JP3432445B2 - Epoxy resin composition for optical semiconductor and semiconductor device - Google Patents

Epoxy resin composition for optical semiconductor and semiconductor device

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Publication number
JP3432445B2
JP3432445B2 JP08783499A JP8783499A JP3432445B2 JP 3432445 B2 JP3432445 B2 JP 3432445B2 JP 08783499 A JP08783499 A JP 08783499A JP 8783499 A JP8783499 A JP 8783499A JP 3432445 B2 JP3432445 B2 JP 3432445B2
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JP
Japan
Prior art keywords
epoxy resin
general formula
group
resin composition
resin represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP08783499A
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Japanese (ja)
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JP2000281868A (en
Inventor
慶一 作道
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
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Priority to JP08783499A priority Critical patent/JP3432445B2/en
Publication of JP2000281868A publication Critical patent/JP2000281868A/en
Application granted granted Critical
Publication of JP3432445B2 publication Critical patent/JP3432445B2/en
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Expired - Fee Related legal-status Critical Current

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  • Led Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、耐熱性、密着性に
優れた光半導体封止用エポキシ樹脂組成物に関するもの
である。
TECHNICAL FIELD The present invention relates to an epoxy resin composition for optical semiconductor encapsulation which is excellent in heat resistance and adhesion.

【0002】[0002]

【従来の技術】従来、発光ダイオード素子をトランスフ
ァーモールドで封止するには、封止樹脂としてビスフェ
ノールA型エポキシ樹脂と硬化剤としての酸無水物の混
合物が用いられてきた。この樹脂系は広い波長領域での
光透過率が高く、又発光ダイオード素子との接着力が高
いため、通電特性等の信頼性が高く、広く用いられてき
た。しかし、近年、車載用半導体装置のエンジンルーム
内への移行に伴ってより高い温度での信頼性が求められ
てきた。このため、従来のビスフェノールA型エポキシ
樹脂と酸無水物との混合物では十分信頼性を保つことが
出来ない。特に温度サイクル試験等の熱応力試験では高
温域での試験処理温度が上昇するため、耐熱性の低いビ
スフェノールA型エポキシと酸無水物混合物の封止材料
では早期に不良が発生する。一方、これまで受光素子に
用いられてきたクレゾールノボラック型エポキシ樹脂と
フェノールノボラック樹脂の混合物は耐熱性が高いこと
から発光ダイオード素子の封止に適用することが考えら
れるが、この樹脂系は発光ダイオード素子との密着性が
低いため、封止後の寿命が短く発光ダイオード素子には
使用できない。従って、高温の環境下で使用される光半
導体装置には、耐熱性と密着性に優れた樹脂組成物が求
められている。
2. Description of the Related Art Conventionally, in order to seal a light emitting diode element by transfer molding, a mixture of a bisphenol A type epoxy resin as a sealing resin and an acid anhydride as a curing agent has been used. Since this resin system has a high light transmittance in a wide wavelength range and a high adhesive force with a light emitting diode element, it has a high reliability such as current-carrying characteristics and has been widely used. However, in recent years, with the shift of the in-vehicle semiconductor device into the engine room, reliability at higher temperatures has been required. Therefore, the conventional mixture of bisphenol A type epoxy resin and acid anhydride cannot maintain sufficient reliability. In particular, in a thermal stress test such as a temperature cycle test, the test treatment temperature in a high temperature range rises, so that a sealing material of a mixture of bisphenol A type epoxy and an acid anhydride, which has a low heat resistance, causes defects early. On the other hand, the mixture of cresol novolac type epoxy resin and phenol novolac resin, which has been used for the light receiving element up to now, is considered to be applied to the sealing of the light emitting diode element because of its high heat resistance. Since the adhesion to the device is low, the life after sealing is short and it cannot be used for a light emitting diode device. Therefore, a resin composition having excellent heat resistance and adhesiveness is required for an optical semiconductor device used in a high temperature environment.

