトンのみを用いたが、本比較例ではワニスを調製するためにアセトンの他にジメチルフォルムアミドとメチルセルソルブを使用する必要があった。それ以外は、実施例15及び16と同様にして、銅張積層板を製造し、そのピール強度を測定した。測定結果は、後述する表4に示す。
【0039】
【表3】
Figure 0003708423
【0040】
【表4】
Figure 0003708423
【0041】
表4に示したように、本発明の硬化剤を用いた実施例15及び16では、アセトンのみを溶剤として用いたにもかかわらず、十分なピール強度を示した。これに対して、本発明の硬化剤を用いず、溶剤としてアセトンのみを用いた比較例4及び5では、低い強度を示すか、ワニスに凝集物が生成した。また、実施例15及び16は、ジシアンジアミド系硬化剤(比較例6)と同程度の十分なピール強度を示していることが分かった。
【0042】
【発明の効果】
本発明のエポキシ樹脂用フェノール系硬化剤を用いると、エポキシ樹脂組成物を硬化させたときに、エポキシ樹脂と、金属や無機材料との密着性を向上させることができる。また、本発明のエポキシ樹脂用フェノール系硬化剤は、ケトン系溶媒にも溶解性が高く、ワニスやプリプレグ等様々な用途に用いることができる。このような理由により、本発明の硬化剤及びそれを用いたエポキシ樹脂組成物は、電子材料分野に好適に用いられる。
【図面の簡単な説明】
【図1】実施例で製造した樹脂を用いて接着した銅合金板のせん断強度の測定方法を説明するための図である。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a phenolic curing agent for epoxy resins having excellent adhesion to metals and inorganic materials and an epoxy resin composition using the same, and they are used in the fields of electronic materials, paints, primers, adhesives and the like. Can be used. Among these, it is particularly suitable for sealing materials, laminates, and mounting materials used in electronic materials.
[0002]
[Prior art]
In recent years, in the field of electronic materials, in addition to the trend toward lighter, thinner and smaller materials, there are trends such as halogen-free materials, antimony-free materials, and lead-free solder materials to prevent environmental pollution. For this reason, sealing materials, laminated materials, mounting materials, and the like used for electronic materials are currently required to have further improved characteristics along their flow.
[0003]
For example, an epoxy resin composition in which a novolac epoxy resin is cured with a phenol novolac resin has been conventionally used as a semiconductor sealing resin. However, in order to cope with high integration of semiconductors, there is a strict demand for smaller and thinner packages. On the other hand, it is necessary to respond to the trend of shifting to lead-free solder due to consideration of environmental issues, and also to cope with the development of lead frame PPF (pre-plated frame). For these reasons, demands for various properties of the sealing resin have become stricter year by year, and it has become difficult for conventional epoxy resin compositions to ensure reliability derived from mechanical strength and the like. Specific required characteristics include higher adhesion to semiconductor chips and lead frames, and in particular, it is required that cracks and interface cracks do not occur in the sealing resin even if immersed in solder after moisture absorption. Has been.
[0004]
Moreover, the glass substrate epoxy laminated board is most often used as the insulating material of the printed wiring board. As a laminated board epoxy resin, a resin using dicyandiamide as a curing agent has been generally used, but due to the heat resistance requirement when lead-free solder or the like is used, a method using a phenol novolac resin as a curing agent is attracting attention. It has come to be. However, when a phenol novolac resin is used as a curing agent, there is a drawback that the adhesiveness with a copper foil, particularly the adhesiveness with an inner copper foil in a multilayer board, is significantly inferior to that of a dicyandiamide type.
[0005]
As means for improving the adhesion between the metal or inorganic substance and the resin, a surface treatment with a silane coupling agent or a method of adding the silane coupling agent to the resin is generally used. is there. Epoxy-based and amino-based commercially available silane coupling agents have been used for many years because they are effective in improving such adhesiveness. The number of cases where the characteristics cannot be satisfied is increasing. Accordingly, the present inventors have developed silane coupling agents having an imidazole group or a dimethylamino group (for example, JP-A Nos. 05-186479, 09-012683, and 09-29588). It was confirmed that this silane coupling agent can greatly improve the adhesion between the metal or inorganic substance and the resin as compared with a commercially available one.
[0006]
[Problems to be solved by the invention]
However, the above-mentioned silane coupling agents having an imidazole group or a dimethylamino group have a drawback that they are difficult to handle during integral blending due to their high viscosity and high hydrolysis rate. Further, some have poor solubility in solvents such as ketones, and when used in varnishes, there is a disadvantage that the pot life is short, which limits the method of use.
