KR20120030049A - Epoxy resin composition, prepreg and cured products thereof - Google Patents
Epoxy resin composition, prepreg and cured products thereof Download PDFInfo
- Publication number
- KR20120030049A KR20120030049A KR1020117027323A KR20117027323A KR20120030049A KR 20120030049 A KR20120030049 A KR 20120030049A KR 1020117027323 A KR1020117027323 A KR 1020117027323A KR 20117027323 A KR20117027323 A KR 20117027323A KR 20120030049 A KR20120030049 A KR 20120030049A
- Authority
- KR
- South Korea
- Prior art keywords
- epoxy resin
- group
- substituted
- resin composition
- unsubstituted
- Prior art date
Links
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 140
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 139
- 239000000203 mixture Substances 0.000 title claims abstract description 81
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 37
- 239000011256 inorganic filler Substances 0.000 claims abstract description 35
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 35
- 238000006243 chemical reaction Methods 0.000 claims abstract description 34
- -1 phenol compound Chemical class 0.000 claims abstract description 31
- 239000000463 material Substances 0.000 claims abstract description 29
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 claims abstract description 27
- 150000001875 compounds Chemical class 0.000 claims abstract description 22
- 150000002989 phenols Chemical class 0.000 claims description 39
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 23
- 125000000217 alkyl group Chemical group 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 20
- 125000003118 aryl group Chemical group 0.000 claims description 18
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 17
- 125000003545 alkoxy group Chemical group 0.000 claims description 16
- 238000006467 substitution reaction Methods 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 9
- 239000000835 fiber Substances 0.000 claims description 8
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 7
- 125000005907 alkyl ester group Chemical group 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000005543 phthalimide group Chemical group 0.000 claims description 4
- 125000004591 piperonyl group Chemical group C(C1=CC=2OCOC2C=C1)* 0.000 claims description 4
- 238000007789 sealing Methods 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 abstract description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 28
- 229920005989 resin Polymers 0.000 description 24
- 239000011347 resin Substances 0.000 description 24
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- 239000013078 crystal Substances 0.000 description 20
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Natural products OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 239000000047 product Substances 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- WDJHALXBUFZDSR-UHFFFAOYSA-N Acetoacetic acid Natural products CC(=O)CC(O)=O WDJHALXBUFZDSR-UHFFFAOYSA-N 0.000 description 13
- 238000003756 stirring Methods 0.000 description 13
- 238000003786 synthesis reaction Methods 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 12
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 10
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 10
- 229960003742 phenol Drugs 0.000 description 10
- 239000002966 varnish Substances 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 9
- 238000002844 melting Methods 0.000 description 9
- 230000008018 melting Effects 0.000 description 9
- TXFPEBPIARQUIG-UHFFFAOYSA-N 4'-hydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C=C1 TXFPEBPIARQUIG-UHFFFAOYSA-N 0.000 description 8
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 238000002425 crystallisation Methods 0.000 description 8
- 230000008025 crystallization Effects 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 7
- 150000001299 aldehydes Chemical class 0.000 description 7
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical group O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 7
- 235000010290 biphenyl Nutrition 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 5
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000004305 biphenyl Substances 0.000 description 5
- 239000012295 chemical reaction liquid Substances 0.000 description 5
- 238000006735 epoxidation reaction Methods 0.000 description 5
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical class OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 5
- OJVAMHKKJGICOG-UHFFFAOYSA-N 2,5-hexanedione Chemical compound CC(=O)CCC(C)=O OJVAMHKKJGICOG-UHFFFAOYSA-N 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 4
- FFWSICBKRCICMR-UHFFFAOYSA-N 5-methyl-2-hexanone Chemical compound CC(C)CCC(C)=O FFWSICBKRCICMR-UHFFFAOYSA-N 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 4
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
- 239000005011 phenolic resin Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 229920005992 thermoplastic resin Polymers 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 3
- JECYUBVRTQDVAT-UHFFFAOYSA-N 2-acetylphenol Chemical compound CC(=O)C1=CC=CC=C1O JECYUBVRTQDVAT-UHFFFAOYSA-N 0.000 description 3
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 229940126214 compound 3 Drugs 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- ZAJNGDIORYACQU-UHFFFAOYSA-N decan-2-one Chemical compound CCCCCCCCC(C)=O ZAJNGDIORYACQU-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 239000012778 molding material Substances 0.000 description 3
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical class C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000002861 polymer material Substances 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- 238000001721 transfer moulding Methods 0.000 description 3
- 238000001291 vacuum drying Methods 0.000 description 3
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- UMYZWICEDUEWIM-UHFFFAOYSA-N 1-(3,4-dimethoxyphenyl)propan-2-one Chemical compound COC1=CC=C(CC(C)=O)C=C1OC UMYZWICEDUEWIM-UHFFFAOYSA-N 0.000 description 2
- WFWKNGZODAOLEO-UHFFFAOYSA-N 1-(4-Methoxyphenyl)-2-propanone Chemical compound COC1=CC=C(CC(C)=O)C=C1 WFWKNGZODAOLEO-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical group C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical class C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- FJPGAMCQJNLTJC-UHFFFAOYSA-N 2,3-Heptanedione Chemical compound CCCCC(=O)C(C)=O FJPGAMCQJNLTJC-UHFFFAOYSA-N 0.000 description 2
- LSKONYYRONEBKA-UHFFFAOYSA-N 2-Dodecanone Chemical compound CCCCCCCCCCC(C)=O LSKONYYRONEBKA-UHFFFAOYSA-N 0.000 description 2
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- CJPNOLIZCWDHJK-UHFFFAOYSA-N 2-Pentadecanone Chemical compound CCCCCCCCCCCCCC(C)=O CJPNOLIZCWDHJK-UHFFFAOYSA-N 0.000 description 2
- POQLVOYRGNFGRM-UHFFFAOYSA-N 2-Tetradecanone Chemical compound CCCCCCCCCCCCC(C)=O POQLVOYRGNFGRM-UHFFFAOYSA-N 0.000 description 2
- ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 2-octanone Chemical compound CCCCCCC(C)=O ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 0.000 description 2
- POSWICCRDBKBMH-UHFFFAOYSA-N 3,3,5-trimethylcyclohexan-1-one Chemical compound CC1CC(=O)CC(C)(C)C1 POSWICCRDBKBMH-UHFFFAOYSA-N 0.000 description 2
- KVFQMAZOBTXCAZ-UHFFFAOYSA-N 3,4-Hexanedione Chemical compound CCC(=O)C(=O)CC KVFQMAZOBTXCAZ-UHFFFAOYSA-N 0.000 description 2
- MBXOOYPCIDHXGH-UHFFFAOYSA-N 3-butylpentane-2,4-dione Chemical compound CCCCC(C(C)=O)C(C)=O MBXOOYPCIDHXGH-UHFFFAOYSA-N 0.000 description 2
- XJLDYKIEURAVBW-UHFFFAOYSA-N 3-decanone Chemical compound CCCCCCCC(=O)CC XJLDYKIEURAVBW-UHFFFAOYSA-N 0.000 description 2
- IAVREABSGIHHMO-UHFFFAOYSA-N 3-hydroxybenzaldehyde Chemical compound OC1=CC=CC(C=O)=C1 IAVREABSGIHHMO-UHFFFAOYSA-N 0.000 description 2
- UJBOOUHRTQVGRU-UHFFFAOYSA-N 3-methylcyclohexan-1-one Chemical compound CC1CCCC(=O)C1 UJBOOUHRTQVGRU-UHFFFAOYSA-N 0.000 description 2
- RHLVCLIPMVJYKS-UHFFFAOYSA-N 3-octanone Chemical compound CCCCCC(=O)CC RHLVCLIPMVJYKS-UHFFFAOYSA-N 0.000 description 2
- PCBSXBYCASFXTM-UHFFFAOYSA-N 4-(4-Methoxyphenyl)-2-butanone Chemical compound COC1=CC=C(CCC(C)=O)C=C1 PCBSXBYCASFXTM-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 2
- DXVYLFHTJZWTRF-UHFFFAOYSA-N Ethyl isobutyl ketone Chemical compound CCC(=O)CC(C)C DXVYLFHTJZWTRF-UHFFFAOYSA-N 0.000 description 2
- LTMXHUUHBSCKEK-UHFFFAOYSA-N Hexadecan-3-one Chemical compound CCCCCCCCCCCCCC(=O)CC LTMXHUUHBSCKEK-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical class C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical group OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 2
- 150000004074 biphenyls Chemical class 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- LOGSONSNCYTHPS-UHFFFAOYSA-N cyclopentane-1,3-dione Chemical compound O=C1CCC(=O)C1 LOGSONSNCYTHPS-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- DMCJFWXGXUEHFD-UHFFFAOYSA-N diheptadecyl ketone Natural products CCCCCCCCCCCCCCCCCC(=O)CCCCCCCCCCCCCCCCC DMCJFWXGXUEHFD-UHFFFAOYSA-N 0.000 description 2
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- VCZMOZVQLARCOE-UHFFFAOYSA-N heptacosan-14-one Chemical compound CCCCCCCCCCCCCC(=O)CCCCCCCCCCCCC VCZMOZVQLARCOE-UHFFFAOYSA-N 0.000 description 2
- WTJKUFMLQFLJOT-UHFFFAOYSA-N heptadecan-9-one Chemical compound CCCCCCCCC(=O)CCCCCCCC WTJKUFMLQFLJOT-UHFFFAOYSA-N 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- PQYGSSYFJIJDFK-UHFFFAOYSA-N heptyl ketone Chemical compound CCCCCCCC(=O)CCCCCCC PQYGSSYFJIJDFK-UHFFFAOYSA-N 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 2
- 150000004780 naphthols Chemical class 0.000 description 2
- YUPOCHDBBHTUBJ-UHFFFAOYSA-N nonadecan-10-one Chemical compound CCCCCCCCCC(=O)CCCCCCCCC YUPOCHDBBHTUBJ-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- TZMFJUDUGYTVRY-UHFFFAOYSA-N pentane-2,3-dione Chemical compound CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- OCHYRSKMMMYUMI-UHFFFAOYSA-N tetradecan-3-one Chemical compound CCCCCCCCCCCC(=O)CC OCHYRSKMMMYUMI-UHFFFAOYSA-N 0.000 description 2
- VARQGBHBYZTYLJ-UHFFFAOYSA-N tricosan-12-one Chemical compound CCCCCCCCCCCC(=O)CCCCCCCCCCC VARQGBHBYZTYLJ-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- KYWIYKKSMDLRDC-UHFFFAOYSA-N undecan-2-one Chemical compound CCCCCCCCCC(C)=O KYWIYKKSMDLRDC-UHFFFAOYSA-N 0.000 description 2
- YNMZZHPSYMOGCI-UHFFFAOYSA-N undecan-3-one Chemical compound CCCCCCCCC(=O)CC YNMZZHPSYMOGCI-UHFFFAOYSA-N 0.000 description 2
- NBSLHMOSERBUOV-UHFFFAOYSA-N undecan-4-one Chemical compound CCCCCCCC(=O)CCC NBSLHMOSERBUOV-UHFFFAOYSA-N 0.000 description 2
- 239000002759 woven fabric Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- PZVCVSQSQHGBNE-UHFFFAOYSA-N (3-acetyloxy-2-oxopropyl) acetate Chemical compound CC(=O)OCC(=O)COC(C)=O PZVCVSQSQHGBNE-UHFFFAOYSA-N 0.000 description 1
- JIRHAGAOHOYLNO-UHFFFAOYSA-N (3-cyclopentyloxy-4-methoxyphenyl)methanol Chemical compound COC1=CC=C(CO)C=C1OC1CCCC1 JIRHAGAOHOYLNO-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical compound O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 description 1
- ULPMRIXXHGUZFA-UHFFFAOYSA-N (R)-4-Methyl-3-hexanone Natural products CCC(C)C(=O)CC ULPMRIXXHGUZFA-UHFFFAOYSA-N 0.000 description 1
- FMGGHNGKHRCJLL-UHFFFAOYSA-N 1,2-bis(chloromethyl)benzene Chemical group ClCC1=CC=CC=C1CCl FMGGHNGKHRCJLL-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- 150000005206 1,2-dihydroxybenzenes Chemical class 0.000 description 1
- YFKBXYGUSOXJGS-UHFFFAOYSA-N 1,3-Diphenyl-2-propanone Chemical compound C=1C=CC=CC=1CC(=O)CC1=CC=CC=C1 YFKBXYGUSOXJGS-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ZZHIDJWUJRKHGX-UHFFFAOYSA-N 1,4-bis(chloromethyl)benzene Chemical compound ClCC1=CC=C(CCl)C=C1 ZZHIDJWUJRKHGX-UHFFFAOYSA-N 0.000 description 1
- DAJPMKAQEUGECW-UHFFFAOYSA-N 1,4-bis(methoxymethyl)benzene Chemical compound COCC1=CC=C(COC)C=C1 DAJPMKAQEUGECW-UHFFFAOYSA-N 0.000 description 1
- VKRKCBWIVLSRBJ-UHFFFAOYSA-N 1,4-dioxaspiro[4.5]decan-8-one Chemical compound C1CC(=O)CCC21OCCO2 VKRKCBWIVLSRBJ-UHFFFAOYSA-N 0.000 description 1
- VRBLNWVVFVBNRK-UHFFFAOYSA-N 1,6-diphenylhexane-1,6-dione Chemical compound C=1C=CC=CC=1C(=O)CCCCC(=O)C1=CC=CC=C1 VRBLNWVVFVBNRK-UHFFFAOYSA-N 0.000 description 1
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical group C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 1
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 1
- NNFOVLFUGLWWCL-UHFFFAOYSA-N 1-acetylpiperidin-4-one Chemical compound CC(=O)N1CCC(=O)CC1 NNFOVLFUGLWWCL-UHFFFAOYSA-N 0.000 description 1
- IYSVFZBXZVPIFA-UHFFFAOYSA-N 1-ethenyl-4-(4-ethenylphenyl)benzene Chemical group C1=CC(C=C)=CC=C1C1=CC=C(C=C)C=C1 IYSVFZBXZVPIFA-UHFFFAOYSA-N 0.000 description 1
- SDRZFSPCVYEJTP-UHFFFAOYSA-N 1-ethenylcyclohexene Chemical compound C=CC1=CCCCC1 SDRZFSPCVYEJTP-UHFFFAOYSA-N 0.000 description 1
- ZIKLJUUTSQYGQI-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxypropoxy)propane Chemical compound CCOCC(C)OCC(C)OCC ZIKLJUUTSQYGQI-UHFFFAOYSA-N 0.000 description 1
- KIAMPLQEZAMORJ-UHFFFAOYSA-N 1-ethoxy-2-[2-(2-ethoxyethoxy)ethoxy]ethane Chemical compound CCOCCOCCOCCOCC KIAMPLQEZAMORJ-UHFFFAOYSA-N 0.000 description 1
- CUZLJOLBIRPEFB-UHFFFAOYSA-N 1-methoxypropan-2-one Chemical compound COCC(C)=O CUZLJOLBIRPEFB-UHFFFAOYSA-N 0.000 description 1
- ALLIZEAXNXSFGD-UHFFFAOYSA-N 1-methyl-2-phenylbenzene Chemical group CC1=CC=CC=C1C1=CC=CC=C1 ALLIZEAXNXSFGD-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- RKPILPRSNWEZJV-UHFFFAOYSA-N 1-morpholin-4-ylbutane-1,3-dione Chemical compound CC(=O)CC(=O)N1CCOCC1 RKPILPRSNWEZJV-UHFFFAOYSA-N 0.000 description 1
- SQAINHDHICKHLX-UHFFFAOYSA-N 1-naphthaldehyde Chemical class C1=CC=C2C(C=O)=CC=CC2=C1 SQAINHDHICKHLX-UHFFFAOYSA-N 0.000 description 1
- QWAVNXZAQASOML-UHFFFAOYSA-N 1-phenoxypropan-2-one Chemical compound CC(=O)COC1=CC=CC=C1 QWAVNXZAQASOML-UHFFFAOYSA-N 0.000 description 1
- DYQAZJQDLPPHNB-UHFFFAOYSA-N 1-phenyl-2-hexanone Chemical compound CCCCC(=O)CC1=CC=CC=C1 DYQAZJQDLPPHNB-UHFFFAOYSA-N 0.000 description 1
- CVBUKMMMRLOKQR-UHFFFAOYSA-N 1-phenylbutane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=CC=C1 CVBUKMMMRLOKQR-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 1
- VVHFXJOCUKBZFS-UHFFFAOYSA-N 2-(chloromethyl)-2-methyloxirane Chemical compound ClCC1(C)CO1 VVHFXJOCUKBZFS-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical class [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- NJBCRXCAPCODGX-UHFFFAOYSA-N 2-methyl-n-(2-methylpropyl)propan-1-amine Chemical class CC(C)CNCC(C)C NJBCRXCAPCODGX-UHFFFAOYSA-N 0.000 description 1
- IEBAJFDSHJYDCK-UHFFFAOYSA-N 2-methylundecan-4-one Chemical compound CCCCCCCC(=O)CC(C)C IEBAJFDSHJYDCK-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- ZVJQBBYAVPAFLX-UHFFFAOYSA-N 3,3-dimethylcyclohexan-1-one Chemical compound CC1(C)CCCC(=O)C1 ZVJQBBYAVPAFLX-UHFFFAOYSA-N 0.000 description 1
- ZDCYWXYPRPCJOY-UHFFFAOYSA-N 3,4-dimethylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1C ZDCYWXYPRPCJOY-UHFFFAOYSA-N 0.000 description 1
