JPH08304372A - Gas chromatographic device - Google Patents
Gas chromatographic deviceInfo
- Publication number
- JPH08304372A JPH08304372A JP7129656A JP12965695A JPH08304372A JP H08304372 A JPH08304372 A JP H08304372A JP 7129656 A JP7129656 A JP 7129656A JP 12965695 A JP12965695 A JP 12965695A JP H08304372 A JPH08304372 A JP H08304372A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- flow rate
- sample
- pressure
- measurement cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
- G01N30/62—Detectors specially adapted therefor
- G01N30/64—Electrical detectors
- G01N30/66—Thermal conductivity detectors
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明はガスクロマトグラフ装置
に関する。FIELD OF THE INVENTION The present invention relates to a gas chromatograph.
【０００２】[0002]
【従来の技術】熱伝導度型検出器（ＴＣＤ：Thermal Co
nductivity Detector）は、ガスクロマトグラフ装置の
検出器として、一般的に使用されているものの一つであ
る。図２は、このＴＣＤの構造を示す図である。ステン
レススチール等の金属ブロック２３の中に形成された２
つの測定セル２１ａ、２１ｂの内部には、それぞれ白金
等の金属製のフィラメント２２ａ、２２ｂが挿入されて
おり、このフィラメント２２ａ、２２ｂは外部から電流
が供給されることにより加熱されている。サンプル側測
定セル２１ａには、カラムを通過してきた測定ガスすな
わちキャリアガスと試料との混合ガスが導入され、一
方、リファレンス側測定セル２１ｂには、対照ガスとし
てキャリアガスのみがリファレンス流路を通して導入さ
れる。2. Description of the Related Art Thermal conductivity type detector (TCD: Thermal Co)
nductivity Detector) is one of the commonly used detectors for gas chromatographs. FIG. 2 is a diagram showing the structure of this TCD. 2 formed in a metal block 23 such as stainless steel
Filaments 22a and 22b made of metal such as platinum are inserted into the insides of the two measuring cells 21a and 21b, and the filaments 22a and 22b are heated by being supplied with an electric current from the outside. The measurement gas that has passed through the column, that is, a mixed gas of a carrier gas and a sample, is introduced into the sample-side measurement cell 21a, while only the carrier gas is introduced into the reference-side measurement cell 21b as a reference gas through the reference channel. To be done.
【０００３】測定ガス中に試料が含まれていないときに
は、測定ガスはキャリアガスのみであるため、キャリア
ガスの熱伝導によってフィラメント２２ａから一定の割
合で熱が奪われる。フィラメント２２ａは、加熱により
供給される熱量と放散される熱量とが等しくなる温度で
平衡し、その温度に応じた電気抵抗を有する。When the sample gas is not contained in the measurement gas, the measurement gas is only the carrier gas, so that heat is taken from the filament 22a at a constant rate due to the heat conduction of the carrier gas. The filament 22a is in equilibrium at a temperature at which the amount of heat supplied by heating and the amount of heat dissipated are equal, and has an electrical resistance corresponding to that temperature.
【０００４】測定ガス中に試料の成分が含まれていると
きには、その成分に応じて測定ガスの熱伝導度が変化
し、フィラメント２２ａから放散される熱量が変化する
ため、フィラメント２２ａの温度すなわち電気抵抗が変
化する。この抵抗変化が、リファレンス側測定セル２１
ｂ内のフィラメント２２ｂを含んで構成されるホイート
ストーンブリッジ回路にて検出され、クロマトグラムと
して記録される。When the measurement gas contains a component of the sample, the thermal conductivity of the measurement gas changes according to the component, and the amount of heat radiated from the filament 22a changes, so that the temperature of the filament 22a, that is, the electricity. The resistance changes. This resistance change is caused by the reference side measurement cell 21.
It is detected by the Wheatstone bridge circuit including the filament 22b in b and recorded as a chromatogram.