[0007]
Then, this invention provides the hardening | curing agent for epoxy resins for manufacturing the epoxy resin composition excellent in adhesiveness with a metal or an inorganic material first, and such an epoxy resin composition and hardened | cured material. For the purpose. Furthermore, it is easy to handle, has high solubility in ketone solvents, and is suitable for various uses including varnishes, and epoxy resin compositions and curings using such curing agents. The purpose is to provide goods.
[0008]
[Means for Solving the Problems]
As a result of intensive studies to achieve the above object, the present inventors have mixed a general phenol-based curing agent and a silane coupling agent having a tertiary or higher amino group to obtain a mixture or reaction thereof. It was found that the adhesion between the metal or inorganic material and the epoxy resin is greatly improved when the product is used as a curing agent. Furthermore, despite the use of a silane coupling agent having a tertiary or higher amino group, this curing agent is easy to handle and dissolves in any commonly used solvent. I found out that
[0009]
That is, according to the present invention, a phenolic curing agent for epoxy resin,
It is a modified phenolic curing agent obtained by melting a phenolic curing agent and stirring and mixing a silane coupling agent having a tertiary or higher amino group which is an imidazole group, a dimethylamino group or a salt thereof. A phenolic curing agent for epoxy resins is provided.
[0010]
The mechanism for improving the adhesive force between a metal or inorganic material and the resin using the curing agent of the present invention is the alkoxy of a silane coupling agent having a hydroxyl group of a phenolic curing agent and a tertiary or higher amino group contained in the curing agent. It is estimated that the curing reaction of the epoxy resin proceeds smoothly when the silyl group reacts and the functions of the curing agent and the curing accelerator are combined in one molecule.
[0011]
The phenolic curing agent used in the present invention may be any as long as it has two or more phenolic hydroxyl groups in one molecule. For example, bisphenol A, bisphenol F, polyvinylphenol, phenol novolac resin, Examples include cresol novolac resin, bisphenol A novolak resin, bisphenol F novolac resin, aralkylphenol resin, and the like. Of these, phenol resin curing agents are particularly preferred.
[0012]
As the silane coupling agent having a tertiary or higher amino group, a silane coupling agent having an imidazole group, a dimethylamino group or a salt thereof effective as a curing accelerator is suitable. For example, JP-A No. 05-186479, Kaihei 09-295988, JP 05-039295, JP 06-279458, JP 09-296135, JP 09-295989, JP 09-295992, JP 10-273492, JP 11-0924482, JP 12-12. -226757, JP-A-11-108246, and the like, and further, a type obtained by adding an organic acid salt such as acetic acid to a silane coupling agent having an imidazole group or a dimethylamino group to form a salt. It is done.
[0013]
Of the above silane coupling agents, the following are particularly preferred. The first is three imidazole silane compounds and mixtures thereof disclosed in JP-A No. 05-186479. These imidazole silane compounds are obtained as a mixture of three kinds by reacting an imidazole compound and a 3-glycidoxypropyl silane compound at 80 to 200 ° C. as disclosed in the same document (hereinafter referred to as this mixture). Is simply referred to as imidazole silane). The second is an organosilicon compound having a dimethylamino group, which is an effective component of the surface treatment agent disclosed in JP-A 09-296135 (hereinafter, this compound is simply referred to as dimethylaminosilane). As disclosed in this document, the dimethylaminosilane can be obtained by heating dimethylamine and epoxysilane to 20 to 80 ° C. and then removing unreacted dimethylamine.
[0014]
The phenolic curing agent for epoxy resin of the present invention is also used as a mixture, but the above phenolic curing agent is melted, and the silane coupling agent having a tertiary or higher amino group is stirred and mixed therein. Even a modified phenolic curing agent obtained in this manner is effective.
[0015]
Moreover, according to this invention, the epoxy resin composition containing (a) epoxy resin and (b) the phenol type hardening | curing agent for epoxy resins of this invention is provided.
[0016]
The epoxy resin used in the epoxy resin composition of the present invention may be any epoxy resin as long as it is an epoxy resin, but is preferably used for general purposes in sealing materials and laminates. For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol A novolak type epoxy resin, phenol novolak type epoxy resin, cresol novolac type epoxy resin, epoxy resin having biphenyl skeleton, epoxy resin having naphthalene skeleton, triphenylmethane Examples thereof include epoxy resins having a skeleton, and epoxy resins obtained by halogenating a part of hydrogen atoms in these epoxy resin structures. In addition, the mixing ratio (hydroxyl group / epoxy group) of these epoxy resin and phenolic curing agent for epoxy resin contained in the epoxy resin composition of the present invention is preferably an amount in the range of 0.2 to 1.2. .