- XIYKRJLTYKUWAM-UHFFFAOYSA-N 3,4-methylenedioxyphenylpropan-2-one Chemical compound CC(=O)CC1=CC=C2OCOC2=C1 XIYKRJLTYKUWAM-UHFFFAOYSA-N 0.000 description 1
- MSANHHHQJYQEOK-UHFFFAOYSA-N 3,5-dimethylcyclohexan-1-one Chemical compound CC1CC(C)CC(=O)C1 MSANHHHQJYQEOK-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- GUARKOVVHJSMRW-UHFFFAOYSA-N 3-ethylpentane-2,4-dione Chemical compound CCC(C(C)=O)C(C)=O GUARKOVVHJSMRW-UHFFFAOYSA-N 0.000 description 1
- PFCHFHIRKBAQGU-UHFFFAOYSA-N 3-hexanone Chemical compound CCCC(=O)CC PFCHFHIRKBAQGU-UHFFFAOYSA-N 0.000 description 1
- LUJMEECXHPYQOF-UHFFFAOYSA-N 3-hydroxyacetophenone Chemical compound CC(=O)C1=CC=CC(O)=C1 LUJMEECXHPYQOF-UHFFFAOYSA-N 0.000 description 1
- GSOHKPVFCOWKPU-UHFFFAOYSA-N 3-methylpentane-2,4-dione Chemical compound CC(=O)C(C)C(C)=O GSOHKPVFCOWKPU-UHFFFAOYSA-N 0.000 description 1
- CJAUDSQXFVZPTO-UHFFFAOYSA-N 3-phenylcyclohexan-1-one Chemical compound C1C(=O)CCCC1C1=CC=CC=C1 CJAUDSQXFVZPTO-UHFFFAOYSA-N 0.000 description 1
- MFBXYJLOYZMFIN-UHFFFAOYSA-N 3-phenylcyclopentan-1-one Chemical compound C1C(=O)CCC1C1=CC=CC=C1 MFBXYJLOYZMFIN-UHFFFAOYSA-N 0.000 description 1
- YIWTXSVNRCWBAC-UHFFFAOYSA-N 3-phenylpentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)C1=CC=CC=C1 YIWTXSVNRCWBAC-UHFFFAOYSA-N 0.000 description 1
- UFERIGCCDYCZLN-UHFFFAOYSA-N 3a,4,7,7a-tetrahydro-1h-indene Chemical compound C1C=CCC2CC=CC21 UFERIGCCDYCZLN-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- PJCCSZUMZMCWSX-UHFFFAOYSA-N 4,4-Dimethoxy-2-butanone Chemical compound COC(OC)CC(C)=O PJCCSZUMZMCWSX-UHFFFAOYSA-N 0.000 description 1
- PXQMSTLNSHMSJB-UHFFFAOYSA-N 4,4-dimethylcyclohexan-1-one Chemical compound CC1(C)CCC(=O)CC1 PXQMSTLNSHMSJB-UHFFFAOYSA-N 0.000 description 1
- ZNWLFTSPNBLXGL-UHFFFAOYSA-N 4-(1,4-dioxaspiro[4.5]decan-8-yl)cyclohexan-1-one Chemical compound C1CC(=O)CCC1C1CCC2(OCCO2)CC1 ZNWLFTSPNBLXGL-UHFFFAOYSA-N 0.000 description 1
- VDVQAHFUWSAGRT-UHFFFAOYSA-N 4-(2-methylpropoxy)butan-2-one Chemical compound CC(C)COCCC(C)=O VDVQAHFUWSAGRT-UHFFFAOYSA-N 0.000 description 1
- TZJLGGWGVLADDN-UHFFFAOYSA-N 4-(3,4-Methylenedioxyphenyl)-2-butanone Chemical compound CC(=O)CCC1=CC=C2OCOC2=C1 TZJLGGWGVLADDN-UHFFFAOYSA-N 0.000 description 1
- YGYPMFPGZQPETF-UHFFFAOYSA-N 4-(4-hydroxy-3,5-dimethylphenyl)-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C=2C=C(C)C(O)=C(C)C=2)=C1 YGYPMFPGZQPETF-UHFFFAOYSA-N 0.000 description 1
- OQIDYCVWAFZRTR-UHFFFAOYSA-N 4-(4-oxocyclohexyl)cyclohexan-1-one Chemical compound C1CC(=O)CCC1C1CCC(=O)CC1 OQIDYCVWAFZRTR-UHFFFAOYSA-N 0.000 description 1
- HDPBBNNDDQOWPJ-UHFFFAOYSA-N 4-[1,2,2-tris(4-hydroxyphenyl)ethyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 HDPBBNNDDQOWPJ-UHFFFAOYSA-N 0.000 description 1
- WFCQTAXSWSWIHS-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 WFCQTAXSWSWIHS-UHFFFAOYSA-N 0.000 description 1
- MTVIFYGHTHZUKX-UHFFFAOYSA-N 4-acetyl-5-oxohexanoic acid Chemical compound CC(=O)C(C(C)=O)CCC(O)=O MTVIFYGHTHZUKX-UHFFFAOYSA-N 0.000 description 1
- YFBGSHHKHHCVDI-UHFFFAOYSA-N 4-ethoxybutan-2-one Chemical compound CCOCCC(C)=O YFBGSHHKHHCVDI-UHFFFAOYSA-N 0.000 description 1
- OKSDJGWHKXFVME-UHFFFAOYSA-N 4-ethylcyclohexan-1-one Chemical compound CCC1CCC(=O)CC1 OKSDJGWHKXFVME-UHFFFAOYSA-N 0.000 description 1
- LVSQXDHWDCMMRJ-UHFFFAOYSA-N 4-hydroxybutan-2-one Chemical compound CC(=O)CCO LVSQXDHWDCMMRJ-UHFFFAOYSA-N 0.000 description 1
- VWMVAQHMFFZQGD-UHFFFAOYSA-N 4-hydroxyphenylacetone Chemical compound CC(=O)CC1=CC=C(O)C=C1 VWMVAQHMFFZQGD-UHFFFAOYSA-N 0.000 description 1
- KOKPBCHLPVDQTK-UHFFFAOYSA-N 4-methoxy-4-methylpentan-2-one Chemical compound COC(C)(C)CC(C)=O KOKPBCHLPVDQTK-UHFFFAOYSA-N 0.000 description 1
- XUPXMIAWKPTZLZ-UHFFFAOYSA-N 4-methylhexan-2-one Chemical compound CCC(C)CC(C)=O XUPXMIAWKPTZLZ-UHFFFAOYSA-N 0.000 description 1
- UKLNPJDLSPMJMQ-UHFFFAOYSA-N 4-pentylcyclohexan-1-one Chemical compound CCCCCC1CCC(=O)CC1 UKLNPJDLSPMJMQ-UHFFFAOYSA-N 0.000 description 1
- YKAYMASDSHFOGI-UHFFFAOYSA-N 4-phenylcyclohexan-1-one Chemical compound C1CC(=O)CCC1C1=CC=CC=C1 YKAYMASDSHFOGI-UHFFFAOYSA-N 0.000 description 1
- MEWOUXCWMNHTIZ-UHFFFAOYSA-N 4-propan-2-yloxybutan-2-one Chemical compound CC(C)OCCC(C)=O MEWOUXCWMNHTIZ-UHFFFAOYSA-N 0.000 description 1
- INYHZQLKOKTDAI-UHFFFAOYSA-N 5-ethenylbicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(C=C)CC1C=C2 INYHZQLKOKTDAI-UHFFFAOYSA-N 0.000 description 1
- RNDVGJZUHCKENF-UHFFFAOYSA-N 5-hexen-2-one Chemical compound CC(=O)CCC=C RNDVGJZUHCKENF-UHFFFAOYSA-N 0.000 description 1
- PSBKJPTZCVYXSD-UHFFFAOYSA-N 5-methylheptan-3-one Chemical compound CCC(C)CC(=O)CC PSBKJPTZCVYXSD-UHFFFAOYSA-N 0.000 description 1
- UPVLGOPSYZTLGB-UHFFFAOYSA-N 5-methyloctan-2-one Chemical compound CCCC(C)CCC(C)=O UPVLGOPSYZTLGB-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- DPLGXGDPPMLJHN-UHFFFAOYSA-N 6-Methylheptan-2-one Chemical compound CC(C)CCCC(C)=O DPLGXGDPPMLJHN-UHFFFAOYSA-N 0.000 description 1
- ZPQAKYPOZRXKFA-UHFFFAOYSA-N 6-Undecanone Chemical compound CCCCCC(=O)CCCCC ZPQAKYPOZRXKFA-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- IXCOKTMGCRJMDR-UHFFFAOYSA-N 9h-fluorene;phenol Chemical compound OC1=CC=CC=C1.OC1=CC=CC=C1.C1=CC=C2CC3=CC=CC=C3C2=C1 IXCOKTMGCRJMDR-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 1
- DBERHVIZRVGDFO-UHFFFAOYSA-N Acetoxyacetone Chemical compound CC(=O)COC(C)=O DBERHVIZRVGDFO-UHFFFAOYSA-N 0.000 description 1
- 208000023514 Barrett esophagus Diseases 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- REIYHFWZISXFKU-UHFFFAOYSA-N Butyl acetoacetate Chemical group CCCCOC(=O)CC(C)=O REIYHFWZISXFKU-UHFFFAOYSA-N 0.000 description 1
- URXZOVBVEGRXIP-UHFFFAOYSA-N C(C)C1=CC2=C3C=C4C=CC=CC4=CC3=CC=C2C(=C1)[B] Chemical class C(C)C1=CC2=C3C=C4C=CC=CC4=CC3=CC=C2C(=C1)[B] URXZOVBVEGRXIP-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical class O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- HMGAHRPPRPQDAS-UHFFFAOYSA-N Methyl-n-heneikosyl-keton Natural products CCCCCCCCCCCCCCCCCCCCCC(C)=O HMGAHRPPRPQDAS-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- IYTXKIXETAELAV-UHFFFAOYSA-N Nonan-3-one Chemical compound CCCCCCC(=O)CC IYTXKIXETAELAV-UHFFFAOYSA-N 0.000 description 1
- TYBCSQFBSWACAA-UHFFFAOYSA-N Nonan-4-one Chemical compound CCCCCC(=O)CCC TYBCSQFBSWACAA-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- AXMVYSVVTMKQSL-UHFFFAOYSA-N UNPD142122 Natural products OC1=CC=C(C=CC=O)C=C1O AXMVYSVVTMKQSL-UHFFFAOYSA-N 0.000 description 1
- XMUZQOKACOLCSS-UHFFFAOYSA-N [2-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=CC=C1CO XMUZQOKACOLCSS-UHFFFAOYSA-N 0.000 description 1
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 150000003935 benzaldehydes Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000005130 benzoxazines Chemical class 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical group C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229940117916 cinnamic aldehyde Drugs 0.000 description 1
- KJPRLNWUNMBNBZ-UHFFFAOYSA-N cinnamic aldehyde Natural products O=CC=CC1=CC=CC=C1 KJPRLNWUNMBNBZ-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000011231 conductive filler Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- MLUCVPSAIODCQM-NSCUHMNNSA-N crotonaldehyde Chemical compound C\C=C\C=O MLUCVPSAIODCQM-NSCUHMNNSA-N 0.000 description 1
- MLUCVPSAIODCQM-UHFFFAOYSA-N crotonaldehyde Natural products CC=CC=O MLUCVPSAIODCQM-UHFFFAOYSA-N 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 150000001924 cycloalkanes Chemical class 0.000 description 1
- CGZZMOTZOONQIA-UHFFFAOYSA-N cycloheptanone Chemical compound O=C1CCCCCC1 CGZZMOTZOONQIA-UHFFFAOYSA-N 0.000 description 1
- HJSLFCCWAKVHIW-UHFFFAOYSA-N cyclohexane-1,3-dione Chemical compound O=C1CCCC(=O)C1 HJSLFCCWAKVHIW-UHFFFAOYSA-N 0.000 description 1
- DCZFGQYXRKMVFG-UHFFFAOYSA-N cyclohexane-1,4-dione Chemical compound O=C1CCC(=O)CC1 DCZFGQYXRKMVFG-UHFFFAOYSA-N 0.000 description 1
- YKFKEYKJGVSEIX-UHFFFAOYSA-N cyclohexanone, 4-(1,1-dimethylethyl)- Chemical compound CC(C)(C)C1CCC(=O)CC1 YKFKEYKJGVSEIX-UHFFFAOYSA-N 0.000 description 1
- MKJDUHZPLQYUCB-UHFFFAOYSA-N decan-4-one Chemical compound CCCCCCC(=O)CCC MKJDUHZPLQYUCB-UHFFFAOYSA-N 0.000 description 1
- JDPQWHLMBJZURR-UHFFFAOYSA-N decan-5-one Chemical compound CCCCCC(=O)CCCC JDPQWHLMBJZURR-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 1
- BADXJIPKFRBFOT-UHFFFAOYSA-N dimedone Chemical compound CC1(C)CC(=O)CC(=O)C1 BADXJIPKFRBFOT-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000006222 dimethylaminomethyl group Chemical group [H]C([H])([H])N(C([H])([H])[H])C([H])([H])* 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- PERIHWAPLOBAJM-UHFFFAOYSA-N dodecan-3-one Chemical compound CCCCCCCCCC(=O)CC PERIHWAPLOBAJM-UHFFFAOYSA-N 0.000 description 1
- AVQSOIZWTINZLU-UHFFFAOYSA-N dodecan-4-one Chemical compound CCCCCCCCC(=O)CCC AVQSOIZWTINZLU-UHFFFAOYSA-N 0.000 description 1
- DOXYUCZSYSEALW-UHFFFAOYSA-N dodecan-5-one Chemical compound CCCCCCCC(=O)CCCC DOXYUCZSYSEALW-UHFFFAOYSA-N 0.000 description 1
- ZAQZICGOYPRHCK-UHFFFAOYSA-N dodecan-6-one Chemical compound CCCCCCC(=O)CCCCC ZAQZICGOYPRHCK-UHFFFAOYSA-N 0.000 description 1
- 239000002305 electric material Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- AZDCYKCDXXPQIK-UHFFFAOYSA-N ethenoxymethylbenzene Chemical class C=COCC1=CC=CC=C1 AZDCYKCDXXPQIK-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000012765 fibrous filler Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 229940083094 guanine derivative acting on arteriolar smooth muscle Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- DOACSXJVHDTDSG-UHFFFAOYSA-N henicosan-11-one Chemical compound CCCCCCCCCCC(=O)CCCCCCCCCC DOACSXJVHDTDSG-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- WPJUQKLHPBNAMG-UHFFFAOYSA-N isoindole-1,3-dione;propan-2-one Chemical compound CC(C)=O.C1=CC=C2C(=O)NC(=O)C2=C1 WPJUQKLHPBNAMG-UHFFFAOYSA-N 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- MQWCXKGKQLNYQG-UHFFFAOYSA-N methyl cyclohexan-4-ol Natural products CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- VKCYHJWLYTUGCC-UHFFFAOYSA-N nonan-2-one Chemical compound CCCCCCCC(C)=O VKCYHJWLYTUGCC-UHFFFAOYSA-N 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- YWXLSHOWXZUMSR-UHFFFAOYSA-N octan-4-one Chemical compound CCCCC(=O)CCC YWXLSHOWXZUMSR-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- KRIOVPPHQSLHCZ-UHFFFAOYSA-N phenyl propionaldehyde Natural products CCC(=O)C1=CC=CC=C1 KRIOVPPHQSLHCZ-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- ZWLUXSQADUDCSB-UHFFFAOYSA-N phthalaldehyde Chemical class O=CC1=CC=CC=C1C=O ZWLUXSQADUDCSB-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Chemical class COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000012453 solvate Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- HTSABYAWKQAHBT-UHFFFAOYSA-N trans 3-methylcyclohexanol Natural products CC1CCCC(O)C1 HTSABYAWKQAHBT-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- WENNKWXPAWNIOO-UHFFFAOYSA-N undecan-5-one Chemical compound CCCCCCC(=O)CCCC WENNKWXPAWNIOO-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/241—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
- C08J5/244—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres using glass fibres
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
- C08G59/625—Hydroxyacids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/249—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs characterised by the additives used in the prepolymer mixture
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3737—Organic materials with or without a thermoconductive filler
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08J2363/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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- H—ELECTRICITY
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0326—Organic insulating material consisting of one material containing O
Abstract
본 발명의 목적은 내열성 및 높은 열전도율을 갖는 경화물이 얻어지는 에폭시 수지 조성물을 제공하는 것에 있다.
본 발명에 관한 에폭시 수지 조성물은 에폭시 수지, 경화제 및 열전도율 20W/m?K 이상의 무기 충전재를 함유해서 이루어지는 에폭시 수지 조성물이고, 경화제로서 소정의 식(1)?(5)으로 나타내어지는 화합물의 1종 이상과 히드록시벤즈알데히드류의 반응에 의하여 얻어지는 페놀 화합물 및/또는 에폭시 수지로서 상기 페놀 화합물에 에피할로히드린을 더 반응시킴으로써 얻어지는 에폭시 화합물을 함유하여 이루어진다. The objective of this invention is providing the epoxy resin composition from which the hardened | cured material which has heat resistance and high thermal conductivity is obtained.
The epoxy resin composition which concerns on this invention is an epoxy resin composition which consists of an epoxy resin, a hardening | curing agent, and the inorganic filler of 20 W / m * K or more of thermal conductivity, and is a 1 type of compound represented by predetermined formula (1)-(5) as a hardening | curing agent. It contains the epoxy compound obtained by making epihalohydrin further react with the said phenol compound as a phenol compound and / or an epoxy resin obtained by reaction of the above and hydroxybenzaldehyde.
Description
본 발명은 신규한 에폭시 수지 조성물 및 상기 에폭시 수지 조성물을 사용해서 얻어지는 프리프레그에 관한 것이다. 또한, 본 발명은 상기 에폭시 수지 조성물 또는 프리프레그를 경화해서 이루어지는 경화물에 관한 것이다.The present invention relates to a novel epoxy resin composition and a prepreg obtained by using the epoxy resin composition. Moreover, this invention relates to the hardened | cured material formed by hardening | curing the said epoxy resin composition or a prepreg.
에폭시 수지 조성물은 일반적으로 기계적 성질, 내수성, 내약품성, 내열성, 전기적 성질 등이 우수한 경화물이 되고, 접착제, 도료, 적층판, 성형 재료, 주형 재료 등의 폭넓은 분야에 이용되고 있다. 최근, 이들의 분야에 사용되는 에폭시 수지의 경화물에는 고순도화를 비롯하여, 난연성, 내열성, 내습성, 강인성, 저선팽창률, 저유전율 특성 등 모든 특성의 향상이 더욱 요구되고 있다.The epoxy resin composition generally becomes a cured product having excellent mechanical properties, water resistance, chemical resistance, heat resistance, electrical properties, and the like, and is used in a wide range of fields such as adhesives, paints, laminates, molding materials, and molding materials. In recent years, cured products of epoxy resins used in these fields have been required to further improve all properties such as high purity, flame retardancy, heat resistance, moisture resistance, toughness, low linear expansion coefficient, and low dielectric constant characteristics.
특히, 에폭시 수지 조성물의 대표적인 용도인 전기?전자 산업 분야에 있어서는 다기능화, 고성능화, 컴팩트화를 목적으로 한 반도체의 고밀도 실장이나 프린트 배선판의 고밀도 배선화가 진행되고 있다. 그러나, 고밀도 실장화나 고밀도 배선화는 반도체 소자나 프린트 배선판의 내부로부터 발생하는 열을 증가시켜 기기류의 오작동을 야기하는 원인이 될 수 있다. 그 때문에 발생한 열을 어떻게 해서 효율적으로 외부로 방출시킬 것인지에 관한 것이 에너지 효율이나 기기 설계의 점에서 중요한 과제가 되고 있다.In particular, in the electric and electronic industries, which are typical applications of epoxy resin compositions, high-density packaging of semiconductors and high-density wiring of printed wiring boards for the purpose of multifunction, high performance, and compactness have been advanced. However, high-density mounting or high-density wiring can increase the heat generated from the inside of a semiconductor element or a printed wiring board, which may cause malfunction of devices. Therefore, how to efficiently discharge the generated heat to the outside has become an important problem in terms of energy efficiency and device design.
