TW202111269A - Heating device and heating method - Google Patents
Heating device and heating method Download PDFInfo
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- TW202111269A TW202111269A TW109118015A TW109118015A TW202111269A TW 202111269 A TW202111269 A TW 202111269A TW 109118015 A TW109118015 A TW 109118015A TW 109118015 A TW109118015 A TW 109118015A TW 202111269 A TW202111269 A TW 202111269A
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D11/00—Arrangement of elements for electric heating in or on furnaces
- F27D11/02—Ohmic resistance heating
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D19/00—Arrangements of controlling devices
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D5/00—Supports, screens, or the like for the charge within the furnace
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/04—Circulating atmospheres by mechanical means
Abstract
Description
本發明,是有關於加熱裝置、加熱系統及加熱方法。The present invention relates to a heating device, a heating system and a heating method.
專利文獻1,是使用將液晶顯示面板等的構成構件也就是玻璃基板等的板狀物熱處理的加熱氣體循環方式的清淨烤箱(例如參照專利文獻1)。此清淨烤箱,是將玻璃基板等的被熱處理物收容在恆溫槽內,在此恆溫槽內使用藉由風扇而循環的加熱氣體來進行加熱物的熱處理。 加熱氣體循環方式的清淨烤箱的情況,因為容易採用將玻璃基板等的被加熱物呈多層狀收容的構造,所以空間效率優異,但是其反面是不易將加熱溫度分布均一化,若進行加熱氣體的攪拌的話,清淨度很有可能會降低。且,被加熱物是比較輕量的情況,藉由加熱氣體的循環對流而會使被加熱物從規定的位置移動。Patent Document 1 uses a cleaning oven of a heating gas circulation method that heat-treats plate-shaped objects such as glass substrates, which are constituent members of a liquid crystal display panel (for example, refer to Patent Document 1). In this clean oven, an object to be heat-treated, such as a glass substrate, is housed in a constant temperature bath, and heating gas circulated by a fan is used in the constant-temperature bath to heat the object to be heated. In the case of a clean oven of the heating gas circulation method, since it is easy to adopt a structure in which heated objects such as glass substrates are housed in multiple layers, it is excellent in space efficiency. However, the reverse is that it is difficult to uniformize the heating temperature distribution. If it is stirred, the cleanliness is likely to be reduced. In addition, when the object to be heated is relatively lightweight, the circulatory convection of the heating gas moves the object to be heated from a predetermined position.
專利文獻2的加熱爐,是多數的棚狀加熱器,由在內部在具有發熱體的放熱板的雙面被覆遠紅外線放射陶瓷的薄層,藉由此放熱板的加熱而從雙面將遠紅外線放射的雙面加熱式的遠紅外線面板加熱器所構成,在爐本體內在上下方向由一定間隔被多層配置,將形成於這些的棚狀加熱器之間的各空間部分各別作為乾燥室。The heating furnace of Patent Document 2 is a large number of shed heaters. Both sides of a heat radiating plate with a heating element are coated with a thin layer of far-infrared radiating ceramics inside. Infrared radiating double-sided heating type far-infrared panel heaters are arranged in multiple layers at regular intervals in the vertical direction in the furnace body, and each space formed between these shed heaters is used as a drying room. .
專利文獻3,是具備:相面對而被立設的加熱用壁體、及在其間被配置成棚狀且由來自加熱用壁體的傳導熱被加熱的複數熱放射構件,將這些的熱放射構件之間的各空間作為收容空間將被加熱物也就是玻璃基板收容,由來自上下的熱放射構件的放射熱進行加熱處理。各收容空間因為是被區劃,所以溫度分布的均一性也優異,起因於熱氣的上昇的上部空間中的熱積蓄現象不會發生。且,因為不進行加熱空氣的吹附,所以可以實現清淨的加熱處理。Patent Document 3 is provided with: facing and erected heating walls, and a plurality of heat radiating members arranged in a shelf shape between them and heated by conduction heat from the heating walls, and the heat Each space between the radiation members serves as a storage space to contain the glass substrate, which is the object to be heated, and heat treatment is performed by the radiation heat from the upper and lower heat radiation members. Since each storage space is divided, the uniformity of the temperature distribution is also excellent, and the heat accumulation phenomenon in the upper space caused by the rise of heat does not occur. In addition, since heating air is not blown, clean heating treatment can be realized.