[0017]
The epoxy resin composition of the present invention may further contain an inorganic filler. The inorganic filler may be any as long as it is generally used for a sealing material, but silica powder having a low impurity concentration and an average particle size of 30 μm or less is preferable. The blending ratio of the inorganic filler is preferably blended so as to contain 25 to 90% by weight with respect to the entire resin composition.
[0018]
The epoxy resin composition of the present invention may be prepared from natural wax, synthetic wax, metal salt of linear fatty acid, release agent such as acid amide, ester, paraffin, flame retardant such as antimony trioxide, carbon as necessary. A coloring agent such as black, a silane coupling agent, various curing accelerators, rubber-based or silicone-based low stress imparting agents, and the like can be appropriately added and blended.
[0019]
The epoxy resin composition of this invention is used suitably for the varnish for laminated boards. Further, the epoxy resin composition of the present invention can be used as a prepreg obtained by impregnating the epoxy resin composition into a base material, and further as a laminated plate obtained by laminating this prepreg. Furthermore, the epoxy resin composition of the present invention can be suitably used as a semiconductor chip mounting material by kneading with a metal powder, and thus can be used for various applications.
[0020]
The epoxy resin composition of the present invention can also be provided as a cured epoxy resin by heating. This cured product is suitably used for a semiconductor sealing device in which a semiconductor chip is sealed by this.
[0021]
According to another aspect of the present invention, there is provided a method for producing a phenolic curing agent for epoxy resin,
Melting phenolic curing agent,
There is provided a method for producing a phenolic curing agent for epoxy resins, characterized in that a silane coupling agent having a tertiary or higher amino group is stirred and mixed to obtain a modified phenolic curing agent.
[0022]
In the method for producing a phenolic curing agent for epoxy resin of the present invention, the weight ratio of the phenolic curing agent and the silane coupling agent having a tertiary or higher amino group is 3 or higher with respect to the phenolic curing agent 1. Silane coupling agents having an amino group are preferably 0.001-1. This mixing ratio is more preferably 0.01 to 0.5. If the amount of the silane coupling agent having a tertiary or higher amino group is too much, it will gel, and if it is too little, the effect of improving adhesion cannot be obtained.
[0023]
When the phenolic curing agent is a solid, the phenolic curing agent and the silane coupling agent are melted in advance and gradually added with a silane coupling agent having a tertiary or higher amino group with sufficient stirring. It is preferable to go. At this time, the hydroxyl group of the phenol resin and the alkoxysilyl group of the silane agent react to produce alcohol.
[0024]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the present invention will be described in detail with reference to examples, but the present invention is not limited to these examples. First, prior to the production of the phenolic curing agent for epoxy resin of the present invention, imidazole silane and dimethylamino silane were produced, and are described below as Synthesis Example 1 and Synthesis Example 2, respectively. In addition, the unit of the mixture ratio described in the Example shall be a weight part.
[0025]
(Synthesis Example 1)
According to the example of JP-A No. 05-186479, imidazole silane was produced as follows. 3.4 g (0.05 mol) of imidazole was dissolved at 95 ° C., and 11.8 g (0.05 mol) of 3-glycidoxypropylmethoxysilane was added dropwise over 30 minutes while stirring in an argon atmosphere. After completion of dropping, the reaction was further carried out at a temperature of 95 ° C. for 1 hour. The resulting imidazole silane was a mixture of three components.
[0026]
(Synthesis Example 2)
According to the example of JP-A 09-296135, dimethylaminosilane was produced as follows. 13.5 g (0.3 mol) of dimethylamine and 17.3 g (0.07 mol) of 3-glycidoxypropyltrimethoxysilane were placed in an autoclave in a nitrogen atmosphere and reacted by heating at 150 ° C. for 1 hour. After the reaction, excess dimethylamine in the reaction mixture was removed by an evaporator to obtain 19.9 g of dimethylaminosilane.
[0027]
(Example 1)
Using the imidazole silane of Synthesis Example 1, the phenolic curing agent for epoxy resin of the present invention was produced as follows. Phenol novolac resin 35 g (hydroxyl equivalent: 104) was heated to 100 ° C. and melted. The imidazole silane 1g of the said synthesis example 1 was added gradually in it, and it stirred for 5 minutes after the addition, and cooled. After cooling, the mixture was pulverized to obtain an imidazolesilane-modified phenol novolac resin (curing agent 1) which is a phenolic curing agent for epoxy resin.
