JP3665283B2 - Heating method and heating apparatus - Google Patents

Heating method and heating apparatus Download PDF

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Publication number
JP3665283B2
JP3665283B2 JP2001332949A JP2001332949A JP3665283B2 JP 3665283 B2 JP3665283 B2 JP 3665283B2 JP 2001332949 A JP2001332949 A JP 2001332949A JP 2001332949 A JP2001332949 A JP 2001332949A JP 3665283 B2 JP3665283 B2 JP 3665283B2
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gas
heating
heater
gas flow
center
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JP2003133033A (en
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靖 長嶋
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Koyo Thermo Systems Co Ltd
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Koyo Thermo Systems Co Ltd
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Priority to JP2001332949A priority Critical patent/JP3665283B2/en
Priority to TW091100768A priority patent/TW513550B/en
Priority to KR1020020004801A priority patent/KR20030035742A/en
Priority to CNB021051224A priority patent/CN100362300C/en
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D11/00—Arrangement of elements for electric heating in or on furnaces
    • F27D11/02—Ohmic resistance heating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F27B17/0083—Chamber type furnaces with means for circulating the atmosphere
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/02—Supplying steam, vapour, gases, or liquids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible

Description

【０００１】
【発明の属する技術分野】
本発明は、互いに間隔をおいて並列する複数のパネル状ヒーターにより加熱対象を加熱する方法と装置に関し、例えばフラットパネルディスプレイ用基板の加熱に利用できる。
【０００２】
【従来の技術】
互いに間隔をおいて並列する複数のパネル状ヒーターを備える加熱装置によって、互いに隣接する前記ヒーターの間において、前記ヒーターの加熱面に対向するように配置される加熱対象を加熱することが従来から行われている。
【０００３】
【発明が解決しようとする課題】
上記のような互いに隣接するパネル状ヒーターの間の加熱領域においては、ヒーターの加熱面の中央近傍では周辺近傍に比べて放熱が少なくなる。そのため、各加熱面の温度分布の均一性が低下するという問題がある。そこで、各ヒーターの出力を加熱面の中央近傍では周辺近傍に比べて低くすることが考えられる。しかし、そのようなヒーター出力の調整には時間を要する。また、加熱温度が例えば２５０度以下のような比較的低温である場合、ヒーター出力を調整しても温度分布の均一性を十分に確保するのは困難であった。
本発明は、上記問題を解決することのできる加熱方法と加熱装置を提供することを目的とする。
【０００４】
【課題を解決するための手段】
本発明方法は、本発明の加熱装置によって、互いに隣接する前記ヒーターの間において、前記ヒーターの加熱面に対向するように配置される加熱対象を加熱するに際して、各ヒーターの内部に設けたガス流動空間に、ヒーターの設定温度よりも低温のガスを導入し、そのガス流動空間に導入されたガスを、前記加熱面の中央から周辺に向かい流動させることを特徴とする。
本発明方法によれば、ヒーターの設定温度よりも低温のガスを、そのヒーターの内部に設けたガス流動空間において加熱面の中央から周辺に向かい流動させるので、加熱対象の配置領域においてヒーターの加熱面の中央近傍での放熱を促進することができる。これにより、加熱面の温度分布を短時間で高精度に均一化し、加熱対象を均一に加熱することができる。
【０００５】
本発明装置は、間隔をおいて並列する複数のパネル状ヒーターを備え、互いに隣接する前記ヒーターの間において、前記ヒーターの加熱面に対向するように加熱対象が配置される加熱装置であって、各ヒーターの内部にガス流動空間が設けられ、そのガス流動空間にガスを導入するためのガス導入手段が設けられ、そのガス流動空間に導入されたガスが前記加熱面の中央から周辺に向かい流動するように、そのガスは加熱面の中央近傍に導入されることを特徴とする。
本発明装置によれば本発明方法を実施することができる。さらに各ヒーターにガス流動空間が設けられることで、中実のヒーターに比べて軽量化できる。
【０００６】
本発明装置においては、前記ガス導入手段は、前記ガス流動空間において前記加熱面の中央近傍からガスを吹き出す吹出し口を有し、各ヒーターに、そのガス流動空間に導入されたガスの排出口が、前記加熱面の周辺に近接する位置に設けられている。
