JP2003133033A - Heating method and heater device - Google Patents
Heating method and heater deviceInfo
- Publication number
- JP2003133033A JP2003133033A JP2001332949A JP2001332949A JP2003133033A JP 2003133033 A JP2003133033 A JP 2003133033A JP 2001332949 A JP2001332949 A JP 2001332949A JP 2001332949 A JP2001332949 A JP 2001332949A JP 2003133033 A JP2003133033 A JP 2003133033A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- heating
- heater
- center
- heating surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D11/00—Arrangement of elements for electric heating in or on furnaces
- F27D11/02—Ohmic resistance heating
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
- F27B17/0083—Chamber type furnaces with means for circulating the atmosphere
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/02—Supplying steam, vapour, gases, or liquids
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、互いに間隔をおい
て並列する複数のパネル状ヒーターにより加熱対象を加
熱する方法と装置に関し、例えばフラットパネルディス
プレイ用基板の加熱に利用できる。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for heating an object to be heated by a plurality of panel-shaped heaters arranged in parallel at intervals, and can be used for heating a flat panel display substrate.
【0002】[0002]
【従来の技術】互いに間隔をおいて並列する複数のパネ
ル状ヒーターを備える加熱装置によって、互いに隣接す
る前記ヒーターの間において、前記ヒーターの加熱面に
対向するように配置される加熱対象を加熱することが従
来から行われている。2. Description of the Related Art A heating device provided with a plurality of panel-shaped heaters arranged in parallel at intervals is used to heat an object to be heated which is arranged between the adjacent heaters so as to face a heating surface of the heaters. Has been done conventionally.
【0003】[0003]
【発明が解決しようとする課題】上記のような互いに隣
接するパネル状ヒーターの間の加熱領域においては、ヒ
ーターの加熱面の中央近傍では周辺近傍に比べて放熱が
少なくなる。そのため、各加熱面の温度分布の均一性が
低下するという問題がある。そこで、各ヒーターの出力
を加熱面の中央近傍では周辺近傍に比べて低くすること
が考えられる。しかし、そのようなヒーター出力の調整
には時間を要する。また、加熱温度が例えば250度以
下のような比較的低温である場合、ヒーター出力を調整
しても温度分布の均一性を十分に確保するのは困難であ
った。本発明は、上記問題を解決することのできる加熱
方法と加熱装置を提供することを目的とする。In the heating region between the panel-shaped heaters adjacent to each other as described above, heat radiation is less in the vicinity of the center of the heating surface of the heater than in the vicinity of the periphery. Therefore, there is a problem that the uniformity of the temperature distribution on each heating surface deteriorates. Therefore, it is conceivable to lower the output of each heater in the vicinity of the center of the heating surface than in the vicinity of the periphery. However, it takes time to adjust the heater output. Further, when the heating temperature is a relatively low temperature of, for example, 250 ° C. or less, it is difficult to sufficiently secure the uniformity of temperature distribution even if the heater output is adjusted. An object of the present invention is to provide a heating method and a heating device that can solve the above problems.
【0004】[0004]
【課題を解決するための手段】本発明方法は、互いに間
隔をおいて並列する複数のパネル状ヒーターを備える加
熱装置によって、互いに隣接する前記ヒーターの間にお
いて、前記ヒーターの加熱面に対向するように配置され
る加熱対象を加熱するに際して、各ヒーターの内部に設
けたガス流動空間に、ヒーターの設定温度よりも低温の
ガスを導入し、そのガス流動空間に導入されたガスを、
前記加熱面の中央から周辺に向かい流動させることを特
徴とする。本発明方法によれば、ヒーターの設定温度よ
りも低温のガスを、そのヒーターの内部に設けたガス流
動空間において加熱面の中央から周辺に向かい流動させ
るので、加熱対象の配置領域においてヒーターの加熱面
の中央近傍での放熱を促進することができる。これによ
り、加熱面の温度分布を短時間で高精度に均一化し、加
熱対象を均一に加熱することができる。According to the method of the present invention, a heating device having a plurality of panel-shaped heaters arranged in parallel at intervals is arranged to face a heating surface of the heater between the heaters adjacent to each other. When heating an object to be heated, the gas flowing space provided inside each heater is introduced with a gas temperature lower than the set temperature of the heater, and the gas introduced into the gas flowing space is
The heating surface is made to flow from the center toward the periphery. According to the method of the present invention, the gas having a temperature lower than the set temperature of the heater is made to flow from the center of the heating surface toward the periphery in the gas flow space provided inside the heater, so that the heating of the heater is performed in the arrangement area of the heating target. Heat dissipation in the vicinity of the center of the surface can be promoted. Thereby, the temperature distribution on the heating surface can be made uniform with high accuracy in a short time, and the heating target can be uniformly heated.