이들 열대책으로서는 메탈 코어 기판을 사용하거나, 설계의 단계에서 방열하기 쉬운 구조를 만들거나, 사용하는 고분자 재료(에폭시 수지)에 고열 전도 필러를 세밀 충전하는 등 각종 연구가 이루어지고 있다. 그러나, 고열 전도 부위를 연결시키는 바인더역의 고분자 재료의 열전도율이 낮기 때문에, 고분자 재료의 열전도 스피이드가 율속(律速)이 되고, 효율적인 방열이 될 수 없는 것이 현재의 상태이다.As these tropical measures, various studies have been made, such as using a metal core substrate, making a structure which is easy to dissipate heat at the design stage, or finely filling a high thermal conductive filler into the polymer material (epoxy resin) to be used. However, since the thermal conductivity of the polymer material in the binder region connecting the high thermally conductive portions is low, the thermal conductivity speed of the polymer material becomes the rate rate and it is not possible to provide efficient heat dissipation.
에폭시 수지의 고열전도화를 실현하는 수단으로서, 특허문헌 1에서는 메소겐기를 에폭시 수지 구조 중에 도입하는 방법이 보고되어 있다. 동 문헌에는 메소겐기를 갖는 에폭시 수지로서, 비페닐 골격을 갖는 에폭시 수지 등이 기재되어 있다. 또한, 비페닐 골격 이외의 에폭시 수지로서는 페닐벤조에이트형의 에폭시 수지가 기재되어 있지만, 상기 에폭시 수지는 산화에 의한 에폭시화 반응에 의해 제조할 필요가 있기 때문에 안전성이나 코스트에 어려움이 있어 실용적이다고는 말할 수 없다.As a means of realizing high thermal conductivity of an epoxy resin, Patent Literature 1 reports a method of introducing a mesogen group into an epoxy resin structure. The document describes an epoxy resin having a biphenyl skeleton as an epoxy resin having a mesogenic group. As epoxy resins other than the biphenyl skeleton, phenylbenzoate-type epoxy resins are described. However, since the epoxy resins need to be produced by epoxidation reactions by oxidation, they are difficult and practical in terms of safety and cost. Can not say.
또한, 특허문헌 2?4에는 비페닐 골격을 갖는 에폭시 수지를 사용한 예가 기재되고 있고, 그 중에서도 특허문헌 3에는 고열전도율을 갖는 무기 충전재를 병용하는 방법이 기재되어 있다. 그러나, 이들 문헌에 기재된 방법에 의해 얻어지는 경화물의 열전도성은 시장의 요망을 만족하는 레벨이 아니고, 비교적 저렴하게 입수가능한 에폭시 수지를 사용한, 보다 높은 열전도율을 갖는 경화물을 제공하는 에폭시 수지 조성물이 요구되고 있다.Moreover, patent document 2-4 describes the example using the epoxy resin which has a biphenyl frame | skeleton, and patent document 3 describes the method of using together the inorganic filler which has high thermal conductivity especially. However, the thermal conductivity of the cured product obtained by the methods described in these documents is not at a level satisfying market demands, and an epoxy resin composition is required that provides a cured product having a higher thermal conductivity using an epoxy resin that is relatively inexpensive. have.
또한, 에폭시 수지와 같이 에폭시 수지 조성물에 함유되는 경화제도 고열전도화를 실현하는 중요한 요소라 말해진다. 종래, 그 경화물이 높은 열전도율을 갖는다라고 하는 에폭시 수지 조성물에 포함되는 경화제로서는 특허문헌 1에는 4,4'-디아미노디페닐벤조에이트, 4,4'-디아미노디페닐메탄, 특허문헌 2 및 3에는 1,5-디아미노나프탈렌 등, 아민계의 경화제를 사용한 예가 보고되고 있다. 그러나, 이들의 아민계의 경화제는 경화 촉진 작용이 있기 때문에 경화물을 작성할 때의 라이프 타임을 확보하는 것이 곤란해서 바람직하다고는 말할 수 없다. 한편, 특허문헌 4에서는 페놀 화합물을 경화제로서 사용하고 있다. 특허문헌 4에서는 구체적으로 카테콜 노볼락이 사용되고 있지만, 동 문헌에 기재된 방법에 의해 얻어지는 경화물의 열전도성도 시장의 요망을 만족하는 레벨이 아니고, 보다 높은 열전도율을 갖는 경화물을 제공하는 에폭시 수지 조성물의 개발이 요구되고 있다.Moreover, the hardening | curing agent contained in an epoxy resin composition like an epoxy resin is said to be an important factor which implements high thermal conductivity. Conventionally, as a hardening | curing agent contained in the epoxy resin composition which the hardened | cured material has a high thermal conductivity, patent document 1 has 4,4'- diamino diphenyl benzoate, 4,4'- diamino diphenylmethane, and patent document 2 And 3, the example using the amine-type hardeners, such as 1, 5- diamino naphthalene, is reported. However, since these amine hardening | curing agents have a hardening acceleration | action action, it is difficult to ensure the life time at the time of producing hardened | cured material, and it cannot be said that it is preferable. On the other hand, in patent document 4, a phenolic compound is used as a hardening | curing agent. Although the catechol novolak is specifically used in patent document 4, the thermal conductivity of the hardened | cured material obtained by the method of the said document also does not satisfy the market demand, but the epoxy resin composition which provides the hardened | cured material which has higher thermal conductivity is provided. Development is required.
(선행 기술 문헌)(Prior art technical literature)
특허문헌 1: 일본국 특허공개 평11-323162호 공보Patent Document 1: Japanese Patent Application Laid-Open No. 11-323162
특허문헌 2: 일본국 특허공개 2004-2573호 공보Patent Document 2: Japanese Patent Publication No. 2004-2573
특허문헌 3: 일본국 특허공개 2006-63315호 공보Patent Document 3: Japanese Patent Application Laid-Open No. 2006-63315
특허문헌 4: 일본국 특허공개 2003-137971호 공보Patent Document 4: Japanese Unexamined Patent Publication No. 2003-137971
본 발명은 이러한 문제를 해결하기 위해 검토한 결과로 이루어진 것이고, 그 경화물이 높은 열전도성을 갖는 에폭시 수지 조성물을 제공하는 것이다.This invention is made | formed as a result of examination in order to solve such a problem, and provides the epoxy resin composition which the hardened | cured material has high thermal conductivity.
본 발명자들은 상기 과제를 해결하기 위해서 예의 연구한 결과, 본 발명을 완성시키는데 이르렀다.MEANS TO SOLVE THE PROBLEM The present inventors came to complete this invention as a result of earnestly researching in order to solve the said subject.
즉, 본 발명은That is, the present invention
(1)(One)
(a') 에폭시 수지,(a ') epoxy resin,
(b) 경화제로서 하기 식(1)?(5)으로 나타내어지는 화합물의 1종이상과 히드록시벤즈알데히드류의 반응에 의해 얻어지는 페놀 화합물, 및(b) Phenolic compound obtained by reaction of 1 or more types of compound represented by following formula (1)-(5) with hydroxybenzaldehyde as a hardening | curing agent, and
(c) 열전도율 20W/m?K이상의 무기 충전재를 함유해서 이루어지는 에폭시 수지 조성물.(c) An epoxy resin composition comprising an inorganic filler having a thermal conductivity of 20 W / m · K or higher.
(식(1) 중 R1은 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?10개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 수산기, 또는 탄소수 1?10개의 치환 또는 무치환의 알콕시기 중 어느 하나를 나타낸다. l은 R1의 수를 나타내고, 0?4의 정수이다.)(In formula (1), R <1> exists independently, and is a hydrogen atom, a C1-C10 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a hydroxyl group, or C1-C10. Any one of substituted or unsubstituted alkoxy groups, l represents the number of R 1 , and is an integer of 0 to 4.
(식(2) 중 R2는 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?20개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 1?15개의 치환 또는 무치환의 알킬카르보닐기, 모르폴리닐카르보닐기, 탄소수 2?10개의 치환 또는 무치환의 알킬에스테르기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기, 프탈이미드기, 피페로닐기 또는 수산기 중 어느 하나를 나타낸다.)(In Formula (2), R <2> is respectively independently present, and a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a C1-C15 substitution, or Unsubstituted alkylcarbonyl group, morpholinylcarbonyl group, substituted or unsubstituted alkyl ester group having 2 to 10 carbon atoms, substituted or unsubstituted alkoxy group having 1 to 10 carbon atoms, phthalimide group, piperonyl group or hydroxyl group Indicates one.)
(식(3) 중 R3은 각각 독립적으로 존재하고, 수소 원자, 탄소수 0?10개의 치환 또는 무치환의 알킬카르보닐기, 탄소수 1?10개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 2?10개의 치환 또는 무치환의 알킬에스테르기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기 또는 수산기 중 어느 하나를 나타낸다. n은 탄소수를 나타내고, 0, 1, 2 중 어느 하나의 정수를 나타낸다. m은 R3의 수를 나타내고, 0≤m≤n+2의 관계를 만족시킨다.)(In Formula (3), R <3> respectively exists independently, and is a hydrogen atom, a C1-C10 substituted or unsubstituted alkylcarbonyl group, a C1-C10 substituted or unsubstituted alkyl group, a C6-C10 substitution, or N represents an unsubstituted aryl group, a substituted or unsubstituted alkyl ester group having 2 to 10 carbon atoms, a substituted or unsubstituted alkoxy group or hydroxyl group having 1 to 10 carbon atoms, n represents carbon number, and 0, 1, An integer of any one of 2. m represents the number of R 3 and satisfies the relationship of 0 ≦ m ≦ n + 2.)
(식(4) 중 R4는 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?20개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기 또는 수산기 중 어느 하나를 나타낸다.)(In formula (4), R <4> respectively exists independently, and is a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a C1-C10 substitution, or Or an unsubstituted alkoxy group or hydroxyl group.)
(식(5) 중 R5는 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?20개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기 또는 수산기 중 어느 하나를 나타낸다. 또한, n은 1?10의 정수이다.)(In formula (5), R <5> exists independently, and is a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a C1-C10 substitution, or Any of an unsubstituted alkoxy group or a hydroxyl group is shown, and n is an integer of 1-10.)
(2)(2)
(a) 상기 (1)에 기재된 페놀 화합물에 에피할로히드린을 더 반응시켜서 얻어지는 에폭시 수지,(a) an epoxy resin obtained by further reacting epihalohydrin with the phenolic compound according to the above (1),
(b') 경화제, 및(b ') a curing agent, and
(c) 열전도율 20W/m?K이상의 무기 충전재를 함유해서 이루어지는 에폭시 수지 조성물.(c) An epoxy resin composition comprising an inorganic filler having a thermal conductivity of 20 W / m · K or higher.
(3)(3)
(a) 상기 (2)에 기재된 에폭시 수지,(a) the epoxy resin as described in said (2),
(b) 상기 (1)에 기재된 페놀 화합물, 및(b) the phenolic compound according to the above (1), and
(c) 열전도율 20W/m?K이상의 무기 충전재를 함유해서 이루어지는 에폭시 수지 조성물.(c) An epoxy resin composition comprising an inorganic filler having a thermal conductivity of 20 W / m · K or higher.
(4)(4)
반도체 밀봉 용도에 사용되는 상기 (1)?(3) 중 어느 하나에 기재된 에폭시 수지 조성물.The epoxy resin composition in any one of said (1)-(3) used for semiconductor sealing use.
(5)(5)
상기 (1)?(3) 중 어느 하나에 기재된 에폭시 수지 조성물 및 시트상의 섬유 기재로 이루어지는 프리프레그.The prepreg which consists of an epoxy resin composition as described in any one of said (1)-(3), and a sheet-like fiber base material.
(6)(6)
상기 (1)?(4) 중 어느 하나에 기재된 에폭시 수지 조성물 또는 상기 (5)에 기재된 프리프레그를 경화해서 이루어지는 경화물에 관한 것이다.It is related with the hardened | cured material formed by hardening | curing the epoxy resin composition in any one of said (1)-(4), or the prepreg as described in said (5).
(발명의 효과)(Effects of the Invention)
본 발명의 에폭시 수지 조성물은 그 경화물이 열전도이 우수하기 때문에 반도체 밀봉 재료, 프리프레그를 비롯한 각종 복합 재료, 접착제, 도료 등에 사용하는 경우에 유용하다.Since the hardened | cured material is excellent in thermal conductivity, the epoxy resin composition of this invention is useful when it uses for various composite materials, such as a semiconductor sealing material and a prepreg, an adhesive agent, coating material, etc.
본 발명의 에폭시 수지 조성물은 에폭시 수지, 경화제 및 열전도율 20W/m?K이상의 무기 충전재(이하, 「(c)성분」이라고 기재한다)를 함유해서 이루어지는 에폭시 수지 조성물이고, 경화제로서, 하기 식(1)?(5)로 나타내어지는 화합물의 1종 이상과 히드록시벤즈알데히드류의 반응에 의해 얻어지는 페놀 화합물(이하, 「(b)성분」이라고 한다), 및/또는 에폭시 수지로서, 상기 (b)성분에 에피할로히드린을 더 반응시켜서 얻어지는 에폭시 화합물(이하,「(a)성분」이라고 한다)을 함유한다.The epoxy resin composition of this invention is an epoxy resin composition which contains an epoxy resin, a hardening | curing agent, and an inorganic filler (Hereinafter, it describes as "(c) component") of 20 W / m * K or more of heat conductivity, As a hardening | curing agent, it is a following formula (1) Phenolic compound (henceforth "(b) component") obtained by reaction of 1 or more types of compound represented by (5), and hydroxybenzaldehyde, and / or an epoxy resin as said (b) component It contains the epoxy compound (henceforth "a component") obtained by making epihalohydrin further react.
우선, 본 발명의 에폭시 수지 조성물이 경화제로서 함유하는 (b)성분에 관하여 설명한다. (b)성분은 하기 식(1)?(5)로 나타내어지는 화합물의 1종 이상과 히드록시벤즈알데히드류의 반응에 의해 얻어지는 페놀 화합물이다.First, the component (b) which the epoxy resin composition of this invention contains as a hardening | curing agent is demonstrated. (b) A component is a phenol compound obtained by reaction of 1 or more types of compound represented by following formula (1)-(5), and hydroxybenzaldehyde.
(식(1) 중 R1은 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?10개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 수산기 또는 탄소수 1?10개의 치환 또는 무치환의 알콕시기 중 어느 하나를 나타낸다. l은 R1의 수를 나타내고, 0?4의 정수이다.)(In formula (1), R <1> exists independently, and is a hydrogen atom, a C1-C10 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a hydroxyl group, or a C1-C10 group. Any one of a substituted or unsubstituted alkoxy group, l represents the number of R 1 , and is an integer of 0-4.)
(식(2) 중 R2은 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?20개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 1?15개의 치환 또는 무치환의 알킬카르보닐기, 모르폴리닐카르보닐기, 탄소수 2?10개의 치환 또는 무치환의 알킬에스테르기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기, 프탈이미드기, 피페로닐기 또는 수산기 중 어느 하나를 나타낸다.)(In Formula (2), R <2> respectively exists independently, and is a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a C1-C15 substitution, or Unsubstituted alkylcarbonyl group, morpholinylcarbonyl group, substituted or unsubstituted alkyl ester group having 2 to 10 carbon atoms, substituted or unsubstituted alkoxy group having 1 to 10 carbon atoms, phthalimide group, piperonyl group or hydroxyl group Indicates one.)
식(2)에 있어서 상기 치환기는 카르보닐기, 에스테르기, 알케닐기, 페닐기, 알콕시기, 에테르기, 프탈이미드기 및 피페로닐기로 이루어지는 군에서 선택되는 적어도 1종인 것이 바람직하다.In Formula (2), it is preferable that the said substituent is at least 1 sort (s) chosen from the group which consists of a carbonyl group, ester group, alkenyl group, phenyl group, alkoxy group, ether group, phthalimide group, and piperonyl group.
(식(3) 중 R3은 각각 독립적으로 존재하고, 수소 원자, 탄소수 0?10개의 치환 또는 무치환의 알킬카르보닐기, 탄소수 1?10개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 2?10개의 치환 또는 무치환의 알킬에스테르기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기 또는 수산기 중 어느 하나를 나타낸다. n은 탄소수를 나타내고, 0, 1, 2 중 어느 하나의 정수를 나타낸다. m은 R3의 수를 나타내고, 0≤m≤n+2의 관계를 만족한다.)(In Formula (3), R <3> respectively exists independently, and is a hydrogen atom, a C1-C10 substituted or unsubstituted alkylcarbonyl group, a C1-C10 substituted or unsubstituted alkyl group, a C6-C10 substitution, or N represents an unsubstituted aryl group, a substituted or unsubstituted alkyl ester group having 2 to 10 carbon atoms, a substituted or unsubstituted alkoxy group or hydroxyl group having 1 to 10 carbon atoms, n represents carbon number, and 0, 1, Represents an integer of any one of 2. m represents the number of R 3 and satisfies the relationship of 0 ≦ m ≦ n + 2.)
또한, 식 중 R3이 탄소수 0개의 치환 또는 무치환의 알킬카르보닐기인 경우란 일반식(3)의 주골격인 시클로알칸을 구성하는 탄소 원자를 포함해서 이루어지는 카르보닐 구조를 나타내고, 예를 들면 1,3-시클로펜탄디온 등이 열거된다.In addition, in the formula, when R <3> is a C0 substituted or unsubstituted alkylcarbonyl group, the carbonyl structure which comprises the carbon atom which comprises cycloalkane which is a main skeleton of General formula (3) shows, for example, 1 , 3-cyclopentanedione, and the like.
식(3)에 있어서 상기 치환기는 에테르기인 것이 바람직하다.In Formula (3), it is preferable that the said substituent is an ether group.
(식(4) 중 R4는 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?20개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기 또는 수산기 중 어느 하나를 나타낸다.)(In formula (4), R <4> respectively exists independently, and is a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a C1-C10 substitution, or Or an unsubstituted alkoxy group or hydroxyl group.)
(식(5) 중 R5는 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?20개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기 또는 수산기 중 어느 하나를 나타낸다. 또한, n은 1?10의 정수이다.)(In formula (5), R <5> exists independently, and is a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a C1-C10 substitution, or Any of an unsubstituted alkoxy group or a hydroxyl group is shown, and n is an integer of 1-10.)