【0003】[0003]

【発明が解決しようとする課題】本発明は、耐熱性が高
く、密着性に優れた光伝達性の高い発光ダイオード素子
封止用エポキシ樹脂組成物を提供するものである。
DISCLOSURE OF THE INVENTION The present invention provides an epoxy resin composition for encapsulating a light emitting diode element, which has high heat resistance, excellent adhesion, and high light transmission.

【0004】[0004]

【課題を解決するための手段】本発明は、(A)全エポ
キシ樹脂中に75重量%以上の一般式(1)で示される
ビフェニル型エポキシ樹脂、(B)150℃でのICI
粘度が3〜30ポイズである一般式(2)で示されるフ
ェノールアラルキル樹脂、(C)硬化促進剤を必須成分
とする樹脂組成物において、予め(A)一般式(1)で
示されるビフェニル型エポキシ樹脂と(B)150℃で
のICI粘度が3〜30ポイズである一般式(2)で示
されるフェノールアラルキル樹脂が溶融混合されている
ことを特徴とする光半導体封止用エポキシ樹脂組成物、
及びこれを用いて封止された光半導体装置である。
The present invention comprises (A) 75% by weight or more of the total epoxy resin of the biphenyl type epoxy resin represented by the general formula (1), and (B) ICI at 150 ° C.
A phenol aralkyl resin represented by the general formula (2) having a viscosity of 3 to 30 poise, and a resin composition containing (C) a curing accelerator as an essential component, wherein (A) a biphenyl type represented by the general formula (1) in advance. Epoxy resin and (B) at 150 ° C
An epoxy resin composition for optical semiconductor encapsulation, wherein the phenol aralkyl resin represented by the general formula (2) having an ICI viscosity of 3 to 30 poise is melt mixed.
And an optical semiconductor device sealed by using the same.

【化3】 (R1は、水素、メチル基、エチル基から選択され、同
一でも異なっていてもよい。nは0〜2の整数)
[Chemical 3] (R1 is selected from hydrogen, methyl group and ethyl group and may be the same or different. N is an integer of 0 to 2)

【0005】[0005]

【化4】 (R2はフェニレン基、ジフェニレン基、ジフェニレン
エーテル基、ジフェニレンメタン基、又はそれらの基に
置換基とし炭素数1〜5のアルキル基のついたもの、l
は0、又は1〜3の整数で、R3は炭素数1〜4のアル
キル基、nは0〜10の整数)
[Chemical 4] (R 2 is a phenylene group, a diphenylene group, a diphenylene ether group, a diphenylene methane group, or those groups each having a substituent and an alkyl group having 1 to 5 carbon atoms, l
Is 0 or an integer of 1 to 3, R 3 is an alkyl group having 1 to 4 carbon atoms, and n is an integer of 0 to 10)

【0006】[0006]

【発明の実施の形態】本発明で用いる一般式(1)て示
されるビフェニル型エポキシ樹脂は、常温で結晶状態で
ありながら熱時は低粘度になることが特徴であるが、フ
ェノール樹脂やその他の原料と配合し、単にロール等で
混練し生産した樹脂組成物を用いて、発光ダイオード素
子を封止した後では硬化物中に結晶性の微粒子が残って
いる。この微粒子は、光透過性に悪影響を与える。特に
封止後発光ダイオード素子上に微粒子が残ることにより
発光強度を大幅に低下させるため完全になくす必要があ
る。本発明者は、種々検討した結果、一般式(1)て示
されるビフェニル型エポキシ樹脂と下記する一般式
(2)で示されるフェノールアラルキル樹脂を予め溶融
した混合物を用いて生産した樹脂組成物の硬化物中に
は、ビフェニル型エポキシ樹脂に起因する結晶性の微粒
子は残存していないことを見いだした。一般式(1)て
示されるビフェニル型エポキシ樹脂としては、4,4’
−ビス(2,3−エポキシプロポキシ)−3,3’,
5,5’−テトラメチルビフェニルが密着性、溶融混練
後の均一性の点で好ましい。
BEST MODE FOR CARRYING OUT THE INVENTION The biphenyl type epoxy resin represented by the general formula (1) used in the present invention is characterized in that it has a low viscosity when heated while being in a crystalline state at room temperature. The crystalline fine particles remain in the cured product after the light emitting diode element is sealed by using the resin composition produced by blending with the above raw material and kneading with a roll or the like. The fine particles adversely affect the light transmittance. In particular, since fine particles remain on the light emitting diode element after sealing, the light emission intensity is significantly reduced, and therefore it is necessary to completely eliminate it. As a result of various studies, the inventor of the present invention has prepared a resin composition produced by using a mixture of a biphenyl type epoxy resin represented by the general formula (1) and a phenol aralkyl resin represented by the following general formula (2) that are melted in advance. It was found that crystalline fine particles due to the biphenyl type epoxy resin did not remain in the cured product. The biphenyl type epoxy resin represented by the general formula (1) includes 4,4 ′
-Bis (2,3-epoxypropoxy) -3,3 ',
5,5′-Tetramethylbiphenyl is preferable in terms of adhesion and uniformity after melt-kneading.