【0005】本発明装置は、間隔をおいて並列する複数
のパネル状ヒーターを備え、互いに隣接する前記ヒータ
ーの間において、前記ヒーターの加熱面に対向するよう
に加熱対象が配置される加熱装置であって、各ヒーター
の内部にガス流動空間が設けられ、そのガス流動空間に
ガスを導入するためのガス導入手段が設けられ、そのガ
ス流動空間に導入されたガスが前記加熱面の中央から周
辺に向かい流動するように、そのガスは加熱面の中央近
傍に導入されることを特徴とする。本発明装置によれば
本発明方法を実施することができる。さらに各ヒーター
にガス流動空間が設けられることで、中実のヒーターに
比べて軽量化できる。The apparatus of the present invention is a heating apparatus comprising a plurality of panel-shaped heaters arranged in parallel at intervals, and between the heaters adjacent to each other, an object to be heated is arranged so as to face the heating surface of the heater. Then, a gas flow space is provided inside each heater, gas introduction means for introducing gas into the gas flow space is provided, and the gas introduced into the gas flow space is around the center of the heating surface. The gas is introduced near the center of the heating surface so that the gas flows toward. According to the device of the present invention, the method of the present invention can be carried out. Furthermore, by providing a gas flow space in each heater, the weight can be reduced compared to a solid heater.
【0006】本発明装置において、前記ガス導入手段
は、前記ガス流動空間において前記加熱面の中央近傍か
らガスを吹き出す吹出し口を有し、各ヒーターに、その
ガス流動空間に導入されたガスの排出口が、前記加熱面
の周辺に近接する位置に設けられているのが好ましい。
これにより、本発明方法を複雑な構成を要することなく
低コストで実施することができる。In the apparatus of the present invention, the gas introduction means has a blowout port for blowing out gas from the vicinity of the center of the heating surface in the gas flow space, and each heater has a discharge port for the gas introduced into the gas flow space. It is preferable that the outlet is provided at a position close to the periphery of the heating surface.
As a result, the method of the present invention can be implemented at low cost without requiring a complicated structure.
【0007】本発明装置において、各ヒーターに、前記
ガス流動空間を前記加熱面の中央近傍の室と、この中央
近傍の室よりも周辺に近接する室とに分割する隔壁が設
けられ、その隔壁に、相隣接する室を連絡するガス流通
孔が設けられ、その加熱面の中央近傍の室に前記ガス導
入手段によってガスが導入されるのが好ましい。これに
より、確実にガスを加熱面の中央から周辺に向かい流動
させることができる。In the apparatus of the present invention, each heater is provided with a partition wall that divides the gas flow space into a chamber near the center of the heating surface and a chamber closer to the periphery than the chamber near the center. It is preferable that a gas flow hole connecting the adjacent chambers is provided, and the gas is introduced into the chamber near the center of the heating surface thereof by the gas introducing means. This ensures that the gas can flow from the center of the heating surface toward the periphery.
【0008】本発明装置において、前記ガスの排出口
は、その排出口から排出されるガスが前記加熱対象に直
接吹き付けられることがないように、前記加熱対象の配
置領域よりも前記加熱面の中央から離れた位置に設けら
れているのが好ましい。これにより、そのガスによる加
熱対象の温度変動を防止できる。In the device of the present invention, the gas discharge port has a center of the heating surface rather than a region where the heating target is arranged so that the gas discharged from the discharge port is not directly blown onto the heating target. Preferably, it is provided at a position away from. As a result, it is possible to prevent the temperature fluctuation of the heating target due to the gas.