且專利文獻4的加熱裝置,是在專利文獻3的加熱裝置中,設置與一對的加熱用壁體的內側密合的一對的傳熱壁體,此傳熱壁體之間將熱放射構件配置成棚狀,來提高溫度均一性。In addition, the heating device of
在專利文獻5中,為了消解專利文獻3的區劃構造中的上側的收容空間的溫度仍會比下側的收容空間更高的問題,藉由將加熱用壁體中的電加熱器的配置間隔,配置成加熱用壁體的上部比加熱用壁體的下部更大,而使下部的發熱量比上部更大。且,在加熱用壁體的中途處設置絕熱部使熱不會朝上方傳導。 [先前技術文獻] [專利文獻]In Patent Document 5, in order to solve the problem that the temperature of the upper storage space in the compartment structure of Patent Document 3 is still higher than the lower storage space, the electric heaters in the heating wall are arranged at intervals , It is arranged such that the upper part of the heating wall is larger than the lower part of the heating wall, and the lower part generates a larger amount of heat than the upper part. In addition, a heat insulating part is provided in the middle of the heating wall so that heat does not conduct upward. [Prior Technical Literature] [Patent Literature]
[專利文獻1]日本特開2001-56141號公報 [專利文獻2]日本特開2001-317872號公報 [專利文獻3]日本特開2013-200077號公報 [專利文獻4]日本特開2005-352306號公報 [專利文獻5]日本特開2005-055152號公報[Patent Document 1] Japanese Patent Application Publication No. 2001-56141 [Patent Document 2] JP 2001-317872 A [Patent Document 3] JP 2013-200077 A [Patent Document 4] JP 2005-352306 A [Patent Document 5] JP 2005-055152 A
[發明所欲解決之問題][The problem to be solved by the invention]
如上述,在專利文獻3~5中,揭示了在設成多層的收容空間配置被加熱物而將加熱的加熱裝置,對於上部的收容空間及下部的收容空間之間的溫度差的問題,是由上述各方法對應。 另一方面,對於上述各收容空間的水平方向的溫度分布,因為是周邊部的熱比中央部的熱更容易朝外部散逸,所以具有溫度容易降低的問題。其中,對於左右方向的溫度分布的對策,是在左右配置加熱用壁體,但是對於深度方向的溫度分布的問題的對策,未被揭示。As described above, in Patent Documents 3 to 5, it is disclosed that the heating device that heats the object by disposing the object to be heated in the multi-layered storage space, the problem of the temperature difference between the upper storage space and the lower storage space is Corresponding by the above methods. On the other hand, with respect to the temperature distribution in the horizontal direction of each of the above-mentioned storage spaces, since the heat in the peripheral part is more likely to escape to the outside than the heat in the central part, there is a problem that the temperature is likely to be lowered. Among them, the countermeasure to the temperature distribution in the left-right direction is to arrange the heating wall on the left and right, but the countermeasure to the problem of the temperature distribution in the depth direction has not been disclosed.
