JP2011252155A - Epoxy resin composition for optical material, and its cured product - Google Patents

Epoxy resin composition for optical material, and its cured product Download PDF

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JP2011252155A
JP2011252155A JP2011161705A JP2011161705A JP2011252155A JP 2011252155 A JP2011252155 A JP 2011252155A JP 2011161705 A JP2011161705 A JP 2011161705A JP 2011161705 A JP2011161705 A JP 2011161705A JP 2011252155 A JP2011252155 A JP 2011252155A
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epoxy resin
resin composition
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Yasumasa Akatsuka
泰昌 赤塚
Katsuhiko Oshimi
克彦 押見
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Nippon Kayaku Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide an epoxy resin composition in which a refractive index of a cured product thereof is very high.SOLUTION: The epoxy resin composition for an optical material includes: a biphenyl novolak type epoxy resin as an epoxy resin; and a phenol resin expressed by formula (2) as a curing agent. In the formula, n denotes a positive number.

Description

本発明は屈折率及び耐熱性の高い硬化物を与える光学材料用エポキシ樹脂組成物に関する。 The present invention relates to an epoxy resin composition for optical materials that provides a cured product having a high refractive index and high heat resistance.

エポキシ樹脂は種々の硬化剤で硬化させることにより、一般的に機械的性質、耐水性、耐薬品性、耐熱性、電気的性質などに優れた硬化物となり、接着剤、塗料、積層板、成形材料、注型材料などの幅広い分野に利用されている。また光学用レンズ、眼鏡レンズ、光ディスク用基板、プラスチック光ファイバなどの分野では、PMMA(ポリメチルメタクリレート)が、また更に高屈折率が求められる場合にはPS(ポリスチレン)が一般的な樹脂材料として使用されてきた。 Epoxy resins are generally cured with various curing agents, resulting in cured products with excellent mechanical properties, water resistance, chemical resistance, heat resistance, electrical properties, etc., adhesives, paints, laminates, moldings It is used in a wide range of fields such as materials and casting materials. In the fields of optical lenses, eyeglass lenses, optical disk substrates, plastic optical fibers, etc., PMMA (polymethyl methacrylate) is used as a general resin material, and PS (polystyrene) is a common resin material when a higher refractive index is required. Have been used.

本発明のエポキシ樹脂組成物は従来一般的に使用されてきたエポキシ樹脂と比較して極めて高い屈折率を有する硬化物を与える。 従って、本発明のエポキシ樹脂組成物は光学用レンズ、眼鏡レンズ、光ディスク用基板、プラスチック光ファイバなどの光学材料用途にきわめて有用である。 The epoxy resin composition of the present invention gives a cured product having an extremely high refractive index as compared with epoxy resins that have been generally used conventionally. Therefore, the epoxy resin composition of the present invention is extremely useful for optical material applications such as optical lenses, spectacle lenses, optical disk substrates, and plastic optical fibers.

しかしながらPMMAやPSは熱可塑性樹脂であるためフレキシビリティーは有するものの、耐熱性の要求される分野では信頼性の面で問題があった。また通常のエポキシ樹脂の硬化物は高い信頼性は有するものの、フレキシビリティーに欠け、屈折率は通常1.5前後であり光学材料用途に用いるには不十分であった。 However, although PMMA and PS are thermoplastic resins, they have flexibility, but have problems in terms of reliability in fields where heat resistance is required. In addition, a cured product of a normal epoxy resin has high reliability, but lacks flexibility, and its refractive index is usually around 1.5, which is insufficient for use in optical materials.

本発明者らはこうした実状に鑑み、耐熱性が高く、しかもフィルム状に成形した場合でも十分なフレキシビリティーを有ししかも屈折率の高い材料を求めて鋭意検討した結果、特定の構造を有するエポキシ樹脂と硬化剤の組み合わせが、これらの特性を満たすことを見出し、本発明を完成させるに至った。 In view of the actual situation, the present inventors have intensively studied for a material having high heat resistance and sufficient flexibility even when formed into a film and having a high refractive index. As a result, the inventors have a specific structure. The inventors have found that a combination of an epoxy resin and a curing agent satisfies these characteristics, and have completed the present invention.