これにより、本発明方法を複雑な構成を要することなく低コストで実施することができる。
【０００７】
本発明装置において、各ヒーターに、前記ガス流動空間を前記加熱面の中央近傍の室と、この中央近傍の室よりも周辺に近接する室とに分割する隔壁が設けられ、その隔壁に、相隣接する室を連絡するガス流通孔が設けられ、その加熱面の中央近傍の室に前記ガス導入手段によってガスが導入されるのが好ましい。
これにより、確実にガスを加熱面の中央から周辺に向かい流動させることができる。
【０００９】
本発明装置においては、前記ヒーターは加熱対象の出入り口を有する炉体の内部に配置され、前記排出口から排出されるガスを、その炉体の出入り口に向かい導く手段が設けられている。
これにより、炉体の出入り口から外気が炉体内に侵入するのを、その排出口から排出されるガスにより抑止して炉体内の温度低下を軽減し、炉体内温度が不均一になるのを防止することができると共に省エネルギー化を図ることができる。
【００１０】
【発明の実施の形態】
図１、図２に示す加熱装置１は、炉体２と、この炉体２の内部に配置される複数のパネル状ヒーター３とを備える。それらヒーター３は、空間を効率良く利用できるように、図３に示すように厚さ方向を上下方向として、上下方向に沿って互いに間隔をおいて並列される。板状の加熱対象４が厚さ方向を上下方向として、互いに隣接するヒーター３の間において、ヒーター３の上面により構成される加熱面に対向するように配置される。その加熱面と加熱対象４の上下面は水平に沿うように配置される。本実施形態では、炉体２の両側の開閉扉２ａ、２ｂにより開閉される出入り口から加熱対象４が出し入れされる。
【００１１】
図４に示すように、各ヒーター３は炉体２によりブラケット５を介して支持されている。各ヒーター３は、ヒーター本体１０と、このヒーター本体１０の下方を覆うヒーターカバー１１とを有する。そのヒーター本体１０は、通電により発熱する発熱体１０ａを、アルミ板１０ｂ、１０ｃにより挟み込むことで構成され、その上面が加熱面３ａとされている。その加熱面３ａから突出する支持片６により加熱対象４が支持される。そのヒーターカバー１１はステンレス鋼板製で、底板１１ａと、この底板１１ａの外縁から上方に伸びる周壁１１ｂとから構成されている。その底板１１ａの下面は金属光沢を有する反射面１１ａ′とされ、加熱面３ａから発する熱線を反射する。これにより加熱対象４は、下方からヒーター３により直接に輻射加熱されると共に、上方から間接的に輻射加熱される。
【００１２】
各ヒーター３の内部に、そのヒーター本体１０とヒーターカバー１１とで囲まれるガス流動空間２０が設けられている。図５に示すように、そのガス流動空間２０は、加熱面３ａの中央近傍の室２０ａと、この中央近傍の室２０ａよりも周辺に近接する室２０ｂとに、隔壁２１によって分割されている。その隔壁２１に、相隣接する室を連絡するガス流通孔２１ａが設けられている。
【００１３】
各ヒーター３のガス流動空間２０にガスを導入するためのガス導入手段としてガス導入配管２２が設けられている。そのガス導入配管２２の一端は、炉体２の外部のガス供給源（図示省略）に接続されている。そのガス導入配管２２の他端は、各ヒーター３に挿入されるように分岐され、各ガス流動空間２０において加熱面３ａの中央近傍の室２０ａに配置されている。これにより、そのガス導入配管２２の他端は、ガス流動空間２０において加熱面３ａの中央近傍からガスを吹き出す吹出し口２２ａとされている。その吹出し口２２ａから吹き出されたガスは、加熱面３ａの中央近傍の室２０ａに導入された後に、図５において矢印で示すように上記ガス流通孔２１ａを通って、加熱面３ａの周辺に近接する室２０ｂに流動する。すなわち、そのガス流動空間２０に導入されたガスは加熱面３ａの中央から周辺に向かい流動する。なお、そのガス流動空間２０に導入するガスを予熱するため、図２に示すように、そのガス導入配管２２を流れるガスの予熱用ヒーター２６が炉体２に取り付けられている。
【００１４】
そのガス流動空間２０に導入されたガスを排出するため、各ヒーター３のヒーターカバー１１の底板１１ａに複数の排出口２３が設けられている。各排出口２３は加熱面３ａの周辺に近接する。各排出口２３から排出されるガスが加熱対象４に直接吹き付けられることがないように、各排出口２３は加熱対象４の配置領域よりも加熱面３ａの中央から離れた位置に配置されている。なお、排出口２３の数や配置は、ガス流動空間２０に導入されたガスを加熱面３ａの中央から周辺に向かい流動させることができれば特に限定されない。
【００１５】
その排出口２３から排出されたガスを炉体２の外部に導くため、各ヒーター３の両側に、外周に複数のガス流入孔２７ａが形成された排気用配管２７が設けられている。各排気用配管２７の一端は閉鎖され、他端は互いに接続されて炉体２の外部において開口する。なお、各排気用配管２７のガス流入孔２７ａは炉体２の出入り口に対向する位置に形成され、これにより排出口２３から排出されるガスは炉体２の出入り口に向かい導かれる。よって、その開閉扉２ａ、２ｂにより閉鎖されていた炉体２の出入り口を開いた時に、その出入り口から外気が炉体２内に侵入するのを、そのガスにより抑止して炉体２内の温度低下を軽減することができる。
【００１６】
そのガスの種類は、加熱対象４に影響を与えることがなければ特に限定されず、例えば窒素ガスやドライエアを用いることができる。そのガス流量は加熱装置１の規模やヒーター３の設定温度に応じて適宜定めればよい。例えば、各ヒーター３の寸法が９５０ｍｍ×１１４０ｍｍ×３８ｍｍで、並列ピッチが７５ｍｍ〜９０ｍｍで、５枚の加熱対象４を処理する場合、ガス流量は各ヒーターあたり毎分２０〜１００リットルとする。ガスの温度は、例えばヒーター３の設定温度が１００℃〜１８０℃であれば２０℃程度低くし、ヒーター３の設定温度が１８０℃〜２５０℃であれば３０℃程度低くするのが好ましいが、これに限定されるものではなく、また、必ずしもガスを予熱する必要はない。
【００１７】