本發明所欲解決的課題,是提供一種溫度分布的均一性及清淨度的穩定性優異的加熱裝置及加熱方法。 尤其是,提供一種可以實現多層式的加熱裝置的深度方向的溫度分布的均一性之加熱裝置及加熱方法。 [用以解決問題之技術手段]The problem to be solved by the present invention is to provide a heating device and a heating method that are excellent in uniformity of temperature distribution and stability of cleanliness. In particular, there is provided a heating device and a heating method that can realize the uniformity of the temperature distribution in the depth direction of the multilayer heating device. [Technical means to solve the problem]
本發明的加熱裝置,是具備:將隔有距離相面對而被立設的複數加熱用壁體、及被設於前述複數加熱用壁體的各個的複數發熱手段、及在複數前述加熱用壁體的相面對領域在上下方向隔有距離而被配置成棚狀並將來自前述加熱用壁體的熱加以傳導的金屬製的複數熱放射構件,前述複數加熱用壁體及前述複數熱放射構件,是將各別收容被加熱物用的複數收容空間上下方向地劃界,前述複數收容空間的各個的上下,是藉由相面對的前述熱放射構件被劃界,前述發熱手段的配置密度,是在前述加熱用壁體的深度方向,周邊部比中央部更高。The heating device of the present invention is provided with: a plurality of heating walls that are arranged to face each other at a distance, and a plurality of heating means provided on each of the plurality of heating walls, and the plurality of heating walls The facing areas of the walls are arranged in a shed shape with a distance in the up and down direction and conduct heat from the heating wall, a plurality of heat radiation members made of metal, the plurality of heating walls and the plurality of heat The radiation member delimits a plurality of storage spaces for separately accommodating objects to be heated in the vertical direction. The upper and lower sides of each of the plurality of storage spaces are delimited by the heat radiation members facing each other, and the heating means The arrangement density is in the depth direction of the heating wall, and the peripheral part is higher than the central part.
這種結構的話,在加熱用壁體的深度方向,因為發熱手段的密度是被配置成周邊部比中央部更高密度,所以深度方向的兩端部的發熱量會變大。其結果,受到來自加熱用壁體的熱傳導的熱放射構件的溫度,也會在深度方向的兩端部上昇,表面溫度的均一性就可提高。這種熱放射構件是在被配置成上下的各收容空間內配置有被加熱物的話,被加熱物,因為是藉由從上下的熱放射構件被放射的熱而被均一地加熱,所以可以實現溫度分布的均一性優異的加熱處理。 且「被配置成…更高密度」,不只是將分離的發熱手段(例如線圈狀加熱器)高密度地配置,也包含將連續的發熱手段的一部分(例如線圈狀加熱器的一圈分)作成比其鄰接部分更密(擠)的狀態。With this structure, in the depth direction of the heating wall, the density of the heat generating means is arranged so that the peripheral part has a higher density than the central part, so the heat generation at both ends in the depth direction will increase. As a result, the temperature of the heat radiation member that receives heat conduction from the heating wall also rises at both ends in the depth direction, and the uniformity of the surface temperature can be improved. This kind of heat radiating member is provided with an object to be heated in each containing space arranged up and down, because the object to be heated is uniformly heated by the heat radiated from the upper and lower heat radiating members, so it can be realized Heat treatment with excellent uniformity of temperature distribution. And "arranged to...higher density" means not only arranging separate heat-generating means (such as coil heaters) at high density, but also includes part of continuous heat-generating means (such as coil heaters) Make it denser (squeezed) than its adjacent part.
前述發熱手段,是由沿前述加熱用壁體的面內的深度方向延伸了前述加熱用壁體的大致全長的複數線圈狀加熱器所構成,該複數線圈狀加熱器之中1個以上的線圈狀加熱器的捲取線間距,是被設定成周邊部比中央部更窄也可以。藉由作成這種結構,在深度方向,與中央部相比溫度容易降低的周邊部,其發熱會變大,加熱用壁體的表面溫度的均一性就可提高。The heating means is composed of a plurality of coil heaters extending substantially the entire length of the heating wall in the depth direction of the heating wall, and one or more coils of the plurality of coil heaters The winding line pitch of the shaped heater may be set so that the peripheral part is narrower than the central part. With this structure, in the depth direction, the peripheral portion, which is likely to have a lower temperature than the central portion, will generate more heat, and the uniformity of the surface temperature of the heating wall can be improved.