すなわち本発明は(1)式(1) That is, the present invention provides the following formula (1)

Figure 2011252155
(式中nは正数を表す。)で表されるエポキシ樹脂及び硬化剤を含有することを特徴とする光学材料用エポキシ樹脂組成物、(2)エポキシ樹脂及び式(2)
Figure 2011252155
(Wherein n represents a positive number) and an epoxy resin composition for an optical material containing an epoxy resin and a curing agent represented by (2) an epoxy resin and a formula (2)

Figure 2011252155
(式中nは正数を表す。)で表されるフェノール樹脂を含有することを特徴とする光学材料用エポキシ樹脂組成物、(3)硬化剤が、式(2)で表されるフェノール樹脂である上記(1)記載の光学材料用エポキシ樹脂組成物、(4)フェノール樹脂の重量平均分子量が3000以上である上記(2)又は(3)記載の光学材料用エポキシ樹脂組成物、(5)溶剤を含有する上記(1)乃至(4)のいずれか1項に記載の光学材料用エポキシ樹脂組成物、(6)上記(1)乃至(5)のいずれか1項に記載のエポキシ樹脂組成物から得られるフィルム状成形物、(7)上記(1)乃至(6)のいずれか1項に記載のエポキシ樹脂組成物を硬化してなる硬化物を提供するものである。
Figure 2011252155
(Wherein n represents a positive number), the epoxy resin composition for optical materials characterized by containing a phenol resin represented by formula (2), wherein the curing agent is represented by formula (2) (4) The epoxy resin composition for optical materials according to (1) above, (4) The epoxy resin composition for optical materials according to (2) or (3) above, wherein the phenol resin has a weight average molecular weight of 3000 or more, (5 (1) The epoxy resin composition for optical materials according to any one of (1) to (4) above, which contains a solvent, (6) The epoxy resin according to any one of (1) to (5) above. A film-like molded article obtained from the composition, and (7) a cured product obtained by curing the epoxy resin composition according to any one of (1) to (6) above.

本発明において式(1)で表されるエポキシ樹脂は公知のものが使用できる。例えば日本化薬(株)製NC−3000S(エポキシ当量284g/eq、軟化点58℃)、NC−3000S−H(エポキシ当量290g/eq、軟化点70℃)などが挙げられる。 尚、式(1)においてnは正数を表し、特に限定されるものではないが、平均値で通常0.1〜7、好ましくは0.2〜6である。 In the present invention, a known epoxy resin represented by the formula (1) can be used. For example, NC-3000S (epoxy equivalent 284 g / eq, softening point 58 ° C.), NC-3000S-H (epoxy equivalent 290 g / eq, softening point 70 ° C.) manufactured by Nippon Kayaku Co., Ltd. can be mentioned. In addition, in Formula (1), n represents a positive number and is not particularly limited. However, the average value is usually 0.1 to 7, and preferably 0.2 to 6.

式(2)で表されるフェノール樹脂も公知のものが使用できる。例えば明和化成(株)製MEH−7851SS(水酸基当量203g/eq、軟化点68℃)等が挙げられる。またフィルム状に成形した場合にフレキシビリティーを付与するためにはエポキシ樹脂、フェノール樹脂いずれも重量平均分子量が大きい方が好ましい。しかしながらエポキシ樹脂の場合は合成プロセスがフェノール樹脂に比べて複雑であるため、フェノール樹脂の分子量増大化を図る方が容易である。式(2)で表されるフェノール樹脂は下記式(3) A well-known phenol resin represented by the formula (2) can also be used. For example, Meiwa Kasei Co., Ltd. product MEH-7851SS (hydroxyl equivalent 203g / eq, softening point 68 degreeC) etc. are mentioned. Moreover, in order to provide flexibility when it is formed into a film, it is preferable that both the epoxy resin and the phenol resin have a large weight average molecular weight. However, in the case of an epoxy resin, since the synthesis process is more complicated than that of a phenol resin, it is easier to increase the molecular weight of the phenol resin. The phenol resin represented by the formula (2) is represented by the following formula (3).

