JP3646757B2 - 投影露光方法及び装置 - Google Patents

投影露光方法及び装置 Download PDF

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Publication number
JP3646757B2
JP3646757B2 JP22126196A JP22126196A JP3646757B2 JP 3646757 B2 JP3646757 B2 JP 3646757B2 JP 22126196 A JP22126196 A JP 22126196A JP 22126196 A JP22126196 A JP 22126196A JP 3646757 B2 JP3646757 B2 JP 3646757B2
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JP
Japan
Prior art keywords
illumination
projection
optical system
light
illumination light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP22126196A
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English (en)
Japanese (ja)
Other versions
JPH1064790A5 (enExample
JPH1064790A (ja
Inventor
純夫 橋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP22126196A priority Critical patent/JP3646757B2/ja
Priority to EP19970113696 priority patent/EP0823662A2/en
Publication of JPH1064790A publication Critical patent/JPH1064790A/ja
Publication of JPH1064790A5 publication Critical patent/JPH1064790A5/ja
Application granted granted Critical
Publication of JP3646757B2 publication Critical patent/JP3646757B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP22126196A 1996-08-07 1996-08-22 投影露光方法及び装置 Expired - Lifetime JP3646757B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP22126196A JP3646757B2 (ja) 1996-08-22 1996-08-22 投影露光方法及び装置
EP19970113696 EP0823662A2 (en) 1996-08-07 1997-08-07 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22126196A JP3646757B2 (ja) 1996-08-22 1996-08-22 投影露光方法及び装置

Publications (3)

Publication Number Publication Date
JPH1064790A JPH1064790A (ja) 1998-03-06
JPH1064790A5 JPH1064790A5 (enExample) 2004-11-04
JP3646757B2 true JP3646757B2 (ja) 2005-05-11

Family

ID=16764005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22126196A Expired - Lifetime JP3646757B2 (ja) 1996-08-07 1996-08-22 投影露光方法及び装置

Country Status (1)

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JP (1) JP3646757B2 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101484435B1 (ko) 2003-04-09 2015-01-19 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
EP1670041A4 (en) 2003-08-28 2007-10-17 Nikon Corp METHOD AND APPARATUS FOR EXPOSURE, AND METHOD FOR MANUFACTURING ASSOCIATED DEVICE
TWI628698B (zh) 2003-10-28 2018-07-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI612338B (zh) 2003-11-20 2018-01-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
JP4552428B2 (ja) * 2003-12-02 2010-09-29 株式会社ニコン 照明光学装置、投影露光装置、露光方法及びデバイス製造方法
TWI614795B (zh) 2004-02-06 2018-02-11 Nikon Corporation 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
KR101328356B1 (ko) 2004-02-13 2013-11-11 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
EP2660853B1 (en) 2005-05-12 2017-07-05 Nikon Corporation Projection optical system, exposure apparatus and exposure method
JP5414968B2 (ja) * 2005-11-14 2014-02-12 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学撮像システムの測定装置および操作方法
US7903234B2 (en) 2006-11-27 2011-03-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
SG143178A1 (en) * 2006-11-27 2008-06-27 Asml Netherlands Bv Lithographic apparatus, device manufacturing method and computer program product
US7829249B2 (en) * 2007-03-05 2010-11-09 Asml Netherlands B.V. Device manufacturing method, computer program and lithographic apparatus
JP5329520B2 (ja) 2007-03-27 2013-10-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 低角度で入射する補正光を用いる補正光学素子
JP2009010131A (ja) 2007-06-27 2009-01-15 Canon Inc 露光装置及びデバイス製造方法
EP2048540A1 (en) * 2007-10-09 2009-04-15 Carl Zeiss SMT AG Microlithographic projection exposure apparatus
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP4553066B2 (ja) * 2010-01-14 2010-09-29 株式会社ニコン 偏光変換部材、照明光学装置、投影露光装置、露光方法及びデバイス製造方法
JP4626719B2 (ja) * 2010-01-14 2011-02-09 株式会社ニコン 照明光学装置、投影露光装置、露光方法及びデバイス製造方法
NL2007498A (en) 2010-12-23 2012-06-27 Asml Netherlands Bv Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus.
NL2011592A (en) 2012-10-31 2014-05-06 Asml Netherlands Bv Compensation for patterning device deformation.
JP7390804B2 (ja) * 2019-05-17 2023-12-04 キヤノン株式会社 露光装置、露光方法、決定方法および物品製造方法

Also Published As

Publication number Publication date
JPH1064790A (ja) 1998-03-06

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