【0007】一般式(1)て示されるビフェニル型エポ
キシ樹脂と下記する一般式(2)で示されるフェノール
アラルキル樹脂の溶融混合物は、120℃〜150℃
で、1時間〜5時間で得られる。得られた溶融混合物中
に、結晶性の微粒子が存在しないことを目視で確認すれ
ばよい。一般式(1)て示されるビフェニル型エポキシ
樹脂は、他のエポキシ樹脂と併用することができる。併
用できるエポキシ樹脂とは、1分子中に2個以上のエポ
キシ基を有するモノマー、オリゴマー、ポリマー全般を
指し、例えば、クレゾールノボラック型エポキシ樹脂、
フェノールノボラック型エポキシ樹脂、ナフタレン型エ
ポキシ樹脂、3官能型エポキシ樹脂、ジシクロペンタジ
エン変性フェノール型エポキシ樹脂等が挙げられる。併
用するエポキシ樹脂としては、一般式(1)のビフェニ
ル型エポキシ樹脂の高い密着性を維持するために全エポ
キシ樹脂中25重量%以下に押さえる必要がある。
A molten mixture of the biphenyl type epoxy resin represented by the general formula (1) and the phenol aralkyl resin represented by the following general formula (2) has a temperature of 120 ° C to 150 ° C.
It can be obtained in 1 to 5 hours. It can be visually confirmed that the obtained molten mixture does not contain crystalline fine particles. The biphenyl type epoxy resin represented by the general formula (1) can be used in combination with another epoxy resin. Epoxy resins that can be used in combination refer to all monomers, oligomers and polymers having two or more epoxy groups in one molecule, for example, cresol novolac type epoxy resin,
Examples thereof include phenol novolac type epoxy resin, naphthalene type epoxy resin, trifunctional epoxy resin, and dicyclopentadiene-modified phenol type epoxy resin. As the epoxy resin used in combination, in order to maintain the high adhesion of the biphenyl type epoxy resin of the general formula (1), it is necessary to suppress it to 25% by weight or less in the total epoxy resin.