【０００５】[0005]
【発明が解決しようとする課題】上記構成のようなＴＣ
Ｄを用いた従来のガスクロマトグラフ装置では、リファ
レンス側測定セル２１ｂに導入されるキャリアガスの流
量を一定に保つように、リファレンス流路には例えば定
圧弁が設けられている。そして、定圧弁はリファレンス
側測定セル２１ｂに導入されるキャリアガスの流量が、
サンプル側測定セル２１ａに導入される測定ガスの流量
と等しくなるように調節されている。The TC having the above-mentioned structure
In the conventional gas chromatograph using D, a constant pressure valve, for example, is provided in the reference channel so as to keep the flow rate of the carrier gas introduced into the reference side measurement cell 21b constant. Then, the constant pressure valve is such that the flow rate of the carrier gas introduced into the reference side measurement cell 21b is
It is adjusted to be equal to the flow rate of the measurement gas introduced into the sample-side measurement cell 21a.
【０００６】ところが、カラム入口の試料気化室内に液
体試料を注入した直後には、試料が気化して体積が急激
に膨張するため、試料気化室内のガス圧は急激に上昇す
る。これにより、カラムの出口すなわちＴＣＤのサンプ
ル側測定セル２１ａの入口でのガス圧も上昇する。この
とき、サンプル側測定セル２１ａに流れ込む測定ガスに
は試料は含まれていないが、その流量が増加するため、
フィラメント２２ａの近傍では測定ガスの体積当たりの
分子数が増加し熱拡散率が変化する。この結果、気化し
た試料はカラムの中を通過中でありサンプル側測定セル
２１ａまでは到達していないにも拘らず、フィラメント
２２ａの温度が変化し、ＴＣＤの検出出力が変化する。
この変化はノイズの一種であって、クロマトグラムのベ
ースラインの変動を生じさせ、分析の精度を低下させる
ことになる。この現象は、内径の小さなキャピラリーカ
ラムを使用し、しかも試料気化室内のガスのすべて又は
殆どをカラムへ送り込む非スプリット型の装置におい
て、特に顕著であり影響が大きい。However, immediately after the liquid sample is injected into the sample vaporizing chamber at the column inlet, the sample vaporizes and the volume expands rapidly, so that the gas pressure in the sample vaporizing chamber rises rapidly. As a result, the gas pressure at the outlet of the column, that is, the inlet of the TCD sample-side measuring cell 21a also rises. At this time, the measurement gas flowing into the sample-side measurement cell 21a does not contain the sample, but its flow rate increases,
In the vicinity of the filament 22a, the number of molecules per volume of the measurement gas increases and the thermal diffusivity changes. As a result, although the vaporized sample is passing through the column and has not reached the sample-side measuring cell 21a, the temperature of the filament 22a changes and the TCD detection output changes.
This change is a kind of noise and causes a change in the baseline of the chromatogram, which reduces the accuracy of analysis. This phenomenon is particularly remarkable and has a great influence in a non-split type apparatus that uses a capillary column having a small inner diameter and sends all or most of the gas in the sample vaporization chamber to the column.
【０００７】本発明はこのような課題を解決するために
成されたものであり、その目的とするところは、試料注
入に起因するクロマトグラムのベースラインの変動を防
止することにより分析精度を向上させたガスクロマトグ
ラフ装置を提供することにある。The present invention has been made to solve such a problem, and an object of the present invention is to improve the analytical accuracy by preventing the fluctuation of the baseline of the chromatogram due to the sample injection. To provide the gas chromatograph apparatus.
