TW513550B - Heating method and heating device - Google Patents
Heating method and heating device Download PDFInfo
- Publication number
- TW513550B TW513550B TW091100768A TW91100768A TW513550B TW 513550 B TW513550 B TW 513550B TW 091100768 A TW091100768 A TW 091100768A TW 91100768 A TW91100768 A TW 91100768A TW 513550 B TW513550 B TW 513550B
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- heating
- heater
- center
- heating surface
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D11/00—Arrangement of elements for electric heating in or on furnaces
- F27D11/02—Ohmic resistance heating
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
- F27B17/0083—Chamber type furnaces with means for circulating the atmosphere
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/02—Supplying steam, vapour, gases, or liquids
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Furnace Details (AREA)
- Devices For Use In Laboratory Experiments (AREA)
- Surface Heating Bodies (AREA)
Abstract
Description
1 五、發明説明( 發明之領域 本發明係有關一種加熱方法及加熱裝置。其為藉由互相 隔開且並列的複數面板狀加熱器,將加熱對象加熱,例如 月b夠利用在平面面板顯示器用的基板加熱。 相關技術之說明 從先前一直所實施的係藉由具備互相隔開且並列的多數 面板狀加熱器(3)的加熱裝置,在互相鄰接的上述加熱器(3) 之間,將相對於上述加熱器(3)的加熱表面(3a)而配置的加 熱對象(4)加熱。 在如上述的互相鄰接的面板狀加熱器之間的加熱領域, 於加熱器加熱表面的中央附近比四周附近變成散熱較少。 爲此,有各加熱表面溫度分布的一致性問題。因此,考慮 在加熱表面的中央附近將加熱器的輸出比起四周附近還降 低。但是’那樣的加熱器輸出調整需要時間。此外,例如 加熱溫度是250度以下比較低溫的時候,儘管調整加熱器輸 出也很難確實地確保溫度分布的一致性。· 本發明之目的係提供能夠解決上述問題的加熱方法及加 熱裝置。 發明之概要 本發明方法之特徵,為藉由具備互相隔開且並列的多數 面板狀加熱器的加熱裝置,在互相鄰接的加熱器之間,將 相對於加熱器加熱表面而配置的加熱對象加熱之際,在設 於各加熱器内部的氣體流動空間,引進比加熱器的設定溫 度更低溫的氣體’使被引進於那氣體流動空間的氣體,從 -4- 本紙張尺度適财S國家標準(CNS)Tlii^^297公釐) 513550 A7 B7 五、發明説明(2 ) 上述加熱表面的中央向四周流動。 如果根據本發明方法,因為在設於上述加熱器内部的氣 體流動空間,使比加熱器的設定溫度更低溫的氣體,從加 熱表面的中央向四周流動,所以能夠促進於在加熱對象的 配置領域於加熱器的加熱表面中央附近的散熱。藉此,能 夠將加熱表面的溫度分佈以短時間且高精度地一致化,而 將加熱對象平均加熱。 本發明裝置係一種加熱裝置,其特徵為藉由具備隔開且 並列的多數面板狀加熱器,在互相鄰接的上述加熱器之 間,配置有相對於上述加熱器加熱表面的加熱對象,在各 加熱器的内部設有氣體流動空間,及為了將氣體引進那氣 體流動空間的引進手段,被引進於那氣體流動空間(20)的 氣體,從上述加熱器加熱表面的中央向四周流動,而被引 進於加熱表面的中央附近。 如果根據本發明裝置,就能夠實施本發明方法。再者由 於在各加熱器設有氣體流動空間,所以比起實心的加熱器 能夠更輕型化。 在本發明裝置的上述氣體引進手段,理想的是在上述氣 體流動空間具有從上述加熱表面的中央附近吹出氣體的吹 出口,且在各加熱器,引進至其氣體流動空間的氣體排出 口,被設在接近上述加熱表面四周的位置。 因此,不需要複雜的結構以低成本就能夠實施本發明方 法。 在本發明裝置的各加熱器,理想的是設有一種隔牆,其 -5- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)1 V. Description of the Invention (Field of the Invention) The present invention relates to a heating method and a heating device. The heating object is heated by a plurality of parallel panel-shaped heaters spaced apart from each other. For example, month b can be used in a flat panel display. The description of the related art has been carried out previously by using a heating device having a plurality of panel-shaped heaters (3) spaced apart from each other in parallel, and between the adjacent heaters (3), The object to be heated (4) disposed with respect to the heating surface (3a) of the heater (3) is heated. In the heating area between the adjacent panel-shaped heaters as described above, near the center of the heating surface of the heater It has less heat dissipation than the surrounding area. Therefore, there is a problem in the consistency of the temperature distribution of each heating