JP3371628B2 - Gas chromatograph - Google Patents

Gas chromatograph

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Publication number
JP3371628B2
JP3371628B2 JP18637895A JP18637895A JP3371628B2 JP 3371628 B2 JP3371628 B2 JP 3371628B2 JP 18637895 A JP18637895 A JP 18637895A JP 18637895 A JP18637895 A JP 18637895A JP 3371628 B2 JP3371628 B2 JP 3371628B2
Authority
JP
Japan
Prior art keywords
flow path
carrier gas
pressure
vaporization chamber
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP18637895A
Other languages
Japanese (ja)
Other versions
JPH0915222A (en
Inventor
雅直 少路
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP18637895A priority Critical patent/JP3371628B2/en
Publication of JPH0915222A publication Critical patent/JPH0915222A/en
Application granted granted Critical
Publication of JP3371628B2 publication Critical patent/JP3371628B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Sampling And Sample Adjustment (AREA)
  • Flow Control (AREA)

Description

【発明の詳細な説明】 【0001】 【産業上の利用分野】本発明は、ガスクロマトグラフ装
置に関する。 【0002】 【従来の技術】従来のガスクロマトグラフの構成及び動
作を図2により説明する。分離カラム38の入口には試
料気化室37が設けられ、試料気化室37にはキャリヤ
ガス源31が接続される。キャリヤガス源31と試料気
化室37とを接続するキャリヤガス流路32には、上流
(キャリヤガス源31側)から順に、圧力制御弁33、
流路抵抗34、流路抵抗34の両端の圧力差を検出する
差圧センサ35、及び、流量制御弁36が設けられる。
試料気化室37にはまた、分離カラム38の入口の圧力
を検出するための圧力センサ39が設けられる。 【0003】ガスクロマトグラフを行なう際は、初めに
所定流量のキャリヤガスを試料気化室37及び分離カラ
ム38に供給しておく。そして、注入器40により試料
を試料気化室37に注入すると、試料は試料気化室37
内で気化され、キャリヤガスに乗せられて分離カラム3
8に送出され、そこで成分分離される。 【0004】キャリヤガス流路32を流れるキャリヤガ
スの流量Fは、次の式で表わすことができる。 F=K×Pin×(ΔP)n …(1) この式において、Pinは流路抵抗34の上流側(図2の
a点)の圧力、ΔPは流路抵抗34の両端の圧力差、n
は0.5〜1程度の定数、そしてKは比例係数である。 【0005】キャリヤガスの流量は流量制御弁36の開
閉により調節することができるが、その値Fを制御する
ためには、上記式より、Pinを固定しておく必要があ
る。そのため、従来のガスクロマトグラフ装置では流路
抵抗34の上流側に圧力制御弁33を設けることにより
inを固定し、制御部30が、差圧センサ35により検
出される流路抵抗34の両端の圧力差ΔPに応じて流量
制御弁36の開度を調節することにより、流量制御を行
なっていた。なお、試料気化室37に設けられた圧力セ
ンサ39は、クロマトグラフを行なう際に、カラム入口
圧の設定、或いはスプリット分析を行なう際のスプリッ
ト比制御等に用いられていた。 【0006】 【発明が解決しようとする課題】上記従来のガスクロマ
トグラフ装置では、Pinを固定するための圧力制御弁3
3が必要であるため、構造が複雑であるとともにコスト
が高いという問題があった。 【0007】本発明はこのような課題を解決するために
成されたものであり、その目的とするところは、より構
造を簡略化し、コストを低減したガスクロマトグラフ装
置を提供することにある。 【0008】 【課題を解決するための手段】上記課題を解決するため
に成された本発明は、キャリヤガスを所定の流量で試料
気化室に供給し、液体試料を該試料気化室に注入するこ
とにより該液体試料を気化して分離カラムに送出するガ
スクロマトグラフ装置において、 a)試料気化室の圧力を検出する圧力センサと、 b)キャリヤガスを試料気化室に供給するためのキャリヤ
ガス流路に設けられた流路抵抗及びその流路抵抗の両端
の圧力差を検出する差圧センサと、 c)上記流路抵抗よりも上流側のキャリヤガス流路に設け
られた流量制御弁と、を備えることを特徴とする。 【0009】 【作用】本発明に係るガスクロマトグラフ装置では、流
量制御弁が流路抵抗よりも上流側に設けられているた
め、試料気化室と流路抵抗との間には圧力低下を生ずる
要素がない。従って、上記式(1)で用いられている流
路抵抗の上流側の圧力Pinは、試料気化室の圧力P
vpに、流路抵抗の両端の圧力差を加えることにより得ら
れる。すなわち、式(1)は、 F=K×(Pvp+ΔP)×(ΔP)n …(2) と表わされ、圧力センサ及び差圧センサの出力のみに基
づいてキャリヤガス流路の流量Fを算出することができ
る。従って、この算出値に基づいて流量制御弁を調節す
ることにより、キャリヤガス流路の流量Fを任意に制御
することができる。 【0010】なお、試料気化室の圧力を検出する圧力セ
ンサは、上記の通り従来のクロマトグラフ装置において
カラム入口圧の設定、或いはスプリット分析を行なう際
のスプリット比制御等の為に備えられているものをその
まま用いることができる。 【0011】 【発明の効果】本発明に係るガスクロマトグラフ装置で
は、キャリヤガス流路の圧力を調節する圧力制御弁が不
要であるため構造が単純であり、コストが低下すると共
に装置の信頼性が向上する。 【0012】 【実施例】本発明の一実施例であるガスクロマトグラフ
装置を図1により説明する。本実施例のガスクロマトグ
ラフ装置は、図2に示した従来のクロマトグラフ装置と
比較すると、圧力制御弁33が廃止され、流量制御弁1
6がキャリヤガス源11と流路抵抗14(及び差圧セン
サ15)の間のキャリヤガス流路12に配置されている
ところに特徴を有する。その他の部分については従来の
装置と同様であり、試料気化室17には分離カラム18
が接続され、また、分離カラム18入口の(すなわち、
試料気化室17内の)圧力を検出するための圧力センサ
19が設けられている。 【0013】本実施例のガスクロマトグラフ装置では、
所定流量のキャリヤガスを試料気化室17及び分離カラ
ム18に供給するために、上記式(2)に従って流量制
御弁16を制御する。すなわち、制御部10は圧力セン
サ19からの圧力信号Pvp及び差圧センサ15からの差
圧信号ΔPに基づき、 F=K×(Pvp+ΔP)×(ΔP)n …(2) を算出し、これが所定の値となるように流量制御弁16
の開度を調節する。なお、流量Fは一定となるように制
御される場合もあるし、時間的に変化するように制御さ
れる場合もある。こうしてキャリヤガスの流量を制御し
つつ、所定の時点で注入器20により試料を試料気化室