【0008】本発明で用いる一般式(2)で示されるフ
ェノールアラルキル樹脂は、発光ダイオード素子との密
着性を高め連続発光時の通電特性劣化を防ぐために用い
る。更に、成形時のバリ、ボイドの発生を防ぐため、一
般式(2)で示されるフェノールアラルキル樹脂の15
0℃でのICI粘度は、3〜30ポイズのものが好まし
い。これは、一般式(1)のビフェニル型エポキシ樹脂
の粘度が、かなり低いため両樹脂を溶融した混合物の粘
度が、一般式(2)で示されるフェノールアラルキル樹
脂の粘度に左右されることによる。一般式(2)で示さ
れるフェノールアラルキル樹脂の内では、下記の構造の
樹脂が、密着性、耐熱性のバランスの点で好ましい。
The phenol aralkyl resin represented by the general formula (2) used in the present invention is used to enhance the adhesion to the light emitting diode element and prevent the deterioration of the current-carrying characteristics during continuous light emission. Furthermore, in order to prevent the formation of burrs and voids during molding, 15% of the phenol aralkyl resin represented by the general formula (2) is used.
The ICI viscosity at 0 ° C. is preferably 3 to 30 poise. This is because the biphenyl type epoxy resin of the general formula (1) has a considerably low viscosity, and therefore the viscosity of the mixture obtained by melting the both resins depends on the viscosity of the phenol aralkyl resin represented by the general formula (2). Among the phenol aralkyl resins represented by the general formula (2), the resin having the following structure is preferable in terms of the balance of adhesion and heat resistance.

【化5】 [Chemical 5]

【0009】一般式(2)て示されるフェノールアラル
キル樹脂は、他のフェノール樹脂併用することができ
る。併用できるフェノール樹脂とは、エポキシ基と反応
できる官能基を1分子中に2個以上有するモノマー、オ
リゴマー、ポリマー全般を指し、例えば、フェノールノ
ボラック樹脂、ビスフェノールM等が挙げられる。本発
明に用いる全エポキシ樹脂と全フェノール樹脂の当量比
としては、0.8〜1.2が好ましい。本発明で用いる
硬化促進剤としては、エポキシ基と水酸基との反応を促
進するものであればよく、一般に封止用材料に使用され
ているものを広く使用することができ、例えば1,8−
ジアザビシクロ(5,4,0)ウンデセン−7、トリフ
ェニルホスフィン、ジメチルベンジルアミン、2−メチ
ルイミダゾール等が挙げられる。これらは単独でも混合
して用いても良い。
The phenol aralkyl resin represented by the general formula (2) can be used in combination with other phenol resins. The phenol resin which can be used in combination refers to all monomers, oligomers and polymers having two or more functional groups capable of reacting with an epoxy group in one molecule, and examples thereof include phenol novolac resin and bisphenol M. The equivalent ratio of the total epoxy resin and the total phenol resin used in the present invention is preferably 0.8 to 1.2. The curing accelerator used in the present invention may be any one as long as it accelerates the reaction between an epoxy group and a hydroxyl group, and those generally used for encapsulating materials can be widely used, for example, 1,8-
Examples thereof include diazabicyclo (5,4,0) undecene-7, triphenylphosphine, dimethylbenzylamine, 2-methylimidazole and the like. These may be used alone or in combination.

【0010】本発明の樹脂組成物は、予め(A)一般式
(1)で示されるビフェニル型エポキシ樹脂と(B)一
般式(2)で示されるフェノールアラルキル樹脂の溶融
混合物、(C)硬化促進剤を必須成分とするが、必要に
応じて、アゾ系、キノン系の染料、モンタン酸等の離型
剤、酸化防止剤等を添加しても良い。
The resin composition of the present invention comprises a melt mixture of (A) a biphenyl type epoxy resin represented by the general formula (1) and (B) a phenol aralkyl resin represented by the general formula (2) in advance, and (C) curing. Although the accelerator is an essential component, an azo-based dye, a quinone-based dye, a release agent such as montanic acid, and an antioxidant may be added as necessary.