surface. Therefore, it is considered that the output of the heater near the center of the heating surface is lower than that of the surrounding area. It takes time to adjust. For example, when the heating temperature is lower than 250 ° C, it is difficult to accurately adjust the heater output. Maintain the uniformity of the temperature distribution. The object of the present invention is to provide a heating method and a heating device that can solve the above problems. SUMMARY OF THE INVENTION The method of the present invention is characterized by having a plurality of panel-shaped heaters spaced apart from each other and arranged in parallel. The heating device introduces a lower temperature than the set temperature of the heater in the gas flow space provided inside each heater when heating a heating object arranged relative to the heater heating surface between adjacent heaters. "Gas" makes the gas introduced into the gas flow space from -4- Paper size National Standard (CNS) Tlii ^^ 297 mm) 513550 A7 B7 5. Description of the invention (2) The center of the above heating surface Flow around. According to the method of the present invention, in the gas flow space provided inside the heater, a gas having a temperature lower than the set temperature of the heater flows from the center of the heating surface to the surroundings, so that it can be promoted in the area where the object is heated. Heat is radiated near the center of the heating surface of the heater. Thereby, the temperature distribution of the heating surface can be uniformized in a short time and with high accuracy, and the object to be heated can be evenly heated. The device according to the present invention is a heating device characterized in that a plurality of panel-shaped heaters are arranged in parallel and spaced apart, and between the heaters adjacent to each other, a heating object with respect to a heating surface of the heater is arranged in each of the heaters. A gas flow space is provided inside the heater, and in order to introduce gas into the gas flow space, the gas introduced into the gas flow space (20) flows from the center of the heating surface of the heater to the surroundings, and is Introduced near the center of the heated surface. If the device according to the invention is used, the method of the invention can be carried out. Furthermore, since a gas flow space is provided in each heater, it can be made lighter than a solid heater. In the above-mentioned gas introduction means of the apparatus of the present invention, it is desirable that the gas flow space has a blow-out port for blowing gas from near the center of the heating surface, and that each heater introduces a gas discharge port into the gas-flow space. It is located near the periphery of the heating surface. Therefore, the method of the present invention can be carried out without requiring a complicated structure at low cost. Each heater in the device of the present invention is desirably provided with a partition wall. The paper size is compliant with China National Standard (CNS) A4 (210 X 297 mm).