【０００８】[0008]
【課題を解決するための手段】上記課題を解決するため
に成された本発明は、カラムから導かれる測定ガスのた
めの第１の測定セル、及び純粋な対照ガスのための第２
の測定セルの二つの測定セルから成る熱伝導度型検出器
を備えるガスクロマトグラフ装置において、 a)前記カラムの入口のガス圧を検出する第１の検出手段
と、 b)前記第２の測定セルに導入される対照ガスの流路のガ
ス圧を検出する第２の検出手段と、 c)前記流路において対照ガスの流量を調節する流量調節
手段と、 d)前記第１の検出手段による検出値に基づき、前記第１
の測定セルに導入される測定ガスの流量と前記第２の測
定セルに導入される対照ガスの流量とが等しくなるよう
な前記流路でのガス圧の目標値を算出し、前記第２の検
出手段の検出値が該目標値となるように前記流量調節手
段を制御する制御手段と、を備えることを特徴としてい
る。The present invention, which was made to solve the above-mentioned problems, comprises a first measuring cell for measuring gas introduced from a column and a second measuring cell for pure control gas.
In a gas chromatograph equipped with a thermal conductivity type detector consisting of two measuring cells of a), a) first detecting means for detecting the gas pressure at the inlet of the column; and b) the second measuring cell. Second detecting means for detecting the gas pressure in the flow path of the reference gas introduced into the chamber, c) flow rate adjusting means for adjusting the flow rate of the reference gas in the flow path, and d) detection by the first detecting means. Based on the value, the first
The target value of the gas pressure in the flow path is calculated so that the flow rate of the measurement gas introduced into the measurement cell and the flow rate of the reference gas introduced into the second measurement cell are equalized, and the second value is calculated. Control means for controlling the flow rate adjusting means so that the detected value of the detecting means becomes the target value.
【０００９】[0009]
【作用】本発明では、カラムの入口にある試料気化室内
のガス圧の変化に応じて、第２の測定セル（リファレン
ス側測定セル）に導入される対照ガスの流量を変化させ
る。すなわち、本発明における制御手段は、第１の検出
手段により検出されるガス圧に基づき、カラム及び対照
ガスの流路の流れ抵抗等を勘案して、第１の測定セル
（サンプル側測定セル）に導入される測定ガスの流量と
第２の測定セル（リファレンス側測定セル）に導入され
る対照ガスの流量とが等しくなるような対照ガスの流路
でのガス圧の目標値を算出する。そして、該流路に設け
られた流量調節手段を制御して、該流路に設けられた第
２の検出手段の検出値が算出された目標値となるように
する。In the present invention, the flow rate of the reference gas introduced into the second measurement cell (reference-side measurement cell) is changed according to the change in the gas pressure in the sample vaporization chamber at the column inlet. That is, the control means in the present invention is based on the gas pressure detected by the first detection means, and in consideration of the flow resistance of the flow path of the column and the control gas, the first measurement cell (sample-side measurement cell). A target value of the gas pressure in the flow path of the reference gas is calculated so that the flow rate of the measurement gas introduced into the second measurement cell and the flow rate of the reference gas introduced into the second measurement cell (reference side measurement cell) become equal. Then, the flow rate adjusting means provided in the flow path is controlled so that the detection value of the second detecting means provided in the flow path becomes the calculated target value.
【００１０】[0010]
【発明の効果】この結果、本発明によれば、試料注入時
にカラム入口のガス圧が急激に上昇してサンプル側測定
セル内のフィラメント近傍を通過する測定ガスの流量が
増加したときには、リファレンス側測定セル内のフィラ
メント近傍を通過する対照ガスの流量も増加されるた
め、両フィラメントから放散される熱量の変化は等しく
なり、ＴＣＤの検出出力は変化しない。従って、クロマ
トグラムのベースラインは変動せず、精度の高い分析が
行なえる。As a result, according to the present invention, when the gas pressure at the column inlet sharply increases during sample injection and the flow rate of the measurement gas passing near the filament in the sample-side measurement cell increases, the reference side Since the flow rate of the reference gas passing near the filament in the measurement cell is also increased, the changes in the amount of heat radiated from both filaments become equal, and the TCD detection output does not change. Therefore, the baseline of the chromatogram does not change, and highly accurate analysis can be performed.