【0011】溶融混合物の製造例1 ビフェニル型エポキシ樹脂(油化シェルエポキシ(株)
・製YX−4000H、融点104℃、エポキシ当量1
95)52.1重量部と式(2−1)(軟化点85℃、
水酸基当量175、ICI粘度10ポイズ/150℃)
46.9重量部を130℃、2時間溶融混合し、結晶性
エポキシ樹脂に起因する微粒子が残存していないことを
確認した後、粉砕し粉末を得た。得られた粉末を溶融混
合物1とする。 溶融混合物の製造例2〜5 表1の配合に従ってビフェニル型エポキシ樹脂(油化シ
ェルエポキシ(株)・製YX−4000H、融点104
℃、エポキシ当量195)と式(2−1)(軟化点85
℃、水酸基当量175、ICI粘度10ポイズ/150
℃)を130℃、2時間溶融混合し、結晶性エポキシ樹
脂に起因する微粒子が残存していないことを確認した
後、粉砕し粉末を得た。得られた粉末をそれぞれ溶融混
合物2〜5とする。
Production Example 1 of Melt Mixture Biphenyl type epoxy resin (Yukaka Shell Epoxy Co., Ltd.)
・ YX-4000H, melting point 104 ° C., epoxy equivalent 1
95) 52.1 parts by weight and formula (2-1) (softening point 85 ° C.,
Hydroxyl equivalent 175, ICI viscosity 10 poise / 150 ° C)
After melt-mixing 46.9 parts by weight at 130 ° C. for 2 hours, it was confirmed that fine particles due to the crystalline epoxy resin did not remain, and then pulverized to obtain a powder. The obtained powder is referred to as a melt mixture 1. Production Examples 2 to 5 of melted mixture Biphenyl type epoxy resin (YX-4000H manufactured by Yuka Shell Epoxy Co., Ltd., melting point 104 according to the formulation shown in Table 1)
C., epoxy equivalent 195) and formula (2-1) (softening point 85
° C, hydroxyl equivalent 175, ICI viscosity 10 poise / 150
(° C) was melt-mixed at 130 ° C for 2 hours, and after confirming that fine particles due to the crystalline epoxy resin did not remain, the powder was pulverized to obtain a powder. The obtained powders are referred to as melt mixtures 2 to 5, respectively.

【0012】[0012]

【実施例】 実施例1 溶融混合物1 99.0重量部 1,8−ジアザビシクロ(5,4,0)ウンデセン−7(以下、DBUという ) 0.5重量部 モンタン酸ワックス 0.5重量部 を粉砕後混合し、70〜90℃の二軸混練機を用いて加
熱混練を行い、冷却固化後粉砕して樹脂組成物の粉末を
得た。この樹脂組成物を、低圧トランスファー成形機を
用いて150℃、70kg/cm2、180秒の条件で
発光ダイオード素子を封止し発光ダイオード装置を得
た。以下に示す方法で評価した。結果を表1に示す。
Example 1 Melt Mixture 1 99.0 parts by weight 1,8-diazabicyclo (5,4,0) undecene-7 (hereinafter referred to as DBU) 0.5 parts by weight Montanic acid wax 0.5 parts by weight After crushing, they were mixed, heated and kneaded using a twin-screw kneader at 70 to 90 ° C., cooled and solidified, and then crushed to obtain a resin composition powder. A light emitting diode device was obtained by sealing the light emitting diode element of this resin composition under the conditions of 150 ° C., 70 kg / cm 2 , and 180 seconds using a low pressure transfer molding machine. It evaluated by the method shown below. The results are shown in Table 1.