上記実施形態によれば、互いに隣接するヒーター３の間において、加熱面３ａに対向するように配置される加熱対象４を輻射加熱するに際して、ガス流動空間２０にヒーターの設定温度よりも低温のガスを導入し、そのガス流動空間２０に導入されたガスを加熱面３ａの中央から周辺に向かい流動させる。これにより、加熱対象４の配置領域において加熱面３ａの中央近傍での放熱を促進することができる。よって、加熱面３ａの温度分布を短時間で高精度に均一化し、加熱対象４を均一に加熱することができる。各ヒーター３にガス流動空間２０が設けられることで、中実のヒーターに比べて軽量化できる。また、加熱面３ａの中央近傍にガスの吹出し口２２ａを設け、加熱面３ａの周辺に近接するガスの排出口２３を設けるだけでよいため、複雑な構成を要することなく低コストで実施することができる。そのガス流動空間２０においてガスは加熱面３ａの中央近傍の室２０ａから周辺に近接する室２０ｂにガス流通孔２１ａを通って流れるので、確実にガスを加熱面３ａの中央から周辺に向かい流動させることができる。さらに、排出口２３から排出されるガスが加熱対象４に直接吹き付けられることがないので、そのガスによる加熱対象４の温度変動を防止できる。
【００１８】
【実施例】
図６は、上記実施形態の加熱装置１により加熱したフラットパネルディスプレイ用ガラス基板の温度と温度偏差の時間変化を示す。そのガラス基板の寸法は７３０ｍｍ×９２０ｍｍ×０．７ｍｍ、ヒーター３の設定温度は２３０℃、ガス流量は毎分３０リットルとした。図の横軸は加熱時間、左縦軸はガラス基板の表面温度、右縦軸はガラス基板の表面温度の偏差を示す。図において実線Ａはガラス基板の最高表面温度位置の温度の時間変化、実線Ｂはガラス基板の最低表面温度位置の温度の時間変化、破線Ｃはガラス基板の最高表面温度位置の設定温度からの偏差の時間変化、破線Ｄはガラス基板の最低表面温度位置の設定温度からの偏差の時間変化、破線Ｅはガラス基板の最高表面温度位置の温度と最低表面温度位置の温度との偏差の時間変化を示す。これにより、上記実施形態の加熱装置１によれば、６分程度で最高表面温度と最低表面温度との偏差を５℃以下にできることを確認できた。これに対して、そのガスを供給しなかった場合は、その偏差は時間が経過しても約１０℃よりも小さくなることはなく、また、目標の偏差に到達するまでに非常に長い時間を要する場合もあった。すなわち、本発明によれば加熱領域における温度分布を短時間で均一化して加熱対象を高精度に均一加熱できることを確認できた。
【００１９】
【発明の効果】
本発明によれば、並列配置される複数のパネル状ヒーターの間の加熱領域における温度分布を、低コストでシンプルな構成により短時間で均一化でき、加熱対象を高精度に均一加熱することができ、さらに各ヒーターを軽量化すると共に省エネルギー化を図ることができる加熱方法と加熱装置を提供できる。
【図面の簡単な説明】
【図１】本発明の実施形態の加熱装置の側面図
【図２】本発明の実施形態の加熱装置の平面図
【図３】本発明の実施形態の加熱装置におけるパネル状ヒーターの並列状態を示す斜視図
【図４】本発明の実施形態の加熱装置における要部の側断面図
【図５】本発明の実施形態の加熱装置における要部の平断面図
【図６】本発明の加熱装置により加熱した基板の温度と温度偏差の時間変化を示す図
【符号の説明】
１ 加熱装置
２ 炉体
３ パネル状ヒーター
３ａ 加熱面
４ 加熱対象
２０ ガス流動空間
２０ａ 加熱面の中央近傍の室
２０ｂ 加熱面の中央近傍の室よりも周辺に近接する室
２１ 隔壁
２１ａ ガス流通孔
２２ ガス導入配管
２２ａ 吹出し口
２３ 排出口[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method and apparatus for heating an object to be heated by a plurality of panel heaters arranged in parallel at intervals, and can be used for heating a flat panel display substrate, for example.
[0002]
[Prior art]
Conventionally, a heating device including a plurality of panel heaters arranged in parallel at intervals is heated between heating elements adjacent to each other so as to face the heating surface of the heater. It has been broken.
[0003]
[Problems to be solved by the invention]
In the heating region between the panel heaters adjacent to each other as described above, heat radiation is less near the center of the heating surface of the heater than near the periphery. Therefore, there exists a problem that the uniformity of the temperature distribution of each heating surface falls. Therefore, it is conceivable that the output of each heater is lower in the vicinity of the center of the heating surface than in the vicinity of the periphery. However, it takes time to adjust the heater output. Further, when the heating temperature is a relatively low temperature such as 250 ° C. or less, it is difficult to ensure sufficient uniformity of the temperature distribution even if the heater output is adjusted.
An object of this invention is to provide the heating method and heating apparatus which can solve the said problem.