前述發熱手段,是由沿前述加熱用壁體的面內的深度方向延伸了前述加熱用壁體的大致全長的複數線圈狀加熱器所構成,該複數線圈狀加熱器的上下方向的間隔,是被配置成下部比上部更狹窄也可以。藉由作成這種結構,在加熱用壁體中,與上部相比溫度容易降低的下部,其發熱量會變大,藉由提高加熱用壁體的上下方向表面溫度的均一性,熱放射板間的溫度的均一性就可提高。The heating means is composed of a plurality of coiled heaters extending substantially the entire length of the heating wall in the depth direction of the heating wall, and the vertical interval of the plurality of coiled heaters is The lower part may be narrower than the upper part. With this structure, in the heating wall, the lower part where the temperature is easily lowered than the upper part will generate a larger amount of heat. By increasing the uniformity of the surface temperature of the heating wall in the vertical direction, the heat radiation plate The uniformity of the temperature between them can be improved.
最佳可以採用,相面對的前述複數加熱用壁體,是在面向於各個的前述收容空間側的各壁面的彼此相對應的位置被直接形成,各別具有將平板狀的被加熱物的寬度方向的各側緣部的背面承接的沿前述收容空間的深度方向延伸的支撐面,的結構。藉由作成這種結構,可以將被加熱物由均一的間隔被保持在熱放射構件,使被加熱物由放射熱而面內均一地被加熱。Preferably, the plurality of heating walls facing each other are directly formed at positions corresponding to each other on each wall surface facing each of the storage space sides, and each has a flat plate-shaped object to be heated. The back surface of each side edge in the width direction receives a supporting surface extending in the depth direction of the storage space. With this structure, the object to be heated can be held by the heat radiating member at a uniform interval, and the object to be heated can be uniformly heated in the plane by radiating heat.
最佳可以採用,具有:被設於前述複數加熱用壁體的各個的至少一個溫度感測器;及以使被設於前述複數加熱用壁體的各個的至少一個溫度感測器的檢出溫度追從目標溫度的方式,將各別被設置在前述複數加熱用壁體的複數發熱手段的各個的發熱量獨立控制的溫調手段;的結構。 藉由此結構,可以修正加熱用壁體間的溫度的不均一,加熱處理的均一性就可提高。Preferably, it can be used to have: at least one temperature sensor provided on each of the plurality of heating walls; and to enable detection of at least one temperature sensor provided on each of the plurality of heating walls In a way that the temperature follows the target temperature, each of the plurality of heating means provided in the above-mentioned plurality of heating walls is individually controlled by a temperature control means that independently controls the amount of heat generation; structure. With this structure, the temperature unevenness between the heating walls can be corrected, and the uniformity of the heating treatment can be improved.
本發明的加熱系統,進一步具有:上述其中任一的加熱裝置、及收容前述加熱裝置的腔室,前述腔室,是具有換氣機構,其是藉由:在底部將大氣取入用的吸氣口、及在天板部將大氣排出的排氣口,而將該腔室內換氣。The heating system of the present invention further has: any one of the heating devices described above, and a chamber accommodating the heating device. The chamber has a ventilating mechanism, which is provided by: a suction for taking in the atmosphere at the bottom The air port and the exhaust port for exhausting the atmosphere in the top plate part to ventilate the chamber.
本發明的加熱方法,是使用上述其中任一的加熱裝置或是上述加熱系統,將被加熱物加熱。 [發明的效果]The heating method of the present invention uses any one of the above heating devices or the above heating system to heat the object to be heated. [Effects of the invention]
依據本發明,可以提供一種加熱裝置,在溫度分布的均一性及清淨度的穩定性優異,可以迅速地對應至少被加熱物的寬度方向尺寸的變更。According to the present invention, it is possible to provide a heating device that is excellent in the uniformity of temperature distribution and stability of cleanliness, and can quickly respond to changes in at least the widthwise dimension of the object to be heated.