【0013】評価方法 温度サイクル試験:上記で得られた発光ダイオード装置
を用いて温度サイクル性を測定した。測定条件は、低温
側−65℃/5分、高温側125℃/5分を1サイクル
とした。測定は上記サイクルを複数回行い樹脂クラック
が発生したサイクル数で判定した。 光透過率:樹脂組成物を、低圧トランスファー成形機を
用いて150℃、70kg/cm2、180秒の条件で
10×30×厚さ1mmのテストピースに成形後、17
5℃、2時間のポストキュアーを行い、光透過率測定用
テストピースとした。得られたテストピースは、分光光
度計(日立製作所(株)・製、330型自記分光光度
計)を用いて、940nmの光透過率(単位%)を測定
した。 連続通電試験:上記で得られた発光ダイオード装置を用
いて連続通電試験を測定した。測定条件は室温で行っ
た。光強度が初期の50%以下を不良とし、不良発生迄
の時間を測定した。 ガラス転移温度(Tg):樹脂組成物を、低圧トランス
ファー成形機を用いて150℃、70kg/cm2、1
80秒の条件で5×5×20mmのテストピースに成形
後、175℃、2時間のポストキュアーを行い、TMA
測定用テストピースとした。得られたテストピースは熱
機械的分析装置(セイコー電子工業(株)・製)を用い
て測定した。Tgは低温側40℃、高温側240℃で接
線を引き、両接線の交点より求めた。
Evaluation Method Temperature Cycle Test: The temperature cycle property was measured using the light emitting diode device obtained above. The measurement conditions were such that the low temperature side was −65 ° C./5 minutes and the high temperature side was 125 ° C./5 minutes as one cycle. The measurement was carried out by repeating the above-mentioned cycle a plurality of times and judging by the number of cycles in which a resin crack occurred. Light transmittance: The resin composition was molded into a test piece of 10 × 30 × 1 mm thick under the conditions of 150 ° C., 70 kg / cm 2 and 180 seconds using a low pressure transfer molding machine, and then 17
Post-curing was performed at 5 ° C. for 2 hours to obtain a test piece for measuring light transmittance. The obtained test piece was measured for light transmittance (unit:%) at 940 nm using a spectrophotometer (manufactured by Hitachi Ltd., Model 330 self-recording spectrophotometer). Continuous energization test: The continuous energization test was measured using the light emitting diode device obtained above. The measurement conditions were room temperature. The light intensity was defined as 50% or less of the initial value, and the time until the occurrence of the defect was measured. Glass transition temperature (Tg): The resin composition was treated with a low pressure transfer molding machine at 150 ° C., 70 kg / cm 2 , 1
After molding into a 5 × 5 × 20 mm test piece under the condition of 80 seconds, post cure at 175 ° C. for 2 hours, and TMA
The test piece for measurement was used. The obtained test piece was measured using a thermomechanical analyzer (manufactured by Seiko Denshi Kogyo KK). The tangent line was drawn at Tg of 40 ° C on the low temperature side and 240 ° C on the high temperature side, and Tg was determined from the intersection of both tangent lines.

【0014】実施例2、3、比較例1〜5 表2の配合に従い、実施例1と同様にして樹脂組成物を
得、実施例1と同様にして評価した。実施例2、3、比
較例1、2は、溶融混合物と他の成分に、更にオルソク
レゾール型エポキシ樹脂(軟化点75℃、エポキシ当量
210)を配合して混練したものである。比較例3のフ
ェノールノボラック樹脂は、軟化点104℃、水酸基当
量104、比較例4のビスフェノールA型エポキシ樹脂
は、軟化点75℃、エポキシ当量480である。比較例
5のビフェニル型エポキシ樹脂、式(2−1)の樹脂
は、溶融混合物に用いたものと同一のものである。結果
を表2に示す。
Examples 2 and 3 and Comparative Examples 1 to 5 According to the formulations shown in Table 2, resin compositions were obtained in the same manner as in Example 1 and evaluated in the same manner as in Example 1. In Examples 2 and 3 and Comparative Examples 1 and 2, an orthocresol type epoxy resin (softening point 75 ° C., epoxy equivalent 210) was further mixed and kneaded with the melt mixture and other components and kneaded. The phenol novolac resin of Comparative Example 3 has a softening point of 104 ° C. and a hydroxyl group equivalent of 104, and the bisphenol A type epoxy resin of Comparative Example 4 has a softening point of 75 ° C. and an epoxy equivalent of 480. The biphenyl type epoxy resin of Comparative Example 5 and the resin of the formula (2-1) are the same as those used in the melt mixture. The results are shown in Table 2.