(b)성분을 얻기 위해서, 히드록시벤즈알데히드류와의 반응에 사용되는 식(1)으로 나타내어지는 화합물의 구체예로서는 o-, m- 및 p-히드록시아세토페논이 열거된다. 이들 중, 에폭시 수지 조성물의 경화물이 높은 열전도성을 나타내기 때문에 p-히드록시아세토페논이 바람직하다.In order to obtain (b) component, o-, m-, and p-hydroxy acetophenone are mentioned as a specific example of the compound represented by Formula (1) used for reaction with hydroxybenzaldehyde. Among these, p-hydroxyacetophenone is preferable because the hardened | cured material of an epoxy resin composition shows high thermal conductivity.
(b)성분을 얻기 위해서, 히드록시벤즈알데히드류와의 반응에 사용되는 식(2)으로 나타내어지는 화합물의 구체예로서는 아세톤, 1,3-디페닐-2-프로파논, 2-부타논, 1-페닐-1,3-부탄디온, 2-펜타논, 3-펜타논, 4-메틸-2-펜타논, 2-헥사논, 3-헥사논, 이소아밀메틸케톤, 에틸이소부틸케톤, 4-메틸-2-헥사논, 1,6-디페닐-1,6-헥산디온, 2-헵타논, 3-헵타논, 4-헵타논, 2-메틸-4-헵타논, 5-메틸-3-헵타논, 6-메틸-2-헵타논, 2,6-디메틸-4-헵타논, 2-옥타논, 3-옥타논, 4-옥타논, 5-메틸-2-옥타논, 2-노나논, 3-노나논, 4-노나논, 5-노나논, 2-데카논, 3-데카논, 4-데카논, 5-데카논, 2-운데카논, 3-운데카논, 4-운데카논, 5-운데카논, 6-운데카논, 2-메틸-4-운데카논, 2-도데카논, 3-도데카논, 4-도데카논, 5-도데카논, 6-도데카논, 2-테트라데카논, 3-테트라데카논, 8-펜타데카논, 10-노나데카논, 7-트리데카논, 2-펜타데카논, 3-헥사데카논, 9-헵타데카논, 11-헨에이코사논, 12-트리코사논, 14-헵타코사논, 16-헨트리아콘타논, 18-펜타트리아콘타논, 4-에톡시-2-부타논, 4-(4-메톡시페닐)-2-부타논, 4-메톡시-4-메틸-2-펜타논, 4-메톡시페닐아세톤, 메톡시아세톤, 페녹시아세톤, 아세토아세트산 메틸, 아세토아세트산 에틸, 아세토아세트산 프로필, 아세토아세트산 부틸, 아세토아세트산 이소부틸, 아세토아세트산 sec-부틸, 아세토아세트산 tert-부틸, 아세토아세트산 3-펜틸, 아세토아세트산 아밀, 아세토아세트산 이소아밀, 아세토아세트산 헥실, 아세토아세트산 헵틸, 아세토아세트산 n-옥틸, 아세토아세트산 벤질, 아세틸숙신산 디메틸, 아세토닐마론산 디메틸, 아세토닐마론산 디에틸, 4-아세틸-5-옥소헥산산 에틸, 아세토아세트산-2-메톡시에틸, 아세토아세트산 알릴, 4-sec-부톡시-2-부타논, 벤질부틸케톤, 비스디메톡시쿠르쿠민, 1,1-디메톡시-3-부타논, 1,3-디아세톡시아세톤, 4-히드록시페닐아세톤, 4-(4-히드록시페닐)-2-부타논, 이소아밀메틸케톤, 4-히드록시-2-부타논, 5-헥센-2-온, 아세토닐아세톤, 3,4-디메톡시페닐아세톤, 피페로닐메틸케톤, 피페로닐아세톤, 프탈이미드아세톤, 4-이소프로폭시-2-부타논, 4-이소부톡시-2-부타논, 아세톡시-2-프로파논, N-아세토아세틸몰포린, 1-아세틸-4-피페리돈 등이 열거된다.In order to obtain the component (b), specific examples of the compound represented by formula (2) used in the reaction with hydroxybenzaldehyde are acetone, 1,3-diphenyl-2-propanone, 2-butanone, 1- Phenyl-1,3-butanedione, 2-pentanone, 3-pentanone, 4-methyl-2-pentanone, 2-hexanone, 3-hexanone, isoamyl methyl ketone, ethyl isobutyl ketone, 4- Methyl-2-hexanone, 1,6-diphenyl-1,6-hexanedione, 2-heptanone, 3-heptanone, 4-heptanone, 2-methyl-4-heptanone, 5-methyl-3 -Heptanone, 6-methyl-2-heptanone, 2,6-dimethyl-4-heptanone, 2-octanone, 3-octanone, 4-octanone, 5-methyl-2-octanone, 2- Nonanon, 3-nonanon, 4-nonanon, 5-nonanon, 2-decanone, 3-decanone, 4-decanone, 5-decanone, 2-undecanone, 3-undecanone, 4- Undecanone, 5-undecanone, 6-undecanone, 2-methyl-4-undecanone, 2-dodecanone, 3-dodecanone, 4-dodecanone, 5-dodecanone, 6-dodecanone, 2-tetra Decanone, 3-tetradecanone, 8-pentadecanone, 10-nonadecanone, 7-trideca , 2-pentadecanone, 3-hexadecanone, 9-heptadecanone, 11-heneicosanone, 12-tricosanone, 14-heptacosanone, 16-gentriacontanone, 18-pentatricontanone , 4-ethoxy-2-butanone, 4- (4-methoxyphenyl) -2-butanone, 4-methoxy-4-methyl-2-pentanone, 4-methoxyphenylacetone, methoxyacetone , Phenoxyacetone, methyl acetoacetic acid, acetoacetic acid ethyl, acetoacetic acid propyl, acetoacetic acid butyl, acetoacetic acid isobutyl, acetoacetic acid sec-butyl, acetoacetic acid tert-butyl, acetoacetic acid 3-pentyl, acetoacetic acid amyl, acetoacetic acid Isoamyl, acetoacetic acid hexyl, acetoacetic acid heptyl, acetoacetic acid n-octyl, acetoacetic acid benzyl, acetylsuccinic acid dimethyl, acetonylmaronic acid dimethyl, acetonylmaronic acid diethyl, 4-acetyl-5-oxohexanoate, aceto 2-methoxyethyl acetate, acetoacetic acid allyl, 4-sec- Methoxy-2-butanone, benzylbutyl ketone, bisdimethoxycurcumin, 1,1-dimethoxy-3-butanone, 1,3-diacetoxyacetone, 4-hydroxyphenylacetone, 4- (4-hydride Hydroxyphenyl) -2-butanone, isoamylmethylketone, 4-hydroxy-2-butanone, 5-hexen-2-one, acetonylacetone, 3,4-dimethoxyphenylacetone, piperonylmethylketone , Piperonyl acetone, phthalimide acetone, 4-isopropoxy-2-butanone, 4-isobutoxy-2-butanone, acetoxy-2-propanone, N-acetoacetylmorpholine, 1-acetyl -4-piperidone and the like.
(b)성분을 얻기 위해서, 히드록시벤즈알데히드류와의 반응에 사용되는 식(3)으로 나타내어지는 화합물의 예로서는 시클로펜타논, 3-페닐시클로펜타논, 1,3-시클로펜탄디온, 시클로헥사논, 3-메틸시클로헥사논, 4-메틸시클로헥사논, 4-에틸시클로헥사논, 4-tert-부틸시클로헥사논, 4-펜틸시클로헥사논, 3-페닐시클로헥사논, 4-페닐시클로헥사논, 3,3-디메틸시클로헥사논, 3,4-디메틸시클로헥사논, 3,5-디메틸시클로헥사논, 4,4-디메틸시클로헥사논, 3,3,5-트리메틸시클로헥사논, 4-시클로헥사논카르복실산 에틸, 1,4-시클로헥산디온모노에틸렌케탈, 비시클로헥산-4,4'-디온모노에틸렌케탈, 1,3-시클로헥산디온, 1,4-시클로헥산디온, 디메돈, 4,4'-비시클로헥사논, 시클로헵타논 등이 열거된다.Examples of the compound represented by formula (3) used in the reaction with hydroxybenzaldehyde in order to obtain the component (b) include cyclopentanone, 3-phenylcyclopentanone, 1,3-cyclopentanedione and cyclohexanone. , 3-methylcyclohexanone, 4-methylcyclohexanone, 4-ethylcyclohexanone, 4-tert-butylcyclohexanone, 4-pentylcyclohexanone, 3-phenylcyclohexanone, 4-phenylcyclohexanone Paddy, 3,3-dimethylcyclohexanone, 3,4-dimethylcyclohexanone, 3,5-dimethylcyclohexanone, 4,4-dimethylcyclohexanone, 3,3,5-trimethylcyclohexanone, 4 -Cyclohexanone carboxylic acid ethyl, 1,4-cyclohexanedione monoethylene ketal, bicyclohexane-4,4'-dione monoethylene ketal, 1,3-cyclohexanedione, 1,4-cyclohexanedione, Dimedone, 4,4'-bicyclohexanone, cycloheptanone, etc. are mentioned.
(b)성분을 얻기 위해서, 히드록시벤즈알데히드류와의 반응에 사용되는 식(4)으로 나타내어지는 화합물의 예로서는 디아세틸, 2,3-펜탄디온, 3,4-헥산디온, 5-메틸-2,3-헥산디온, 2,3-헵탄디온 등이 열거된다.Examples of the compound represented by formula (4) used in the reaction with hydroxybenzaldehyde in order to obtain the component (b) include diacetyl, 2,3-pentanedione, 3,4-hexanedione and 5-methyl-2. , 3-hexanedione, 2,3-heptanedione and the like.
(b)성분을 얻기 위해서, 히드록시벤즈알데히드류와의 반응에 사용되는 식(5)으로 나타내어지는 화합물의 구체예로서는 아세틸아세톤, 디아세토아세트산 에틸, 2,5-헥산디온, 3-메틸-2,4-펜탄디온, 3-에틸-2,4-펜탄디온, 3-부틸-2,4-펜탄디온, 3-페닐-2,4-펜탄디온, 3-부틸-2,4-펜탄디온 등이 열거된다.To obtain the component (b), specific examples of the compound represented by formula (5) used in the reaction with hydroxybenzaldehydes include acetylacetone, diacetoacetic acid ethyl, 2,5-hexanedione, 3-methyl-2, 4-pentanedione, 3-ethyl-2,4-pentanedione, 3-butyl-2,4-pentanedione, 3-phenyl-2,4-pentanedione, 3-butyl-2,4-pentanedione, and the like. Listed.
(b)성분을 얻기 위해서, 식(1)?(5)으로 나타내어지는 화합물의 1종 이상과의 반응에 사용되는 히드록시벤즈알데히드류로서는 예를 들면, o-, m- 및 p-히드록시벤즈알데히드 등이 열거된다. 이들은 1종만을 사용해도, 2종이상을 병용해도 좋다. 이들 중, 에폭시 수지 조성물의 경화물이 특히 높은 열전도성을 나타내기 때문에 p-히드록시벤즈알데히드를 단독으로 사용하는 것이 바람직하다.To obtain the component (b), examples of the hydroxybenzaldehydes used in the reaction with one or more of the compounds represented by the formulas (1) to (5) include, for example, o-, m- and p-hydroxybenzaldehyde. And the like. These may use only 1 type or may use 2 or more types together. Among these, since the hardened | cured material of an epoxy resin composition shows especially high thermal conductivity, it is preferable to use p-hydroxybenzaldehyde independently.
(b)성분은 산성 조건 하 또는 염기성 조건 하, 식(1)?(5)로 나타내어지는 화합물의 1종 이상과 히드록시벤즈알데히드류의 알데히드 축합 반응에 의해 얻어진다.(b) A component is obtained by the aldehyde condensation reaction of 1 or more types of compound represented by Formula (1)-(5), and under acidic conditions or basic conditions, and hydroxybenzaldehyde.
히드록시벤즈알데히드류는 식(1)으로 나타내어지는 화합물 1몰에 대하여 1.0?1.05몰, 식(2)?식(5)으로 나타내어지는 화합물 1몰에 대하여 2.0?3.15몰을 사용하는 것이 각각 바람직하다.As for hydroxybenzaldehyde, it is preferable to use 1.0-1.05 mol with respect to 1 mol of compounds represented by Formula (1), and 2.0-3.15 mol with respect to 1 mol of compounds represented by Formula (2)-Formula (5), respectively. .
산성 조건하에서 알데히드 축합반응을 행하는 경우, 사용할 수 있는 산성 촉매로서는 염산, 황산, 질산과 같은 무기산, 톨루엔술폰산, 크실렌술폰산, 옥살산 등의 유기산이 열거된다. 이들은 단독으로 사용해도 좋고, 복수의 종류를 병용해도 좋다. 산성 촉매의 사용량은 히드록시벤즈알데히드류 1몰에 대하여 0.01?1.0몰, 바람직하게는 0.2?0.5몰이다.When the aldehyde condensation reaction is carried out under acidic conditions, examples of the acidic catalyst that can be used include inorganic acids such as hydrochloric acid, sulfuric acid and nitric acid, organic acids such as toluenesulfonic acid, xylenesulfonic acid and oxalic acid. These may be used independently and may use multiple types together. The usage-amount of an acidic catalyst is 0.01-1.0 mol with respect to 1 mol of hydroxy benzaldehydes, Preferably it is 0.2-0.5 mol.
한편, 염기성 조건하에서 알데히드 축합 반응을 행하는 경우, 사용할 수 있는 염기성 촉매로서는 수산화 나트륨 및 수산화 칼륨 등의 금속 수산화물, 탄산 칼륨 및 탄산 나트륨 등의 탄산 알칼리 금속염, 디에틸아민, 트리에틸아민, 트리부틸아민, 디이소부틸아민, 피리딘 및 피페리딘 등의 아민 유도체, 및 디메틸아미노에틸알콜 및 디에틸아미노에틸알콜 등의 아미노알콜 유도체가 열거된다. 염기성 조건의 경우도 앞에서 열거한 염기성 촉매를 단독으로 사용해도 좋고, 복수의 종류를 병용해도 좋다. 염기성 촉매의 사용량은 히드록시벤즈알데히드류 1몰에 대하여 0.1?2.5몰, 바람직하게는 0.2?2.0몰이다.On the other hand, when performing an aldehyde condensation reaction under basic conditions, as a basic catalyst which can be used, metal hydroxides, such as sodium hydroxide and potassium hydroxide, alkali metal carbonates, such as potassium carbonate and sodium carbonate, diethylamine, triethylamine, tributylamine Amine derivatives such as diisobutylamine, pyridine and piperidine, and amino alcohol derivatives such as dimethylaminoethyl alcohol and diethylaminoethyl alcohol. In the case of basic conditions, the above-mentioned basic catalyst may be used independently, and multiple types may be used together. The usage-amount of a basic catalyst is 0.1-2.5 mol with respect to 1 mol of hydroxy benzaldehydes, Preferably it is 0.2-2.0 mol.
(b)성분을 얻는 반응에서는 필요에 따라서 용제를 사용해도 좋다. 사용할 수 있는 용제로서는 예를 들면, 케톤류와 같이 히드록시벤즈알데히드류와의 반응성을 갖는 것이 아니면 특별히 제한은 없지만, 원료의 히드록시벤즈알데히드류를 용이하게 용해시키는 점에서는 알콜류를 용제로서 사용하는 것이 바람직하다.In reaction which obtains (b) component, you may use a solvent as needed. The solvent that can be used is not particularly limited as long as it has a reactivity with hydroxybenzaldehyde, such as ketones. However, alcohol is preferably used as a solvent in view of easily dissolving hydroxybenzaldehyde of a raw material. .
반응 온도는 통상 10?90℃이고, 바람직하게는 35?70℃이다. 반응 시간은 통상 0.5?10시간이지만, 원료 화합물의 종류에 의해 반응성에 차가 있기 때문에 이것으로만 한정되지 않는다. 반응 종료 후, 수지로서 인출하는 경우에는 반응물을 수세 후 또는 수세 없이 가열 감압 하에서 반응액으로부터 미반응물이나 용매 등을 제거한다. 결정으로 인출하는 경우, 대량의 수중에 반응액을 적하함으로써 결정을 석출시킨다. 염기성 조건에서 반응을 행한 경우에는 생성된 (b)성분이 수중에 용해되는 경우도 있을 수 있으므로, 염산을 가하는 등해서 중성?산성 조건으로 하여 결정으로서 석출시킨다.The reaction temperature is usually 10 to 90 ° C, preferably 35 to 70 ° C. Although reaction time is 0.5 to 10 hours normally, since there is a difference in reactivity by the kind of raw material compound, it is not limited only to this. When the reaction product is taken out as a resin after completion of the reaction, unreacted substances, solvents, and the like are removed from the reaction liquid under reduced pressure after washing with water or without washing with water. In the case of withdrawing the crystal, the crystal is precipitated by dropping the reaction liquid into a large amount of water. When the reaction is carried out under basic conditions, the resulting component (b) may be dissolved in water. Thus, hydrochloric acid is added to precipitate as a crystal under neutral and acidic conditions.
다음에 본 발명의 에폭시 수지 조성물이 에폭시 수지로서 함유하는 (a)성분 에 관하여 설명한다.Next, the (a) component which the epoxy resin composition of this invention contains as an epoxy resin is demonstrated.
본 발명의 에폭시 수지 조성물이 함유하는 (a)성분은 상기 방법에 의해 얻어진 (b)성분과 에피할로히드린을 반응시켜 에폭시화함으로써 얻어진다. 또한, 에폭시화 시에는 (b)성분을 1종류만 사용해도, 2종 이상을 병용해도 좋다. 또한, (b)성분에 (b)성분 이외의 페놀 화합물을 병용해도 좋다.(A) component which the epoxy resin composition of this invention contains is obtained by making the (b) component obtained by the said method, and epihalohydrin react and epoxidize. In addition, at the time of epoxidation, you may use only one type of (b) component, or may use 2 or more types together. Moreover, you may use together phenolic compounds other than (b) component to (b) component.
병용할 수 있는 (b)성분 이외의 페놀 화합물로서는 에폭시 수지의 원료로서 통상 사용되는 페놀 화합물이면 특별히 제한없이 사용할 수 있지만, 경화물이 높은 열전도율을 갖는다고 하는 본 발명의 효과가 손상될 우려가 있으므로 병용할 수 있는 페놀 화합물의 사용량은 매우 적은 것이 바람직하고, (b)성분만을 사용하는 것이 특히 바람직하다.As a phenolic compound other than (b) component which can be used together, if it is a phenolic compound normally used as a raw material of an epoxy resin, it can use without a restriction | limiting, but since the effect of this invention that hardened | cured material has high thermal conductivity may be impaired. It is preferable that the usage-amount of the phenol compound which can be used together is very small, and it is especially preferable to use only (b) component.