17に注入することにより、試料のクロマトグラフ分析
が行なわれる。 【0014】なお、本発明に係るガスクロマトグラフ装
置はキャリヤガスの流量Fを制御せず、単に流量Fをモ
ニタするだけの場合(例えば、圧力制御の場合)にもも
ちろん利用することができる。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas chromatograph. 2. Description of the Related Art The configuration and operation of a conventional gas chromatograph will be described with reference to FIG. A sample vaporization chamber 37 is provided at the inlet of the separation column 38, and the carrier gas source 31 is connected to the sample vaporization chamber 37. In the carrier gas flow path 32 connecting the carrier gas source 31 and the sample vaporization chamber 37, a pressure control valve 33,
A flow path resistance 34, a differential pressure sensor 35 for detecting a pressure difference between both ends of the flow path resistance 34, and a flow control valve 36 are provided.
The sample vaporization chamber 37 is also provided with a pressure sensor 39 for detecting the pressure at the inlet of the separation column 38. When performing a gas chromatograph, a carrier gas at a predetermined flow rate is first supplied to a sample vaporization chamber 37 and a separation column 38. Then, when the sample is injected into the sample vaporizing chamber 37 by the injector 40, the sample is
Vaporized in the reactor, loaded on a carrier gas,
8, where the components are separated. The flow rate F of the carrier gas flowing through the carrier gas flow path 32 can be expressed by the following equation. In F = K × P in × ( ΔP) n ... (1) This equation, P in is the pressure difference across the pressure, [Delta] P is the flow resistance 34 on the upstream side of the flow path resistance 34 (a point in FIG. 2) , N
Is a constant of about 0.5 to 1, and K is a proportional coefficient. [0005] The flow rate of the carrier gas can be adjusted by opening and closing the flow control valve 36, but in order to control the value F, it is necessary to fix Pin in accordance with the above equation. Therefore, in the conventional gas chromatograph apparatus P in fixed by providing the pressure control valve 33 on the upstream side of the flow path resistance 34, the control unit 30, a is the flow path resistance 34 detected by the differential pressure sensor 35 at both ends The flow control is performed by adjusting the opening of the flow control valve 36 according to the pressure difference ΔP. The pressure sensor 39 provided in the sample vaporization chamber 37 was used for setting a column inlet pressure when performing a chromatograph or controlling a split ratio when performing a split analysis. In the above conventional gas chromatograph, the pressure control valve 3 for fixing Pin is fixed.
3 requires a complicated structure and a high cost. The present invention has been made to solve such problems, and an object of the present invention is to provide a gas chromatograph apparatus having a simpler structure and a reduced cost. [0008] In order to solve the above-mentioned problems, the present invention provides a carrier gas supplied to a sample vaporization chamber at a predetermined flow rate, and injects a liquid sample into the sample vaporization chamber. In the gas chromatograph apparatus for vaporizing the liquid sample and sending it to the separation column, a) a pressure sensor for detecting the pressure of the sample vaporization chamber, and b) a carrier gas flow path for supplying a carrier gas to the sample vaporization chamber A pressure difference