【0009】本発明装置において、前記ヒーターは加熱
対象の出入り口を有する炉体の内部に配置され、前記排
出口から排出されるガスを、その炉体の出入り口に向か
い導く手段が設けられているのが好ましい。これによ
り、炉体の出入り口から外気が炉体内に侵入するのを、
その排出口から排出されるガスにより抑止して炉体内の
温度低下を軽減し、炉体内温度が不均一になるのを防止
することができると共に省エネルギー化を図ることがで
きる。In the apparatus of the present invention, the heater is arranged inside a furnace body having an inlet / outlet for heating, and means for guiding the gas discharged from the outlet toward the inlet / outlet of the furnace body is provided. Is preferred. This prevents outside air from entering the furnace body through the entrance and exit of the furnace body.
It is possible to suppress the temperature decrease in the furnace body by suppressing it by the gas discharged from the discharge port, prevent the temperature inside the furnace body from becoming non-uniform, and save energy.
【0010】[0010]
【発明の実施の形態】図1、図2に示す加熱装置1は、
炉体2と、この炉体2の内部に配置される複数のパネル
状ヒーター3とを備える。それらヒーター3は、空間を
効率良く利用できるように、図3に示すように厚さ方向
を上下方向として、上下方向に沿って互いに間隔をおい
て並列される。板状の加熱対象4が厚さ方向を上下方向
として、互いに隣接するヒーター3の間において、ヒー
ター3の上面により構成される加熱面に対向するように
配置される。その加熱面と加熱対象4の上下面は水平に
沿うように配置される。本実施形態では、炉体2の両側
の開閉扉2a、2bにより開閉される出入り口から加熱
対象4が出し入れされる。BEST MODE FOR CARRYING OUT THE INVENTION A heating device 1 shown in FIGS.
The furnace body 2 and a plurality of panel-shaped heaters 3 arranged inside the furnace body 2 are provided. In order to efficiently use the space, the heaters 3 are arranged in parallel with each other at intervals in the vertical direction with the thickness direction as the vertical direction as shown in FIG. The plate-shaped heating target 4 is arranged between the heaters 3 adjacent to each other with the thickness direction being the vertical direction so as to face the heating surface constituted by the upper surface of the heater 3. The heating surface and the upper and lower surfaces of the heating target 4 are arranged horizontally. In the present embodiment, the heating target 4 is put into and taken out from the entrances that are opened and closed by the opening and closing doors 2a and 2b on both sides of the furnace body 2.
【0011】図4に示すように、各ヒーター3は炉体2
によりブラケット5を介して支持されている。各ヒータ
ー3は、ヒーター本体10と、このヒーター本体10の
下方を覆うヒーターカバー11とを有する。そのヒータ
ー本体10は、通電により発熱する発熱体10aを、ア
ルミ板10b、10cにより挟み込むことで構成され、
その上面が加熱面3aとされている。その加熱面3aか
ら突出する支持片6により加熱対象4が支持される。そ
のヒーターカバー11はステンレス鋼板製で、底板11
aと、この底板11aの外縁から上方に伸びる周壁11
bとから構成されている。その底板11aの下面は金属
光沢を有する反射面11a′とされ、加熱面3aから発
する熱線を反射する。これにより加熱対象4は、下方か
らヒーター3により直接に輻射加熱されると共に、上方
から間接的に輻射加熱される。As shown in FIG. 4, each heater 3 has a furnace body 2
Is supported via the bracket 5. Each heater 3 has a heater body 10 and a heater cover 11 that covers the lower portion of the heater body 10. The heater body 10 is configured by sandwiching a heating element 10a that generates heat when energized with aluminum plates 10b and 10c,
The upper surface is the heating surface 3a. The heating target 4 is supported by the support piece 6 protruding from the heating surface 3a. The heater cover 11 is made of stainless steel plate, and the bottom plate 11
a and the peripheral wall 11 extending upward from the outer edge of the bottom plate 11a
b and. The bottom surface of the bottom plate 11a is a reflecting surface 11a 'having a metallic luster and reflects the heat rays emitted from the heating surface 3a. As a result, the heating target 4 is directly radiantly heated from below by the heater 3 and indirectly radiantly heated from above.