(a)성분으로서는 특히 높은 열전도율 갖는 경화물이 얻어지기 때문에 히드록시 벤즈알데히드류와 식(3)으로 나타내어지는 화합물의 반응에 의해 얻어진 (b)성분을 이용하여 얻어지는 에폭시화물이 바람직하다.Especially as the (a) component, since the hardened | cured material which has high thermal conductivity is obtained, the epoxide obtained by using (b) component obtained by reaction of hydroxy benzaldehyde and the compound represented by Formula (3) is preferable.
(a)성분을 얻는 반응에 있어서, 에피할로히드린으로서는 에피클로로히드린, α-메틸에피클로로히드린, β-메틸에피클로로히드린, 에피브로모히드린 등을 사용할 수 있지만, 공업적으로 입수가 용이한 에피클로로히드린이 바람직하다. 에피할로히드린의 사용량은 (b)성분의 수산기 1몰에 대하여 통상 2?20몰, 바람직하게는 4?15몰이다.In the reaction for obtaining the component (a), epichlorohydrin, α-methyl epichlorohydrin, β-methyl epichlorohydrin, epibromohydrin and the like can be used as epihalohydrin. Epichlorohydrin is readily available. The usage-amount of epihalohydrin is 2-20 mol normally with respect to 1 mol of hydroxyl groups of (b) component, Preferably it is 4-15 mol.
에폭시화 반응에 사용할 수 있는 알칼리 금속 수산화물로서는 수산화 나트륨, 수산화 칼륨 등이 열거되고, 이들은 고형물을 그대로 사용해도, 또는 그 수용액을 사용해도 좋다. 수용액을 사용하는 경우에는 상기 알칼리 금속 수산화물의 수용액을 연속적으로 반응계내에 첨가함과 아울러, 감압 상태 또는 상압 상태에서 연속적으로 유출시킨 물 및 에피할로히드린의 혼합액으로부터 분액에 의해 물을 제거하고, 에피할로히드린만을 반응계내에 연속적으로 복귀시키는 방법이어도 좋다. 알칼리 금속 수산화물의 사용량은 (b)성분의 수산기 1몰에 대하여 통상 0.9?3.0몰, 바람직하게는 1.0?2.5몰, 보다 바람직하게는 1.1?2.0몰이다.Examples of alkali metal hydroxides that can be used for the epoxidation reaction include sodium hydroxide and potassium hydroxide, and these may use solids as they are or may use an aqueous solution thereof. In the case of using an aqueous solution, an aqueous solution of the alkali metal hydroxide is continuously added to the reaction system, and water is separated from the mixed solution of water and epihalohydrin continuously discharged under reduced pressure or normal pressure, The method of returning only epihalohydrin only in a reaction system may be sufficient. The use amount of alkali metal hydroxide is 0.9-3.0 mol normally with respect to 1 mol of hydroxyl groups of (b) component, Preferably it is 1.0-2.5 mol, More preferably, it is 1.1-2.0 mol.
에폭시화 반응을 촉진하기 위해서, 테트라메틸암모늄클로라이드, 테트라메틸암모늄브로마이드, 트리메틸벤질암모늄클로라이드 등의 4급 암모늄염을 촉매로서 첨가하는 것이 바람직하다. 4급 암모늄염의 사용량으로서는 (b)성분의 수산기 1몰에 대하여 통상 0.1?15g이고, 바람직하게는 0.2?10g이다.In order to promote the epoxidation reaction, it is preferable to add quaternary ammonium salts such as tetramethylammonium chloride, tetramethylammonium bromide, trimethylbenzylammonium chloride as a catalyst. As the usage-amount of a quaternary ammonium salt, it is 0.1-15 g normally with respect to 1 mol of hydroxyl groups of (b) component, Preferably it is 0.2-10 g.
또한, 에폭시화 시에 메탄올, 에탄올, 이소프로필알콜 등의 알콜류, 디메틸술폰, 디메틸술폭시드, 테트라히드로푸란, 디옥산 등의 비프로톤성 극성 용매 등을 첨가해서 반응을 행하는 것이 반응 진행상 바람직하다.In addition, it is preferable in the progress of reaction to carry out reaction by adding alcohols, such as methanol, ethanol, and isopropyl alcohol, an aprotic polar solvent, such as dimethyl sulfone, dimethyl sulfoxide, tetrahydrofuran, dioxane, etc. at the time of epoxidation.
상기 알콜류를 사용하는 경우, 그 사용량은 에피할로히드린의 사용량에 대하여 통상 2?50질량%, 바람직하게는 4?20질량%이다. 또한, 비프로톤성 극성 용매를 사용하는 경우에는 에피할로히드린의 사용량에 대하여 통상 5?100질량%, 바람직하게는 10?80질량%이다.When using the said alcohol, the usage-amount is 2-50 mass% normally with respect to the usage-amount of epihalohydrin, Preferably it is 4-20 mass%. In addition, when using an aprotic polar solvent, it is 5-100 mass% normally with respect to the usage-amount of epihalohydrin, Preferably it is 10-80 mass%.
반응 온도는 통상 30?90℃이고, 바람직하게는 35?80℃이다. 반응 시간은 통상 0.5?10시간이고, 바람직하게는 1?8시간이다.The reaction temperature is usually 30 to 90 ° C, preferably 35 to 80 ° C. The reaction time is usually 0.5 to 10 hours, preferably 1 to 8 hours.
반응 종료 후, 반응물을 수세 후 또는 수세 없이 가열 감압 하에서 반응 액으로부터 에피할로히드린이나 용매 등을 제거한다. 또한 (a)성분 중에 포함되는 가수분해성 할로겐의 양을 더욱 저감시키기 위해서, 회수한 (a)성분을 톨루엔, 메틸이소부틸케톤 등의 용제에 용해하고, 수산화 나트륨, 수산화 칼륨 등의 알칼리 금속 수산화물의 수용액을 가해서 반응을 행해도 좋다. 이러한 조작을 행함으로써 폐환(閉環)을 확실한 것으로 할 수 있다. 이 경우, 알칼리 금속 수산화물의 사용량은 (b) 성분의 수산기 1몰에 대하여 통상 0.01?0.3몰, 바람직하게는 0.05?0.2몰이다. 반응 온도는 통상 50?120℃, 반응 시간은 통상 0.5?2시간이다.After completion of the reaction, the reaction product is removed from the reaction solution under reduced pressure by heating with or without washing with water. Furthermore, in order to further reduce the amount of hydrolyzable halogen contained in (a) component, collect | recovered (a) component is melt | dissolved in solvents, such as toluene and methyl isobutyl ketone, and alkali metal hydroxides, such as sodium hydroxide and potassium hydroxide, are carried out. You may react by adding aqueous solution. By performing such an operation, the closing ring can be assured. In this case, the usage-amount of alkali metal hydroxide is 0.01-0.3 mol normally with respect to 1 mol of hydroxyl groups of (b) component, Preferably it is 0.05-0.2 mol. Reaction temperature is 50-120 degreeC normally, and reaction time is 0.5 to 2 hours normally.
반응 종료 후, 생성한 염을 여과, 수세 등에 의해 제거하고, 가열 감압 하에서 용제를 더욱 증류 제거함으로써 (a)성분이 얻어진다. 또한, (a)성분이 결정으로서 석출하는 경우에는 대량의 물에 생성한 염을 용해한 후에, (a)성분의 결정을 여과 수집해도 좋다.After completion | finish of reaction, the produced | generated salt is removed by filtration, water washing, etc., and (a) component is obtained by further distilling a solvent off under heating pressure reduction. In addition, when (a) component precipitates as a crystal | crystallization, after melt | dissolving the salt produced | generated in a large amount of water, you may collect and collect the crystal | crystallization of (a) component.
이하, 본 발명의 에폭시 수지 조성물에 대해서 기재한다.Hereinafter, it describes about the epoxy resin composition of this invention.
본 발명의 에폭시 수지 조성물은 에폭시 수지와 경화제와 열전도율 20W/m?K이상의 무기 충전재를 포함하고, 에폭시 수지로서의 (a)성분 및 경화제로서의 (b)성분의 적어도 어느 1개를 필수 성분으로서 더 함유한다.The epoxy resin composition of this invention contains an epoxy resin, a hardening | curing agent, and inorganic filler of 20 W / m * K or more of heat conductivity, and also contains at least any one of (a) component as an epoxy resin and (b) component as a hardening | curing agent as an essential component. do.
본 발명의 에폭시 수지 조성물에 있어서, 에폭시 수지인 (a)성분은 단독으로 또는 다른 에폭시 수지(이하, 「(a')성분」이라고 한다)와 병용해서 사용할 수 있다.In the epoxy resin composition of this invention, (a) component which is an epoxy resin can be used individually or in combination with another epoxy resin (henceforth "a component").
(a')성분의 구체예로서는 비스페놀류(비스페놀 A, 비스페놀 F, 비스페놀 S, 비페놀, 비스페놀 AD 및 비스페놀 I 등)나 페놀류(페놀, 알킬 치환 페놀, 방향족 치환 페놀, 나프톨, 알킬 치환 나프톨, 디히드록시벤젠, 알킬 치환 디히드록시벤젠 및 디히드록시나프탈렌 등)와 각종 알데히드(포름알데히드, 아세트알데히드, 알킬알데히드, 벤즈알데히드, 알킬 치환 벤즈알데히드, 히드록시벤즈알데히드, 나프토 알데히드, 글루타르알데히드, 프탈알데히드, 크로톤알데히드 및 신남알데히드 등)의 중축합물, 크실렌 등의 방향족 화합물과 포름알데히드의 중축합물과 페놀류의 중축합물, 페놀류와 각종 디엔 화합물(디시클로펜타디엔, 테르펜류, 비닐시클로헥센, 노르보르나디엔, 비닐노르보르넨, 테트라히드로인덴, 디비닐벤젠, 디비닐비페닐, 디이소프로페닐비페닐, 부타디엔 및 이소프렌 등)의 중축합물, 페놀류와 케톤류 (아세톤, 메틸에틸케톤, 메틸이소부틸케톤, 아세토페논 및 벤조페논 등)의 중축합물, 페놀류와 방향족 디메탄올류(벤젠디메탄올 및 비페닐디메탄올 등)의 중축합물, 페놀류와 방향족 디클로로메틸류(α,α'-디클로로크실렌 및 비스클로로메틸비페닐 등)의 중축합물, 페놀류와 방향족 비스알콕시메틸류(비스메톡시메틸벤젠, 비스메톡시메틸비페닐 및 비스페녹시메틸비페닐 등)의 중축합물, 비스페놀류와 각종 알데히드의 중축합물, 및 알콜류 등을 글리시딜화한 글리시딜에테르계 에폭시 수지, 지환식 에폭시 수지, 글리시딜아민계 에폭시 수지, 글리시딜에스테르계 에폭시 수지 등이 열거되지만, 통상 사용되는 에폭시 수지이면 이들에 한정되는 것은 아니다. 이들은 1종류만 사용해도, 2종 이상을 병용해도 좋다.Specific examples of the component (a ') include bisphenols (bisphenol A, bisphenol F, bisphenol S, biphenol, bisphenol AD, bisphenol I, etc.) and phenols (phenol, alkyl substituted phenol, aromatic substituted phenol, naphthol, alkyl substituted naphthol, di Hydroxybenzene, alkyl substituted dihydroxybenzene, dihydroxynaphthalene, etc.) and various aldehydes (formaldehyde, acetaldehyde, alkylaldehyde, benzaldehyde, alkyl substituted benzaldehyde, hydroxybenzaldehyde, naphthoaldehyde, glutaraldehyde, phthalaldehyde , Polycondensates of crotonaldehyde and cinnamic aldehyde), aromatic compounds such as xylene, polycondensates of formaldehyde and phenols, phenols and various diene compounds (dicyclopentadiene, terpenes, vinylcyclohexene, norbornenadi N, vinylnorbornene, tetrahydroindene, divinylbenzene, divinylbiphenyl, diisopropenylbipe , Polycondensates of butadiene and isoprene), polycondensates of phenols and ketones (such as acetone, methyl ethyl ketone, methyl isobutyl ketone, acetophenone and benzophenone), phenols and aromatic dimethanols (benzenedimethanol and biphenyldiphenyl) Polycondensates of methanol, etc., polycondensates of phenols and aromatic dichloromethyls (such as α, α'-dichloroxylene and bischloromethylbiphenyl), phenols and aromatic bisalkoxymethyls (bismethoxymethylbenzene, bismethoxy Glycidyl ether epoxy resins glycidylated with polycondensates of methyl biphenyl and bisphenoxymethyl biphenyl, bisphenols and various aldehydes, and alcohols, alicyclic epoxy resins and glycidyls Although an amine epoxy resin, glycidyl ester epoxy resin, etc. are mentioned, It is not limited to these if it is an epoxy resin normally used. These may use only one type or may use 2 or more types together.
(a')성분을 병용하는 경우, 본 발명의 에폭시 수지 조성물 중의 전체 에폭시 수지 성분에 차지하는 (a)성분의 비율은 30질량%이상이 바람직하고, 40질량%이상이 보다 바람직하고, 70질량%이상이 더욱 바람직하고, 특히 바람직하게는 100질량%((a')성분을 병용하지 않을 경우)이다. 단, (a)성분을 에폭시 수지 조성물의 개질제로서 사용하는 경우에는 전체 에폭시 수지 중에서 1?30질량%가 되는 비율로 첨가한다.When using together (a ') component, 30 mass% or more is preferable, as for the ratio of (a) component to all the epoxy resin components in the epoxy resin composition of this invention, 40 mass% or more is more preferable, 70 mass% The above is more preferable, Especially preferably, it is 100 mass% (when not using (a ') component together). However, when using (a) component as a modifier of an epoxy resin composition, it adds in the ratio used as 1-30 mass% in all the epoxy resins.
본 발명의 에폭시 수지 조성물에 있어서, 경화제인 (b)성분은 단독으로 또는 다른 경화제와 병용해서 사용할 수 있다.In the epoxy resin composition of this invention, (b) component which is a hardening | curing agent can be used individually or in combination with another hardening | curing agent.
본 발명의 에폭시 수지 조성물이 함유하는 다른 경화제(이하, 「(b')성분」이라고 한다)로서는 예를 들면, 아민계 화합물, 산무수물계 화합물, 아미드계 화합물 및 페놀계 화합물 등이 열거된다. 이들 (b')성분의 구체예를 하기 (a)?(e)에 나타낸다.As another hardening | curing agent (henceforth "(b ') component") which the epoxy resin composition of this invention contains, an amine type compound, an acid anhydride type compound, an amide type compound, a phenol type compound, etc. are mentioned, for example. Specific examples of these (b ') components are shown in the following (a) to (e).
(a)아민계 화합물(a) Amine compound
디아미노디페닐메탄, 디에틸렌트리아민, 트리에틸렌테트라민, 디아미노디페닐술폰, 이소포론디아민 및 나프탈렌디아민 등Diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine and naphthalenediamine, etc.
(b)산무수물계 화합물(b) acid anhydride compounds
무수 프탈산, 무수 트리멜리트산, 무수 피로멜리트산, 무수 말레산, 테트라히드로무수 프탈산, 메틸테트라히드로 무수 프탈산, 무수 메틸나직산, 헥사히드로무수 프탈산 및 메틸헥사히드로 무수 프탈산 등Phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydro phthalic anhydride, methyltetrahydro phthalic anhydride, methylnasic acid anhydride, hexahydro phthalic anhydride and methylhexahydro phthalic anhydride, etc.
(c)아미드계 화합물(c) Amide Compound
디시안디아미드 또는 리놀렌산의 2량체와 에틸렌디아민으로부터 합성되는 폴리아미드 수지 등Polyamide resins synthesized from dimers of dicyandiamide or linolenic acid and ethylenediamine
(d)페놀계 화합물(d) phenolic compounds
다가 페놀류(비스페놀 A, 비스페놀 F, 비스페놀 S, 플루오렌비스페놀, 테르펜디페놀, 4,4'-디히드록시비페닐, 2,2'-디히드록시비페닐, 3,3',5,5'-테트라메틸-(1,1'-비페닐)-4,4'-디올, 하이드로퀴논, 레조르신, 나프탈렌디올, 트리스-(4-히드록시페닐)메탄 및 1,1,2,2-테트라키스(4-히드록시페닐)에탄 등); 페놀류(예를 들면 페놀, 알킬 치환 페놀, 나프톨, 알킬 치환 나프톨, 디히드록시벤젠 및 디히드록시나프탈렌 등)와 알데히드류(포름알데히드, 아세트알데히드, 벤즈알데히드, p-히드록시벤즈알데히드, o-히드록시벤즈알데히드 및 푸르푸랄 등), 케톤류(p-히드록시 아세토페논 및 o-히드록시아세토페논 등), 또는 디엔류(디시클로펜타디엔 및 트리시클로펜타디엔 등)의 축합에 의해 얻어지는 페놀 수지; 상기 페놀류와 치환 비페닐류(4,4'-비스(클로로메틸)-1,1'-비페닐 및 4,4'-비스(메톡시메틸)-1,1'-비페닐 등) 또는 치환 페닐류(1,4-비스(클로로메틸)벤젠, 1,4-비스(메톡시메틸)벤젠 및 1,4-비스(히드록시메틸)벤젠 등) 등과의 중축합에 의해 얻어지는 페놀 수지; 상기 페놀류 및/또는 상기 페놀 수지의 변성물; 테트라브로모비스페놀 A 및 브롬화 페놀 수지 등의 할로겐화 페놀류Polyhydric phenols (bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, terpenediphenol, 4,4'- dihydroxy biphenyl, 2,2'- dihydroxy biphenyl, 3,3 ', 5,5 '-Tetramethyl- (1,1'-biphenyl) -4,4'-diol, hydroquinone, resorcin, naphthalenediol, tris- (4-hydroxyphenyl) methane and 1,1,2,2- Tetrakis (4-hydroxyphenyl) ethane and the like); Phenols (e.g. phenol, alkyl substituted phenol, naphthol, alkyl substituted naphthol, dihydroxybenzene and dihydroxynaphthalene, etc.) and aldehydes (formaldehyde, acetaldehyde, benzaldehyde, p-hydroxybenzaldehyde, o-hydroxy Phenol resins obtained by condensation of benzaldehyde, furfural and the like), ketones (such as p-hydroxy acetophenone and o-hydroxyacetophenone, and the like) or dienes (such as dicyclopentadiene and tricyclopentadiene); The phenols and substituted biphenyls (4,4'-bis (chloromethyl) -1,1'-biphenyl and 4,4'-bis (methoxymethyl) -1,1'-biphenyl, etc.) or substituted Phenolic resin obtained by polycondensation with phenyl (1, 4-bis (chloromethyl) benzene, 1, 4-bis (methoxymethyl) benzene, 1, 4-bis (hydroxymethyl) benzene, etc.); Modified products of the phenols and / or the phenol resins; Halogenated phenols such as tetrabromobisphenol A and brominated phenol resins
(e)기타 이미다졸류, BF3-아민착체, 구아니딘 유도체(e) other imidazoles, BF 3 -amine complexes, guanidine derivatives
이들 (b') 성분 중에서는 디아미노디페닐메탄, 디아미노디페닐술폰 및 나프탈렌디아민 등의 아민계 화합물, 및 카테콜과 알데히드류, 케톤류, 디엔류, 치환 비페닐류 또는 치환 페닐류와의 축합물 등이 바람직하다. 이들 성분이 활성 수소기끼리가 인접하고 있는 구조를 갖기 때문이고, 이것에 의해 에폭시 수지가 양호하게 배열된다. 예를 들면, 카테콜과의 축합물의 경우, 열경화에 의해 반응하는 수산기가 서로 오르토 위치에 있기 때문에 병렬적으로 늘어서도록 중합한다. 한편, 아민에서는 열경화 시에 반응하는 수소기가 질소 원자를 통하여 병렬적으로 늘어서 있으므로, 그 경우도 병렬적으로 늘어서도록 중합한다.Among these (b ') components, amine compounds such as diaminodiphenylmethane, diaminodiphenylsulfone and naphthalenediamine, and catechols with aldehydes, ketones, dienes, substituted biphenyls or substituted phenyls Condensates and the like are preferred. This is because these components have a structure in which active hydrogen groups are adjacent to each other, whereby an epoxy resin is favorably arranged. For example, in the case of a condensate with catechol, since the hydroxyl groups reacted by thermosetting are in the ortho position, they are polymerized so as to be parallel to each other. On the other hand, in an amine, since the hydrogen groups reacting at the time of thermosetting are lined up in parallel via a nitrogen atom, it superposes | polymerizes also in parallel.