【００１１】[0011]
【実施例】以下、本発明の実施例について図１を参照し
つつ説明する。Embodiments of the present invention will be described below with reference to FIG.
【００１２】試料気化室１０には、キャリアガス流路を
通してＨｅガス等のキャリアガスが供給される。キャリ
アガス流路には流量制御弁１１が設けられ、ガス流量が
制御される。またキャリアガス流路上の試料気化室１０
の近傍には、圧力センサ１２が設けられている。この圧
力センサ１２と試料気化室１０との間にはガス抵抗が殆
ど無いため、圧力センサ１２によって検出されるガス圧
は、試料気化室１０内部のガス圧と同一と看做せる。A carrier gas such as He gas is supplied to the sample vaporization chamber 10 through a carrier gas passage. A flow rate control valve 11 is provided in the carrier gas flow path to control the gas flow rate. In addition, the sample vaporization chamber 10 on the carrier gas channel
A pressure sensor 12 is provided in the vicinity of. Since there is almost no gas resistance between the pressure sensor 12 and the sample vaporization chamber 10, the gas pressure detected by the pressure sensor 12 can be regarded as the same as the gas pressure inside the sample vaporization chamber 10.
【００１３】試料気化室１０は高温に加熱されており、
液体試料が注入されると即座に気化し、キャリアガスと
ともにカラム１３へ送られる。圧力センサ１２による検
出信号は制御部１４へ入力されている。カラム１３中を
通過した測定ガスは、ＴＣＤ２０のサンプル側測定セル
２１ａに供給され、フィラメント２２ａの近傍を通過し
た後に大気中に排出される。一方、ＴＣＤ２０のリファ
レンス側測定セル２１ｂに供給されるガスのリファレン
ス流路には、流量制御弁１５、圧力センサ１６及びスロ
ットルバルブ等の抵抗１７が設けられている。流量制御
弁１５は、制御部１４により制御される。また、ＴＣＤ
２０の検出出力は増幅器１８で増幅された後、記録計１
９にて記録される。The sample vaporization chamber 10 is heated to a high temperature,
When the liquid sample is injected, it immediately vaporizes and is sent to the column 13 together with the carrier gas. The detection signal from the pressure sensor 12 is input to the control unit 14. The measurement gas that has passed through the column 13 is supplied to the sample-side measurement cell 21a of the TCD 20, passed through the vicinity of the filament 22a, and then discharged into the atmosphere. On the other hand, a flow path control valve 15, a pressure sensor 16, and a resistor 17 such as a throttle valve are provided in the reference flow path of the gas supplied to the reference side measurement cell 21b of the TCD 20. The flow rate control valve 15 is controlled by the control unit 14. Also, TCD
After the detection output of 20 is amplified by the amplifier 18, the recorder 1
Recorded at 9.
【００１４】上記構成において、制御部１４は圧力セン
サ１２の検出信号に基づき、流量制御弁１５を以下のよ
うに制御する。In the above structure, the control unit 14 controls the flow rate control valve 15 as follows based on the detection signal of the pressure sensor 12.
【００１５】すなわち、キャリアガス流路の圧力センサ
１２におけるガス圧をＰ1i、リファレンス流路の圧力セ
ンサ１６におけるガス圧をＰ2i、ＴＣＤ２０のガス出口
の圧力すなわち大気圧をＰoとすると、サンプル側測定
セル２１ａ及びリファレンス側測定セル２１ｂのガス入
口におけるガスの流量Ｆ1及びＦ2は次の式で表わされ
る。 Ｆ1＝ａ1［（Ｐ1i 2−Ｐo 2）／Ｐo］ Ｆ2＝ａ2［（Ｐ2i 2−Ｐo 2）／Ｐo］ ここで、ａ1、ａ2は、カラム１３や抵抗１７の流れ抵
抗、ガスの粘性係数、ガスの温度などに基づきそれぞれ
決まる定数である。That is, assuming that the gas pressure in the pressure sensor 12 in the carrier gas flow path is P 1i , the gas pressure in the pressure sensor 16 in the reference flow path is P 2i , and the pressure at the gas outlet of the TCD 20, that is, the atmospheric pressure is P o , the sample The gas flow rates F 1 and F 2 at the gas inlets of the side measurement cell 21a and the reference side measurement cell 21b are expressed by the following equations. F 1 = a 1 [(P 1i 2 −P o 2 ) / P o ] F 2 = a 2 [(P 2i 2 −P o 2 ) / P o ] where a 1 and a 2 are columns 13 And the flow resistance of the resistor 17, the viscosity coefficient of the gas, the temperature of the gas, and the like.
