JP3288557B2 - Cathode ray tube with transparent electromagnetic wave shielding film - Google Patents

Cathode ray tube with transparent electromagnetic wave shielding film

Info

Publication number
JP3288557B2
JP3288557B2 JP20634795A JP20634795A JP3288557B2 JP 3288557 B2 JP3288557 B2 JP 3288557B2 JP 20634795 A JP20634795 A JP 20634795A JP 20634795 A JP20634795 A JP 20634795A JP 3288557 B2 JP3288557 B2 JP 3288557B2
Authority
JP
Japan
Prior art keywords
electromagnetic wave
transparent conductive
film
cathode ray
ray tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP20634795A
Other languages
Japanese (ja)
Other versions
JPH0955175A (en
Inventor
暢 木下
哲也 中別府
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Osaka Cement Co Ltd
Original Assignee
Sumitomo Osaka Cement Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Osaka Cement Co Ltd filed Critical Sumitomo Osaka Cement Co Ltd
Priority to JP20634795A priority Critical patent/JP3288557B2/en
Publication of JPH0955175A publication Critical patent/JPH0955175A/en
Application granted granted Critical
Publication of JP3288557B2 publication Critical patent/JP3288557B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、フェースパネル表
面に薄膜状の導電膜を形成させて、発生する電磁波の漏
洩を防止できるようにした透明性電磁波遮蔽膜付き陰極
線管に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cathode ray tube having a transparent electromagnetic wave shielding film formed by forming a thin conductive film on the surface of a face panel to prevent leakage of generated electromagnetic waves.

【0002】[0002]

【従来の技術】現在、TVブラウン管やコンピュータの
ディスプレイ等を構成する陰極線管は、赤色・緑色・青
色に発光する蛍光面に電子銃からの電子ビームを射突さ
せることによって文字や画像を映出させるものである。
この陰極線管は、高電圧で電子ビームを発射するため
に、電磁波が輻射され、人体や周囲の機器に悪影響を及
ぼす場合がある。また、電子ビームが蛍光体に射突する
ときには、表示面に静電気が発生する。
2. Description of the Related Art At present, a cathode ray tube constituting a TV cathode ray tube or a display of a computer displays characters and images by projecting an electron beam from an electron gun onto a phosphor screen emitting red, green and blue light. It is to let.
Since the cathode ray tube emits an electron beam at a high voltage, an electromagnetic wave is radiated, which may adversely affect a human body and peripheral devices. Also, when the electron beam strikes the phosphor, static electricity is generated on the display surface.

【0003】これらの問題点を解決するために、従来で
は、酸化インジウム等の透明導電性酸化物膜をスパッタ
法や蒸着法等で形成したフェースプレートを表示面の前
面に張り付けて電磁波遮蔽を行ったり、また、前記アン
チモンドープ酸化錫とシリカゾル系バインダーの分散液
を表示面にコーティングすることにより透明導電性膜を
形成し、表示面の帯電防止を行ったりしており、さら
に、画像コントラストを上げるために帯電防止コーティ
ング液に染料などの着色剤を含有させて、帯電防止、高
コントラスト化を図ったりしている。陰極線管のフェー
スパネル表面に高い導電性を有する導電膜を形成する方
法としては、フェースパネルを蒸着釜に入れて、酸化イ
ンジウム化合物や酸化錫化合物を蒸着により表面に形成
させる方法(PVD法)、また、インジウムや錫の有機
化合物、塩溶液等を熱分解させてパネル表面に導電膜を
形成させる方法(CVD法)等が知られている。このよ
うに、現在では、陰極線管の表面に、その透明性を確保
しつつ導電性をもたせるための透明導電膜を成膜するこ
とが広く行われている。
In order to solve these problems, conventionally, a face plate in which a transparent conductive oxide film such as indium oxide is formed by a sputtering method, a vapor deposition method or the like is attached to the front surface of a display surface to shield electromagnetic waves. Or, a transparent conductive film is formed by coating a dispersion of the antimony-doped tin oxide and a silica sol-based binder on the display surface, thereby preventing the display surface from being charged, and further increasing the image contrast. For this reason, a coloring agent such as a dye is contained in an antistatic coating solution to prevent static and improve contrast. As a method for forming a conductive film having high conductivity on the surface of the face panel of a cathode ray tube, a method in which the face panel is put into an evaporation vessel and an indium oxide compound or a tin oxide compound is formed on the surface by evaporation (PVD method); In addition, a method (CVD method) of forming a conductive film on a panel surface by thermally decomposing an organic compound of indium or tin, a salt solution, or the like is known. As described above, at present, it is widely practiced to form a transparent conductive film on the surface of a cathode ray tube so as to have conductivity while ensuring its transparency.