(b')성분은 단독으로 사용해도 좋고, 복수를 병용해도 좋다.(b ') A component may be used independently and may use multiple together.
(b')성분을 병용하는 경우, 본 발명의 에폭시 수지 조성물 중의 전체 경화제 성분에 차지하는 (b)성분의 비율은 20질량%이상이 바람직하고, 30질량%이상이 보다 바람직하고, 70질량%이상이 더욱 바람직하고, 특히 바람직하게는 100질량%((b')성분을 병용하지 않을 경우)이다.When using together (b ') a component, 20 mass% or more is preferable, as for the ratio of (b) component to all the hardening | curing agent components in the epoxy resin composition of this invention, 30 mass% or more is more preferable, 70 mass% or more More preferably, it is 100 mass% (when not using a component (b ') together) more preferably.
본 발명의 에폭시 수지 조성물에 있어서, (b)성분을 포함하는 전체 경화제의 사용량은 전체 에폭시 수지의 에폭시기 1당량에 대하여 0.5?2.0당량이 바람직하고, 0.6?1.5당량이 특히 바람직하다.In the epoxy resin composition of this invention, 0.5-2.0 equivalent is preferable with respect to 1 equivalent of epoxy groups of all the epoxy resins, and, as for the usage-amount of all the hardening | curing agents containing (b) component, 0.6-1.5 equivalent is especially preferable.
본 발명의 에폭시 수지 조성물로서는 에폭시 수지로서 (a)성분을 100질량% 사용하고, 경화제로서 (b)성분을 100질량% 사용하는 경우가 가장 바람직하다.As the epoxy resin composition of this invention, the case where 100 mass% of (a) component is used as an epoxy resin and 100 mass% of (b) component is used as a hardening agent is the most preferable.
본 발명의 에폭시 수지 조성물이 함유하는 무기 충전재는 에폭시 수지 조성물의 경화물에 보다 높은 열전도율을 부여할 목적으로 가해지는 것이고, 무기 충전재 자체의 열전도율이 지나치게 낮을 경우에는 에폭시 수지와 경화제의 조합에 의해 얻어진 고열전도율이 손상될 우려가 있다. 따라서, 본 발명의 에폭시 수지 조성물이 함유하는 무기 충전재로서는 열전도율이 높을수록 바람직하고, 통상 20W/m?K이상, 바람직하게는 30W/m?K이상, 보다 바람직하게는 50W/m?K이상의 열전도율을 갖는 것이면 하등 제한은 없다. 또한, 여기서 말하는 열전도율이란 ASTM E1530에 근거한 방법으로 측정한 값이다. 이러한 특성을 갖는 무기 충전재의 구체예로서는 질화 붕소, 질화 알루미늄, 질화 규소, 탄화 규소, 질화 티탄, 산화 아연, 탄화텅스텐, 알루미나, 산화마그네슘 등의 무기 분말 충전재, 합성 섬유, 세라믹스 섬유 등의 섬유질 충전재, 착색제 등이 열거된다. 이들 무기 충전재의 형상은 분말(덩어리상, 구상), 단섬유, 장섬유 등 어떠한 것이라도 좋지만, 특히, 평판상의 것이면 무기 충전재 자신의 적층 효과에 의해 경화물의 열전도성이 보다 높아지고, 경화물의 방열성이 더욱 향상하므로 바람직하다.The inorganic filler contained in the epoxy resin composition of the present invention is applied for the purpose of imparting higher thermal conductivity to the cured product of the epoxy resin composition, and when the thermal conductivity of the inorganic filler itself is too low, it is obtained by the combination of the epoxy resin and the curing agent. High thermal conductivity may be impaired. Therefore, as an inorganic filler which the epoxy resin composition of this invention contains, it is so preferable that thermal conductivity is high, and it is 20W / m * K or more normally, Preferably it is 30W / m * K or more, More preferably, it is 50W / m * K or more There is no restriction as long as In addition, the thermal conductivity here is the value measured by the method based on ASTME1530. Specific examples of the inorganic filler having such characteristics include inorganic fillers such as boron nitride, aluminum nitride, silicon nitride, silicon carbide, titanium nitride, zinc oxide, tungsten carbide, alumina, magnesium oxide, fibrous fillers such as synthetic fibers, ceramic fibers, Colorants and the like. The inorganic filler may be in the form of powder (lump shape, spherical shape), short fibers, or long fibers, but in particular, in the case of a flat plate, the thermal conductivity of the cured product becomes higher due to the lamination effect of the inorganic filler itself, It is preferable because it further improves.
본 발명의 에폭시 수지 조성물에 있어서의 무기 충전재의 사용량은 에폭시 수지 조성물 중의 수지 성분 100질량부에 대하여 통상 2?1000질량부, 바람직하게는 400?1000질량부이지만, 열전도율을 될 수 있는 한 높이기 위해서는 본 발명의 에폭시 수지 조성물의 구체적인 용도에 있어서의 취급 등에 지장을 초래하지 않는 범위에서, 가능한 한 무기 충전재의 사용량을 늘리는 것이 바람직하다. 이들 무기 충전재는 1종만을 사용해도, 2종류 이상을 병용해도 좋다.Although the usage-amount of the inorganic filler in the epoxy resin composition of this invention is 2-100 mass parts normally with respect to 100 mass parts of resin components in an epoxy resin composition, Preferably it is 400-1000 mass parts, but in order to make thermal conductivity as high as possible It is preferable to increase the usage-amount of an inorganic filler as much as possible in the range which does not interfere with the handling etc. in the specific use of the epoxy resin composition of this invention. These inorganic fillers may use only 1 type, or may use two or more types together.
또한, 충전재 전체로서의 열전도율을 20W/m?K이상으로 유지할 수 있는 범위이면, 열전도율이 20W/m?K이상인 무기 충전재에 열전도율이 20W/m?K이하인 충전재를 병용해도 상관없지만, 될 수 있는 한 열전도율이 높은 경화물을 얻는다고 하는 것이 본 발명의 목적기 때문에 열전도율이 20W/m?K이하인 충전재의 사용은 최소한으로 해야 한다. 병용할 수 있는 충전재의 종류나 형상에 특별히 제한은 없다.In addition, as long as the thermal conductivity of the filler as a whole can be maintained at 20 W / m-K or more, an inorganic filler having a thermal conductivity of 20 W / m-K or more may be used in combination with a filler having a thermal conductivity of 20 W / m-K or less. Since it is an object of the present invention to obtain a cured product having high thermal conductivity, use of a filler having a thermal conductivity of 20 W / m · K or less should be minimized. There is no restriction | limiting in particular in the kind and shape of the filler which can be used together.
본 발명의 에폭시 수지 조성물을 반도체 밀봉 용도에 사용하는 경우 및 프리프레그 용도에 사용하는 경우에는 경화물의 내열성, 내습성, 역학적 성질 등의 점으로부터, 에폭시 수지 조성물 중에 있어서 60?93질량%를 차지하는 비율로 열전도율이 20W/m?K이상인 무기 충전재를 사용하는 것이 바람직하다. 이 경우, 잔부는 에폭시 수지 성분, 경화제 성분 및 기타 필요에 따라서 첨가되는 첨가제이며, 첨가제로서는 병용할 수 있는 다른 무기 충전재나 후술하는 경화 촉진제 등이다.When using the epoxy resin composition of this invention for a semiconductor sealing use, and when using it for a prepreg use, the ratio which occupies 60-93 mass% in an epoxy resin composition from the points of heat resistance, moisture resistance, and mechanical properties of hardened | cured material. It is preferable to use an inorganic filler having a thermal conductivity of 20 W / m · K or more. In this case, remainder is an additive added according to an epoxy resin component, a hardening | curing agent component, and other necessities, As an additive, it is another inorganic filler which can be used together, a hardening accelerator mentioned later, etc.
본 발명의 에폭시 수지 조성물은 에폭시 수지로서의 (a)성분 및 경화제로서의 (b)성분 중 적어도 어느 1개를 필수 성분으로서 함유하고 있으면 되고, 상기에서 설명한 실시형태 이외에, 에폭시 수지(특별하게 한정되지 않지만, 예를 들면 상기 (a')성분이 바람직하다)와 (b)성분과 (c)성분을 포함하는 조성물 또는 (a)성분과 경화제(특별하게 한정되지 않지만, 예를 들면 상기 (b')성분이 바람직하다)와 (c)성분을 포함하는 조성물이어도, 그 경화물은 (a)성분과 (b)성분과 (c)성분을 포함하는 조성물과 동일하게 뛰어난 열전도성을 갖는다.The epoxy resin composition of this invention should just contain at least one of (a) component as an epoxy resin, and (b) component as a hardening | curing agent as an essential component, and epoxy resin (it does not specifically limit in addition to embodiment mentioned above), For example, the composition containing the said (a ') component is preferable), (b) component, and (c) component, or (a) component and hardening | curing agent (It is not specifically limited, For example, said (b'). Even if it is a composition containing a component) and (c) component, the hardened | cured material has the outstanding thermal conductivity similarly to the composition containing (a) component, (b) component, and (c) component.
본 발명의 에폭시 수지 조성물에는 경화촉진제를 함유시킬 수도 있다. 사용할 수 있는 경화 촉진제로서는 예를 들면, 2-메틸이미다졸, 2-에틸이미다졸, 2-페닐이미다졸 및 2-에틸-4-메틸이미다졸 등의 이미다졸류, 2-(디메틸아미노메틸)페놀, 트리에틸렌디아민, 트리에탄올아민 및 1,8-디아자비시클로(5,4,0)운데센-7 등의 제3급 아민류, 트리페닐포스핀, 디페닐포스핀 및 트리부틸포스핀 등의 유기 포스핀류, 옥틸산 주석 등의 금속 화합물, 테트라페닐포스포늄?테트라페닐보레이트 및 테트라페닐포스포늄?에틸트리페닐보레이트 등의 테트라 치환 포스포늄?테트라 치환 보레이트, 2-에틸-4-메틸이미다졸?테트라페닐보레이트 및 N-메틸모르포린?테트라페닐보레이트 등의 테트라페닐보론염 등이 열거된다. 경화 촉진제는 에폭시 수지 100질량부에 대하여 0.01?15질량부가 필요에 따라서 사용된다.The epoxy resin composition of this invention can also contain a hardening accelerator. As a curing accelerator which can be used, for example, imidazoles, such as 2-methylimidazole, 2-ethylimidazole, 2-phenylimidazole, and 2-ethyl-4-methylimidazole, 2- ( Tertiary amines such as dimethylaminomethyl) phenol, triethylenediamine, triethanolamine and 1,8-diazabicyclo (5,4,0) undecene-7, triphenylphosphine, diphenylphosphine and tributyl Organic phosphines such as phosphine, metal compounds such as octylic acid tin, tetra substituted phosphonium tetra substituted borates such as tetraphenylphosphonium tetraphenylborate and tetraphenylphosphonium ethyltriphenylborate, 2-ethyl-4 Tetraphenyl boron salts, such as -methylimidazole tetraphenyl borate and N-methylmorpholine tetraphenyl borate, etc. are mentioned. A hardening accelerator is used as needed for 0.01-15 mass parts with respect to 100 mass parts of epoxy resins.
본 발명의 에폭시 수지 조성물에는 필요에 따라서 실란 커플링제, 이형제 및 안료 등 각종 배합제, 각종 열경화성 수지 및 각종 열가소성 수지 등을 첨가할 수 있다. 열경화성 수지 및 열가소성 수지의 구체예로서는 비닐에스테르 수지, 불포화 폴리에스테르 수지, 말레이미드 수지, 시아네이트 수지, 이소시아네이트 화합물, 벤조옥사진 화합물, 비닐벤질에테르 화합물, 폴리부타디엔 및 이 변성물, 아크릴로니트릴 공중합체의 변성물, 인덴 수지, 불소 수지, 실리콘 수지, 폴리에테르 이미드, 폴리에테르술폰, 폴리페닐렌에테르, 폴리아세탈, 폴리스티렌, 폴리에틸렌, 디시클로펜타디엔 수지 등이 열거된다. 열경화성 수지 또는 열가소성 수지는 본 발명의 에폭시 수지 조성물 중에 있어서 60질량% 이하를 차지하는 양이 사용된다.Various compounding agents, such as a silane coupling agent, a mold release agent, and a pigment, various thermosetting resins, various thermoplastic resins, etc. can be added to the epoxy resin composition of this invention as needed. Specific examples of the thermosetting resin and the thermoplastic resin include vinyl ester resins, unsaturated polyester resins, maleimide resins, cyanate resins, isocyanate compounds, benzoxazine compounds, vinyl benzyl ether compounds, polybutadienes and modified substances thereof, and acrylonitrile copolymers. Modified compounds, indene resins, fluorine resins, silicone resins, polyether imides, polyether sulfones, polyphenylene ethers, polyacetals, polystyrenes, polyethylene, dicyclopentadiene resins, and the like. The amount which occupies 60 mass% or less in the epoxy resin composition of this invention is used for a thermosetting resin or a thermoplastic resin.
본 발명의 에폭시 수지 조성물은 상기 각 성분을 균일하게 혼합함으로써 얻어지고, 그 바람직한 용도로서는 반도체 밀봉재나 프린트 배선판 등이 열거된다.The epoxy resin composition of this invention is obtained by mixing each said component uniformly, As a preferable use, a semiconductor sealing material, a printed wiring board, etc. are mentioned.
본 발명의 에폭시 수지 조성물은 종래 알려져 있는 것과 동일한 방법으로 용이하게 그 경화물로 할 수 있다. 본 발명의 경화물의 형성은 예를 들면, 에폭시 수지, 경화제 및 열전도율이 20W/m?K이상인 무기 충전재, 및 필요에 의해 경화 촉진제, 배합제, 각종 열경화성 수지나 각종 열가소성 수지 등을 압출기, 니더 또는 롤 등을 이용하여 균일해질 때까지 충분히 혼합해서 에폭시 수지 조성물을 얻은 후, 상기 에폭시 수지 조성물을 용융 주형법, 트랜스퍼 성형법, 인젝션 성형법 또는 압축 성형법 등에 의해 성형하고, 이어서 그 융점 이상으로 2?10시간 가열함으로써 행할 수 있다. 본 발명의 에폭시 수지 조성물을 반도체 밀봉 용도에 사용할 경우에는 상기의 방법으로 리드프레임 등에 탑재된 반도체 소자를 밀봉하면 된다.The epoxy resin composition of this invention can be easily made into the hardened | cured material by the method similar to what is conventionally known. Formation of the cured product of the present invention is, for example, an epoxy resin, a curing agent and an inorganic filler having a thermal conductivity of 20 W / m? K or more, and a curing accelerator, a compounding agent, various thermosetting resins, various thermoplastic resins, etc. After mixing sufficiently until it becomes uniform using a roll etc. and obtaining an epoxy resin composition, the said epoxy resin composition is shape | molded by the molten casting method, the transfer molding method, the injection molding method, the compression molding method, etc., and it is 2 to 10 hours beyond the melting point then, It can carry out by heating. When using the epoxy resin composition of this invention for a semiconductor sealing use, what is necessary is just to seal the semiconductor element mounted in a lead frame etc. by said method.
또한, 본 발명의 에폭시 수지 조성물은 용제를 포함하는 바니쉬로 할 수도 있다. 상기 바니쉬는 예를 들면, 에폭시 수지, 경화제 및 열전도율이 20W/m?K이상인 무기 충전재, 및 필요에 따라 기타의 성분을 포함하는 혼합물을 톨루엔, 크실렌, 아세톤, 메틸에틸케톤, 메틸이소부틸케톤, 시클로헥사논, 시클로펜타논, N, N'-디메틸포름아미드, N, N'-디메틸아세트아미드, 디메틸술폭시드, N-메틸피롤리돈, 에틸렌글리콜디메틸에테르, 에틸렌글리콜디에틸에테르, 디프로필렌글리콜디메틸에테르, 디프로필렌글리콜디에틸에테르, 트리에틸렌글리콜디메틸에테르, 트리에틸렌글리콜디에틸에테르 등의 글리콜에테르류, 아세트산 에틸, 아세트산 부틸, 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트, 부틸셀로솔브아세테이트, 카르비톨아세테이트, 프로필렌글리콜모노메틸에테르아세테이트, 글루타르산 디알킬, 숙신산 디알킬, 아디프산 디알킬 등의 에스테르류, γ-부티로락톤 등의 환상 에스테르류, 석유 에테르, 석유 나프타, 수소 첨가 석유 나프타 및 솔벤트 나프타 등의 석유계 용제 등의 유기 용제와 혼합함으로써 얻을 수 있다. 용제의 양은 바니쉬 전체에 대하여 통상 10?95질량%, 바람직하게는 15?85질량%이다.Moreover, the epoxy resin composition of this invention can also be used as the varnish containing a solvent. The varnish may be, for example, an epoxy resin, a curing agent and an inorganic filler having a thermal conductivity of 20 W / m? K or higher, and a mixture containing other components, if necessary, toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, Cyclohexanone, cyclopentanone, N, N'-dimethylformamide, N, N'-dimethylacetamide, dimethyl sulfoxide, N-methylpyrrolidone, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, dipropylene Glycol ethers such as glycol dimethyl ether, dipropylene glycol diethyl ether, triethylene glycol dimethyl ether, triethylene glycol diethyl ether, ethyl acetate, butyl acetate, methyl cellosolve acetate, ethyl cellosolve acetate, and butyl cello Solvate acetate, carbitol acetate, propylene glycol monomethyl ether acetate, dialkyl glutaric acid, dialkyl succinate, adipic acid dial With esters, such as γ- butynyl it can be obtained by mixing with an organic solvent such as a petroleum solvent of cyclic esters, petroleum ether, petroleum naphtha, hydrogenated petroleum naphtha and solvent naphtha, such as lactone. The quantity of a solvent is 10-95 mass% normally with respect to the whole varnish, Preferably it is 15-85 mass%.