sensor for detecting a pressure difference between both ends of the flow path resistance and the flow path resistance, and c) a flow control valve provided in the carrier gas flow path upstream of the flow path resistance. It is characterized by having. In the gas chromatograph device according to the present invention, since the flow control valve is provided on the upstream side of the flow path resistance, an element which causes a pressure drop between the sample vaporizing chamber and the flow path resistance. There is no. Therefore, the pressure P in on the upstream side of the flow path resistance used in the above equation (1) is equal to the pressure P in the sample vaporization chamber.
It is obtained by adding the pressure difference between both ends of the flow path resistance to vp . That is, equation (1) is expressed as follows: F = K × (P vp + ΔP) × (ΔP) n (2), and the flow rate F of the carrier gas flow path is determined based only on the outputs of the pressure sensor and the differential pressure sensor. Can be calculated. Therefore, by adjusting the flow control valve based on this calculated value, the flow rate F of the carrier gas flow path can be arbitrarily controlled. The pressure sensor for detecting the pressure in the sample vaporization chamber is provided for setting the column inlet pressure in a conventional chromatographic apparatus or controlling the split ratio when performing a split analysis, as described above. Those can be used as they are. The gas chromatograph apparatus according to the present invention does not require a pressure control valve for adjusting the pressure of the carrier gas flow path, so that the structure is simple, the cost is reduced, and the reliability of the apparatus is reduced. improves. FIG. 1 shows a gas chromatograph apparatus according to an embodiment of the present invention. The gas chromatograph device of the present embodiment is different from the conventional chromatograph device shown in FIG.
6 is disposed in the carrier gas flow path 12 between the carrier gas source 11 and the flow path resistance 14 (and the differential pressure sensor 15). The other parts are the same as those of the conventional apparatus.
Are connected, and at the inlet of the separation column 18 (ie,
A pressure sensor 19 for detecting the pressure (in the sample vaporization chamber 17) is provided. In the gas chromatograph of this embodiment,
In order to supply the carrier gas at a predetermined flow rate to the sample vaporization chamber 17 and the separation column 18, the flow control valve 16 is controlled according to the above equation (2). That is, the control unit 10 calculates F = K × (P vp + ΔP) × (ΔP) n (2) based on the pressure signal P vp from the pressure sensor 19 and the differential pressure signal ΔP from the differential pressure sensor 15. , So that this becomes a predetermined value.
Adjust the opening of. The flow rate F may be controlled to be constant, or may be controlled to change with time. By controlling the flow rate of the carrier gas and injecting the sample into the sample vaporizing chamber 17 by the injector 20 at a predetermined time, the sample is subjected to chromatographic analysis. The gas chromatograph apparatus according to the present invention can be used in a case where the flow rate F of the carrier gas is not controlled but the flow rate F is simply monitored (for example, in the case of pressure control).