【0004】[0004]

【発明が解決しようとする課題】従来の透明導電膜の導
電性能は、帯電防止膜として使用するのであれば十分な
性能を示すが、ブラウン管の表示面に被覆したとき透明
性が低下し、電極膜、電磁波遮蔽膜などの用途に用いる
には不十分なものであった。また、前記PVD法やCV
D法では、得られた透明導電膜は、透明性・導電性とも
に良好であるとしても、膜形成には真空処理や高温処理
が必要であり、設備投資が多額となり、製造費が高価に
なるという問題点があった。
The conventional transparent conductive film exhibits sufficient conductive properties if it is used as an antistatic film. However, when it is coated on the display surface of a cathode ray tube, the transparency deteriorates, and It was insufficient for use in applications such as films and electromagnetic wave shielding films. In addition, the PVD method or CV
In the method D, the obtained transparent conductive film has good transparency and conductivity, but requires vacuum treatment or high-temperature treatment for film formation, resulting in large capital investment and high manufacturing cost. There was a problem.

【0005】また、塗布法による導電膜の形成は、コス
トが安く、熟練した技術が必要ないなどの利点を有する
ものの、高温処理が必要であったり、基材として用いる
ことのできる材料が限定されるなどの問題点があった。
上記問題点は、基材上に透明導電膜を有する反射防止膜
などの多層膜においても同様の問題点が生じている。
Although the formation of a conductive film by a coating method has advantages such as low cost and no need for skilled techniques, it requires high-temperature treatment or limits the materials that can be used as a substrate. And other problems.
The same problem occurs in a multilayer film such as an antireflection film having a transparent conductive film on a substrate.

【0006】本発明は、従来の技術における前記問題点
を解消するためのものであり、そのための課題は、安価
に製造でき、透明度が高く、電磁波遮蔽性の優れた透明
性電磁波遮蔽膜付き陰極線管を提供することにある。
An object of the present invention is to solve the above-mentioned problems in the prior art, and an object of the present invention is to provide a cathode ray with a transparent electromagnetic wave shielding film which can be manufactured at low cost, has high transparency, and has excellent electromagnetic wave shielding properties. To provide tubes.

【0007】[0007]

【課題を解決するための手段】本発明における課題解決
のため具体的に構成された請求項1記載の透明性電磁波
遮蔽膜付き陰極線管は、平均粒径が 0.05μm以下の銀
微粒子と、可視光の波長領域に透明性を有する粒径が
0.1μm以下の無機微粒子とを含み、前記透明導電膜へ
の銀微粒子の配合割合は 10 重量%以上であり、体積固
有抵抗値が 103Ω・cm以下である透明性電磁波遮蔽膜
を表示画面上に備えたことを特徴とするものである。
The cathode ray tube with a transparent electromagnetic wave shielding film according to claim 1, which is specifically configured to solve the problems in the present invention, comprises silver fine particles having an average particle diameter of 0.05 μm or less and visible light. Particle size that is transparent in the wavelength region of light
A transparent electromagnetic wave shielding film containing inorganic fine particles of 0.1 μm or less, wherein the mixing ratio of the silver fine particles to the transparent conductive film is 10% by weight or more, and the volume resistivity value is 10 3 Ω · cm or less. It is characterized by being provided above.

【0008】また、請求項2記載の透明性電磁波遮蔽膜
付き陰極線管は、前記透明性電磁波遮蔽膜は、平均粒径
が 0.05μm以下の銀コロイドと、可視光の波長領域に
透明性を有する粒径が 0.1μm以下の無機微粒子とを少
なくとも含有させた塗料を塗布して形成されたことを特
徴とする。
According to a second aspect of the present invention, there is provided a cathode ray tube with a transparent electromagnetic wave shielding film, wherein the transparent electromagnetic wave shielding film has a silver colloid having an average particle diameter of 0.05 μm or less and has transparency in a visible light wavelength region. It is formed by applying a paint containing at least inorganic fine particles having a particle size of 0.1 μm or less.