【００１６】いま、試料が試料気化室１０内に注入され
ることによって、キャリアガス流路の圧力センサ１２の
ガス圧がＰ1iからＰ1i＋△Ｐ1iに変化したとすると、流
量Ｆ1の変化分△Ｆ1は次式となる。 △Ｆ1＝ａ1｛［（Ｐ1i＋△Ｐ1i）2−Ｐ1i 2］／Ｐo｝ ＝ａ1［（△Ｐ1i 2＋2Ｐ1i△Ｐ1i）／Ｐo］ この△Ｆ1と流量Ｆ2の変化分である△Ｆ2とを等しくす
るため、圧力センサ１６にて検出されるガス圧がＰ2i＋
△Ｐ2iとなるべく流量制御弁１５を制御する。すなわ
ち、既知であるＰ1i、△Ｐ1i及びＰ2iに基づき、 ａ1［（△Ｐ1i 2＋2Ｐ1i△Ｐ1i）／Ｐo］ ＝ａ2［（△Ｐ2i 2＋2Ｐ2i△Ｐ2i）／Ｐo］ を満たす△Ｐ2iを算出し、Ｐ2i＋△Ｐ2iを圧力センサ１
６のガス圧の目標値とする。[0016] Now, by the sample is injected into the sample vaporizing chamber 10, the gas pressure of the pressure sensor 12 of the carrier gas flow path is changed from P 1i to P 1i + △ P 1i, the flow rate F 1 The change ΔF 1 is given by the following equation. ΔF 1 = a 1 {[(P 1i + ΔP 1i ) 2 −P 1i 2 ] / P o } = a 1 [(ΔP 1i 2 + 2P 1i ΔP 1i ) / P o ] This ΔF 1 and The gas pressure detected by the pressure sensor 16 is P 2i + in order to equalize ΔF 2 which is the change in the flow rate F 2.
The flow control valve 15 is controlled as much as ΔP 2i . That is, based on the known P 1i , ΔP 1i and P 2i , a 1 [(ΔP 1i 2 + 2P 1i ΔP 1i ) / P o ] = a 2 [(ΔP 2i 2 + 2P 2i ΔP 2i ) / P o] satisfies the △ P 2i is calculated, the pressure sensor 1 a P 2i + △ P 2i
The target value of the gas pressure of 6 is set.