【図面の簡単な説明】 【図1】 本発明の一実施例のガスクロマトグラフ装置
の概略構成図。 【図2】 従来のガスクロマトグラフ装置の概略構成
図。 【符号の説明】 10、30…制御部 11、31…キャリヤガス源 12、32…キャリヤガス流路 33…圧力制御弁 14、34…流路抵抗 15、35…差圧センサ 16、36…流量制御弁 17、37…試料気化室 18、38…分離カラム 19、39…圧力センサ 20、40…注入器
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic configuration diagram of a gas chromatograph apparatus according to one embodiment of the present invention. FIG. 2 is a schematic configuration diagram of a conventional gas chromatograph device. [Description of Signs] 10, 30 ... Control units 11, 31 ... Carrier gas sources 12, 32 ... Carrier gas flow paths 33 ... Pressure control valves 14, 34 ... Flow path resistances 15, 35 ... Differential pressure sensors 16, 36 ... Flow rates Control valves 17, 37 ... Sample vaporization chambers 18, 38 ... Separation columns 19, 39 ... Pressure sensors 20, 40 ... Injector

Claims (1)

(57)【特許請求の範囲】 【請求項1】 キャリヤガスを所定の流量で試料気化室
に供給し、液体試料を該試料気化室に注入することによ
り該液体試料を気化して分離カラムに送出するガスクロ
マトグラフ装置において、 a)試料気化室の圧力を検出する圧力センサと、 b)キャリヤガスを試料気化室に供給するためのキャリヤ
ガス流路に設けられた流路抵抗及びその流路抵抗の両端
の圧力差を検出する差圧センサと、 c)上記流路抵抗よりも上流側のキャリヤガス流路に設け
られた流量制御弁と、を備えることを特徴とするガスク
ロマトグラフ装置。
(57) [Claims 1] A carrier gas is supplied to a sample vaporization chamber at a predetermined flow rate, and a liquid sample is injected into the sample vaporization chamber to vaporize the liquid sample to form a separation column. In the gas chromatograph device to be delivered, a) a pressure sensor for detecting the pressure of the sample vaporization chamber, and b) a flow path resistance provided in a carrier gas flow path for supplying a carrier gas to the sample vaporization chamber and its flow path resistance. And c) a flow control valve provided in the carrier gas flow path upstream of the flow path resistance.
JP18637895A 1995-06-28 1995-06-28 Gas chromatograph Expired - Fee Related JP3371628B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18637895A JP3371628B2 (en) 1995-06-28 1995-06-28 Gas chromatograph

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18637895A JP3371628B2 (en) 1995-06-28 1995-06-28 Gas chromatograph

Publications (2)

Publication Number Publication Date
JPH0915222A JPH0915222A (en) 1997-01-17
JP3371628B2 true JP3371628B2 (en) 2003-01-27

Family

ID=16187349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18637895A Expired - Fee Related JP3371628B2 (en) 1995-06-28 1995-06-28 Gas chromatograph

Country Status (1)

Country Link
JP (1) JP3371628B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012237600A (en) * 2011-05-10 2012-12-06 Shimadzu Corp Gas chromatography apparatus
JP6281450B2 (en) * 2014-09-09 2018-02-21 株式会社島津製作所 Gas chromatograph and flow control device used therefor

Also Published As

Publication number Publication date
JPH0915222A (en) 1997-01-17

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