【0009】また、請求項3記載の透明性電磁波遮蔽膜
付き陰極線管は、前記透明性電磁波遮蔽膜上に、前記透
明性電磁波遮蔽膜よりも低屈折率の被膜を被覆させたこ
とを特徴とする。
According to a third aspect of the present invention, in the cathode ray tube with the transparent electromagnetic wave shielding film, a coating having a lower refractive index than the transparent electromagnetic wave shielding film is coated on the transparent electromagnetic wave shielding film. I do.

【0010】[0010]

【0011】[0011]

【0012】[0012]

【発明の実施の形態】以下、本発明の実施の形態を具体
的に説明する。本発明者等は、陰極線管のフェースパネ
ル表面に均等に分散させるべき金属微粒子には、金、
銀、銅、ニッケル等の金属、特に銀を含有させることが
効果的であり、陰極線管のフェースパネル表面に均等に
分散させるには、金属微粒子をコロイド状にして混入さ
せた塗料を塗布することが製造を容易にし、塗布された
塗料によってフェースパネル表面に目的とする透明性電
磁波遮蔽膜(以下、透明導電膜という)が得られ、この
ような透明導電膜で被覆されたフェースパネル表面を有
する陰極線管が本発明の課題を効果的に解決できること
を見出した。この場合において、この陰極線管のフェー
スパネル表面を被覆する透明導電膜には、可視光の波長
領域( 400〜700nm)で透明性を有し、粒径が 0.1μ
m以下の無機微粒子を添加することにより、高い導電性
を有して静電気の帯電を防止できるばかりか人体に有害
な電磁波を遮蔽することができる、透明性の高いフェー
スパネル表面が得られる。また、透明導電膜で被覆され
たフェースパネル表面に、さらに低屈折率膜を被覆して
多層化することにより、効果的に反射防止機能を付する
ことができるとともに透明導電性膜の強度向上に有効で
ある。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be specifically described below. The present inventors have proposed that the metal fine particles to be uniformly dispersed on the face panel surface of the cathode ray tube include gold,
It is effective to contain metals such as silver, copper, nickel, etc., especially silver, and to uniformly disperse them on the face panel surface of the cathode ray tube, apply a paint in which metal fine particles are colloidally mixed. Makes it easy to manufacture, and a desired transparent electromagnetic wave shielding film (hereinafter, referred to as a transparent conductive film) is obtained on the face panel surface by the applied paint, and has a face panel surface covered with such a transparent conductive film. It has been found that a cathode ray tube can effectively solve the problem of the present invention. In this case, the transparent conductive film covering the surface of the face panel of the cathode ray tube has transparency in the visible light wavelength region (400 to 700 nm) and a particle size of 0.1 μm.
By adding inorganic fine particles having a particle size of m or less, a highly transparent face panel surface having high conductivity, not only preventing electrostatic charging but also shielding electromagnetic waves harmful to the human body can be obtained. In addition, the surface of the face panel covered with the transparent conductive film is further coated with a low-refractive-index film to form a multilayer, so that the antireflection function can be effectively provided and the strength of the transparent conductive film can be improved. It is valid.

【0013】以下では前記金属微粒子として銀微粒子を
用い、塗料に混入させるべき金属コロイドには銀コロイ
ドとした場合について具体的に説明する。銀コロイドの
粒径は透明性および導電性の観点から 0.05 μm以下、
また、透明導電膜中の配合量は重量比で 10 %以上とす
る。この銀コロイドの粒径が 0.05 μmを越えると、銀
コロイドによる吸収が大きくなりすぎるために、実用的
な透明性を有する透明導電膜が得られなくなる。また、
銀コロイドの膜中の配合量が透明導電膜中に 10 重量%
より少ない場合には銀コロイドを添加することによる導
電性の向上はみられない等の問題点がある。
Hereinafter, the case where silver fine particles are used as the metal fine particles and silver colloid is used as the metal colloid to be mixed into the paint will be specifically described. The particle size of the silver colloid is 0.05 μm or less from the viewpoint of transparency and conductivity.
Also, the compounding amount in the transparent conductive film is 10% or more by weight. When the particle size of the silver colloid exceeds 0.05 μm, the absorption by the silver colloid becomes too large, so that a transparent conductive film having practical transparency cannot be obtained. Also,
10% by weight of silver colloid in the transparent conductive film
When the amount is smaller, there is a problem that the conductivity is not improved by adding the silver colloid.