【0012】各ヒーター3の内部に、そのヒーター本体
10とヒーターカバー11とで囲まれるガス流動空間2
0が設けられている。図5に示すように、そのガス流動
空間20は、加熱面3aの中央近傍の室20aと、この
中央近傍の室20aよりも周辺に近接する室20bと
に、隔壁21によって分割されている。その隔壁21
に、相隣接する室を連絡するガス流通孔21aが設けら
れている。A gas flow space 2 surrounded by the heater body 10 and the heater cover 11 inside each heater 3.
0 is provided. As shown in FIG. 5, the gas flow space 20 is divided by a partition wall 21 into a chamber 20a near the center of the heating surface 3a and a chamber 20b closer to the periphery than the chamber 20a near the center. The partition 21
Further, a gas flow hole 21a for connecting the adjacent chambers is provided.
【0013】各ヒーター3のガス流動空間20にガスを
導入するためのガス導入手段としてガス導入配管22が
設けられている。そのガス導入配管22の一端は、炉体
2の外部のガス供給源(図示省略)に接続されている。
そのガス導入配管22の他端は、各ヒーター3に挿入さ
れるように分岐され、各ガス流動空間20において加熱
面3aの中央近傍の室20aに配置されている。これに
より、そのガス導入配管22の他端は、ガス流動空間2
0において加熱面3aの中央近傍からガスを吹き出す吹
出し口22aとされている。その吹出し口22aから吹
き出されたガスは、加熱面3aの中央近傍の室20aに
導入された後に、図5において矢印で示すように上記ガ
ス流通孔21aを通って、加熱面3aの周辺に近接する
室20bに流動する。すなわち、そのガス流動空間20
に導入されたガスは加熱面3aの中央から周辺に向かい
流動する。なお、そのガス流動空間20に導入するガス
を予熱するため、図2に示すように、そのガス導入配管
22を流れるガスの予熱用ヒーター26が炉体2に取り
付けられている。A gas introduction pipe 22 is provided as a gas introduction means for introducing gas into the gas flow space 20 of each heater 3. One end of the gas introduction pipe 22 is connected to a gas supply source (not shown) outside the furnace body 2.
The other end of the gas introduction pipe 22 is branched so as to be inserted into each heater 3, and is arranged in a chamber 20a in the vicinity of the center of the heating surface 3a in each gas flow space 20. Thereby, the other end of the gas introduction pipe 22 is connected to the gas flow space 2
At 0, it is an outlet 22a that blows out gas from the vicinity of the center of the heating surface 3a. The gas blown out from the outlet 22a is introduced into the chamber 20a near the center of the heating surface 3a, and then passes through the gas circulation hole 21a as shown by an arrow in FIG. Flows into the chamber 20b. That is, the gas flow space 20
The gas introduced into the heater flows from the center of the heating surface 3a toward the periphery. In order to preheat the gas introduced into the gas flow space 20, a heater 26 for preheating the gas flowing through the gas introduction pipe 22 is attached to the furnace body 2 as shown in FIG.
【0014】そのガス流動空間20に導入されたガスを
排出するため、各ヒーター3のヒーターカバー11の底
板11aに複数の排出口23が設けられている。各排出
口23は加熱面3aの周辺に近接する。各排出口23か
ら排出されるガスが加熱対象4に直接吹き付けられるこ
とがないように、各排出口23は加熱対象4の配置領域
よりも加熱面3aの中央から離れた位置に配置されてい
る。なお、排出口23の数や配置は、ガス流動空間20
に導入されたガスを加熱面3aの中央から周辺に向かい
流動させることができれば特に限定されない。In order to discharge the gas introduced into the gas flow space 20, a plurality of discharge ports 23 are provided in the bottom plate 11a of the heater cover 11 of each heater 3. Each outlet 23 is close to the periphery of the heating surface 3a. Each exhaust port 23 is arranged at a position farther from the center of the heating surface 3a than the arrangement region of the heating target 4 so that the gas exhausted from each exhaust port 23 is not directly blown to the heating target 4. . In addition, the number and arrangement of the discharge ports 23 are determined by the gas flow space 20.