[0028]
(Example 2)
A dimethylaminosilane-modified phenol novolac resin (a phenolic curing agent for epoxy resin) was used in the same manner as in Example 1 except that 1 g of imidazolesilane in Example 1 was used instead of 1 g of dimethylaminosilane in Synthesis Example 2 above. Curing agent 2) was obtained.
[0029]
(Example 3) to (Example 14)
In Examples 3 to 14, an epoxy resin composition was produced as follows using the curing agent 1 of Example 1 or the curing agent 2 of Example 2. Materials including an ortho-cresol novolac type epoxy resin (epoxy equivalent: 210) were mixed at room temperature at a ratio shown in Table 1 described later. As shown in Table 1, fused silica powder (average particle size 14 μm), 2-ethyl-4-methylimidazole, 3-glycidoxypropyltrimethoxysilane, and the like were added as appropriate additives. This mixture was further kneaded and cooled at 90 to 100 ° C. and then pulverized to obtain an epoxy resin composition.
[0030]
Using the epoxy resin composition obtained as described above, two copper alloy plates (C-7005, size: 50 mm × 25 mm) were bonded as shown in FIG. 1, and the resin composition was cured. The curing conditions at this time were 175 ° C. for 8 hours. A specimen having the structure shown in FIG. 1 was used as a test piece, which was pulled in the direction of an arrow by a tensile tester, and the shear strength was measured. The tensile speed at this time was 1 mm / min. The results are shown in Table 2 below.
[0031]
(Comparative Example 1) to (Comparative Example 3)
In Comparative Examples 1 to 3, a phenol novolac resin was used as a curing agent instead of the phenolic curing agent for epoxy resin of the present invention. That is, an epoxy resin composition was manufactured in the same manner as in Examples 3 to 14 except that the materials and mixing ratios shown in Table 1 were used. Moreover, the shear strength measurement similar to the said Examples 3-14 was performed using the obtained epoxy resin composition. The measurement results are shown in Table 2 described later.
[0032]
[Table 1]
Figure 0003708423
[0033]
[Table 2]
Figure 0003708423
[0034]
Examples 3 to 14 using the curing agent of the present invention all showed sufficient shear bond strength. Among these, Examples 3, 6, 9 and 12 were cases where the fused silica powder was not included as an additive, and showed high shear adhesive strength of 80 kg / cm 2 or more. In contrast, in Comparative Example 1 in which the curing agent of the present invention was not used and no fused silica powder was included, the strength was insufficient at 60 Kg / cm 2 . On the other hand, Examples 4, 5, 7, 8, 10, 11, 13, and 14 contained fused silica powder and exhibited a shear bond strength of 32 kg / cm 2 or more. On the other hand, Comparative Examples 2 and 3 which similarly contain fused silica powder without using the curing agent of the present invention showed a low strength of 25 Kg / cm 2 , or could not be bonded due to the formation of aggregates.
[0035]
(Example 15) and (Example 16)
In Examples 15 and 16, a varnish was produced using the curing agent 1 of Example 1, and a prepreg and a copper clad laminate were obtained using the varnish. First, brominated bisphenol A type epoxy resin (Br content: 21.5%, epoxy equivalent: 480), orthocresol novolak type epoxy resin (epoxy equivalent: 210), and imidazole silane modified as curing agent 1 of Example 1 A novolak resin and other materials shown in Table 3 described later were mixed in the ratio shown in Table 3. Acetone was added to this mixture to prepare a varnish.
[0036]
Next, each varnish was impregnated with a specification 7628 type glass woven fabric base (non-alkali plain woven glass cloth for laminate) so that the resin content was approximately 50%, and dried to obtain a prepreg. By stacking 8 sheets of this prepreg, and using copper foil (thickness: 35 μm), it is stacked on one side, and this is pressed for 90 minutes at 175 ° C. and 40 kg / cm 2 of heating and pressurizing, so that the copper-clad laminate Got. As an adhesive evaluation of this copper-clad laminate, peel strength was measured at a circuit width of 1 cm. The results are shown in Table 4 below.
[0037]
(Comparative Example 4) and (Comparative Example 5)
In Comparative Examples 4 and 5, a phenol novolac resin (hydroxyl equivalent: 104) was used in place of the curing agent of the present invention, and the other materials shown in Table 3 were used at the mixing ratio shown in Table 3. Other than that was carried out similarly to Example 15 and 16, and obtained the copper clad laminated board, and measured the peel strength. The measurement results are shown in Table 4 described later.