【0014】陰極線管のフェースパネル表面に塗布され
る銀コロイドを含有した透明導電塗料としては、たとえ
ば、銀コロイドに、可視光の波長領域で透明な材料とし
て、珪素、アルミニウム、ジルコニウム、セリウム、チ
タン、イットリウム、亜鉛、マグネシウム、インジウ
ム、錫、アンチモン、ガリウム等より選ばれる酸化物、
複合酸化物、または窒化物、特に、インジウム、錫等を
主成分とする透明導電性微粒子を添加した塗料を用い
る。また、上記塗料に添加される酸化物、複合酸化物、
または窒化物等の微粒子の粒径については、やはり透明
性の観点から 0.1μm以下のものを用いるものとする。
このような銀コロイドを含有した透明導電塗料には、透
過色や反射色の調整のために、顔料や染料等の色料を添
加することが可能である。
The transparent conductive paint containing silver colloid applied to the face panel surface of the cathode ray tube includes, for example, silver, colloid, silicon, aluminum, zirconium, cerium, titanium as transparent material in the visible light wavelength region. , Oxides selected from yttrium, zinc, magnesium, indium, tin, antimony, gallium, etc.,
A composite oxide or a nitride, particularly a coating material to which transparent conductive fine particles mainly containing indium, tin, or the like are added is used. Further, oxides, composite oxides added to the paint,
Alternatively, the particle size of the fine particles such as nitrides should be 0.1 μm or less from the viewpoint of transparency.
Colorants such as pigments and dyes can be added to the transparent conductive paint containing such a silver colloid in order to adjust the transmission color and the reflection color.

【0015】陰極線管のフェースパネル表面に形成され
る透明導電膜は、前記透明導電塗料をフェースパネル表
面に塗布することにより容易に透明導電膜を形成でき
る。形成させる透明導電膜の膜厚は、透明性を確保する
ために1μm以下が望ましく、さらには前記透明導電膜
とその上に低屈折率の膜を形成させた陰極線管における
透明導電膜の膜厚では、光学的反射防止機能を付与させ
るために 0.2μm以下とするのが好ましい。塗料配合や
塗布条件は、所望とする導電性と透明性を適宜考慮して
設計するのが好ましい。透明導電膜の透明性は、極めて
微細な銀コロイド粒子と可視光に透明な微粒子とを添加
併用することによって、効果的に達成される。塗布方法
には、スピンコート法、ロールコート法、スプレー法、
バーコート法、デイップ法、メニスカスコート法など通
常の成膜方法が使用可能である。
The transparent conductive film formed on the face panel surface of the cathode ray tube can be easily formed by applying the transparent conductive paint to the face panel surface. The thickness of the transparent conductive film to be formed is desirably 1 μm or less in order to ensure transparency, and further, the thickness of the transparent conductive film in the cathode ray tube having the transparent conductive film and a film having a low refractive index formed thereon. Is preferably 0.2 μm or less in order to provide an optical antireflection function. It is preferable to design the coating composition and application conditions in consideration of desired conductivity and transparency. The transparency of the transparent conductive film is effectively achieved by adding and using extremely fine colloidal silver particles and fine particles transparent to visible light. Coating methods include spin coating, roll coating, spraying,
Conventional film forming methods such as a bar coating method, a dip method, and a meniscus coating method can be used.

【0016】透明導電性膜の静電気帯電防止性能に加え
て電磁波漏洩防止性能を発揮させるために必要な導電性
能は、電磁波遮蔽効果と導電膜の体積固有抵抗との関係
式で一般に、
The conductive performance necessary for exhibiting the electromagnetic wave leakage prevention performance in addition to the electrostatic antistatic performance of the transparent conductive film is generally expressed by the relational expression between the electromagnetic wave shielding effect and the volume resistivity of the conductive film.