상기한 바와 같이 해서 얻어지는 바니쉬를 유리 섬유, 카본 섬유, 폴리에스테르 섬유, 폴리아미드 섬유, 알루미나 섬유 및 종이 등의 시트상의 섬유 기재에 함침시킨 후에 가열에 의해 용제를 제거함과 아울러, 상기 바니쉬를 반경화 상태로 함으로써, 본 발명의 프리프레그를 얻을 수 있다. 또한, 여기서 말하는「반경화 상태」란 반응성의 관능기인 에폭시기가 일부 미반응으로 남아있는 상태를 의미한다. 상기 프리프레그를 열 프레스 성형해서 경화물을 얻을 수 있다.The varnish obtained as described above is impregnated into a sheet-like fibrous base material such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber and paper, and then the solvent is removed by heating, and the varnish is semi-hardened. By making it into the state, the prepreg of this invention can be obtained. In addition, the "semi-cured state" here means the state in which the epoxy group which is a reactive functional group remains partially unreacted. Hardened | cured material can be obtained by hot press molding the said prepreg.
(실시예)(Example)
이하, 본 발명을 실시예에서 더욱 상세하게 설명하지만, 본 발명은 이들 실시예에 한정되는 것은 아니다. 합성예, 실시예, 비교예에 있어서 부는 질량부를 의미한다. 또한, 에폭시 당량, 융점, 열전도율은 이하의 조건으로 측정했다.Hereinafter, although an Example demonstrates this invention still in detail, this invention is not limited to these Examples. In a synthesis example, an Example, and a comparative example, a part means a mass part. In addition, epoxy equivalent, melting | fusing point, and thermal conductivity were measured on condition of the following.
?에폭시 당량? Epoxy equivalent
JIS K-7236에 기재된 방법으로 측정하고, 단위는 g/eq.이다.It is measured by the method described in JIS K-7236, and the unit is g / eq.
?융점? Melting point
Seiko Instruments Inc.제작 EXSTAR6000Manufactured by Seiko Instruments Inc.EXSTAR6000
측정 시료 2mg?5mg 승온 속도 10℃/min.Measurement sample 2 mg-5 mg Temperature increase rate 10 degreeC / min.
?열전도율Thermal conductivity
ASTM E1530에 준거한 방법으로 측정Measured according to ASTM E1530
?수산기 당량Hydroxyl equivalent
JIS K-0070에 기재된 방법에 준거한 방법으로 측정하고, 단위는 g/eq.이다.It measures by the method based on the method of JISK-0070, and a unit is g / eq.
합성예 1Synthesis Example 1
교반기, 환류 냉각관, 교반 장치를 구비한 플라스크에 p-히드록시아세토페논 136부, p-히드록시벤즈알데히드 124부 및 에탄올 300부를 투입하고 용해했다. 이것에 97% 황산 51.0부를 첨가 후 60℃까지 승온하고, 이 온도에서 8시간 반응 후, 반응액을 물 1200부에 주입하고, 정석시켰다. 결정을 여과 분별 후, 물 600부로 2회 수세하고, 그 후 진공 건조하고, 적갈색 결정의 페놀 화합물 1을 220부 얻었다. 얻어진 결정의 융점은 DSC측정에 의해 203℃이었다.136 parts of p-hydroxyacetophenone, 124 parts of p-hydroxybenzaldehyde and 300 parts of ethanol were added to a flask equipped with a stirrer, a reflux condenser and a stirring device, and dissolved. After adding 51.0 parts of 97% sulfuric acid to this, it heated up to 60 degreeC, after reaction at this temperature for 8 hours, the reaction liquid was poured into 1200 parts of water, and it crystallized. The crystals were filtered off, washed twice with 600 parts of water, and then dried in vacuo to obtain 220 parts of phenol compounds 1 of reddish brown crystals. Melting | fusing point of the obtained crystal | crystallization was 203 degreeC by DSC measurement.
합성예 2Synthesis Example 2
교반기, 환류 냉각관, 교반 장치를 구비한 플라스크에 아세톤 29부, p-히드록시벤즈알데히드 124g 및 에탄올 300부를 투입하여 용해했다. 이것에 50% 수산화 나트륨 수용액 80부를 첨가 후 45℃까지 승온하고, 이 온도에서 120시간 반응 후, 반응액을 1.5N 염산 800mL에 주입하고, 정석시켰다. 결정을 여과 선별 후, 물 600부로 2회 수세하고, 그 후 진공 건조하고, 황색 결정의 페놀 화합물 2를 210부 얻었다. 얻어진 결정의 융점은 DSC측정에 의해 101℃이었다.29 parts of acetone, 124 g of p-hydroxybenzaldehyde, and 300 parts of ethanol were added to the flask equipped with the stirrer, the reflux condenser, and the stirring apparatus, and dissolved. 80 parts of 50% sodium hydroxide aqueous solution was added to this, and it heated up to 45 degreeC, after reaction at this temperature for 120 hours, the reaction liquid was poured into 800 mL of 1.5N hydrochloric acid, and crystallized. The crystals were filtered off, washed twice with 600 parts of water, and then dried in vacuo to obtain 210 parts of yellow phenol compounds 2 as yellow crystals. Melting | fusing point of the obtained crystal | crystallization was 101 degreeC by DSC measurement.
합성예 3Synthesis Example 3
교반기, 환류 냉각관, 교반 장치를 구비한 플라스크에 시클로헥사논 49부, p-히드록시벤즈알데히드 124부 및 에탄올 250부를 넣고 용해했다. 이것에 37% 염산 25부를 첨가 후 60℃까지 승온하고, 이 온도에서 10시간 반응 후, 반응액을 물 1000부에 주입하고, 정석시켰다. 결정을 여과 선별 후, 물 800부로 2회 수세하고, 그 후 진공 건조하고, 황색결정의 페놀 화합물 3을 210부 얻었다. 얻어진 결정의 융점은 DSC측정에 의해 289℃이었다.49 parts of cyclohexanone, 124 parts of p-hydroxybenzaldehyde and 250 parts of ethanol were dissolved in a flask equipped with a stirrer, a reflux condenser and a stirring device. 25 parts of 37% hydrochloric acid was added to this, and it heated up to 60 degreeC, after reaction at this temperature for 10 hours, the reaction liquid was poured into 1000 parts of water, and it crystallized. The crystals were filtered off, washed twice with 800 parts of water, and then vacuum dried to obtain 210 parts of yellow phenol compounds 3 as yellow crystals. Melting | fusing point of the obtained crystal | crystallization was 289 degreeC by DSC measurement.
합성예 4Synthesis Example 4
교반기, 환류 냉각관, 교반 장치를 구비한 플라스크에 질소 퍼지를 실시하면서, 합성예 1에서 얻어진 페놀 화합물 1을 120부, 에피클로로히드린 925부, 디메틸술폭시드(DMSO) 139부를 더해, 교반 하, 45℃까지 승온하고, 용해하고, 플레이크상의 수산화 나트륨 40부를 90분간 걸쳐서 분할 첨가한 후, 45℃인 채로 1.5시간, 그 후 70℃로 승온해 30분간 반응을 행했다. 반응 종료 후, 로터리 에바포레이터를 이용하여 70℃로 감압 하, 과잉의 에피클로로히드린 등의 용제를 800부 증류 제거했다. 잔류물을 물 1500부에 주입하여 결정을 석출시켰다. 결정을 여과 후, 600부의 메탄올로 세정하고, 그 후 70℃로 진공 건조함으로써 에폭시 수지 1을 166부 얻었다. 얻어진 에폭시 수지의 에폭시 당량은 200g/eq., 융점은 DSC로 108℃이었다.120 parts of phenolic compounds 1 obtained by the synthesis example 1, 925 parts of epichlorohydrin, and 139 parts of dimethyl sulfoxide (DMSO) were added, carrying out nitrogen purge to the flask provided with the stirrer, the reflux condenser, and the stirring apparatus, and stirring After heating up to 45 degreeC and melt | dissolving and dividingly adding 40 parts of flake shaped sodium hydroxide over 90 minutes, it heated up at 70 degreeC for 1.5 hours, and reacted for 30 minutes, remaining 45 degreeC. After completion | finish of reaction, 800 parts of solvents, such as excess epichlorohydrin, were distilled off under reduced pressure at 70 degreeC using the rotary evaporator. The residue was poured into 1500 parts of water to precipitate crystals. After filtering the crystal | crystallization, 600 parts of methanol were wash | cleaned and 166 parts of epoxy resins 1 were obtained by vacuum-drying at 70 degreeC after that. The epoxy equivalent of the obtained epoxy resin was 200 g / eq., And melting | fusing point was 108 degreeC by DSC.
합성예 5Synthesis Example 5
교반기, 환류 냉각관, 교반 장치를 구비한 플라스크에 질소 퍼지를 실시하면서, 합성예 2에서 얻어진 페놀 화합물 2을 133부, 에피클로로히드린 925부, DMSO 139부를 가해서, 교반 하, 45℃까지 승온하고, 용해하고, 플레이크상의 수산화 나트륨 40부를 90분간 걸쳐서 분할 첨가한 후, 45℃인채로 1.5시간, 그 후 70℃까지 승온하여 30분간 반응을 행했다. 반응 종료 후, 로터리 에바포레이터를 이용하여 70℃로 감압 하, 과잉의 에피클로로히드린 등의 용제를 800부 증류 제거했다. 잔류물을 물 1500부에 주입하여 결정을 석출시켰다. 결정을 여과 후 600부의 메탄올로 세정하고, 그 후 70℃로 진공 건조함으로써 에폭시 수지 2를 180부 얻었다. 얻어진 에폭시 수지의 에폭시 당량은 220g/eq., 융점은 DSC로 117℃이었다.133 parts of phenolic compound 2 obtained by the synthesis example 2, 925 parts of epichlorohydrin, and 139 parts of DMSO were added, carrying out nitrogen purge to the flask provided with the stirrer, the reflux condenser, and the stirring apparatus, and it heated up to 45 degreeC under stirring. After melt | dissolving and dividingly adding 40 parts of flake shaped sodium hydroxide over 90 minutes, it heated up to 70 degreeC for 1.5 hours with 45 degreeC, and reaction was performed for 30 minutes. After completion | finish of reaction, 800 parts of solvents, such as excess epichlorohydrin, were distilled off under reduced pressure at 70 degreeC using the rotary evaporator. The residue was poured into 1500 parts of water to precipitate crystals. After filtering the crystal | crystallization, it wash | cleaned with 600 parts of methanol, and 180 parts of epoxy resins 2 were obtained by vacuum-drying at 70 degreeC after that. The epoxy equivalent of the obtained epoxy resin was 220 g / eq., And melting | fusing point was 117 degreeC in DSC.
합성예 6Synthesis Example 6
교반기, 환류 냉각관, 교반 장치를 구비한 플라스크에 질소 퍼지를 실시하면서, 합성예 3에서 얻어진 페놀 화합물 3을 153부, 에피클로로히드린 925부, DMSO 139부를 가하여, 교반 하, 45℃까지 승온하고, 용해하고, 플레이크상의 수산화 나트륨 40부를 90분간 걸쳐서 분할 첨가한 후, 45℃인 채로 1.5시간, 그 후 70℃로 승온하여 30분간 반응을 행했다. 반응 종료 후, 로터리 에바포레이터를 이용하여 70℃로 감압 하, 과잉의 에피클로로히드린 등의 용제를 800부 증류 제거했다. 잔류물을 물 1500부에 주입하여 결정을 석출시켰다. 결정을 여과 후 600부의 메탄올로 세정하고, 그 후 70℃로 진공 건조함으로써 에폭시 수지 3을 199부 얻었다. 얻어진 에폭시 수지의 에폭시 당량은 219g/eq., 융점은 DSC로 145℃이었다.153 parts of phenolic compound 3 obtained by the synthesis example 3, 925 parts of epichlorohydrin, and 139 parts of DMSO were added, carrying out nitrogen purge to the flask provided with the stirrer, the reflux condenser, and the stirring apparatus, and it heated up to 45 degreeC under stirring. After dissolving and dividingly adding 40 parts of flake sodium hydroxide over 90 minutes, it heated up at 70 degreeC for 1.5 hours with 45 degreeC, and reaction was performed for 30 minutes. After completion | finish of reaction, 800 parts of solvents, such as excess epichlorohydrin, were distilled off under reduced pressure at 70 degreeC using the rotary evaporator. The residue was poured into 1500 parts of water to precipitate crystals. After filtering the crystal | crystallization, it wash | cleaned with 600 parts of methanol, and 199 parts of epoxy resins 3 were obtained by vacuum-drying at 70 degreeC after that. The epoxy equivalent of the obtained epoxy resin was 219g / eq., And melting | fusing point was 145 degreeC by DSC.
실시예 1?3 및 비교예 1?3Examples 1 to 3 and Comparative Examples 1 to 3
각종 성분을 표 1의 비율(부)로 배합하고, 믹싱 롤에 의한 혼련과 그것에 이어서 태블릿화 후, 트랜스퍼 성형으로 수지 성형체를 조제했다. 이어서, 상기 수지성형체를 160℃에서 2시간, 180℃에서 8시간 가열함으로써, 본 발명의 에폭시 수지 조성물 및 비교용 수지 조성물의 경화물을 얻었다. 이들 경화물의 열전도율을 측정한 결과를 표 1에 나타냈다.Various components were mix | blended in the ratio (part) of Table 1, and the resin molding was prepared by transfer molding after kneading with a mixing roll and then tableting. Next, the cured product of the epoxy resin composition and the comparative resin composition of the present invention was obtained by heating the resin molded product at 160 ° C. for 2 hours and at 180 ° C. for 8 hours. Table 1 shows the results of measuring the thermal conductivity of these cured products.
에폭시 수지 4: 하기 식(6) 및 (7)으로 나타내어지는 에폭시 수지를 등몰 함유하는 비페닐형 에폭시 수지(상품명: YL-6121H Japan Epoxy Resin Co., Ltd. 제작 에폭시 당량 175g/eq.)Epoxy resin 4: Biphenyl type epoxy resin containing equimolar moieties of epoxy resin represented by following formula (6) and (7) (brand name: YL-6121H Japan Epoxy Resin Co., Ltd. Epoxy equivalent 175g / eq.)
경화제 1: 1,5-나프탈렌디아민(Tokyo Chemical Industry Co., Ltd. 제작, 아민 당량 40g/eq.)Curing agent 1: 1,5-naphthalenediamine (manufactured by Tokyo Chemical Industry Co., Ltd., amine equivalent 40g / eq.)
무기 충전재 1: 구상 알루미나(상품명: DAW-100 DENKI KAGAKU KOGYO KABUSHIKI KAISHA 제작, 열전도율 38W/m?K)Inorganic filler 1: spherical alumina (brand name: DAW-100 DENKI KAGAKU KOGYO KABUSHIKI KAISHA, heat conductivity 38W / m? K)
무기 충전재 2: 질화 붕소(상품명: SGP DENKI KAGAKU KOGYO KABUSHIKI KAISHA 제작, 열전도율 60W/m?K)Inorganic filler 2: Boron nitride (Brand name: SGP DENKI KAGAKU KOGYO KABUSHIKI KAISHA, Thermal conductivity 60W / m? K)
무기 충전재 3: 용융 실리카(상품명: MSR2212 용삼 제작, 열전도율 1.38W/m?K)Inorganic filler 3: Fused silica (trade name: MSR2212 Yongsam manufactured, thermal conductivity of 1.38W / m? K)
실시예 4Example 4
디메틸포름아미드 1000부에 합성예 6에서 얻어진 에폭시 수지 3을 100부 첨가하고, 또한 이것을 70℃에서 용해시킨 후, 실온으로 복귀시켰다.100 parts of epoxy resin 3 obtained in Synthesis Example 6 was added to 1000 parts of dimethylformamide, and after dissolving it at 70 ° C, the temperature was returned to room temperature.
디메틸포름아미드 48부에 경화제인 1,5-나프탈렌디아민(Tokyo Chemical Industry Co., Ltd. 제작, 아민 당량 40g/eq.) 18부를 70℃에서 용해시킨 후, 실온으로 복귀시켰다. 상기의 에폭시 수지 용액과 경화제 용액을 교반 날개 타입의 호모 믹서로 혼합?교반해서 균일한 바니쉬로 하고, 또한 무기 충전재(상품명: SGP DENKI KAGAKU KOGYO KABUSHIKI KAISHA 제작, 열전도율 60W/m?K) 224부(수지 고형분 100체적부에 대하여 50체적부) 및 디메틸포름아미드 100부를 가해서 혼합?교반하여 본 발명의 에폭시 수지 조성물을 조제했다.After dissolving 18 parts of 1,5-naphthalenediamine (A Tokyo Chemical Industry Co., Ltd. make, amine equivalent of 40 g / eq.) Which is a hardening | curing agent in 48 parts of dimethylformamide, it returned to room temperature. 224 parts of said epoxy resin solution and hardening | curing agent solution are mixed and stirred by the stirring blade type homomixer, and it is made into a uniform varnish, and an inorganic filler (brand name: SGP DENKI KAGAKU KOGYO KABUSHIKI KAISHA, heat conductivity 60W / m? K) 50 volume part) and 100 parts of dimethylformamide were added with respect to 100 volume part of resin solid content, and it mixed and stirred, and prepared the epoxy resin composition of this invention.
