JP3462215B2 - プラズマアーク製粉方法及びその装置 - Google Patents

プラズマアーク製粉方法及びその装置

Info

Publication number
JP3462215B2
JP3462215B2 JP50921996A JP50921996A JP3462215B2 JP 3462215 B2 JP3462215 B2 JP 3462215B2 JP 50921996 A JP50921996 A JP 50921996A JP 50921996 A JP50921996 A JP 50921996A JP 3462215 B2 JP3462215 B2 JP 3462215B2
Authority
JP
Japan
Prior art keywords
plasma
reactant
plasma chamber
plasma arc
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP50921996A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09505268A (ja
Inventor
スロール、ベルナール
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WC Heraus GmbH and Co KG
Original Assignee
WC Heraus GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WC Heraus GmbH and Co KG filed Critical WC Heraus GmbH and Co KG
Publication of JPH09505268A publication Critical patent/JPH09505268A/ja
Application granted granted Critical
Publication of JP3462215B2 publication Critical patent/JP3462215B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G15/00—Compounds of gallium, indium or thallium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00—Compounds of tin
    • C01G19/02—Oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
JP50921996A 1994-09-07 1995-09-07 プラズマアーク製粉方法及びその装置 Expired - Fee Related JP3462215B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR94/10874 1994-09-07
FR9410874A FR2724123A1 (fr) 1994-09-07 1994-09-07 Dispositif permettant la stabilisation d'une reaction chimique continue entre plusieurs corps dans un plasma
PCT/EP1995/003513 WO1996007475A1 (de) 1994-09-07 1995-09-07 Verfahren für die herstellung eines pulvers in einem plasmalichtbogen und vorrichtung für die durchführung des verfahrens

Publications (2)

Publication Number Publication Date
JPH09505268A JPH09505268A (ja) 1997-05-27
JP3462215B2 true JP3462215B2 (ja) 2003-11-05

Family

ID=9466868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50921996A Expired - Fee Related JP3462215B2 (ja) 1994-09-07 1995-09-07 プラズマアーク製粉方法及びその装置

Country Status (8)

Country Link
US (1) US5723027A (enExample)
EP (1) EP0726806B1 (enExample)
JP (1) JP3462215B2 (enExample)
KR (1) KR100300885B1 (enExample)
CN (1) CN1135190A (enExample)
DE (1) DE59506276D1 (enExample)
FR (1) FR2724123A1 (enExample)
WO (1) WO1996007475A1 (enExample)