Figure 2011252155
(式中、Xは塩素原子、メトキシ基、エトキシ基、水酸基のいずれかを表す。)で表される化合物とフェノールとを酸触媒の存在下で縮合反応させることにより得ることが出来る。式(2)で表されるフェノール樹脂の重量平均分子量はフェノールと式(3)で表される化合物の仕込み比率によりコントロールすることが出来る。フェノールと式(3)で表される化合物のモル仕込み比率は通常10:1〜1.05:1であるが、好ましくは8:1〜1.1:1である。重量平均分子量はGPCを用いて測定することが出来る。通常は500〜20000であるが、硬化物をフィルム状に成形してフレキシビリティーを付与したい場合は、通常3000以上、好ましくは3000〜20000である。 尚、式(2)においてnは正数を表し、特に限定されるものではないが、平均値で通常0.1〜25、好ましくは0.2〜20である。
Figure 2011252155
(Wherein X represents a chlorine atom, a methoxy group, an ethoxy group, or a hydroxyl group) and a phenol can be obtained by a condensation reaction in the presence of an acid catalyst. The weight average molecular weight of the phenol resin represented by the formula (2) can be controlled by the charging ratio of the phenol and the compound represented by the formula (3). The molar charge ratio of phenol and the compound represented by formula (3) is usually 10: 1 to 1.05: 1, but preferably 8: 1 to 1.1: 1. The weight average molecular weight can be measured using GPC. Usually, it is 500-20000, but when forming hardened | cured material into a film form and providing flexibility, it is 3000 or more normally, Preferably it is 3000-20000. In the formula (2), n represents a positive number and is not particularly limited. However, the average value is usually 0.1 to 25, and preferably 0.2 to 20.

本発明のエポキシ樹脂組成物においては、式(1)で表されるエポキシ樹脂以外に他のエポキシ樹脂を併用することも可能である。併用する場合、式(1)で表されるエポキシ樹脂の全エポキシ樹脂中に占める割合は30重量%以上が好ましく、特に40重量%以上が好ましい。 In the epoxy resin composition of the present invention, other epoxy resins can be used in combination with the epoxy resin represented by the formula (1). When used in combination, the proportion of the epoxy resin represented by formula (1) in the total epoxy resin is preferably 30% by weight or more, particularly preferably 40% by weight or more.

式(1)で表されるエポキシ樹脂と併用し得る他のエポキシ樹脂の具体例としては、クレゾールノボラック型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、ビフェニル型エポキシ樹脂、ジシクロペンタジエンフェノール共縮合型エポキシ樹脂、脂肪族環状エポキシ樹脂、水素化ビスフェノールA型エポキシ樹脂などが挙げられる。 Specific examples of other epoxy resins that can be used in combination with the epoxy resin represented by the formula (1) include cresol novolac type epoxy resins, phenol novolac type epoxy resins, bisphenol A type epoxy resins, bisphenol F type epoxy resins, and triphenyl. Examples include methane type epoxy resins, biphenyl type epoxy resins, dicyclopentadienephenol co-condensation type epoxy resins, aliphatic cyclic epoxy resins, and hydrogenated bisphenol A type epoxy resins.

本発明のエポキシ樹脂組成物においては式(2)で表されるフェノール樹脂以外に他の硬化剤を併用することも可能である。併用する場合、式(2)で表されるフェノール樹脂の全硬化剤中に占める割合は30重量%以上が好ましく、特に40重量%以上が好ましい。 In the epoxy resin composition of this invention, it is also possible to use other hardening | curing agents together besides the phenol resin represented by Formula (2). When used in combination, the proportion of the phenol resin represented by formula (2) in the total curing agent is preferably 30% by weight or more, particularly preferably 40% by weight or more.

式(2)で表されるフェノール樹脂と併用し得る硬化剤としては、例えばアミン系化合物、酸無水物系化合物、アミド系化合物、フェノ−ル系化合物などが挙げられる。用い得る硬化剤の具体例としては、ジアミノジフェニルメタン、ジエチレントリアミン、トリエチレンテトラミン、ジアミノジフェニルスルホン、イソホロンジアミン、ジシアンジアミド、リノレン酸の2量体とエチレンジアミンとより合成されるポリアミド樹脂、無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水メチルナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、フェノ−ルノボラック、及びこれらの変性物、イミダゾ−ル、BF−アミン錯体、グアニジン誘導体などが挙げられるがこれらに限定されるものではない。これらは単独で用いてもよく、2種以上併用してもよい。 Examples of the curing agent that can be used in combination with the phenol resin represented by the formula (2) include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, and the like. Specific examples of the curing agent that can be used include diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, dicyandiamide, a polyamide resin synthesized from linolenic acid and ethylenediamine, phthalic anhydride, triethylene anhydride. Meritic acid, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, phenol novolac, and modified products thereof, Examples include, but are not limited to, imidazole, BF 3 -amine complexes, guanidine derivatives, and the like. These may be used alone or in combination of two or more.