【００１７】具体的には、制御部１４は、圧力センサ１
２の検出値を入力することによりＰ2i＋△Ｐ2iを導出す
る演算回路、或いは演算プログラムを有するＣＰＵを備
えている。そして、常に、圧力センサ１２の検出信号か
らリファレンス流路のガス圧の目標値を算出し、圧力セ
ンサ１６の検出信号がその目標値になるように流量制御
弁１５を制御する。このため、試料気化室１０内部のガ
ス圧が上昇したときには、リファレンス流路からリファ
レンス側測定セル２１ｂに導入されるキャリアガスの流
量も増加する。この結果、試料を含んだ測定ガスがサン
プル側測定セル２１ａに到達するまでは、２つのフィラ
メント２２ａ、２２ｂの温度変化すなわち電気抵抗の変
化は等しくなるため、ホイートストーンブリッジ回路の
平衡状態は保たれ、ＴＣＤ検出出力は変動しない。そし
て、試料を含んだ測定ガスがサンプル側測定セル２１ａ
に導入されたときに、その熱伝導度の変化によってフィ
ラメント２１ａの抵抗が変化し、試料中の成分に対応す
るＴＣＤ検出出力が得られる。Specifically, the controller 14 controls the pressure sensor 1
And a CPU having an arithmetic circuit, or calculation program for deriving the P 2i + △ P 2i by entering the second detection value. Then, the target value of the gas pressure in the reference flow path is always calculated from the detection signal of the pressure sensor 12, and the flow control valve 15 is controlled so that the detection signal of the pressure sensor 16 becomes the target value. Therefore, when the gas pressure inside the sample vaporization chamber 10 rises, the flow rate of the carrier gas introduced from the reference flow path into the reference side measurement cell 21b also increases. As a result, until the measurement gas containing the sample reaches the measurement cell 21a on the sample side, the temperature changes of the two filaments 22a and 22b, that is, the changes in the electrical resistance become equal, so that the equilibrium state of the Wheatstone bridge circuit is maintained. The TCD detection output does not fluctuate. Then, the measurement gas containing the sample is used as the measurement cell 21a on the sample side.
When introduced into the sample, the resistance of the filament 21a changes due to the change in its thermal conductivity, and the TCD detection output corresponding to the component in the sample is obtained.
【００１８】なお、上記構成において、リファレンス流
路側の抵抗１７としてカラム１３と同一特性のものを使
用し、温度等の条件を同一に保つようにすれば、ａ1＝
ａ2となるため、流量の制御が容易かつ正確に行なえ
る。In the above structure, if the resistance 17 on the reference flow path side has the same characteristics as the column 13 and the conditions such as temperature are kept the same, a 1 =
Since it is a 2 , the flow rate can be controlled easily and accurately.
【００１９】また、リファレンス流路のガス圧の目標値
を算出するときに用いられる定数ａ1、ａ2は予め計算さ
れた固定値であっても良いが、より好ましくは、カラム
の温度等をモニタした結果、或いは、使用するキャリア
ガスの種類等に関する外部からの指定等に対応し修正さ
れた値が用いられる。Further, the constants a 1 and a 2 used when calculating the target value of the gas pressure in the reference flow path may be fixed values calculated in advance, but more preferably, the temperature of the column or the like is used. As a result of monitoring, or a value corrected corresponding to designation from the outside regarding the type of carrier gas to be used and the like is used.
【００２０】更に、上記実施例は非スプリット型のクロ
マトグラフ装置について説明したが、試料気化室からキ
ャリアガスの一部を排出するようなスプリット型ガスク
ロマトグラフ装置においても、本発明の構成を用いるこ
とにより分析精度の一層の向上が期待できる。Further, although the above-mentioned embodiment has explained the non-split type chromatograph apparatus, the constitution of the present invention can be applied to a split type gas chromatograph apparatus in which a part of the carrier gas is discharged from the sample vaporizing chamber. Therefore, further improvement in analysis accuracy can be expected.
【図面の簡単な説明】[Brief description of drawings]
【図１】 本発明の実施例であるガスクロマトグラフ装
置の構成図。FIG. 1 is a configuration diagram of a gas chromatograph device that is an embodiment of the present invention.
【図２】 ガスクロマトグラフ装置の熱伝導度型検出器
の構造を示す図。FIG. 2 is a diagram showing a structure of a thermal conductivity type detector of a gas chromatograph device.