There is no particular limitation as long as the gas introduced into the heating surface 3a can flow from the center of the heating surface 3a toward the periphery.
【0015】その排出口23から排出されたガスを炉体
2の外部に導くため、各ヒーター3の両側に、外周に複
数のガス流入孔27aが形成された排気用配管27が設
けられている。各排気用配管27の一端は閉鎖され、他
端は互いに接続されて炉体2の外部において開口する。
なお、各排気用配管27のガス流入孔27aは炉体2の
出入り口に対向する位置に形成され、これにより排出口
23から排出されるガスは炉体2の出入り口に向かい導
かれる。よって、その開閉扉2a、2bにより閉鎖され
ていた炉体2の出入り口を開いた時に、その出入り口か
ら外気が炉体2内に侵入するのを、そのガスにより抑止
して炉体2内の温度低下を軽減することができる。In order to guide the gas discharged from the discharge port 23 to the outside of the furnace body 2, exhaust pipes 27 having a plurality of gas inflow holes 27a on the outer periphery are provided on both sides of each heater 3. . One end of each exhaust pipe 27 is closed and the other ends are connected to each other and open outside the furnace body 2.
The gas inflow hole 27a of each exhaust pipe 27 is formed at a position facing the outlet / inlet of the furnace body 2, whereby the gas discharged from the outlet 23 is guided toward the outlet / inlet of the furnace body 2. Therefore, when the entrance / exit of the furnace body 2 which is closed by the opening / closing doors 2a and 2b is opened, the outside air is prevented from entering the furnace body 2 through the entrance / exit door by the gas, and the temperature inside the furnace body 2 is controlled. The decrease can be reduced.
【0016】そのガスの種類は、加熱対象4に影響を与
えることがなければ特に限定されず、例えば窒素ガスや
ドライエアを用いることができる。そのガス流量は加熱
装置1の規模やヒーター3の設定温度に応じて適宜定め
ればよい。例えば、各ヒーター3の寸法が950mm×
1140mm×38mmで、並列ピッチが75mm〜9
0mmで、5枚の加熱対象4を処理する場合、ガス流量
は各ヒーターあたり毎分20〜100リットルとする。
ガスの温度は、例えばヒーター3の設定温度が100℃
〜180℃であれば20℃程度低くし、ヒーター3の設
定温度が180℃〜250℃であれば30℃程度低くす
るのが好ましいが、これに限定されるものではなく、ま
た、必ずしもガスを予熱する必要はない。The type of gas is not particularly limited as long as it does not affect the object 4 to be heated, and for example, nitrogen gas or dry air can be used. The gas flow rate may be appropriately determined according to the scale of the heating device 1 and the set temperature of the heater 3. For example, the size of each heater 3 is 950 mm ×
1140 mm x 38 mm with a parallel pitch of 75 mm-9
When processing 5 heating objects 4 with 0 mm, the gas flow rate is 20 to 100 liters per minute for each heater.
As for the temperature of the gas, for example, the set temperature of the heater 3 is 100 ° C.
If the temperature is set to 180 ° C, the temperature is lowered by about 20 ° C, and if the set temperature of the heater 3 is 180 ° C to 250 ° C, it is preferable that the temperature is lowered by about 30 ° C. No need to preheat.