[0004]
[Means for Solving the Problems]
In the method of the present invention, the gas flow provided in each heater is heated by the heating device of the present invention when heating the heating object disposed so as to face the heating surface of the heater between the heaters adjacent to each other. A gas having a temperature lower than the set temperature of the heater is introduced into the space, and the gas introduced into the gas flow space is caused to flow from the center to the periphery of the heating surface.
According to the method of the present invention, the gas having a temperature lower than the set temperature of the heater is caused to flow from the center to the periphery of the heating surface in the gas flow space provided in the heater, so that the heating of the heater in the arrangement region to be heated is performed. Heat dissipation near the center of the surface can be promoted. Thereby, the temperature distribution of the heating surface can be made uniform with high accuracy in a short time, and the object to be heated can be heated uniformly.
[0005]
The device of the present invention is a heating device including a plurality of panel-like heaters arranged in parallel at intervals, and a heating target is disposed between the heaters adjacent to each other so as to face the heating surface of the heater, A gas flow space is provided inside each heater, and gas introduction means for introducing gas into the gas flow space is provided. The gas introduced into the gas flow space flows from the center to the periphery of the heating surface. Thus, the gas is introduced near the center of the heating surface.
According to the apparatus of the present invention, the method of the present invention can be carried out. Furthermore, by providing a gas flow space in each heater, the weight can be reduced as compared to a solid heater.
[0006]
In the present invention apparatus, the gas introducing means, said has the outlet blowing out the gas from the vicinity of the center of the heating surface in the gas flow space, in each heater, the outlet of the gas introduced into the gas flow space , that provided at a position close to the periphery of the heating surface.
Thereby, the method of the present invention can be implemented at low cost without requiring a complicated configuration.
[0007]
In the apparatus of the present invention, each heater is provided with a partition that divides the gas flow space into a chamber near the center of the heating surface and a chamber closer to the periphery than the chamber near the center. It is preferable that a gas flow hole for connecting adjacent chambers is provided, and the gas is introduced into the chamber near the center of the heating surface by the gas introducing means.