本発明のエポキシ樹脂組成物において硬化剤の使用量は、エポキシ樹脂のエポキシ基1当量に対して0.7〜1.2当量が好ましい。エポキシ基1当量に対して、0.7当量に満たない場合、あるいは1.2当量を超える場合、いずれも硬化が不完全となり良好な硬化物性が得られない恐れがある。 In the epoxy resin composition of the present invention, the amount of the curing agent used is preferably 0.7 to 1.2 equivalents relative to 1 equivalent of the epoxy group of the epoxy resin. When less than 0.7 equivalent or more than 1.2 equivalent with respect to 1 equivalent of epoxy group, curing may be incomplete and good cured properties may not be obtained.

また本発明のエポキシ樹脂組成物においては硬化促進剤を使用しても差し支えない。用い得る硬化促進剤の具体例としては2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール等のイミダゾ−ル類、2−(ジメチルアミノメチル)フェノール、1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7等の第3級アミン類、トリフェニルホスフィン等のホスフィン類、オクチル酸スズ等の金属化合物、ジアゾニウム塩、ヨードニウム塩、スルホニウム塩等の各種オニウム塩等が挙げられる。硬化促進剤はエポキシ樹脂100重量部に対して0.1〜5.0重量部が必要に応じ用いられる。 In the epoxy resin composition of the present invention, a curing accelerator may be used. Specific examples of curing accelerators that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2- (dimethylaminomethyl) phenol, 1,8-diaza- Tertiary amines such as bicyclo (5,4,0) undecene-7, phosphines such as triphenylphosphine, metal compounds such as tin octylate, various onium salts such as diazonium salts, iodonium salts, sulfonium salts, etc. Can be mentioned. The curing accelerator is used as necessary in an amount of 0.1 to 5.0 parts by weight based on 100 parts by weight of the epoxy resin.

本発明のエポキシ樹脂組成物は必要により無機充填材を含有しうる。用いうる無機充填材の具体例としてはシリカ、アルミナ、タルク等が挙げられる。無機充填材は本発明のエポキシ樹脂組成物中において0〜90重量%を占める量が用いられる。更に本発明のエポキシ樹脂組成物には、シランカップリング剤、ステアリン酸、パルミチン酸、ステアリン酸亜鉛、ステアリン酸カルシウム等の離型剤、顔料等の種々の配合剤を添加することができる。 The epoxy resin composition of the present invention may contain an inorganic filler as necessary. Specific examples of the inorganic filler that can be used include silica, alumina, talc and the like. The inorganic filler is used in an amount of 0 to 90% by weight in the epoxy resin composition of the present invention. Furthermore, various compounding agents such as silane coupling agents, mold release agents such as stearic acid, palmitic acid, zinc stearate, calcium stearate, and pigments can be added to the epoxy resin composition of the present invention.

本発明のエポキシ樹脂組成物は、各成分を均一に混合することにより得られる。本発明のエポキシ樹脂組成物は従来知られている方法と同様の方法で容易にその硬化物とすることができる。例えばエポキシ樹脂及び硬化剤並びに必要により硬化促進剤、無機充填材及び配合剤とを必要に応じて押出機、ニ−ダ、ロ−ル等を用いて均一になるまで充分に混合してエポキシ樹脂組成物を得、そのエポキシ樹脂組成物を溶融後注型あるいはトランスファ−成型機などを用いて成型し、さらに80〜200℃で1〜10時間加熱することにより硬化物を得ることができる。また、オニウム塩を硬化触媒として使用する場合は熱だけでなく紫外線などの光照射によっても硬化物を得ることが可能である。 The epoxy resin composition of this invention is obtained by mixing each component uniformly. The epoxy resin composition of the present invention can be easily made into a cured product by a method similar to a conventionally known method. For example, an epoxy resin and a curing agent and, if necessary, a curing accelerator, an inorganic filler, and a compounding agent are thoroughly mixed using an extruder, a kneader, a roll or the like as necessary until they become uniform. A cured product can be obtained by obtaining a composition, molding the epoxy resin composition using a cast or transfer molding machine after melting, and further heating at 80 to 200 ° C. for 1 to 10 hours. When an onium salt is used as a curing catalyst, a cured product can be obtained not only by heat but also by irradiation with light such as ultraviolet rays.