【0017】上記実施形態によれば、互いに隣接するヒ
ーター3の間において、加熱面3aに対向するように配
置される加熱対象4を輻射加熱するに際して、ガス流動
空間20にヒーターの設定温度よりも低温のガスを導入
し、そのガス流動空間20に導入されたガスを加熱面3
aの中央から周辺に向かい流動させる。これにより、加
熱対象4の配置領域において加熱面3aの中央近傍での
放熱を促進することができる。よって、加熱面3aの温
度分布を短時間で高精度に均一化し、加熱対象4を均一
に加熱することができる。各ヒーター3にガス流動空間
20が設けられることで、中実のヒーターに比べて軽量
化できる。また、加熱面3aの中央近傍にガスの吹出し
口22aを設け、加熱面3aの周辺に近接するガスの排
出口23を設けるだけでよいため、複雑な構成を要する
ことなく低コストで実施することができる。そのガス流
動空間20においてガスは加熱面3aの中央近傍の室2
0aから周辺に近接する室20bにガス流通孔21aを
通って流れるので、確実にガスを加熱面3aの中央から
周辺に向かい流動させることができる。さらに、排出口
23から排出されるガスが加熱対象4に直接吹き付けら
れることがないので、そのガスによる加熱対象4の温度
変動を防止できる。According to the above embodiment, when the heating target 4 arranged so as to face the heating surface 3a is radiantly heated between the heaters 3 adjacent to each other, the gas flow space 20 is heated to a temperature higher than the set temperature of the heater. A low temperature gas is introduced, and the gas introduced into the gas flow space 20 is heated by the heating surface 3
Flow from the center of a toward the periphery. This can promote heat dissipation in the vicinity of the center of the heating surface 3a in the area where the heating target 4 is arranged. Therefore, the temperature distribution on the heating surface 3a can be made uniform with high accuracy in a short time, and the heating target 4 can be heated uniformly. By providing the gas flow space 20 in each heater 3, the weight can be reduced as compared with a solid heater. Further, since it is only necessary to provide the gas outlet 22a near the center of the heating surface 3a and to provide the gas outlet 23 adjacent to the periphery of the heating surface 3a, it is possible to carry out at low cost without requiring a complicated configuration. You can In the gas flow space 20, the gas is supplied to the chamber 2 near the center of the heating surface 3a.
Since the gas flows from 0a to the chamber 20b adjacent to the periphery through the gas circulation hole 21a, the gas can be reliably flowed from the center of the heating surface 3a toward the periphery. Further, since the gas discharged from the discharge port 23 is not directly blown to the heating target 4, it is possible to prevent the temperature fluctuation of the heating target 4 due to the gas.
【0018】[0018]
【実施例】図6は、上記実施形態の加熱装置1により加
熱したフラットパネルディスプレイ用ガラス基板の温度
と温度偏差の時間変化を示す。そのガラス基板の寸法は
730mm×920mm×0.7mm、ヒーター3の設
定温度は230℃、ガス流量は毎分30リットルとし
た。図の横軸は加熱時間、左縦軸はガラス基板の表面温
度、右縦軸はガラス基板の表面温度の偏差を示す。図に
おいて実線Aはガラス基板の最高表面温度位置の温度の
時間変化、実線Bはガラス基板の最低表面温度位置の温
度の時間変化、破線Cはガラス基板の最高表面温度位置
の設定温度からの偏差の時間変化、破線Dはガラス基板
の最低表面温度位置の設定温度からの偏差の時間変化、
破線Eはガラス基板の最高表面温度位置の温度と最低表
面温度位置の温度との偏差の時間変化を示す。これによ
り、上記実施形態の加熱装置1によれば、6分程度で最
高表面温度と最低表面温度との偏差を5℃以下にできる
ことを確認できた。これに対して、そのガスを供給しな
かった場合は、その偏差は時間が経過しても約10℃よ
りも小さくなることはなく、また、目標の偏差に到達す
るまでに非常に長い時間を要する場合もあった。すなわ
ち、本発明によれば加熱領域における温度分布を短時間
で均一化して加熱対象を高精度に均一加熱できることを
確認できた。EXAMPLE FIG. 6 shows changes with time of temperature and temperature deviation of the glass substrate for a flat panel display heated by the heating device 1 of the above embodiment. The dimensions of the glass substrate were 730 mm × 920 mm × 0.7 mm, the set temperature of the heater 3 was 230 ° C., and the gas flow rate was 30 liters per minute. The horizontal axis of the figure shows the heating time, the left vertical axis shows the surface temperature of the glass substrate, and the right vertical axis shows the deviation of the surface temperature of the glass substrate. In the figure, the solid line A shows the time change of the temperature at the maximum surface temperature position of the glass substrate, the solid line B shows the time change of the temperature at the minimum surface temperature position of the glass substrate, and the broken line C shows the deviation from the set temperature of the maximum surface temperature position of the glass substrate. , The broken line D shows the time variation of the deviation of the minimum surface temperature position of the glass substrate from the set temperature,
The broken line E shows the time change of the deviation between the temperature at the highest surface temperature position and the temperature at the lowest surface temperature position of the glass substrate. From this, it was confirmed that according to the heating device 1 of the above-described embodiment, the deviation between the maximum surface temperature and the minimum surface temperature can be set to 5 ° C. or less in about 6 minutes. On the other hand, when the gas is not supplied, the deviation does not become smaller than about 10 ° C. over time, and it takes a very long time to reach the target deviation. In some cases it took. That is, according to the present invention, it was confirmed that the temperature distribution in the heating region can be made uniform in a short time and the object to be heated can be uniformly heated with high accuracy.