以下,依據第1圖~第6圖,說明本發明的實施方式的加熱裝置100。如第1圖所示,加熱裝置100,是具備:隔有距離而相面對配置的複數加熱用壁體10(10A~10C)、及被設於加熱用壁體10的發熱手段也就是複數線圈狀加熱器11、及在複數加熱用壁體10的相面對領域在上下方向(A1-A2方向)隔有距離被配置成棚狀的複數熱放射構件12、及被設於上下方向相鄰接的熱放射構件12之間的被加熱物13的收容空間14。Hereinafter, the
加熱用壁體10的上端側及下端側是各別藉由天板16及底板17而被連結,底板17的下面,是藉由架台單元30而被支撐。The upper end side and the lower end side of the
加熱用壁體10,是由不銹鋼所形成,是箱型的加熱裝置100的兩側面及中央的成為分隔壁的構造構件,並且成為加熱裝置的熱源的構件。在本實施方式中,由左側加熱用壁體10A、中央加熱用壁體10B、右側加熱用壁體10C的3枚所構成。在各加熱用壁體10中,沿從正面側至背面側為止的水平方向被開設複數貫通孔24,線圈狀加熱器11是各別可裝卸地被插入這些的貫通孔24內。The
線圈狀加熱器11,詳細如第3圖所示,是成為在金屬管(護套)11s的內部收容了捲取成線圈狀的發熱線11w的構造。在第3圖中簡略化顯示,但是在捲取成線圈狀的發熱線11w是從右端朝左端往復,從右端伸出2條的導線。往復的發熱線11w之間、以及發熱線11w及金屬管11s之間,是利用由固化的粉末狀的氧化鎂所構成的絕緣層而被絕緣。
第3圖(a),是顯示發熱線11w的捲取線間距是均一,可獲得長度方向均一的發熱量的線圈狀加熱器11A的例。
另一方面,第3圖(b),是顯示發熱線11w的捲取線間距,成為在兩端部W1、W1小,在中央部W2大,兩端部的發熱量是比中央部的發熱量更大的線圈狀加熱器11B的例。As shown in FIG. 3 in detail, the
各加熱用壁體10中的線圈狀加熱器11的配置,是如第4圖A所示,在下部的間隔窄且上部間隔寬地被配置的全部的貫通孔24,插入:上述發熱線11w的捲取線間距,成為在兩端部小,在中央部大的線圈狀加熱器11B。由此,對於各加熱用壁體10的上下方向(A1-A2方向),因為發熱量是在線圈狀加熱器11B的配置間隔小的下部變大,所以溫度容易降低的下部的溫度就容易昇高。且,對於深度方向(B1-B2方向),是溫度容易降低的深度方向兩端部的發熱量變大,溫度分布成為均一。The arrangement of the
但是線圈狀加熱器11的配置不限定於此,如第4圖B所示,也可以在加熱用壁體10的下部的各貫通孔24,插入:上述發熱線11w的捲取線間距,成為在兩端部小,在中央部大的線圈狀加熱器11B,在上部的貫通孔24中,插入:發熱線11w的捲取線間距均一的線圈狀加熱器11A。由此,只有加大前後方向兩端部的熱特別容易被奪走的加熱用壁體10的下部的發熱量,就可以將溫度分布均一化。However, the arrangement of the
且如第4圖C所示,也可以在加熱用壁體10的最下部及最上部的貫通孔24,插入:上述發熱線11w的捲取線間距,成為在兩端部小,在中央部大的線圈狀加熱器11B,在中間的各貫通孔24中,插入:發熱線11w的捲取線間距均一的線圈狀加熱器11A。由此,例如,在加熱裝置是被設置在腔室內的情況等,熱容易被該腔室內的氣流奪走,只有加大加熱用壁體10的最上部及最下部的前後方向兩端部的發熱量,就可以將溫度分布均一化。
且各線圈狀加熱器11的配線,是從加熱裝置100背面側伸出。And as shown in Fig. 4C, it is also possible to insert in the through
在各加熱用壁體10中,且如第1圖所示,從正面側沿水平方向被開設了別的複數貫通孔25,讓溫度感測器15被插入。以使溫度感測器15的檢出溫度追從目標溫度的方式,藉由溫調手段(圖示省略)獨立地控制:各別被設置在各加熱用壁體10的複數線圈狀加熱器11的各個的發熱量。或是使複數線圈狀加熱器11被群組化成複數群組,並獨立地控制各群組的發熱量。