また本発明のエポキシ樹脂組成物をトルエン、キシレン、アセトン、メチルエチルケトン、メチルイソブチルケトン等の溶剤に溶解させてワニスを調製し、ガラス繊維、カ−ボン繊維、ポリエステル繊維、ポリアミド繊維、アルミナ繊維、紙などに含浸させ加熱半乾燥して得たプリプレグを熱プレス成型して硬化物を得ることもできる。更にこのワニスを銅箔、PET(ポリエチレングリコールテレフタレート)フィルム、ポリイミドフィルムなどの基材に塗布し加熱することによりフィルム状の硬化物を得ることも出来、例えば光ディスクの基板用接着剤として用いることが出来る。この際の溶剤は、本発明のエポキシ樹脂組成物と該溶剤の混合物中で通常10〜70重量%、好ましくは15〜70重量%を占める量を用いる。 Moreover, the epoxy resin composition of the present invention is dissolved in a solvent such as toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone to prepare a varnish, and glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, paper It is also possible to obtain a cured product by hot press-molding a prepreg obtained by impregnation into a solution and heating and semi-drying. Furthermore, this varnish can be applied to a substrate such as a copper foil, a PET (polyethylene glycol terephthalate) film, a polyimide film and heated to obtain a film-like cured product. For example, it can be used as an adhesive for a substrate of an optical disk. I can do it. The solvent used here is usually 10 to 70% by weight, preferably 15 to 70% by weight in the mixture of the epoxy resin composition of the present invention and the solvent.

次に本発明を実施例により
更に具体的に説明するが、以下において部は特に断わりのない限り重量部である。
EXAMPLES Next, the present invention will be described more specifically with reference to examples. In the following, parts are parts by weight unless otherwise specified.

実施例1 式(1)で表されるエポキシ樹脂としてNC−3000S(日本化薬(株)製、軟化点℃、エポキシ当量280g/eq)28部、式(2)で表されるフェノール樹脂としてカヤハードHBPN(日本化薬(株)製、軟化点130℃、水酸基当量242g/eq、GPCによる重量平均分子量15800)を24.2部、硬化促進剤としてトリフェニルホスフィン(TPP)を0.28部、溶剤としてメチルエチルケトン52.5部を均一に溶解させワニス(本発明のエポキシ樹脂組成物)を調製した。次いでアプリケーターを用いてPETフィルム上に乾燥後の厚さが200μmになるように均一に塗布し、160℃のオーブン中で2時間、乾燥、硬化を行いフィルム状の硬化物を得た。この硬化物は折り曲げても割れることはなく十分なフレキシビリティーを有していた。この硬化物のガラス転移温度をDMA(動的粘弾性測定装置)を用いて測定したところ161℃であった。また下記の条件にて屈折率を測定したところ1.655であった。 Example 1 As an epoxy resin represented by the formula (1), NC-3000S (manufactured by Nippon Kayaku Co., Ltd., softening point ° C, epoxy equivalent 280 g / eq) 28 parts, a phenol resin represented by the formula (2) Kayahard HBPN (manufactured by Nippon Kayaku Co., Ltd., softening point 130 ° C., hydroxyl equivalent 242 g / eq, weight average molecular weight 15800 by GPC) 24.2 parts, triphenylphosphine (TPP) 0.28 parts as curing accelerator Then, 52.5 parts of methyl ethyl ketone as a solvent was uniformly dissolved to prepare a varnish (epoxy resin composition of the present invention). Next, it was uniformly coated on a PET film using an applicator so that the thickness after drying was 200 μm, and dried and cured in an oven at 160 ° C. for 2 hours to obtain a film-like cured product. This cured product did not break even when bent, and had sufficient flexibility. It was 161 degreeC when the glass transition temperature of this hardened | cured material was measured using DMA (dynamic viscoelasticity measuring apparatus). The refractive index measured under the following conditions was 1.655.