【0017】[0017]

【数1】 ここで S(dB) ;電磁波遮蔽効果 ρ(Ω・cm);導電膜の体積固有抵抗 f(MHz) ;電磁波周波数 t(cm) ;導電膜の膜厚 で表現される。本発明の透明導電性塗料で透明導電性膜
を作成する場合の膜厚は、透過率の観点から1μm(1
×10-4cm)程度以下とすることが好ましいので (1)
式は
(Equation 1) Here, S (dB); electromagnetic wave shielding effect ρ (Ω · cm); volume resistivity of conductive film f (MHz); electromagnetic wave frequency t (cm); When a transparent conductive film is formed with the transparent conductive paint of the present invention, the film thickness is 1 μm (1 μm) from the viewpoint of transmittance.
(× 10 −4 cm) or less (1)
ceremony

【0018】[0018]

【数2】 となる。Sは値が大きいほど、電磁波遮蔽効果が大きく
なり、S>30dBのときに、電磁波遮蔽効果があると
みなされる。
(Equation 2) Becomes As the value of S increases, the electromagnetic wave shielding effect increases, and when S> 30 dB, it is considered that the electromagnetic wave shielding effect is obtained.

【0019】また、規制対象となる電磁波の周波数は 1
0 KHz〜 1000 MHzの範囲が一般的であるので、透
明導電膜の導電性としては、 10 3 Ω・cm以下の体積
固有抵抗が必要である。すなわち、透明導電膜の体積固
有抵抗値は、より低い方が、より広範な周波数の電磁波
を有効に遮蔽することが可能となる。
The frequency of the electromagnetic wave to be regulated is 1
Since the range of 0 KHz to 1000 MHz is generally used, the conductivity of the transparent conductive film needs to have a volume resistivity of 10 3 Ω · cm or less. That is, the lower the volume resistivity of the transparent conductive film, the more effectively it is possible to effectively shield electromagnetic waves of a wider range of frequencies.

【0020】透明導電膜への銀コロイドの配合割合を重
量比率で 10 %以上とすることで、透明導電性膜の体積
固有抵抗を満足することができるため、本発明の透明導
電性塗料を用いることにより、静電気帯電防止効果に加
えて電磁波漏洩防止効果に優れた透明導電膜を形成する
ことが可能になる。
By setting the blending ratio of the silver colloid in the transparent conductive film to 10% or more by weight, the volume resistivity of the transparent conductive film can be satisfied, so that the transparent conductive paint of the present invention is used. This makes it possible to form a transparent conductive film having an excellent effect of preventing electromagnetic wave leakage in addition to an effect of preventing electrostatic charge.

【0021】前記の透明導電性塗料に可視光の波長領域
( 400〜700 nm)で透明性を有し、粒径が 0.1μm以
下の無機微粒子を添加することにより、透明性の高い導
電性塗料が得られる。この場合に、銀コロイドと無機微
粒子との配合比については、透明導電性膜に要求される
透過率と導電性を考慮した配合が必要である。通常は、
透明導電膜中の重量配合比で、 Ag:無機酸化物=70:30〜10:90 が実用的な範囲である。
By adding inorganic fine particles having a transparency in the visible light wavelength region (400 to 700 nm) and a particle size of 0.1 μm or less to the above-mentioned transparent conductive paint, a highly transparent conductive paint is obtained. Is obtained. In this case, the blending ratio between the silver colloid and the inorganic fine particles needs to be blended in consideration of the transmittance and conductivity required for the transparent conductive film. Normally,
Ag: inorganic oxide = 70: 30 to 10:90 by weight in the transparent conductive film is a practical range.

【0022】このような透明導電塗料から形成される透
明導電膜の透明性は、粒径が 0.05μm以下の極めて微
細な銀コロイドに加えて、可視光に透明な粒径 0.1μm
以下の無機微粒子を添加することによって効果的に向上
させることができ、導電性については、銀コロイドを透
明導電膜中に重量比で 10 重量%以上配合することによ
り効果的に有効な導電性を達成できる。
The transparency of the transparent conductive film formed from such a transparent conductive coating material is such that, in addition to an extremely fine silver colloid having a particle size of 0.05 μm or less, a transparent particle size of 0.1 μm
It can be effectively improved by adding the following inorganic fine particles, and the conductivity can be improved effectively by blending silver colloid in the transparent conductive film in a weight ratio of 10% by weight or more. Can be achieved.