Thereby, gas can be reliably made to flow toward the periphery from the center of a heating surface.
[0009]
In the present invention apparatus, the heater is disposed inside the furnace body having inlet and outlet of the heating target, the gas discharged from the discharge port, is that provided means for directing toward the doorway of the furnace body.
This prevents the outside air from entering the furnace body from the entrance / exit of the furnace body by the gas exhausted from the exhaust port to reduce the temperature drop inside the furnace body and prevent the furnace body temperature from becoming uneven. Energy saving.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
A heating device 1 shown in FIGS. 1 and 2 includes a furnace body 2 and a plurality of panel heaters 3 disposed inside the furnace body 2. The heaters 3 are juxtaposed at intervals along the vertical direction with the thickness direction being the vertical direction as shown in FIG. 3 so that the space can be used efficiently. The plate-like heating object 4 is arranged so as to face the heating surface constituted by the upper surface of the heater 3 between the heaters 3 adjacent to each other with the thickness direction being the vertical direction. The heating surface and the upper and lower surfaces of the heating object 4 are arranged along the horizontal. In the present embodiment, the heating object 4 is put in and out from the doorway opened and closed by the open / close doors 2a and 2b on both sides of the furnace body 2.
[0011]
As shown in FIG. 4, each heater 3 is supported by a furnace body 2 via a bracket 5. Each heater 3 includes a heater body 10 and a heater cover 11 that covers the lower side of the heater body 10. The heater body 10 is configured by sandwiching a heating element 10a that generates heat when energized between aluminum plates 10b and 10c, and its upper surface is a heating surface 3a. The heating target 4 is supported by the support piece 6 protruding from the heating surface 3a. The heater cover 11 is made of a stainless steel plate, and includes a bottom plate 11a and a peripheral wall 11b extending upward from the outer edge of the bottom plate 11a. The bottom surface of the bottom plate 11a is a reflective surface 11a 'having a metallic luster, and reflects the heat rays emitted from the heating surface 3a. Thereby, the heating object 4 is directly radiantly heated from below by the heater 3 and indirectly radiantly heated from above.
[0012]
A gas flow space 20 surrounded by the heater body 10 and the heater cover 11 is provided inside each heater 3. As shown in FIG. 5, the gas flow space 20 is divided by a partition wall 21 into a chamber 20a near the center of the heating surface 3a and a chamber 20b closer to the periphery than the chamber 20a near the center. The partition wall 21 is provided with a gas flow hole 21a that communicates adjacent chambers.
[0013]
A gas introduction pipe 22 is provided as a gas introduction means for introducing gas into the gas flow space 20 of each heater 3. One end of the gas introduction pipe 22 is connected to a gas supply source (not shown) outside the furnace body 2. The other end of the gas introduction pipe 22 is branched so as to be inserted into each heater 3, and is arranged in a chamber 20 a near the center of the heating surface 3 a in each gas flow space 20. Thereby, the other end of the gas introduction pipe 22 is a blowout port 22a through which gas is blown out from the vicinity of the center of the heating surface 3a in the gas flow space 20. The gas blown from the blowout port 22a is introduced into the chamber 20a in the vicinity of the center of the heating surface 3a, and then passes through the gas circulation hole 21a as shown by the arrow in FIG. 5 to approach the periphery of the heating surface 3a. Flow into the chamber 20b. That is, the gas introduced into the gas flow space 20 flows from the center of the heating surface 3a toward the periphery. In order to preheat the gas introduced into the gas flow space 20, a heater 26 for preheating the gas flowing through the gas introduction pipe 22 is attached to the furnace body 2 as shown in FIG.
[0014]
In order to discharge the gas introduced into the gas flow space 20, a plurality of discharge ports 23 are provided in the bottom plate 11 a of the heater cover 11 of each heater 3. Each outlet 23 is close to the periphery of the heating surface 3a. Each discharge port 23 is arranged at a position farther from the center of the heating surface 3a than the arrangement region of the heating target 4 so that the gas discharged from each discharge port 23 is not directly blown onto the heating target 4. . The number and arrangement of the discharge ports 23 are not particularly limited as long as the gas introduced into the gas flow space 20 can flow from the center of the heating surface 3a toward the periphery.