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DE19721649C2 (de) * 1997-05-23 2003-02-20 Heraeus Gmbh W C Verfahren zur Herstellung eines Mischkristallpulvers mit geringem spezifischen elektrischen Widerstand
EP1109641A4 (en) * 1998-07-21 2004-10-06 Commw Scient Ind Res Org METHOD AND APPARATUS FOR PRODUCING VAPORS OF MATERIALS
RU2263006C2 (ru) * 2000-02-10 2005-10-27 Тетроникс Лимитед Плазменно-дуговой реактор и способ получения тонких порошков
TW561085B (en) * 2001-10-29 2003-11-11 Phild Co Ltd Method and device for producing metal powder
FR2839506B1 (fr) * 2002-05-10 2005-06-10 Michelle Paparone Serole Oxyde mixte d'indium etain dit ito a grande conductivite electrique a nanostructure
US6955745B1 (en) * 2002-08-01 2005-10-18 University Of Florida Research Foundation, Inc. Method of spark-processing silicon and resulting materials
WO2005116650A2 (en) * 2004-04-19 2005-12-08 Sdc Materials, Llc High throughput discovery of materials through vapor phase synthesis
EP2153157A4 (en) 2007-05-11 2014-02-26 Sdcmaterials Inc WATER COOLING SYSTEM AND HEAT TRANSFER SYSTEM
US7582265B2 (en) * 2007-06-28 2009-09-01 Plasma Waste Recycling, Inc. Gas conduit for plasma gasification reactors
US8481449B1 (en) 2007-10-15 2013-07-09 SDCmaterials, Inc. Method and system for forming plug and play oxide catalysts
CA2751709C (en) * 2009-02-08 2023-05-23 Ap Solutions, Inc. Plasma source and method for removing materials from substrates utilizing pressure waves
DE112010001371A5 (de) 2009-03-27 2012-08-30 Heraeus Materials Technology Gmbh & Co. Kg Herstellung von Fasern aus Platin oder Palladium oder Legierungen auf Platin- oder Palladiumbasis und von Vliesen oder Netzen daraus
US8652992B2 (en) 2009-12-15 2014-02-18 SDCmaterials, Inc. Pinning and affixing nano-active material
US9149797B2 (en) * 2009-12-15 2015-10-06 SDCmaterials, Inc. Catalyst production method and system
US20110143930A1 (en) * 2009-12-15 2011-06-16 SDCmaterials, Inc. Tunable size of nano-active material on nano-support
US9090475B1 (en) 2009-12-15 2015-07-28 SDCmaterials, Inc. In situ oxide removal, dispersal and drying for silicon SiO2
US9126191B2 (en) * 2009-12-15 2015-09-08 SDCmaterials, Inc. Advanced catalysts for automotive applications
US8669202B2 (en) 2011-02-23 2014-03-11 SDCmaterials, Inc. Wet chemical and plasma methods of forming stable PtPd catalysts
AU2012299065B2 (en) 2011-08-19 2015-06-04 SDCmaterials, Inc. Coated substrates for use in catalysis and catalytic converters and methods of coating substrates with washcoat compositions
KR101307155B1 (ko) * 2011-11-17 2013-09-10 주식회사 포스코 몰드플럭스 주입장치
US9511352B2 (en) 2012-11-21 2016-12-06 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
US9156025B2 (en) 2012-11-21 2015-10-13 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
US9586179B2 (en) 2013-07-25 2017-03-07 SDCmaterials, Inc. Washcoats and coated substrates for catalytic converters and methods of making and using same
US9427732B2 (en) 2013-10-22 2016-08-30 SDCmaterials, Inc. Catalyst design for heavy-duty diesel combustion engines
CA2926135A1 (en) 2013-10-22 2015-04-30 SDCmaterials, Inc. Compositions of lean nox trap
WO2015143225A1 (en) 2014-03-21 2015-09-24 SDCmaterials, Inc. Compositions for passive nox adsorption (pna) systems
JP2021045730A (ja) * 2019-09-20 2021-03-25 三菱ケミカルエンジニアリング株式会社 反応生成物製造装置及び反応生成物製造方法
CN113479929B (zh) * 2021-08-11 2022-06-21 芜湖映日科技股份有限公司 一种高纯纳米氧化铟的制备方法
CN115072766A (zh) * 2022-08-08 2022-09-20 湖南工业大学 一种高温溅射法制备高纯氧化铟的设备
CN116177593B (zh) * 2022-09-08 2024-03-29 昆明理工大学 一种微米级二氧化锡粉末的制备系统与制备方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR378483A (fr) * 1906-06-18 1907-10-05 Sebastian Ziani De Ferranti Perfectionnements aux fours électriques
DE661185C (de) * 1936-02-01 1938-06-13 Bernhard Berghaus Verfahren und Vorrichtung zur Herstellung von metallischen UEberzuegen aus mittels eines Lichtbogens in einer Kammer verdampften Metallen
CH281749A (de) * 1941-06-26 1952-03-31 Electronic Reduction Corp Verfahren zur Herstellung von Metallhalogeniden aus hitzebeständigen Mineralien dieser Metalle.
DE916288C (de) * 1950-09-22 1955-12-01 Johannes Wotschke Dr Ing Verfahren und Vorrichtung zur physikalischen oder/und chemischen Umwandlung von schwer vergasbaren Metallen, deren Oxyden oder aehnlichen Stoffen
BE538618A (enExample) * 1954-05-11
GB959027A (en) * 1959-09-14 1964-05-27 British Oxygen Co Ltd Apparatus and process for spraying molten metal
US3101308A (en) * 1960-10-11 1963-08-20 Sheer Korman Associates Process for reduction of ores to metals, alloys, interstitial and intermetallic compounds
FR1560417A (enExample) * 1968-01-08 1969-03-21
US3708409A (en) * 1969-05-22 1973-01-02 Ionarc Smelters Ltd Chemical process in high enthalpy thermal environment and apparatus therefor
JPS62111373A (ja) * 1985-11-11 1987-05-22 Ricoh Co Ltd バ−コ−ドシンボルマ−キング材料
FR2603209A1 (fr) * 1986-08-28 1988-03-04 Serole Bernard Tuyere de reaction chimique continue.
US4801435A (en) * 1986-09-08 1989-01-31 Plasma Holdings N.V. Hybrid plasma reactor
US5196102A (en) * 1991-08-08 1993-03-23 Microelectronics And Computer Technology Corporation Method and apparatus for applying a compound of a metal and a gas onto a surface
US5562809A (en) * 1993-01-22 1996-10-08 Plasma Plus Method for making hydrogen saturated metal compounds

Also Published As

Publication number Publication date
DE59506276D1 (de) 1999-07-29
KR960705623A (ko) 1996-11-08
WO1996007475A1 (de) 1996-03-14
FR2724123A1 (fr) 1996-03-08
CN1135190A (zh) 1996-11-06
JPH09505268A (ja) 1997-05-27
FR2724123B1 (enExample) 1997-02-21
KR100300885B1 (ko) 2002-04-24
EP0726806B1 (de) 1999-06-23
US5723027A (en) 1998-03-03
EP0726806A1 (de) 1996-08-21

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