又,上述的線圈狀加熱器11的結構和配置,是在藉由溫調手段將發熱手段控制時,可實現加熱用壁體10的溫度的均一化。換言之,如亂流干擾等的原因時因為只有溫調手段的話,不易實現加熱用壁體10的溫度的均一化,所以藉由對於線圈狀加熱器11的結構和配置採取措施就可實現加熱用壁體10的溫度的均一化。In each
熱放射構件12,是在加熱用壁體10的相面對領域在上下方向隔有距離被配置成棚狀使來自前述加熱用壁體10的熱被傳導的構件。在本實施方式中,嵌入兩側的加熱用壁體10中的溝而被配置成棚狀。各熱放射構件12,是由在表面施加了黑色電鍍的鋁板所形成,可獲得優秀的熱放射功能。The
各收容空間14,是由:兩側的加熱用壁體10、及上下的熱放射構件12所劃界的空間,將被加熱物1枚1枚地收容,由來自上下的熱放射構件12的放射熱進行加熱處理。加熱用壁體10,是在面向於各個的收容空間14的側的各壁面的彼此相對應的位置,形成有沿收容空間的深度方向(B1-B2方向)延伸的溝10t,該溝10t的下側內面,是成為將平板狀的被加熱物13的寬度方向的各側緣部的背面承接的支撐面。使用規定的搬運裝置,以使被加熱物的左右方向的兩端部進入各溝10t的方式將被加熱物搬入,被加熱物就可以被載置在前述支撐面。被加熱物13的兩側緣部是可傳熱地被開放的話被加熱物13的溫度容易在兩側緣部成為不均一。因此,藉由通過溝10t的支撐面對於被加熱物13的兩側緣部直接傳熱,就可達成被加熱物13的溫度的均一化。Each
各收容空間14的前面14a(第2圖參照),是開口。藉由將前面14a開口,在收容空間的內部被加熱而膨脹的空氣就可朝外部被散逸。背面14b側因為是被閉塞,所以在收容空間的內部被加熱而膨脹的空氣即使朝外部散逸,空氣也不易從外部流入收容空間14內。
又,可以依據前面14a的開口的大小,設置將開口部開閉的開閉門(圖示省略)。此開閉門,是被加熱物13的搬入、搬出時被開放,加熱時被閉塞。但是,開閉門的閉塞時,收容空間的內部也可以不是完全地被密閉,例如以使被加熱膨脹的空氣可以散逸的方式在開閉門及開口部之間形成間隙。由此,在收容空間14的內部被加熱而膨脹的空氣只會朝外部散逸,因為空氣不會從外部流入收容空間14的內部,所以在收容空間14內不易形成對流。The
如第5圖所示,各收容空間14的背面14b側,是藉由背壁構件26而被閉塞,在此背壁構件26,可以設置可將氣體導入收容空間14內的給氣路徑27。由此,如第5圖的箭頭G,氣體是從收容空間14的背面14b側朝前面14a側流動,從前述間隙朝收容空間14外被排出。此氣體,可舉例:防止被加熱物表面的氧化用的惰性氣體、和與被加熱物13表面引起特定的化學反應用的氣體等。
且此氣體的流動,是以不會將灰塵捲起程度的極弱的層流的方式將流量調整。As shown in FIG. 5, the
最上部的2枚的熱放射構件12之間及最底部的2枚的熱放射構件12之間,各別是不導入被加熱物13的空的空間,且是形成空氣的絕熱層用的絕熱空間20T、20B。Between the top two
架台單元30,是被配置於設有加熱裝置100的地板面,將底板17及其上的加熱裝置本體搭載。具備:使加熱裝置100的熱不會傳達至地板面的絕熱功能、和使地板面的振動不會傳達至加熱裝置本體的防振功能等。The
包含架台單元30的加熱裝置100本體,也可以為了防止灰塵從外部混入、和為了防止排熱影響清淨室等的設置場所的其他的裝置,如第6圖所示,而配置於腔室200內。在此腔室200中,藉由設於腔室天板的排氣口220的鼓風機風扇230,將腔室200內部的加熱裝置100的熱排氣排出,由此在成為負壓的腔室200內部,從左下的吸氣口210將外氣導入。在吸氣口210的內側設有HEPA過濾器(圖示省略),防止灰塵從外部混入。The main body of the
接著,對於如此結構的本發明的加熱裝置100的動作參照第1圖~第4圖A進行說明。
使用加熱裝置100的情況,使用規定的搬運裝置,通過各收容空間14的前面14a的開口部將各被加熱物搬入各個的收容空間14。在線圈狀加熱器11開始通電的話,可以隨著規定的程式進行熱處理。
藉由無圖示的溫調手段,以使各溫度感測器15的檢出溫度成為目標溫度的方式,獨立地控制複數線圈狀加熱器11的發熱量的各個或是各群組。Next, the operation of the