線 513550 五、發明説明( 係分割上述氣體流動空間與上述加熱表面中央附近的隔 間’及此中央附近的隔間更接近四周的隔間;在其隔牆設 有連絡鄰接隔間的氣體流通孔,在其加熱表面中央附近的 隔間,藉由上述氣體引進手段引進氣體。 藉此,能夠確實地使氣體從加熱表面的中央向四周流 動。 - 在本發明裝置,理想的是上述氣體的排出口,從其排出 口排出的氣體並不直接喷吹上述加熱對象,而是被設在比 上述加熱對象的配置領域更加離開上述加熱表面中央的位 置。 藉此,能夠防止由於其氣體的加熱對象的溫度變動。 至於本發明裝置,令人滿意的是上述加熱器被配置在具 有=熱對象的出入口的爐体内部,及將從上述排出口排出 的氣體,向其爐体的出入口引導的手段。 藉此,藉由從那排出口排出的氣體,抑制外面的空氣從 爐体的出入口侵入爐体内,減輕爐体内的溫度降低,能夠 防止爐体内溫度變成不平均的同時,還能夠謀求省能源 化。 如果根據本發明,係能夠將在並列配置的多數的面板狀 加熱时之間的加熱領域的溫度分布,藉由低價格、簡單的 、’。構在短時間内-致化,能夠將加熱對象高精度地平均加 熱,並且提供將各加熱器輕量化的同時,還能夠謀求省能 源化的加熱方法及加熱裝置。 圖面之簡要説明 -6- 本紙張尺度適财㈣家料(CNS) ^格 X 297公釐) B7 B7五、發明説明(4 ) 圖1係本發明實施形態的加熱裝置的側視圖。 圖2係本發明實施形態的加熱裝置的平面圖。 圖3係表不在本發明實施形態的加熱裝置的面板狀加熱器 的並列狀態的立體圖。 圖4係在本發明實施形態的加熱裝置主要部份的側視剖面 圖。 ' 圖5係在本發明實施形態的加熱裝置主要部份的平面剖面 圖。 圖6係表示藉由本發明的加熱裝置加熱過的基板溫度及溫 度偏差的時間變化的圖。 適合實施例子的詳細的說明 在圖1、圖2所示的加熱裝置丨係具備爐體2及配置於該爐 體2内部的多數面板狀加熱器3。其加熱器3能夠有效率地利 用空間,如圖3所示以厚度方向為上下方向,沿著上下方向 互相地隔開而並列。板狀的加熱對象4係以厚度方向作為上 下方向,在互相鄰接的加熱器3之間,相對於藉於由加熱器 3的上面所構成的加熱表面而被配置。其加熱表面及加熱對 象4的上面沿著水平被配置。在本實施形態,藉由爐體2的 兩側的開閉門2a,2b從被開關的出入口存取加熱對象4。 如圖4所示,各加熱器3是藉由爐體2經由支架5被支撑。 各加熱器3具有加熱器本體10,及遮蔽該加熱器本體1〇的下 邊的加熱器覆盍物11。其加熱器本體,將由通上電流發 熱的發熱体l〇a,藉由鋁板i〇b,i〇c夾緊而構成,其上面當 作加熱表面3a。藉由從其加熱表面3a突出的支撐物6支撐加 -Ί, 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐) 513550 A7 B7 五、發明説明(5 ) 熱對象4。其加熱器覆蓋物丨丨是不銹鋼鋼板製品,由底板 1 la及從此底板丨ia的外緣延伸至上方的周墙丨lb所從構 成。其底板11a的下面被做成具有金屬光澤的折射表面 Ua’,折射從加熱表面3a發出的熱線。藉此,加熱對象4從 下邊錯由加熱器3直接地被輻射加熱的同時,從上方間接地 被賴射加熱。 在各加熱器3的内部’設有用其加熱器本體1〇及加熱器覆 盍物11包圍的氣體流動空間20。如圖5所示,其氣體流動空 間20 ’被加熱表面3a的中央附近的隔間2〇a及比起該中央附 近的隔間20a更加接近四周的隔間20b,藉由隔牆21分割 着。在其隔牆21,設有連絡鄰接隔間的氣體流通孔21a。 在各加熱器3的氣體流動空間20,作為為了引進氣體的引 進手段,而設有氣體引進配管22。其氣體引進配管22的一 端’被連接在爐體2的外部的氣體供應來源(圖示省略)。其 氣體引進配管22的另一端,被各加熱器3插入而分岐,在各 氣體流動空間2 0被配置於加熱表面3 a中央附近的隔間2 0 a。 藉此,其氣體引進配管22的另一端,作為在氣體流動空間 20從加熱表面3a的中央附近吹出氣體的吹出口 22a。從其吹 吹出口 22a吹出的氣體,被引進入加熱表面3a的中央附近的 隔間20a之後,通過如在圖5箭頭所示的上述氣體流通孔 21a ’流動至接近加熱表面3a四周的隔間20b。亦即,被引 進至其氣體動空間2 0的氣體從加熱表面3a的中央向四周 流動。再者,為了將引進至其氣體流動空間2〇的氣體預 熱,如圖2所示,在爐體2安裝流經其氣體引進配管22的氣 -8- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 裝Line 513550 V. Description of the invention (Describes the above-mentioned gas flow space and the compartment near the center of the heating surface 'and the compartment near this center closer to the surrounding compartments; the partition wall is provided with a gas flow connecting adjacent compartments A hole is introduced into the compartment near the center of the heating surface by the above-mentioned gas introduction means. By this, the gas can be reliably flowed from the center of the heating surface to the surroundings.-In the device of the present invention, the gas In the exhaust port, the gas exhausted from the exhaust port does not directly blow the heating target, but is provided at a position farther away from the center of the heating surface than the arrangement area of the heating target. This can prevent heating by the gas. The temperature change of the object. As for the device of the present invention, it is desirable that the heater is disposed inside the furnace body having the inlet and outlet of the hot object, and the gas discharged from the outlet is guided to the inlet and outlet of the furnace body. By this means, the exhaust gas from the exhaust port is used to prevent outside air from entering the furnace body through the inlet and outlet of the furnace body. In order to reduce the temperature drop in the furnace, it is possible to prevent the temperature in the furnace from becoming uneven, and also to save energy. According to the present invention, it is possible to heat a plurality of panels arranged side by side in the heating area between The temperature distribution is