１０…試料気化室 １２…圧力センサ（第１の検出手段） １３…カラム １４…制御部（制御手段） １５…流量制御部（流量調節手段） １６…圧力センサ（第２の検出手段） ２０…ＴＣＤ（熱伝導度型検出器） ２１ａ…サンプル側測定セル（第１の測定セル） ２１ｂ…リファレンス側測定セル（第２の測定セル） DESCRIPTION OF SYMBOLS 10 ... Sample vaporization chamber 12 ... Pressure sensor (1st detection means) 13 ... Column 14 ... Control part (control means) 15 ... Flow rate control part (flow rate adjustment means) 16 ... Pressure sensor (2nd detection means) 20 ... TCD (Thermal conductivity type detector) 21a ... Sample-side measurement cell (first measurement cell) 21b ... Reference-side measurement cell (second measurement cell)
Claims (1)
１の測定セル、及び純粋な対照ガスのための第２の測定
セルの二つの測定セルから成る熱伝導度型検出器を備え
るガスクロマトグラフ装置において、 a)前記カラムの入口のガス圧を検出する第１の検出手段
と、 b)前記第２の測定セルに導入される対照ガスの流路のガ
ス圧を検出する第２の検出手段と、 c)前記流路において対照ガスの流量を調節する流量調節
手段と、 d)前記第１の検出手段による検出値に基づき、前記第１
の測定セルに導入される測定ガスの流量と前記第２の測
定セルに導入される対照ガスの流量とが等しくなるよう
な前記流路でのガス圧の目標値を算出し、前記第２の検
出手段の検出値が該目標値となるように前記流量調節手
段を制御する制御手段と、を備えることを特徴とするガ
スクロマトグラフ装置。1. A gas chromatograph with a thermal conductivity detector consisting of two measuring cells, a first measuring cell for a measuring gas led from a column and a second measuring cell for a pure control gas. In the apparatus, a) first detecting means for detecting the gas pressure at the inlet of the column, and b) second detecting means for detecting the gas pressure in the flow path of the reference gas introduced into the second measuring cell. And c) a flow rate adjusting means for adjusting the flow rate of the reference gas in the flow path, and d) the first detecting means based on the detected value by the first detecting means.
The target value of the gas pressure in the flow path is calculated so that the flow rate of the measurement gas introduced into the measurement cell and the flow rate of the reference gas introduced into the second measurement cell are equalized, and the second value is calculated. A gas chromatograph device comprising: a control unit that controls the flow rate adjusting unit so that the detection value of the detection unit becomes the target value.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7129656A JPH08304372A (en) | 1995-04-27 | 1995-04-27 | Gas chromatographic device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7129656A JPH08304372A (en) | 1995-04-27 | 1995-04-27 | Gas chromatographic device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08304372A true JPH08304372A (en) | 1996-11-22 |
Family
ID=15014909
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7129656A Pending JPH08304372A (en) | 1995-04-27 | 1995-04-27 | Gas chromatographic device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08304372A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6654742B1 (en) | 1999-02-12 | 2003-11-25 | International Business Machines Corporation | Method and system for document collection final search result by arithmetical operations between search results sorted by multiple ranking metrics |
| JP2014108395A (en) * | 2012-12-03 | 2014-06-12 | Air Liquide Japan Ltd | Vaporization amount monitoring system for solid material and monitoring method |
| CN105510493A (en) * | 2014-10-10 | 2016-04-20 | 株式会社岛津制作所 | Thermal conductivity detector and gas chromatograph |
| JP2016142688A (en) * | 2015-02-04 | 2016-08-08 | 株式会社島津製作所 | Gas chromatograph |
-
1995
- 1995-04-27 JP JP7129656A patent/JPH08304372A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6654742B1 (en) | 1999-02-12 | 2003-11-25 | International Business Machines Corporation | Method and system for document collection final search result by arithmetical operations between search results sorted by multiple ranking metrics |
| JP2014108395A (en) * | 2012-12-03 | 2014-06-12 | Air Liquide Japan Ltd | Vaporization amount monitoring system for solid material and monitoring method |
| CN105510493A (en) * | 2014-10-10 | 2016-04-20 | 株式会社岛津制作所 | Thermal conductivity detector and gas chromatograph |
| JP2016142688A (en) * | 2015-02-04 | 2016-08-08 | 株式会社島津製作所 | Gas chromatograph |
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