因為在各收容空間14的左右配置加熱用壁體10,在上下配置熱放射構件12,所以藉由:從藉由線圈狀加熱器11的熱而昇溫的左右的加熱用壁體10所放射的熱、及從藉由來自這些的加熱用壁體的熱傳導而發熱的熱放射構件12朝上下被放射的熱,而被加熱。
以使各加熱用壁體10成為目標溫度的方式進行加熱,因為各熱放射構件12也被加熱至與加熱用壁體10相同溫度,所以收容空間14彼此之間的溫度均一性變高。
在此,線圈狀加熱器11,其發熱線11w的捲取線間距,因為是使用在兩端部小,在中央部大的線圈狀加熱器11B,所以在加熱用壁體10的深度方向,溫度容易降低的深度方向(B1-B2方向)兩端部的發熱量變大,溫度分布被均一化。因此,各收容空間14內的深度方向的溫度分布也被均一化。
因此,各個的收容空間14內是不會不均勻而是均等地被加熱,加熱裝置100整體中的溫度分布的均一性也良好。Since the
且各收容空間14,因為是如上述被區劃,所以起因於熱氣的上昇的上部空間中的熱積蓄現象及過熱現象不會發生。且,因為不會藉由風扇而將加熱氣體攪拌、循環,所以清淨度的穩定性也優異,被加熱物也不會藉由氣體流而被移動。In addition, since each
且也可以藉由在各收容空間14設置給氣路徑27,將收容空間14內的空氣置換成惰性氣體或是特定氣體。因此,也可以藉由惰性氣體導入防止被加熱物13氧化,或利用與被導入的特定氣體的反應對於被加熱物13施加表面處理。In addition, by providing an
又,前述的加熱裝置100只是例示本發明的加熱裝置,本發明不限定於加熱裝置100。
例如,將深度方向的發熱手段的配置密度成為周邊部比中央部更高的手段,在本實施方式中,在加熱用壁體10中,將發熱線11w的捲取線間距成為在兩端部小且在中央部大的線圈狀加熱器11B,沿深度方向延伸地配置。但是,在本發明中,不限定於此,在加熱用壁體10中,將線圈狀加熱器11A或是11B,沿上下方向延伸地配置,深度方向的配置間隔也可以在兩端部小且在中央部大。
且發熱手段也不限定於線圈狀加熱器,也可以是其他的加熱器、和加熱管,將這些沿上下方向延伸地配置,深度方向的配置間隔也可以成為在兩端部小且在中央部大。In addition, the
且在本實施方式中,在各加熱用壁體10中,以使各溫度感測器15的檢出溫度成為目標溫度的方式,獨立地控制位於各部分的線圈狀加熱器11的發熱量,但是不限定於此,成為目標的溫度均一性若是緩慢的情況,也可以分別對於各區域個別地控制線圈狀加熱器11的發熱量,或整批地控制全部的線圈狀加熱器的發熱量。In the present embodiment, in each
且在本實施方式中,在被加熱物的各收容空間14的前面14a設置開閉門(圖示省略)使可以開閉,在背面14b的背壁構件26中設置給氣路徑27使可以供給氣體,但是依據使用條件等,省略這些也無妨。In this embodiment, an opening and closing door (not shown) is provided on the
且在上述加熱裝置100中,加熱用壁體10、天板16、底板17,是由不銹鋼所形成,熱放射構件12,是由在表面施加了黑色電鍍的鋁板所形成。但是,不限定於這些的材料,將加熱用壁體10A~10C、天板16、底板17等由鋁和鋁合金(或是為了抑制輻射熱的發散而施加了無光澤的表面處理的鋁和鋁合金)所形成也可以。且,對於熱放射構件12的表面處理也不限定於黑色電鍍,也可以採用可以抑制輻射熱的發散的表面處理,例如,施加了無光澤的表面處理。
[產業上的可利用性]In the
本發明的加熱裝置,可以廣泛利用在進行玻璃基板和半導體導線架或是其他的金屬板和合成樹脂板等的各種板狀構件的熱處理的產業領域中。The heating device of the present invention can be widely used in the industrial field for heat treatment of various plate-shaped members such as glass substrates, semiconductor lead frames, other metal plates, and synthetic resin plates.