low-priced, simple, and can be heated in a short period of time. It can evenly heat the object to be heated with high accuracy, and it also provides energy saving while reducing the weight of each heater. Heating method and heating device. Brief description of the drawing -6- This paper size is suitable for household materials (CNS) ^ X X 297 mm) B7 B7 V. Description of the invention (4) Figure 1 shows the heating of the embodiment of the present invention Side view of the appliance. Fig. 2 is a plan view of a heating device according to an embodiment of the present invention. Fig. 3 is a perspective view showing a juxtaposed state of panel heaters of the heating device according to the embodiment of the present invention. Fig. 4 is a side sectional view of a main part of a heating apparatus according to an embodiment of the present invention. Fig. 5 is a plan sectional view of a main part of the heating device according to the embodiment of the present invention. Fig. 6 is a graph showing a substrate temperature heated by the heating apparatus of the present invention and a time variation of a temperature deviation. Detailed description of a suitable implementation example The heating device shown in Figs. 1 and 2 includes a furnace body 2 and a plurality of panel-shaped heaters 3 arranged inside the furnace body 2. The heater 3 can efficiently use the space. As shown in FIG. 3, the thickness direction is used as the up-down direction, and they are spaced apart from each other and aligned side by side. The plate-shaped heating object 4 has a thickness direction as an up-down direction, and is disposed between adjacent heaters 3 with respect to a heating surface formed by the upper surface of the heater 3. The heating surface and the upper surface of the heating object 4 are arranged horizontally. In this embodiment, the heating target 4 is accessed from the opened / closed door through the opening / closing doors 2a, 2b on both sides of the furnace body 2. As shown in FIG. 4, each heater 3 is supported by a furnace body 2 via a bracket 5. Each of the heaters 3 includes a heater body 10 and a heater cover 11 that covers the underside of the heater body 10. The heater body is constituted by a heating element 10a that is heated by passing an electric current, and is clamped by aluminum plates i0b, ioc, and the upper surface is used as a heating surface 3a. Supported by a support 6 protruding from its heating surface 3a, this paper size applies Chinese National Standard (CNS) A4 specifications (210X 297 mm) 513550 A7 B7 V. Description of the invention (5) Hot object 4. The heater cover is made of stainless steel plate, and is composed of a bottom plate 1 la and a peripheral wall extending from the outer edge of the bottom plate ia to the upper side. The bottom surface of the bottom plate 11a is made of a metallic glossy refracting surface Ua ', which refracts the heat rays emitted from the heating surface 3a. Thereby, the heating object 4 is directly radiantly heated by the heater 3 from the lower side, and is also indirectly heated by the radiation from the upper side. Inside each of the heaters 3, a gas flow space 20 surrounded by a heater body 10 and a heater covering 11 is provided. As shown in FIG. 5, the gas flow space 20 ′ of the compartment 20 a near the center of the heated surface 3 a and the compartments 20 b closer to the surroundings than the compartment 20 a near the center are divided by the partition wall 21. . The partition wall 21 is provided with a gas circulation hole 21a that communicates