GPCの測定条件 機種:SYSTEM−21(Shodex製) カラム:KF−804L+KF−803L(×2本)連結 溶離液:THF (1ml/min.,40℃) 検出器:RI(RI−71S) UV(254nm;UV−41) サンプル:約0.4重量%THF溶液 (100μlインジェクト) 検量線:Shodex製標準ポリスチレン使用ガラス転移点測定条件 機種:RHEOLOGRPH−SOLID(東洋精機製) 昇温速度:2℃/分 周波数:10ヘルツ モード:引っ張りモード屈折率測定条件 測定装置:多波長アッベ屈折計DR−M2(株式会社アタゴ製) 測定波長:1.589nm(D線) GPC measurement conditions Model: SYSTEM-21 (manufactured by Shodex) Column: KF-804L + KF-803L (× 2) connection Eluent: THF (1 ml / min., 40 ° C.) Detector: RI (RI-71S) UV ( 254 nm; UV-41) Sample: Approx. 0.4 wt% THF solution (100 μl injection) Calibration curve: Glass transition point measurement conditions using standard polystyrene made by Shodex Model: RHEOLOGPH-SOLID (manufactured by Toyo Seiki) Temperature increase rate: 2 ° C. / Min Frequency: 10 Hz Mode: Tensile mode refractive index measurement conditions Measuring device: Multiwavelength Abbe refractometer DR-M2 (manufactured by Atago Co., Ltd.) Measurement wavelength: 1.589 nm (D line)

このように本発明のエポキシ樹脂組成物から得られた硬化物はフィルム状に成形してもフレキシビリティーを有し、しかも高い耐熱性(ガラス転移点が高いことから判断される)及び高屈折率を示した。 Thus, the cured product obtained from the epoxy resin composition of the present invention has flexibility even when formed into a film, and has high heat resistance (determined from the high glass transition point) and high refraction. Showed the rate.

Claims (6)

エポキシ樹脂及び式(2)
Figure 2011252155
(式中nは正数を表す。)で表されるフェノール樹脂を含有することを特徴とする光学材料用エポキシ樹脂組成物。
Epoxy resin and formula (2)
Figure 2011252155
The epoxy resin composition for optical materials characterized by containing the phenol resin represented by (In formula, n represents a positive number.).
エポキシ樹脂が下記式(1)
Figure 2011252155
(式中nは正数を表す。)で表されるエポキシ樹脂である請求項1に記載の光学材料用エポキシ樹脂組成物。
The epoxy resin is represented by the following formula (1)
Figure 2011252155
The epoxy resin composition for an optical material according to claim 1, wherein the epoxy resin is represented by the formula (n represents a positive number).
フェノール樹脂の重量平均分子量が3000以上である請求項1または請求項2のいずれか一項に記載の光学材料用エポキシ樹脂組成物。 The epoxy resin composition for an optical material according to claim 1, wherein the phenol resin has a weight average molecular weight of 3000 or more. 溶剤を含有する請求項1乃至3のいずれか1項に記載の光学材料用エポキシ樹脂組成物。 The epoxy resin composition for optical materials according to any one of claims 1 to 3, comprising a solvent. 請求項1乃至4のいずれか1項に記載のエポキシ樹脂組成物から得られるフィルム状成形物。 The film-shaped molding obtained from the epoxy resin composition of any one of Claims 1 thru | or 4. 請求項1乃至4のいずれか1項に記載のエポキシ樹脂組成物を硬化してなる硬化物。 Hardened | cured material formed by hardening | curing the epoxy resin composition of any one of Claims 1 thru | or 4.
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JP2000281868A (en) * 1999-03-30 2000-10-10 Sumitomo Bakelite Co Ltd Epoxy resin composition for photosemiconductor and semiconductor device
JP2000351831A (en) * 1999-06-11 2000-12-19 Nippon Kayaku Co Ltd Epoxy resin composition for sealing photo-semiconductor
JP2001055429A (en) * 1999-08-19 2001-02-27 Nippon Kayaku Co Ltd Partially and nuclearly hydrogenated polyfunctional aromatic epoxy resin and epoxy resin composition containing the same
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* Cited by examiner, † Cited by third party
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