【0019】[0019]
【発明の効果】本発明によれば、並列配置される複数の
パネル状ヒーターの間の加熱領域における温度分布を、
低コストでシンプルな構成により短時間で均一化でき、
加熱対象を高精度に均一加熱することができ、さらに各
ヒーターを軽量化すると共に省エネルギー化を図ること
ができる加熱方法と加熱装置を提供できる。According to the present invention, the temperature distribution in the heating region between a plurality of panel-shaped heaters arranged in parallel is
Low cost and simple structure enables uniformization in a short time,
It is possible to provide a heating method and a heating device capable of uniformly heating an object to be heated with high accuracy, reducing the weight of each heater, and saving energy.
【図1】本発明の実施形態の加熱装置の側面図FIG. 1 is a side view of a heating device according to an embodiment of the present invention.
【図2】本発明の実施形態の加熱装置の平面図FIG. 2 is a plan view of the heating device according to the embodiment of the present invention.
【図3】本発明の実施形態の加熱装置におけるパネル状
ヒーターの並列状態を示す斜視図FIG. 3 is a perspective view showing a parallel state of panel heaters in the heating device according to the embodiment of the present invention.
【図4】本発明の実施形態の加熱装置における要部の側
断面図FIG. 4 is a side sectional view of a main part of the heating device according to the embodiment of the present invention.
【図5】本発明の実施形態の加熱装置における要部の平
断面図FIG. 5 is a plan sectional view of a main part of the heating device according to the embodiment of the present invention.
【図6】本発明の加熱装置により加熱した基板の温度と
温度偏差の時間変化を示す図FIG. 6 is a diagram showing the temperature of the substrate heated by the heating device of the present invention and the time variation of the temperature deviation.
1 加熱装置 2 炉体 3 パネル状ヒーター 3a 加熱面 4 加熱対象 20 ガス流動空間 20a 加熱面の中央近傍の室 20b 加熱面の中央近傍の室よりも周辺に近接する室 21 隔壁 21a ガス流通孔 22 ガス導入配管 22a 吹出し口 23 排出口 1 heating device 2 furnace body 3 panel heater 3a Heating surface 4 heating target 20 gas flow space 20a Room near the center of the heating surface 20b Room closer to the periphery than room near the center of the heating surface 21 partition 21a Gas flow hole 22 Gas introduction piping 22a outlet 23 outlet
Claims (6)
状ヒーターを備える加熱装置によって、互いに隣接する
前記ヒーターの間において、前記ヒーターの加熱面に対
向するように配置される加熱対象を加熱するに際して、
各ヒーターの内部に設けたガス流動空間に、ヒーターの
設定温度よりも低温のガスを導入し、そのガス流動空間
に導入されたガスを、前記加熱面の中央から周辺に向か
い流動させることを特徴とする加熱方法。1. A heating device provided with a plurality of panel-shaped heaters arranged in parallel with each other at intervals to heat an object to be heated arranged between the heaters adjacent to each other so as to face a heating surface of the heater. On the occasion,
A gas having a temperature lower than the set temperature of the heater is introduced into the gas flow space provided inside each heater, and the gas introduced into the gas flow space is caused to flow from the center of the heating surface toward the periphery. And heating method.