with the adjacent partition. The gas flow space 20 of each heater 3 is provided with a gas introduction pipe 22 as an introduction means for introducing gas. One end 'of the gas introduction pipe 22 is connected to a gas supply source (not shown) outside the furnace body 2. The other end of the gas introduction pipe 22 is inserted and divided by each heater 3, and each gas flow space 20 is arranged in a compartment 20a near the center of the heating surface 3a. Thereby, the other end of the gas introduction pipe 22 serves as a blow-out port 22a for blowing out gas from the vicinity of the center of the heating surface 3a in the gas flow space 20. The gas blown from its blowing outlet 22a is drawn into the compartment 20a near the center of the heating surface 3a, and then flows through the above-mentioned gas circulation hole 21a 'as shown by the arrow in FIG. 5 to the compartment close to the periphery of the heating surface 3a. 20b. That is, the gas introduced into its gas dynamic space 20 flows from the center of the heating surface 3a to the surroundings. Furthermore, in order to preheat the gas introduced into the gas flow space 20, as shown in FIG. 2, a gas-8 flowing through the gas introduction pipe 22 of the furnace body 2 is installed. ) A4 size (210 X 297 mm)
線 513550 第091100768號專利申請案 中文說明書修正頁(91年9月) A7 B7Line 513550 Patent Application No. 091100768 Patent Application Manual (September 91) A7 B7
五 發明説明(6 體預熱用加熱器26。 為了排出被引進至其氣體流動空間20在的氣體,在各加熱 器3的加熱器覆蓋物11的底板11a設有多數的排出口 23。各 排出口 23接近加熱表面3a的四周。從各排出口 23排出的氣 體並不直接喷吹上述加熱對象,而是各排出口23被配置在比 起加熱對象4的配置領域更從加熱表面從3a的中央離開的位 置。再者,排出口 23的數目或配置,只要能夠使引進至氣體 流動空間20的氣體從加熱表面3a的中央向四周流動的話, 並不特別限定。 為了引導從其排出口 23排出的氣體至爐體2的外部,在各 加熱器3的兩側,於外周設有形成多數的氣體流入孔27a的 排氣用配管27。各排氣用配管27的一端被封閉,另一端互 相地被連接而在爐體2的外部開口。再者,各排氣用配管27 的氣體流入孔27a是被形成在相對於爐體2出入口的位置, 藉此,從排出口 23排出的氣體向着爐體2的出入口而被引 導。因此,打開藉由其開閉門2a、2b而被封閉的爐體2的出 入口之時,靠著其氣體抑制外面的空氣從其出入口侵入爐體 2内部,而能夠減輕爐體2内部的溫度降低。 其氣體的種類,只要不對加熱對象4有影響的話,就不特 別地限定,例如能夠用氮氣或乾空氣。其氣體流量只要依加 熱裝置1的規模或加熱器3的設定溫度適度地決定就可以。例 如,各加熱器3的尺寸是950 mm X 1140 mm X 38 mm,並 列間距是7 5 mm〜90 mm,處理5片的加熱對象4的時候, 氣體流量為各加熱器每分鐘20〜100公升。氣體的 -9- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)Fifth invention description (six-body preheating heater 26. In order to exhaust the gas introduced into the gas flow space 20, a plurality of discharge ports 23 are provided on the bottom plate 11a of the heater cover 11 of each heater 3. Each The discharge port 23 is close to the periphery of the heating surface 3a. The gas discharged from each discharge port 23 does not directly blow the above-mentioned heating target, but each discharge port 23 is arranged more from the heating surface from 3a than the arrangement area of the heating target 4. The position at which the center is separated. The number or arrangement of the discharge ports 23 is not particularly limited as long as the gas introduced into the gas flow space 20 can flow from the center of the heating surface 3a to the surroundings. The exhaust gas 23 is discharged to the outside of the furnace body 2, and on both sides of each heater 3, an exhaust pipe 27 is formed on the periphery to form a large number of gas inflow holes 27a. One end of each exhaust pipe 27 is closed, and the other One ends are connected to each other and open to the outside of the furnace body 2. Further, the gas inflow holes 27a of the exhaust pipes 27 are formed at positions relative to the inlet and outlet of the furnace body 2, thereby discharging from the discharge port 23 The gas is guided toward the entrance and exit of the furnace body 2. Therefore, when