이 에폭시 수지 조성물의 바니쉬를 두께 0.2mm의 유리 섬유 직포(상품명: 7628/AS890AW 아사히 슈어벨 제작)에 함침시키고, 가열 건조해서 프리프레그를 얻었다. 이 프리프레그 4매와 그 양측에 배합한 동박을 중첩한 후, 온도 175℃, 압력 4MPa의 조건에서 90분간 가열 가압 성형해서 일체화하여 두께 0.8mm의 적층판을 얻었다. 이 적층판의 열전도율을 측정한 바, 4.8W/m?K이었다.The varnish of this epoxy resin composition was impregnated into the glass fiber woven fabric (brand name: 7628 / AS890AW Asahi Shovel make) of thickness 0.2mm, and it heat-dried and obtained the prepreg. After the four prepregs and the copper foil blended on both sides thereof were superposed, they were integrally heated and molded for 90 minutes under conditions of a temperature of 175 ° C and a pressure of 4 MPa to obtain a laminated plate having a thickness of 0.8 mm. It was 4.8 W / m * K when the heat conductivity of this laminated sheet was measured.
비교예 4Comparative Example 4
실시예 4에 있어서의 에폭시 수지 3을 에폭시 수지 4(YL-6121H) 100부로, 1,5-나프탈렌디아민의 양을 23부로, 무기 충전재의 량을 234부로 각각 변경한 것이외는 실시예 4와 동일한 조작 조작 순서에 의해 적층판을 얻었다. 이 적층판의 열전도율을 측정한 바, 3.6W/m?K이었다.The epoxy resin 3 in Example 4 was changed to 100 parts of epoxy resin 4 (YL-6121H), the amount of 1,5-naphthalenediamine was changed to 23 parts, and the amount of the inorganic filler was changed to 234 parts, respectively. The laminated board was obtained by the operation procedure. It was 3.6 W / m * K when the heat conductivity of this laminated sheet was measured.
실시예 5Example 5
각종 성분을 표 2의 비율(부)로 배합하고, 충분하게 혼합한 후에 프레임에 직접 넣고, 175℃에서 가압 성형함으로써 수지 성형체를 조제했다. 이어서, 상기 수지 성형체를 160℃에서 2시간, 180℃에서 8시간 더 가열함으로써, 본 발명의 에폭시 수지 조성물의 경화물을 얻었다. 이 경화물의 열전도율을 측정한 결과를 표 2에 나타냈다.The various components were mix | blended in the ratio (part) of Table 2, and after mixing enough, it directly put in a frame and pressure-molded at 175 degreeC, and the resin molding was prepared. Next, the hardened | cured material of the epoxy resin composition of this invention was obtained by heating the said resin molded object further at 160 degreeC for 2 hours, and 180 degreeC for 8 hours. Table 2 shows the results of measuring the thermal conductivity of this cured product.
실시예 6?8 및 비교예 5?7Examples 6-8 and Comparative Examples 5-7
각종 성분을 표 2의 비율(부)로 배합하고, 믹싱 롤에 의한 혼련과 그것에 이어서 태블릿화 후, 트랜스퍼 성형으로 수지 성형체를 조제했다. 이어서, 상기 수지성형체를 160℃에서 2시간, 180℃에서 8시간 더 가열함으로써, 본 발명의 에폭시 수지 조성물 및 비교용 수지 조성물의 경화물을 얻었다. 이들 경화물의 열전도율을 측정한 결과를 표 2에 나타냈다. 또한, 표 2에 있어서의 에폭시 수지 3, 경화제 1, 무기 충전재 1 및 2는 실시예 1?3에서 사용한 것과 같다.Various components were mix | blended in the ratio (part) of Table 2, and the resin molding was prepared by transfer molding after kneading with a mixing roll and then tableting. Next, the cured product of the epoxy resin composition and the comparative resin composition of the present invention was obtained by further heating the resin molded article at 160 ° C. for 2 hours and at 180 ° C. for 8 hours. Table 2 shows the results of measuring the thermal conductivity of these cured products. In addition, the epoxy resin 3, the hardening | curing agent 1, and the inorganic fillers 1 and 2 in Table 2 are the same as what was used in Examples 1-3.
에폭시 수지 5: 하기 식(8)으로 나타내어지는 에폭시 수지(상품명: NC-3000 Epoxy resin 5: Epoxy resin represented by following formula (8) (brand name: NC-3000
Nippon Kayaku Co., Ltd. 제작 에폭시 당량 276g/eq.)Nippon Kayaku Co., Ltd. Epoxy Equivalent 276g / eq.)
경화제 2: 합성예 3에 의해 얻어진 페놀 화합물 3(수산기 당량 153g/eq.)Curing agent 2: Phenolic compound 3 obtained by the synthesis example 3 (hydroxyl equivalent 153g / eq.)
경화제 3: 하기 식(9)으로 나타내어지는 페놀 노볼락 수지(상품명: H-1, MEIWA PLASTIC INDUSTRIES, LTD. 제작 수산기 당량 105g/eq.)Curing agent 3: Phenolic novolak resin represented by following formula (9) (brand name: H-1, MEIWA PLASTIC INDUSTRIES, LTD.
경화제 4: 하기 식(10)으로 나타내어지는 카테콜 노볼락 수지(수산기 당량 59g/eq., 연화점 104℃)Curing agent 4: Catechol novolak resin represented by following formula (10) (hydroxyl equivalent 59g / eq., Softening point 104 degreeC)
경화 촉진제: 트리페닐포스핀(HOKKO CHEMICAL INDUSTRY CO., LTD. 제작)Curing accelerator: triphenylphosphine (manufactured by HOKKO CHEMICAL INDUSTRY CO., LTD.)
실시예 9Example 9
디메틸포름아미드 1000부에 에폭시 수지 5(NC-3000) 100부, 합성예 3에서 얻어진 페놀 화합물 3 56부를 70℃에서 용해시킨 후, 실온으로 복귀시켰다.After dissolving 100 parts of epoxy resin 5 (NC-3000) and 56 parts of phenolic compound 3 obtained by the synthesis example 3 at 70 degreeC at 1000 parts of dimethylformamide, it returned to room temperature.
디메틸포름아미드 48부에 경화촉진제인 트리페닐포스핀(HOKKO CHEMICAL INDUSTRY CO., LTD. 제작) 1부를 70℃에서 용해시킨 후, 실온으로 복귀시켰다. 상기의 에폭시 수지 용액과 경화 촉진제 용액을 교반 날개 타입의 호모믹서로 혼합?교반해서 균일한 바니쉬로 하고, 또한 무기 충전재(상품명: SGP DENKI KAGAKU KOGYO KABUSHIKI KAISHA 제작, 열전도율 60W/m?K) 296부(수지 고형분 100체적부에 대하여 50체적부) 및 디메틸포름아미드 100부를 가해서 혼합?교반하여 본 발명의 에폭시 수지 조성물을 조제했다.One part of triphenylphosphine (manufactured by HOKKO CHEMICAL INDUSTRY CO., LTD.), A curing accelerator, was dissolved at 70 ° C after 48 parts of dimethylformamide, and then returned to room temperature. 296 parts of said epoxy resin solution and hardening accelerator solution were mixed and stirred by the stirring blade type homomixer to make a uniform varnish, and also an inorganic filler (brand name: SGP DENKI KAGAKU KOGYO KABUSHIKI KAISHA, heat conductivity 60W / m? K) (50 vol. Parts to 100 vol. Of resin solid content) and 100 parts of dimethylformamide were added, followed by mixing and stirring to prepare the epoxy resin composition of the present invention.
이 에폭시 수지 조성물의 바니쉬를 두께 0.2mm의 유리 섬유 직포(상품명: 7628/AS890AW 아사히 슈어벨 제작)에 함침시키고, 가열 건조해서 프리프레그를 얻었다. 이 프리프레그 4매와 그 양측에 배합한 동박을 중첩한 후, 온도 175℃, 압력 4MPa의 조건으로 90분간 가열 가압 성형해서 일체화하고, 두께 0.8mm의 적층판을 얻었다. 이 적층판의 열전도율을 측정한 바, 4.5W/m?K이었다.The varnish of this epoxy resin composition was impregnated into the glass fiber woven fabric (brand name: 7628 / AS890AW Asahi Shovel make) of thickness 0.2mm, and it heat-dried and obtained the prepreg. After stacking the four prepregs and the copper foil blended on both sides thereof, the mixture was heated and molded for 90 minutes under the condition of a temperature of 175 ° C and a pressure of 4 MPa to obtain a laminated plate having a thickness of 0.8 mm. It was 4.5 W / m * K when the heat conductivity of this laminated sheet was measured.
비교예 8Comparative Example 8
실시예 9에 있어서의 페놀 화합물 3 56부를 식(9)으로 나타내어지는 페놀노볼락 수지 29부에, 무기 충전재의 양을 245부로 각각 변경한 것 이외는 실시예 9와 동일한 조작 순서에 의해 적층판을 얻었다. 이 적층판의 열전도율을 측정한 바, 3.9W/m?K이었다.56 parts of phenol compounds 3 in Example 9 were prepared in 29 parts of the phenol novolac resin represented by the formula (9), except that the amount of the inorganic filler was changed to 245 parts, respectively. Got it. It was 3.9 W / m * K when the heat conductivity of this laminated sheet was measured.
비교예 9Comparative Example 9
실시예 9에 있어서의 페놀 화합물 3 56부를 식(10)으로 나타내어지는 카테콜 노볼락 수지 38부에, 무기 충전재의 양을 262부로 각각 변경한 것 이외는 실시예 9와 동일한 조작 순서에 의해 적층판을 얻었다. 이 적층판의 열전도율을 측정한 바, 4.1W/m?K이었다.56 parts of phenolic compounds 3 in Example 9 were laminated by 38 parts of catechol novolak resin represented by Formula (10) except having changed the quantity of the inorganic filler into 262 parts, respectively, by the operation procedure similar to Example 9 Got. It was 4.1 W / m * K when the heat conductivity of this laminated sheet was measured.
비교예 10Comparative Example 10
디메틸포름아미드 1000부에 에폭시 수지 5(NC-3000) 100부를 70℃에서 용해시킨 후, 실온으로 복귀시켰다.After dissolving 100 parts of epoxy resin 5 (NC-3000) at 1000 degreeC in 1000 parts of dimethylformamide, it returned to room temperature.
디메틸포름아미드 48부에 경화제인 1,5-나프탈렌디아민 15부를 70℃에서 용해시킨 후, 실온으로 복귀시켰다. 상기의 에폭시 수지 용액과 경화제 용액을 교반 날개 타입의 호모믹서로 혼합?교반해서 균일한 바니쉬로 하고, 또한 무기 충전재(상품명: SGP DENKI KAGAKU KOGYO KABUSHIKI KAISHA 제작, 열전도율 60W/m?K) 224부(수지 고형분 100체적부에 대하여 50체적부) 및 디메틸포름아미드 100부를 가해서 혼합?교반하여 비교예의 에폭시 수지 조성물을 조제했다.After dissolving 15 parts of 1, 5- naphthalenediamine which is a hardening | curing agent at 70 degreeC at 48 parts of dimethylformamide, it returned to room temperature. 224 parts of the above-mentioned epoxy resin solution and hardener solution were mixed and stirred with a homomixer of a stirring blade type to make a uniform varnish, and an inorganic filler (brand name: SGP DENKI KAGAKU KOGYO KABUSHIKI KAISHA, manufactured with thermal conductivity 60 W / m? K). 50 volume part) and 100 parts of dimethylformamide were added with respect to 100 volume part of resin solid content, and it mixed and stirred, and prepared the epoxy resin composition of the comparative example.
그 후의 공정은 실시예 9와 동일한 조작 순서에 의해 적층판을 얻었다. 이 적층판의 열전도율을 측정한 바, 4.4W/m?K이었다.The subsequent process obtained the laminated board by the same operation procedure as Example 9. It was 4.4 W / m * K when the heat conductivity of this laminated sheet was measured.
이상의 결과로부터, 본 발명의 에폭시 수지 조성물의 경화물은 우수한 열전도성을 갖는 것을 확인할 수 있었다. 따라서, 본 발명의 에폭시 수지 조성물의 경화물은 전기?전자부품용 절연재료 및 적층판(프린트 배선판 등) 등에 사용할 경우에 매우 유용하다.From the above result, it was confirmed that the hardened | cured material of the epoxy resin composition of this invention has the outstanding thermal conductivity. Therefore, the hardened | cured material of the epoxy resin composition of this invention is very useful when used for the insulation material for electrical and electronic components, a laminated board (printed wiring board, etc.).
본 발명을 특정한 실시형태를 참조해서 상세하게 설명했지만, 본 발명의 정신과 범위를 벗어남없이 다양한 변경 및 수정이 가능한 것은 당업자에 있어서 명확하다.Although this invention was demonstrated in detail with reference to the specific embodiment, it is clear for those skilled in the art for various changes and correction to be possible, without leaving | separating the mind and range of this invention.
또한, 본 출원은 2009년 12월 21일자로 출원된 일본특허출원(특허출원 2009-288706) 및 2009년 6월 5일자로 출원된 일본특허출원(특허출원 2009-136455)에 기초하고 있고, 그 전체가 인용에 의해 원용된다. 또한 여기에 인용되는 모든 참조는 전체로서 포함된다.Moreover, this application is based on the Japanese patent application (patent application 2009-288706) filed on December 21, 2009 and the Japanese patent application (patent application 2009-136455) filed on June 5, 2009, The whole is incorporated by reference. Also, all references cited herein are incorporated in their entirety.
(산업상의 이용 가능성)(Industrial availability)
본 발명의 에폭시 수지 조성물의 경화물은 종래의 에폭시 수지의 경화물과 비교해서 뛰어난 열전도성을 갖는다. 따라서, 밀봉재, 프리프레그 등으로서 전기?전자 재료, 성형 재료, 주형 재료, 적층 재료, 도료, 접착제, 레지스트, 광학 재료등의 광범위한 용도에 매우 유용하다.The hardened | cured material of the epoxy resin composition of this invention has the outstanding thermal conductivity compared with the hardened | cured material of the conventional epoxy resin. Therefore, it is very useful for a wide range of applications such as electric and electronic materials, molding materials, mold materials, laminated materials, paints, adhesives, resists, optical materials, and the like as sealing materials and prepregs.
Claims (6)
(b) 경화제로서 하기 식(1)?(5)으로 나타내어지는 화합물의 1종이상과 히드록시벤즈알데히드류의 반응에 의해 얻어지는 페놀 화합물, 및
(c) 열전도율 20W/m?K이상의 무기 충전재를 함유해서 이루어지는 것을 특징으로 하는 에폭시 수지 조성물.
[(식(1) 중 R1은 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?10개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 수산기, 또는 탄소수 1?10개의 치환 또는 무치환의 알콕시기 중 어느 하나를 나타낸다. l은 R1의 수를 나타내고, 0?4의 정수이다]
[식(2) 중 R2은 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?20개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 1?15개의 치환 또는 무치환의 알킬카르보닐기, 모르폴리닐카르보닐기, 탄소수 2?10개의 치환 또는 무치환의 알킬에스테르기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기, 프탈이미드기, 피페로닐기 또는 수산기 중 어느 하나를 나타낸다]
[식(3) 중 R3은 각각 독립적으로 존재하고, 수소 원자, 탄소수 0?10개의 치환 또는 무치환의 알킬카르보닐기, 탄소수 1?10개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 2?10개의 치환 또는 무치환의 알킬에스테르기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기 또는 수산기 중 어느 하나를 나타낸다. n은 탄소수를 나타내고, 0, 1, 2 중 어느 하나의 정수를 나타낸다. m은 R3의 수를 나타내고, 0≤m≤n+2의 관계를 만족한다]
[식(4) 중 R4는 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?20개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기 또는 수산기 중 어느 하나를 나타낸다]
[식(5) 중 R5는 각각 독립적으로 존재하고, 수소 원자, 탄소수 1?20개의 치환 또는 무치환의 알킬기, 탄소수 6?10개의 치환 또는 무치환의 아릴기, 탄소수 1?10개의 치환 또는 무치환의 알콕시기 또는 수산기 중 어느 하나를 나타낸다. 또한, n은 1?10의 정수이다](a ') epoxy resin,
(b) Phenolic compound obtained by reaction of 1 or more types of compound represented by following formula (1)-(5) with hydroxybenzaldehyde as a hardening | curing agent, and
(c) An epoxy resin composition comprising an inorganic filler having a thermal conductivity of 20 W / m · K or higher.
[(In formula (1), R <1> exists independently, and is a hydrogen atom, a C1-C10 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a hydroxyl group, or a C1-C ?.). Any one of ten substituted or unsubstituted alkoxy groups, l represents the number of R 1 , and is an integer of 0 to 4;
[In Formula (2), R <2> exists independently, and is a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a C1-C15 substitution, or Unsubstituted alkylcarbonyl group, morpholinylcarbonyl group, substituted or unsubstituted alkyl ester group having 2 to 10 carbon atoms, substituted or unsubstituted alkoxy group having 1 to 10 carbon atoms, phthalimide group, piperonyl group or hydroxyl group Represents one]
[In Formula (3), R <3> respectively exists independently, and is a hydrogen atom, a C1-C10 substituted or unsubstituted alkylcarbonyl group, a C1-C10 substituted or unsubstituted alkyl group, a C6-C10 substitution, or An unsubstituted aryl group, a C2-C10 substituted or unsubstituted alkylester group, a C1-C10 substituted or unsubstituted alkoxy group, or a hydroxyl group is shown. n represents a carbon number and represents the integer of any one of 0, 1, 2. m represents the number of R 3 and satisfies the relationship of 0≤m≤n + 2]
[In Formula (4), R <4> exists independently, and is a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a C1-C10 substitution, or Any one of an unsubstituted alkoxy group or hydroxyl group]
[In Formula (5), R <5> respectively exists independently, and is a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C6-C10 substituted or unsubstituted aryl group, a C1-C10 substitution, or The unsubstituted alkoxy group or hydroxyl group is shown. And n is an integer of 1 to 10]
(b') 경화제, 및
(c) 열전도율 20W/m?K이상의 무기 충전재를 함유해서 이루어지는 것을 특징으로 하는 에폭시 수지 조성물.(a) an epoxy resin obtained by further reacting epihalohydrin with the phenolic compound according to claim 1,
(b ') a curing agent, and
(c) An epoxy resin composition comprising an inorganic filler having a thermal conductivity of 20 W / m · K or higher.
(b) 제 1 항에 기재된 페놀 화합물, 및
(c) 열전도율 20W/m?K이상의 무기 충전재를 함유해서 이루어지는 것을 특징으로 하는 에폭시 수지 조성물.(a) the epoxy resin according to claim 2,
(b) the phenolic compound according to claim 1, and
(c) An epoxy resin composition comprising an inorganic filler having a thermal conductivity of 20 W / m · K or higher.
반도체 밀봉 용도에 사용되는 것을 특징으로 하는 에폭시 수지 조성물.The method according to any one of claims 1 to 3,
An epoxy resin composition, which is used for semiconductor sealing applications.
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