[0015]
In order to guide the gas discharged from the discharge port 23 to the outside of the furnace body 2, exhaust pipes 27 having a plurality of gas inflow holes 27 a formed on the outer periphery are provided on both sides of each heater 3. One end of each exhaust pipe 27 is closed, and the other ends are connected to each other and open outside the furnace body 2. In addition, the gas inflow hole 27a of each exhaust pipe 27 is formed at a position facing the entrance / exit of the furnace body 2, and thereby the gas discharged from the exhaust port 23 is guided toward the entrance / exit of the furnace body 2. Therefore, when the door of the furnace body 2 closed by the opening / closing doors 2a and 2b is opened, the outside air is prevented from entering the furnace body 2 from the door and the temperature in the furnace body 2 is suppressed. Reduction can be reduced.
[0016]
The type of the gas is not particularly limited as long as it does not affect the heating target 4, and for example, nitrogen gas or dry air can be used. The gas flow rate may be appropriately determined according to the scale of the heating device 1 and the set temperature of the heater 3. For example, when the dimensions of each heater 3 are 950 mm × 1140 mm × 38 mm, the parallel pitch is 75 mm to 90 mm, and five heating objects 4 are processed, the gas flow rate is 20 to 100 liters per minute for each heater. The temperature of the gas is preferably about 20 ° C. lower if the set temperature of the heater 3 is 100 ° C. to 180 ° C., for example, and about 30 ° C. lower if the set temperature of the heater 3 is 180 ° C. to 250 ° C. The present invention is not limited to this, and it is not always necessary to preheat the gas.
[0017]
According to the above-described embodiment, when the heating object 4 disposed so as to face the heating surface 3a is radiantly heated between the heaters 3 adjacent to each other, the gas flowing into the gas flow space 20 is lower in temperature than the set temperature of the heater. And the gas introduced into the gas flow space 20 flows from the center of the heating surface 3a toward the periphery. Thereby, in the arrangement | positioning area | region of the heating target 4, the thermal radiation in the center vicinity of the heating surface 3a can be accelerated | stimulated. Therefore, the temperature distribution of the heating surface 3a can be made uniform with high accuracy in a short time, and the heating object 4 can be heated uniformly. By providing the gas flow space 20 in each heater 3, the weight can be reduced as compared with a solid heater. Moreover, since it is only necessary to provide the gas outlet 22a in the vicinity of the center of the heating surface 3a and the gas outlet 23 in the vicinity of the periphery of the heating surface 3a, it is possible to carry out at a low cost without requiring a complicated configuration. Can do. In the gas flow space 20, the gas flows from the chamber 20a near the center of the heating surface 3a to the chamber 20b near the periphery through the gas flow hole 21a, so that the gas surely flows from the center of the heating surface 3a toward the periphery. be able to. Furthermore, since the gas discharged from the discharge port 23 is not directly blown onto the heating object 4, temperature fluctuations of the heating object 4 due to the gas can be prevented.
[0018]
【Example】
FIG. 6 shows changes over time in the temperature and temperature deviation of the glass substrate for flat panel display heated by the heating device 1 of the above embodiment. The dimensions of the glass substrate were 730 mm × 920 mm × 0.7 mm, the set temperature of the heater 3 was 230 ° C., and the gas flow rate was 30 liters per minute. In the figure, the horizontal axis represents the heating time, the left vertical axis represents the glass substrate surface temperature, and the right vertical axis represents the glass substrate surface temperature deviation. In the figure, the solid line A is the time change of the temperature of the maximum surface temperature position of the glass substrate, the solid line B is the time change of the temperature of the minimum surface temperature position of the glass substrate, and the broken line C is a deviation from the set temperature of the maximum surface temperature position of the glass substrate. , The broken line D represents the time variation of the deviation from the set temperature of the minimum surface temperature position of the glass substrate, and the broken line E represents the time variation of the deviation between the temperature of the maximum surface temperature position of the glass substrate and the temperature of the minimum surface temperature position. Show. Thereby, according to the heating apparatus 1 of the said embodiment, it has confirmed that the deviation of the maximum surface temperature and the minimum surface temperature could be 5 degrees C or less in about 6 minutes. On the other hand, when the gas is not supplied, the deviation does not become smaller than about 10 ° C. even when time elapses, and a very long time is required until the target deviation is reached. Sometimes it took. That is, according to the present invention, it was confirmed that the temperature distribution in the heating region can be made uniform in a short time and the heating object can be uniformly heated with high accuracy.