【0023】本発明で使用される透明導電塗料の製造方
法においては、特に限定された方法があるわけではない
が、銀コロイドと無機微粒子を混合した液を、目的に応
じて、バインダー成分や各種色料を添加し、超音波分散
機やサンドミル等の通常の分散機を用いて分散塗料化す
ることが可能である。本発明の透明導電膜では、上記に
述べたような方法により、陰極線管フエースパネル表面
に、従来よりも安価に、透明性にすぐれ、静電気帯電防
止機能や電磁波遮蔽機能、さらには赤外線遮蔽機能を付
与することが可能となる。
There is no particular limitation on the method for producing the transparent conductive coating used in the present invention. However, a liquid obtained by mixing a silver colloid and inorganic fine particles may be mixed with a binder component or various kinds of materials according to the purpose. It is possible to add a colorant and form a dispersion paint using a usual disperser such as an ultrasonic disperser or a sand mill. In the transparent conductive film of the present invention, by the above-described method, the surface of the cathode ray tube face panel is provided with an antistatic function, an electromagnetic wave shielding function, and an infrared ray shielding function on the surface of the cathode ray tube face at a lower cost than before, with excellent transparency. Can be granted.

【0024】さらに加えて、透明導電膜上に、当該被膜
よりも低屈折率を有する膜を形成することにより、陰極
線管のような画像表示器においては、解像度を損なうこ
となく蛍光灯などの外光の映り込みを抑制する反射防止
機能をも付与することも可能とした。一般に、薄膜の光
学的反射防止性能は、その膜を構成する膜の屈折率と膜
厚、及び多層膜ではさらに積層膜数により決定される。
反射防止機能を有する多層膜では、反射防止をする波長
をλとして、2層構成の反射防止膜では、基材側から高
屈折率層と低屈折率層とを光学厚みλ/4およびλ/
4、またはλ/2およびλ/4の膜構成や、3層構成の
反射防止膜では、基材側から中屈折率層、高屈折率層お
よび低屈折率層を光学厚みλ/4およびおよびλ/2お
よびλ/4の膜構成などが知られている。
In addition, by forming a film having a lower refractive index than the film on the transparent conductive film, in an image display such as a cathode ray tube, the resolution of a fluorescent lamp or the like can be reduced without impairing the resolution. It is also possible to provide an anti-reflection function for suppressing reflection of light. Generally, the optical antireflection performance of a thin film is determined by the refractive index and the thickness of the film constituting the film, and furthermore, in the case of a multilayer film, the number of laminated films.
In a multilayer film having an anti-reflection function, the wavelength for anti-reflection is set to λ, and in the two-layer anti-reflection film, the optical layers λ / 4 and λ /
In an antireflection film having a film configuration of 4, or λ / 2 and λ / 4, or a three-layer antireflection film, the medium refractive index layer, the high refractive index layer, and the low refractive index layer are formed from the substrate side with an optical thickness of λ / 4 and Film configurations of λ / 2 and λ / 4 are known.

【0025】透明導電膜を有する多層膜において、透明
導電膜の上に形成される低屈折率膜を構成する物質とし
ては、膜強度の点及び屈折率の制御の点から M(OR)m n ここに〔M=Si,Ti,Zr. m+n=4,
m=1〜4〕 〔R=C1 〜C4 のアルキル基 n=1
〜3〕 で示される化合物あるいは部分加水分解物の単独や混合
物を用いることが好ましい。
In the multilayer film having the transparent conductive film, the material constituting the low refractive index film formed on the transparent conductive film is M (OR) m R from the viewpoint of the film strength and the control of the refractive index. n [M = Si, Ti, Zr. m + n = 4
m = 1-4] [R = C 1 -C 4 alkyl group n = 1
To 3] or a mixture of partial hydrolysates alone or in combination.

【0026】低屈折率膜の外表面に、さらに低屈折率膜
を構成する物質と同様の物質を用いて、均等に分散した
突起を設けた3層構造とすることにより、反射像の輪郭
が不明瞭になることを防止する防眩効果を付与すること
ができる。
The outer surface of the low-refractive-index film is made of a material similar to the material constituting the low-refractive-index film and has a three-layer structure in which evenly distributed projections are provided. An antiglare effect for preventing obscuration can be provided.

【0027】以上に説明した透明導電膜あるいは透明導
電膜の上に低屈折率膜を形成した多層膜を陰極線管の表
面に構成することにより、従来になく、容易に、帯電防
止機能、電磁波遮蔽機能、反射防止機能、防眩機能、お
よび高透明性等の優れた機能を付与でき、視認性の優れ
ているとともに人体保護に有効な表示面を有する陰極線
管が実現できることとなった。
By forming the above-described transparent conductive film or a multilayer film in which a low refractive index film is formed on the transparent conductive film on the surface of the cathode ray tube, an antistatic function and an electromagnetic wave shielding function can be easily achieved. Excellent functions such as a function, an antireflection function, an antiglare function, and high transparency can be provided, and a cathode ray tube having excellent visibility and having a display surface effective for protecting the human body can be realized.