【表1】 [Table 1]

【0015】[0015]

【表2】 [Table 2]

【0016】[0016]

【発明の効果】本発明に従うと、耐熱性、連続通電特性
に優れた発光ダイオード装置を得ることができる。
According to the present invention, a light emitting diode device having excellent heat resistance and continuous energization characteristics can be obtained.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C08L 63/00 - 63/10 C08G 59/00 - 59/72 H01L 23/29 H01L 23/31 ─────────────────────────────────────────────────── ─── Continuation of front page (58) Fields surveyed (Int.Cl. 7 , DB name) C08L 63/00-63/10 C08G 59/00-59/72 H01L 23/29 H01L 23/31

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 (A)全エポキシ樹脂中に75重量%以
上の一般式(1)で示されるビフェニル型エポキシ樹
脂、(B)150℃でのICI粘度が3〜30ポイズで
ある一般式(2)で示されるフェノールアラルキル樹
脂、(C)硬化促進剤を必須成分とする樹脂組成物にお
いて、予め(A)一般式(1)で示されるビフェニル型
エポキシ樹脂と(B)150℃でのICI粘度が3〜3
0ポイズである一般式(2)で示されるフェノールアラ
ルキル樹脂が溶融混合されていることを特徴とする光半
導体封止用エポキシ樹脂組成物。 【化1】 (R1は、水素、メチル基、エチル基から選択され、同
一でも異なっていてもよい。nは0〜2整数) 【化2】 (R2はフェニレン基、ジフェニレン基、ジフェニレン
エーテル基、ジフェニレンメタン基、又はそれらの基に
置換基とし炭素数1〜5のアルキル基のついたもの、l
は0、又は1〜3の整数で、R3は炭素数1〜4のアル
キル基、nは0〜10の整数)
1. A biphenyl type epoxy resin represented by the general formula (1) in an amount of (A) total epoxy resin of 75% by weight or more, and (B) an ICI viscosity at 150 ° C. of 3 to 30 poises.
A phenolic aralkyl resin represented by a general formula (2) and a resin composition containing (C) a curing accelerator as an essential component, and (A) a biphenyl epoxy resin represented by the general formula (1) and (B) 150 ICI viscosity at ℃ is 3 to 3
An epoxy resin composition for encapsulating an optical semiconductor, wherein a phenol aralkyl resin represented by the general formula (2) having 0 poise is melt-mixed. [Chemical 1] (R1 is selected from hydrogen, methyl group and ethyl group and may be the same or different. N is an integer of 0 to 2) (R2 is a phenylene group, a diphenylene group, a diphenylene ether group, a diphenylene methane group, or those groups each having a substituent and an alkyl group having 1 to 5 carbon atoms, l
Is 0 or an integer of 1 to 3, R 3 is an alkyl group having 1 to 4 carbon atoms, and n is an integer of 0 to 10)
【請求項2】 請求項1のエポキシ樹脂組成物を用いて
発光ダイオード素子を封止してなる光半導体装置。
2. An optical semiconductor device obtained by encapsulating a light emitting diode element using the epoxy resin composition according to claim 1.
JP08783499A 1999-03-30 1999-03-30 Epoxy resin composition for optical semiconductor and semiconductor device Expired - Fee Related JP3432445B2 (en)

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200062964A (en) 2018-11-27 2020-06-04 주식회사 에스모머티리얼즈 Epoxy resin composition for photosemiconductor element molding and method for preparation of the same

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005120228A (en) * 2003-10-16 2005-05-12 Nitto Denko Corp Epoxy resin composition for optical semiconductor element sealing and optical semiconductor device using the composition
JP5110997B2 (en) * 2007-07-23 2012-12-26 日東電工株式会社 Epoxy resin composition for optical semiconductor element sealing and optical semiconductor device using the same
JP2011089130A (en) * 2010-12-10 2011-05-06 Nippon Kayaku Co Ltd Epoxy resin composition for optical material and cured article thereof
JP2011252155A (en) * 2011-07-25 2011-12-15 Nippon Kayaku Co Ltd Epoxy resin composition for optical material, and its cured product

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200062964A (en) 2018-11-27 2020-06-04 주식회사 에스모머티리얼즈 Epoxy resin composition for photosemiconductor element molding and method for preparation of the same

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