the entrance and exit of the furnace body 2 closed by its opening and closing doors 2a and 2b is opened, the outside air is suppressed by the gas to enter the furnace body 2 from its entrance and exit. The inside can reduce the temperature drop inside the furnace body 2. The type of gas is not particularly limited as long as it does not affect the heating object 4, for example, nitrogen or dry air can be used. The gas flow rate can be determined by the heating device 1 The scale or the set temperature of the heater 3 can be appropriately determined. For example, the size of each heater 3 is 950 mm X 1140 mm X 38 mm, and the parallel pitch is 7 5 mm to 90 mm. At that time, the gas flow rate is 20 to 100 liters per minute for each heater. The gas size is -9- This paper size applies to China National Standard (CNS) A4 specifications (210 X 297 mm)
裝Hold
513550 A7 B7 五、發明説明(7 ) 溫度,例如如果加熱器3的設定溫度是100 °C〜180 °C的 話,要降低20°C左右,如果加熱器3的設定溫度是180°C〜 250°C的話,理想的是降低30°C左右,但是並非一定被限制 於此,此外,也不一定要將氣體預熱。 如果根據上述實施形態,在互相鄰接的加熱器3之間,將 相對於加熱表面3a而配置的加熱對象4輻射加熱之際,在流 動空間20引進比加熱器設定溫度4更低溫的氣體,使被引進 於其氣體流動空間20的氣體,從加熱表面3a的中央向四周 流動。藉此,能夠促進在加熱對象4的配置領域於加熱器的 加熱表面3a中央附近的散熱。因此,能夠將加熱表面3a的 溫度分佈以短時間且高精度地一致化,而將加熱對象4平均 加熱。由於在各加熱器3設有氣體流動空間20,所以比起實 心的加熱器能夠更輕型化。此外,因為只要在加熱表面3a 中央附近設有氣體的吹出口,及接近加熱表面3a四周的氣 體排出口 23就可以,所以不需要複雜的結構以低成本就能 夠實施本發明方法。因為在其氣體流動空間20,氣體從加 熱表面3 a中央附近的隔間20a通過接近四周的隔間20b的流 通孔流動;所以能夠確實地使氣體從加熱表面3a的中央向 四周流動。再者,因為從排出口 23排出的氣體並不直接噴 吹加熱對象,所以能夠防止由於其氣體的加熱對象4的溫度 變動。 實施例 圖6係表示根據上述實施形態的加熱裝置1,已加熱的平 面面板顯示器用玻璃基板的溫度及溫度偏差的時間變化。 -10- 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐) 裝513550 A7 B7 V. Description of the invention (7) Temperature, for example, if the set temperature of heater 3 is 100 ° C ~ 180 ° C, lower it by about 20 ° C, if the set temperature of heater 3 is 180 ° C ~ 250 It is desirable to lower the temperature by about 30 ° C, but it is not necessarily limited to this, and it is not necessary to preheat the gas. According to the above-mentioned embodiment, when the heating object 4 disposed with respect to the heating surface 3a is radiated between adjacent heaters 3, a gas having a lower temperature than the heater set temperature 4 is introduced into the flow space 20, so that The gas introduced into the gas flow space 20 flows from the center of the heating surface 3a to the surroundings. Thereby, it is possible to promote heat radiation near the center of the heating surface 3a of the heater in the arrangement area of the heating object 4. Therefore, the temperature distribution of the heating surface 3a can be uniformized in a short time and with high accuracy, and the heating target 4 can be evenly heated. Since the gas flow space 20 is provided in each heater 3, it can be made lighter than a solid heater. In addition, since it is sufficient to provide a gas outlet near the center of the heating surface 3a and a gas outlet 23 near the periphery of the heating surface 3a, the method of the present invention can be carried out without requiring a complicated structure at low cost. In the gas flow space 20, the gas flows from the compartment 20a near the center of the heating surface 3a through the through-holes of the surrounding compartments 20b; therefore, the gas can be reliably flowed from the center of the heating surface 3a to the surroundings. Furthermore, since the gas discharged from the discharge port 23 does not directly blow the heating target, it is possible to prevent the temperature of the heating target 4 from being fluctuated due to the gas. Example Fig. 6 shows the temperature change of a heated glass substrate for a flat panel display according to the heating device 1 according to the above embodiment and the time variation of the temperature deviation. -10- This paper size applies to China National Standard (CNS) A4 (210X 297mm)
