JP3607265B2 - 磁気抵抗素子 - Google Patents

磁気抵抗素子 Download PDF

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Publication number
JP3607265B2
JP3607265B2 JP2002185023A JP2002185023A JP3607265B2 JP 3607265 B2 JP3607265 B2 JP 3607265B2 JP 2002185023 A JP2002185023 A JP 2002185023A JP 2002185023 A JP2002185023 A JP 2002185023A JP 3607265 B2 JP3607265 B2 JP 3607265B2
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JP
Japan
Prior art keywords
layer
magnetoresistive element
nonmagnetic layer
element according
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002185023A
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English (en)
Japanese (ja)
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JP2003086865A (ja
JP2003086865A5 (https=
Inventor
望 松川
明弘 小田川
康成 杉田
三男 里見
良男 川島
雅祥 平本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP2002185023A priority Critical patent/JP3607265B2/ja
Publication of JP2003086865A publication Critical patent/JP2003086865A/ja
Publication of JP2003086865A5 publication Critical patent/JP2003086865A5/ja
Application granted granted Critical
Publication of JP3607265B2 publication Critical patent/JP3607265B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Measuring Magnetic Variables (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
  • Hall/Mr Elements (AREA)
JP2002185023A 2001-06-26 2002-06-25 磁気抵抗素子 Expired - Fee Related JP3607265B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002185023A JP3607265B2 (ja) 2001-06-26 2002-06-25 磁気抵抗素子

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001192217 2001-06-26
JP2001-192217 2001-06-26
JP2002185023A JP3607265B2 (ja) 2001-06-26 2002-06-25 磁気抵抗素子

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2003386605A Division JP3551196B2 (ja) 2001-06-26 2003-11-17 磁気抵抗素子の製造方法

Publications (3)

Publication Number Publication Date
JP2003086865A JP2003086865A (ja) 2003-03-20
JP2003086865A5 JP2003086865A5 (https=) 2004-11-11
JP3607265B2 true JP3607265B2 (ja) 2005-01-05

Family

ID=26617537

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002185023A Expired - Fee Related JP3607265B2 (ja) 2001-06-26 2002-06-25 磁気抵抗素子

Country Status (1)

Country Link
JP (1) JP3607265B2 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4024499B2 (ja) 2001-08-15 2007-12-19 株式会社東芝 磁気抵抗効果素子、磁気ヘッド及び磁気再生装置
EP1475847A1 (en) 2002-02-15 2004-11-10 Matsushita Electric Industrial Co., Ltd. Magnetic reluctance element and method for preparation thereof and nonvolatile memory comprising the element
WO2003092083A1 (fr) * 2002-04-24 2003-11-06 Matsushita Electric Industrial Co., Ltd. Element magnetoresistant
WO2005031838A1 (ja) 2003-09-30 2005-04-07 Japan Aviation Electronics Industry Limited 固体表面の平坦化方法及びその装置
JP4765106B2 (ja) 2005-05-20 2011-09-07 日本航空電子工業株式会社 固体試料表面の平坦化加工方法
JP2008306169A (ja) * 2007-05-07 2008-12-18 Canon Anelva Corp 磁気抵抗素子、磁気抵抗素子の製造方法及び磁性多層膜作成装置
US8174800B2 (en) 2007-05-07 2012-05-08 Canon Anelva Corporation Magnetoresistive element, method of manufacturing the same, and magnetic multilayered film manufacturing apparatus
EP2323189B1 (en) * 2008-09-12 2019-01-30 Hitachi Metals, Ltd. Use of a self-pinned spin valve magnetoresistance effect film

Also Published As

Publication number Publication date
JP2003086865A (ja) 2003-03-20

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