ターを備え、互いに隣接する前記ヒーターの間におい
て、前記ヒーターの加熱面に対向するように加熱対象が
配置される加熱装置であって、各ヒーターの内部にガス
流動空間が設けられ、そのガス流動空間にガスを導入す
るためのガス導入手段が設けられ、そのガス流動空間に
導入されたガスが前記加熱面の中央から周辺に向かい流
動するように、そのガスは加熱面の中央近傍に導入され
ることを特徴とする加熱装置。2. A heating device comprising a plurality of panel-shaped heaters arranged in parallel at intervals, wherein heating objects are arranged between the heaters adjacent to each other so as to face a heating surface of the heaters. A gas flow space is provided inside each heater, and gas introduction means for introducing gas into the gas flow space is provided, and the gas introduced into the gas flow space flows from the center of the heating surface toward the periphery. So that the gas is introduced near the center of the heating surface.
おいて前記加熱面の中央近傍からガスを吹き出す吹出し
口を有し、各ヒーターに、そのガス流動空間に導入され
たガスの排出口が、前記加熱面の周辺に近接する位置に
設けられている請求項2に記載の加熱装置。3. The gas introducing means has an outlet for ejecting gas from the vicinity of the center of the heating surface in the gas flow space, and each heater has an outlet for the gas introduced into the gas flow space. The heating device according to claim 2, wherein the heating device is provided in a position close to the periphery of the heating surface.
熱面の中央近傍の室と、この中央近傍の室よりも周辺に
近接する室とに分割する隔壁が設けられ、その隔壁に、
相隣接する室を連絡するガス流通孔が設けられ、その加
熱面の中央近傍の室に前記ガス導入手段によってガスが
導入される請求項3に記載の加熱装置。4. Each of the heaters is provided with a partition wall that divides the gas flow space into a chamber near the center of the heating surface and a chamber closer to the periphery than the chamber near the center.
The heating device according to claim 3, wherein a gas flow hole that connects the chambers adjacent to each other is provided, and the gas is introduced into the chamber near the center of the heating surface by the gas introducing unit.
されるガスが前記加熱対象に直接吹き付けられることが
ないように、前記加熱対象の配置領域よりも前記加熱面
の中央から離れた位置に設けられている請求項3または
4に記載の加熱装置。5. The gas discharge port is located farther from the center of the heating surface than the heating target arrangement region so that the gas discharged from the discharge port is not directly sprayed onto the heating target. The heating device according to claim 3, which is provided at a position.
る炉体の内部に配置され、前記排出口から排出されるガ
スを、その炉体の出入り口に向かい導く手段が設けられ
ている請求項3〜5の中の何れかに記載の加熱装置。6. The heater is arranged inside a furnace body having an inlet / outlet port to be heated, and means for guiding the gas discharged from the exhaust port to the inlet / outlet port of the furnace body is provided. The heating device according to claim 5.
Priority Applications (4)
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JP2001332949A JP3665283B2 (en) | 2001-10-30 | 2001-10-30 | Heating method and heating apparatus |
TW091100768A TW513550B (en) | 2001-10-30 | 2002-01-18 | Heating method and heating device |
KR1020020004801A KR20030035742A (en) | 2001-10-30 | 2002-01-28 | Heating method and heating apparatus |
CNB021051224A CN100362300C (en) | 2001-10-30 | 2002-02-22 | Heating method and heater |
Applications Claiming Priority (1)
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JP2001332949A JP3665283B2 (en) | 2001-10-30 | 2001-10-30 | Heating method and heating apparatus |
Related Child Applications (1)
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JP2004376992A Division JP3840486B2 (en) | 2004-12-27 | 2004-12-27 | Heating method and heating apparatus |
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JP2003133033A true JP2003133033A (en) | 2003-05-09 |
JP3665283B2 JP3665283B2 (en) | 2005-06-29 |
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JP (1) | JP3665283B2 (en) |
KR (1) | KR20030035742A (en) |
CN (1) | CN100362300C (en) |
TW (1) | TW513550B (en) |
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-
2001
- 2001-10-30 JP JP2001332949A patent/JP3665283B2/en not_active Expired - Lifetime
-
2002
- 2002-01-18 TW TW091100768A patent/TW513550B/en not_active IP Right Cessation
- 2002-01-28 KR KR1020020004801A patent/KR20030035742A/en not_active Application Discontinuation
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KR20030035742A (en) | 2003-05-09 |
CN100362300C (en) | 2008-01-16 |
JP3665283B2 (en) | 2005-06-29 |
CN1417550A (en) | 2003-05-14 |
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