線 513550 A7 B7 五、發明説明(8 ) 其玻璃基板尺寸是730 mm X 92 0 mm X 0.7 mm,加熱器3 的設定溫度為230°C,氣體流量為每分30公升。圖的橫軸為 加熱時間,左邊縱軸是玻璃基板的表面溫度,右邊縱轴係 表示玻璃基板的表面溫度的偏差。至於圖的實線A係表示玻 璃基板的最高表面溫度位置的溫度的時間變化,實線B係玻 璃基板的最低表面溫度位置的溫度的時間變化,虛線C係從 玻璃基板的最高表面溫度位置的設定溫度的偏差的時間變 化,虛線D係從玻璃基板的最低表面溫度位置的設定溫度的 偏差的時間變化,虛線E係玻璃基板的最高表面溫度位置的 溫度及最低表面溫度位置的溫度的偏差的時間變化。藉 此,如果根據上述實施形態的加熱裝置1,能夠確認了在6 分鐘左右最高表面溫度與最低表面溫度的偏差可以到51以 下。對此,沒有供給其氣體的時候,其偏差即使經過一段 時間也沒有變成比10 °C左右還小,此外,也有到達目標的 偏差需要非常長時間的情況。亦即,確認了如果根據本發 明能夠將在加熱領域的溫度分佈以短時間且高精度地一致 化,而將加熱對象平均加熱。 -11- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)Line 513550 A7 B7 V. Description of the invention (8) The size of the glass substrate is 730 mm X 9200 mm X 0.7 mm, the set temperature of the heater 3 is 230 ° C, and the gas flow rate is 30 liters per minute. The horizontal axis of the figure is the heating time, the vertical axis on the left is the surface temperature of the glass substrate, and the vertical axis on the right indicates the deviation of the surface temperature of the glass substrate. As for the solid line A in the figure, the time variation of the temperature at the highest surface temperature position of the glass substrate is shown, the solid line B is the time variation of the temperature at the lowest surface temperature position of the glass substrate, and the dashed line C is from the highest surface temperature position of the glass substrate. The time variation of the set temperature deviation, the dotted line D is the time change of the set temperature deviation from the lowest surface temperature position of the glass substrate, and the dashed line E is the temperature deviation of the temperature of the highest surface temperature position and the lowest surface temperature position of the glass substrate. Change of time. Therefore, according to the heating device 1 of the above embodiment, it can be confirmed that the deviation between the maximum surface temperature and the minimum surface temperature can be less than 51 in about 6 minutes. On the other hand, when the gas is not supplied, the deviation does not become smaller than about 10 ° C even after a period of time, and the deviation to reach the target may take a long time. That is, it was confirmed that if the temperature distribution in the heating field can be uniformized in a short time and with high accuracy according to the present invention, the object to be heated can be evenly heated. -11- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)
裝 訂Binding
513550 修 JC;513550 Repair JC;
第091100768號專利申請案 中文說明書修正頁(91年9月) A7 B7 ”.二..义:: 年月 a 五、發明説明( 8a) 元件符號說明: 1 加熱裝置 26 預熱用加熱器 2 爐体 27 排氣用配管 2 a,2 b 開閉門 27a 氣體流入孔 3 加熱器 3a 加熱表面 4 加熱對象 5 支架 6 支撐物 10 加熱器本體 10a 發熱體 10b,10c 鋁板 11 加熱器覆蓋物 1 la 底板 1 laf 反射面 lib 周墙 20 氣體流動空間 20a,20b 隔間 2 1 隔牆 21a 氣體流通孔 22 氣體引進配管 22a 吹出口 23 排出口 -113- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)Revised page of Chinese Specification for Patent Application No. 091100768 (September 91) A7 B7 ”.II .. Meaning :: month a. V. Description of Invention (8a) Element Symbol Description: 1 Heating device 26 Preheating heater 2 Furnace 27 Exhaust piping 2 a, 2 b Opening and closing door 27a Gas inflow hole 3 Heater 3a Heating surface 4 Object to be heated 5 Bracket 6 Support 10 Heater body 10a Heater 10b, 10c Aluminum plate 11 Heater cover 1 la Base plate 1 laf Reflective surface perimeter wall 20 Gas flow space 20a, 20b Compartment 2 1 Partition wall 21a Gas flow hole 22 Gas introduction pipe 22a Blowout port 23 Discharge port -113- This paper size applies to China National Standard (CNS) A4 specifications (210 X 297 mm)