[0019]
【The invention's effect】
According to the present invention, the temperature distribution in the heating region between a plurality of panel heaters arranged in parallel can be made uniform in a short time with a low-cost and simple configuration, and the heating target can be uniformly heated with high accuracy. Further, it is possible to provide a heating method and a heating apparatus that can reduce the weight of each heater and save energy.
[Brief description of the drawings]
FIG. 1 is a side view of a heating apparatus according to an embodiment of the present invention. FIG. 2 is a plan view of the heating apparatus according to an embodiment of the present invention. FIG. 4 is a side cross-sectional view of the main part of the heating device according to the embodiment of the present invention. FIG. 5 is a plan cross-sectional view of the main part of the heating device of the embodiment of the present invention. Of time variation of temperature and temperature deviation of substrate heated by heat 【Explanation of symbols】
DESCRIPTION OF SYMBOLS 1 Heating apparatus 2 Furnace body 3 Panel heater 3a Heating surface 4 Heating object 20 Gas flow space 20a Chamber 20b near the center of the heating surface Chamber 21 closer to the periphery than a chamber near the center of the heating surface Partition wall 21a Gas flow hole 22 Gas inlet piping 22a Outlet 23 Outlet

Claims (3)

間隔をおいて並列する複数のパネル状ヒーターを備え、
互いに隣接する前記ヒーターの間において、前記ヒーターの加熱面に対向するように加熱対象が配置される加熱装置であって、
各ヒーターの内部にガス流動空間が設けられ、
そのガス流動空間にガスを導入するためのガス導入手段が設けられ、
前記ガス導入手段は、前記ガス流動空間において前記加熱面の中央近傍からガスを吹き出す吹出し口を有し、
そのガス流動空間に導入されたガスが前記加熱面の中央から周辺に向かい流動するように、そのガスは加熱面の中央近傍に導入され、
各ヒーターに、そのガス流動空間に導入されたガスの排出口が、前記加熱面の周辺に近接する位置に設けられ、
前記ヒーターは加熱対象の出入り口を有する炉体の内部に配置され、
前記排出口から排出されるガスを、その炉体の出入り口に向かい導く手段が設けられていることを特徴とする加熱装置。A plurality of panel heaters arranged in parallel at intervals,
Between the heaters adjacent to each other, a heating device in which a heating target is arranged so as to face the heating surface of the heater,
A gas flow space is provided inside each heater,
Gas introducing means for introducing gas into the gas flow space is provided,
The gas introduction means has a blowout port for blowing out gas from the vicinity of the center of the heating surface in the gas flow space,
The gas is introduced near the center of the heating surface so that the gas introduced into the gas flow space flows from the center of the heating surface toward the periphery,
In each heater, a gas outlet introduced into the gas flow space is provided at a position close to the periphery of the heating surface,
The heater is arranged inside a furnace body having an entrance to be heated,
A heating device characterized in that means for guiding the gas discharged from the discharge port toward the doorway of the furnace body is provided. 各ヒーターに、前記ガス流動空間を前記加熱面の中央近傍の室と、この中央近傍の室よりも周辺に近接する室とに分割する隔壁が設けられ、
その隔壁に、相隣接する室を連絡するガス流通孔が設けられ、
その加熱面の中央近傍の室に前記ガス導入手段によってガスが導入される請求項１に記載の加熱装置。 Each heater is provided with a partition that divides the gas flow space into a chamber near the center of the heating surface and a chamber closer to the periphery than the chamber near the center,
The partition wall is provided with a gas flow hole that communicates between adjacent chambers,
The heating apparatus according to claim 1, wherein gas is introduced into the chamber near the center of the heating surface by the gas introduction means . 請求項１または２に記載の加熱装置によって、互いに隣接する前記ヒーターの間において、前記ヒーターの加熱面に対向するように配置される加熱対象を加熱するに際して、
各ヒーターの内部に設けたガス流動空間に、ヒーターの設定温度よりも低温のガスを導入し、そのガス流動空間に導入されたガスを、前記加熱面の中央から周辺に向かい流動させることを特徴とする加熱方法。 When heating a heating object arranged so as to face the heating surface of the heater between the heaters adjacent to each other by the heating device according to claim 1 or 2,
A gas having a temperature lower than the set temperature of the heater is introduced into the gas flow space provided in each heater, and the gas introduced into the gas flow space flows from the center of the heating surface toward the periphery. Heating method .
JP2001332949A 2001-10-30 2001-10-30 Heating method and heating apparatus Expired - Lifetime JP3665283B2 (en)

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