10,10A~10C:加熱用壁體
10t:溝
11,11A,11B:線圈狀加熱器
11s:金屬管(護套)
11w:發熱線
12:熱放射構件
13:被加熱物
14:收容空間
14a:前面
14b:背面
15:溫度感測器
16:天板
17:底板
20T,20B:絕熱層
24:貫通孔
25:貫通孔
26:背壁構件
27:吸氣路徑
30:架台單元
100:加熱裝置
200:腔室
210:吸氣口
220:排氣口
230:鼓風機風扇
W1:兩端部
W2:中央部10,10A~10C: Wall for
[第1圖]顯示本發明的實施方式的加熱裝置的前視圖。 [第2圖]第1圖所示的加熱裝置的右側視圖。 [第3圖]顯示加熱用加熱器的外觀圖。 [第4圖A]顯示加熱用壁體中的加熱用加熱器的配置的一例的剖面圖。 [第4圖B]顯示加熱用壁體中的加熱用加熱器的配置的一例的剖面圖。 [第4圖C]顯示加熱用壁體中的加熱用加熱器的配置的一例的剖面圖。 [第5圖]顯示各收容空間中的空氣的流動的說明圖。 [第6圖]顯示加熱裝置的空調腔室的一例中的空氣的流動的說明圖。[Figure 1] A front view showing a heating device according to an embodiment of the present invention. [Figure 2] A right side view of the heating device shown in Figure 1. [Figure 3] shows the appearance of a heating heater. [Fig. 4A] A cross-sectional view showing an example of the arrangement of the heating heater in the heating wall. [Fig. 4B] A cross-sectional view showing an example of the arrangement of the heating heater in the heating wall. [Fig. 4C] A cross-sectional view showing an example of the arrangement of the heating heater in the heating wall. [Figure 5] An explanatory diagram showing the flow of air in each storage space. [Fig. 6] An explanatory diagram showing the flow of air in an example of the air-conditioning chamber of the heating device.
10,10A~10C:加熱用壁體 10,10A~10C: Wall for heating
10t:溝 10t: groove
11:線圈狀加熱器 11: Coil heater
12:熱放射構件 12: Heat radiation member
13:被加熱物 13: Object to be heated
14:收容空間 14: Containment Space
15:溫度感測器 15: Temperature sensor
16:天板 16: top plate
17:底板 17: bottom plate
20T,20B:絕熱層 20T, 20B: Insulation layer
24:貫通孔 24: Through hole
25:貫通孔 25: Through hole
30:架台單元 30: stand unit
100:加熱裝置 100: heating device
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JP2019102655 | 2019-05-31 | ||
JP2019-102655 | 2019-05-31 |
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