Claims (1)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001332949A JP3665283B2 (en) | 2001-10-30 | 2001-10-30 | Heating method and heating apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
TW513550B true TW513550B (en) | 2002-12-11 |
Family
ID=19148296
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW091100768A TW513550B (en) | 2001-10-30 | 2002-01-18 | Heating method and heating device |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3665283B2 (en) |
KR (1) | KR20030035742A (en) |
CN (1) | CN100362300C (en) |
TW (1) | TW513550B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021197448A (en) * | 2020-06-15 | 2021-12-27 | 光洋サーモシステム株式会社 | Thermal treatment device |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4517448A (en) * | 1981-03-23 | 1985-05-14 | Radiant Technology Corporation | Infrared furnace with atmosphere control capability |
CN1174210C (en) * | 1997-12-02 | 2004-11-03 | 康宁股份有限公司 | Tunnel Kiln for firing ceramic honeycomb bodies |
-
2001
- 2001-10-30 JP JP2001332949A patent/JP3665283B2/en not_active Expired - Lifetime
-
2002
- 2002-01-18 TW TW091100768A patent/TW513550B/en not_active IP Right Cessation
- 2002-01-28 KR KR1020020004801A patent/KR20030035742A/en not_active Application Discontinuation
- 2002-02-22 CN CNB021051224A patent/CN100362300C/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR20030035742A (en) | 2003-05-09 |
CN1417550A (en) | 2003-05-14 |
JP3665283B2 (en) | 2005-06-29 |
JP2003133033A (en) | 2003-05-09 |
CN100362300C (en) | 2008-01-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6399923B2 (en) | Heating furnace including vertically spaced-apart double-sided far-infrared-radiation panel heaters defining multi-stage drying chambers | |
US20050115958A1 (en) | Composite cooking apparatus | |
US20110126819A1 (en) | Heating cooker | |
TW513550B (en) | Heating method and heating device | |
JP2001012856A5 (en) | ||
US7000433B1 (en) | Device for heating plates of glass | |
TW533301B (en) | Heating device | |
JP3840486B2 (en) | Heating method and heating apparatus | |
KR20180043960A (en) | Apparatus for drying flexible film having air distribution function | |
KR20160007235A (en) | Hot air blowers using carbon heater | |
CN110391132A (en) | Organic membrane formation device | |
KR20060099242A (en) | An oven for bake or dry of wide lcd glass | |
JPWO2004083755A1 (en) | Multistage heating system for large substrates | |
CN208620808U (en) | A kind of Muffle furnace | |
CN217383763U (en) | High-precision experimental furnace | |
WO2024093794A1 (en) | Glass tempering heating furnace and glass tempering method | |
KR102485866B1 (en) | Apparatus for processing substrate | |
TWI833960B (en) | Heating device, heating system and heating method | |
CN210346309U (en) | Gas heating furnace capable of prestoraging hot water | |
CN109405547A (en) | Apparatus for baking | |
JP2005001808A (en) | Feed chute and feed chute heating system | |
JPH1125862A (en) | Thermal treatment device for plasma display panel | |
CN109197923A (en) | Baking machine | |
KR101445129B1 (en) | Process gas ejecting member for heat treatment apparatus | |
WO2004085942A1 (en) | Large-sized substrate multistage type heating device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MM4A | Annulment or lapse of patent due to non-payment of fees |