[0038]
(Comparative Example 6)
In this comparative example, the materials shown in Table 3 were used at the mixing ratio shown in Table 3 without using the curing agent of the present invention. In preparing the varnish, only acetone was used in the above examples, but in this comparative example, it was necessary to use dimethylformamide and methyl cellosolve in addition to acetone in order to prepare the varnish. Other than that was carried out similarly to Example 15 and 16, and manufactured the copper clad laminated board, and measured the peel strength. The measurement results are shown in Table 4 described later.
[0039]
[Table 3]
Figure 0003708423
[0040]
[Table 4]
Figure 0003708423
[0041]
As shown in Table 4, in Examples 15 and 16 using the curing agent of the present invention, sufficient peel strength was exhibited even though only acetone was used as a solvent. On the other hand, Comparative Examples 4 and 5 using only acetone as a solvent without using the curing agent of the present invention showed low strength or produced aggregates in the varnish. Moreover, it turned out that Example 15 and 16 has shown sufficient peel strength comparable as a dicyandiamide type hardening | curing agent (comparative example 6).
[0042]
【The invention's effect】
When the phenolic curing agent for epoxy resin of the present invention is used, when the epoxy resin composition is cured, the adhesion between the epoxy resin and the metal or inorganic material can be improved. In addition, the phenolic curing agent for epoxy resins of the present invention is highly soluble in ketone solvents and can be used for various applications such as varnishes and prepregs. For these reasons, the curing agent of the present invention and the epoxy resin composition using the same are suitably used in the field of electronic materials.
[Brief description of the drawings]
BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a diagram for explaining a method for measuring the shear strength of a copper alloy plate bonded using a resin produced in an example.

Claims (10)

エポキシ樹脂用フェノール系硬化剤であって、
フェノール系硬化剤を溶融し、その中にイミダゾール基又はジメチルアミノ基又はそれらの塩である3級以上のアミノ基を有するシランカップリング剤を攪拌混合して得られた変性フェノール系硬化剤であることを特徴とするエポキシ樹脂用フェノール系硬化剤。
A phenolic curing agent for epoxy resin,
It is a modified phenolic curing agent obtained by melting a phenolic curing agent and stirring and mixing a silane coupling agent having a tertiary or higher amino group which is an imidazole group, a dimethylamino group or a salt thereof. A phenolic curing agent for epoxy resins characterized by the above .
(a)エポキシ樹脂、及び、(b)請求項1に記載のエポキシ樹脂用フェノール系硬化剤を含むエポキシ樹脂組成物。  An epoxy resin composition comprising (a) an epoxy resin, and (b) the phenolic curing agent for epoxy resin according to claim 1. さらに、無機質充填材を含む請求項記載のエポキシ樹脂組成物。Furthermore, the epoxy resin composition of Claim 2 containing an inorganic filler. 請求項2又は3に記載のエポキシ樹脂組成物を用いた積層板用ワニス。The varnish for laminated boards using the epoxy resin composition of Claim 2 or 3 . 請求項2又は3に記載のエポキシ樹脂組成物を基材に含浸したプリプレグ。A prepreg obtained by impregnating a base material with the epoxy resin composition according to claim 2 . 請求項に記載のプリプレグを積層形成してなる積層板。A laminate obtained by laminating the prepreg according to claim 5 . 請求項2又は3に記載のエポキシ樹脂組成物を金属粉末と混練してなる半導体チップマウンティング材料。A semiconductor chip mounting material obtained by kneading the epoxy resin composition according to claim 2 or 3 with metal powder. 請求項2又は3に記載のエポキシ樹脂組成物を加熱して得られたエポキシ樹脂硬化物。A cured epoxy resin obtained by heating the epoxy resin composition according to claim 2 . 請求項に記載のエポキシ樹脂硬化物によって半導体チップが封止されている半導体封止装置。A semiconductor sealing device in which a semiconductor chip is sealed with the cured epoxy resin according to claim 8 . エポキシ樹脂用フェノール系硬化剤の製造方法であって、フェノール系硬化剤を溶融し、イミダゾール基又はジメチルアミノ基又はそれらの塩である3級以上のアミノ基を有するシランカップリング剤を攪拌混合し、変性フェノール系硬化剤を得ることを特徴とするエポキシ樹脂用フェノール系硬化剤の製造方法。A method for producing a phenolic curing agent for epoxy resin, comprising melting a phenolic curing agent and stirring and mixing a silane coupling agent having a tertiary or higher amino group which is an imidazole group, a dimethylamino group or a salt thereof. A method for producing a phenolic curing agent for epoxy resin, characterized by obtaining a modified phenolic curing agent.
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