【0028】以下、実施例を説明する。Hereinafter, embodiments will be described.

【実施例】 銀コロイドの調整 クエン酸ナトリウム2水和物 14 g,硫酸第1鉄
7.5gを溶解させた溶液60 gを5℃に保持した状態で、
硝酸銀 2.5gを溶解させた溶液 25 gを加えて銀コロイ
ドを生成させた。生成させた銀コロイドを遠心分離によ
り水洗を行い不純物を除去したのち 52.5 gの純水を加
えて塗料用の銀コロイドを調整した。得られた銀コロイ
ドの粒径は、 0.005〜 0.03 μmであった。
Example Preparation of silver colloid Sodium citrate dihydrate 14 g, ferrous sulfate
While maintaining 60 g of a solution in which 7.5 g is dissolved at 5 ° C,
25 g of a solution of 2.5 g of silver nitrate was added to form a silver colloid. The formed silver colloid was washed with water by centrifugation to remove impurities, and then 52.5 g of pure water was added to prepare a silver colloid for paint. The particle size of the obtained silver colloid was 0.005 to 0.03 μm.

【0029】 低屈折率塗料の調整 (A液)0.8gのテトラエトキシシランと、 0.8gの 0.
1N塩酸と 98.4 gのエチルアルコールとを混合して均
一な溶液とした。 (B液)0.8gのチタニウムイソプトキシドと、 0.8g
の 0.1N塩酸と 98.4 gのエチルアルコールとを混合し
て均一な溶液とした。以上のA液 90 gとB液 10 gと
を混合して、低屈折率塗料を調整した。
Preparation of Low Refractive Index Paint (Solution A) 0.8 g of tetraethoxysilane and 0.8 g of 0.1.
1N hydrochloric acid and 98.4 g of ethyl alcohol were mixed to form a uniform solution. (Solution B) 0.8 g of titanium isoptoxide and 0.8 g
Was mixed with 98.4 g of ethyl alcohol to obtain a uniform solution. 90 g of Solution A and 10 g of Solution B were mixed to prepare a low refractive index paint.

【0030】 膜評価方法 ・表面抵抗値:三菱油化株式会社製 ロレスタAP(4
端針法) ・ヘーズ :東京電色株式会社製 Automatic Haze
Meter H III DPにより膜自体のヘーズを測定 ・視感反射率:GAMMA分光反射スペクトルにより膜
の 400〜700 nmの視感反射率を測定 ・透過率 :日本分光株式会社製 U−Best50
により膜自体の 550nm透過率を測定 ・耐擦傷性 :1kgの荷重下、ケシゴムで膜表面を2
0回往復後、膜表面の傷の付き具合を目視で評価。 ○;キズなし △;ややキズあり ×;キズ多
い ・鉛筆硬度 :1kgの荷重下、鉛筆で膜表面を走査
後、目視で膜表面にキズが生じ始める鉛筆の硬度を膜の
鉛筆硬度として判定
Film evaluation method-Surface resistance value: Loresta AP (4 manufactured by Mitsubishi Yuka Co., Ltd.)
・ Haze: Automatic Haze manufactured by Tokyo Denshoku Co., Ltd.
The haze of the film itself is measured by Meter H III DP.-Luminous reflectance: The luminous reflectance of the film at 400 to 700 nm is measured by GAMMA spectral reflection spectrum.-Transmittance: U-Best50 manufactured by JASCO Corporation.
Measure the transmittance of the film itself at 550 nm by using the following methods:-Scratch resistance: 1 mm under a load of 2 kg with poppy rubber
After reciprocating 0 times, the degree of damage on the film surface was visually evaluated. ○; no scratches △; slight scratches ×; many scratches ・ Pencil hardness: After scanning the film surface with a pencil under a load of 1 kg, the hardness of the pencil at which scratches begin to occur on the film surface visually is determined as the pencil hardness of the film.

【0031】(実施例1) 〔透明導電塗料の調整〕 銀コロイド液 16.7 g アンチモンドープ酸化錫微粉末 1.5 g (住友大阪セメント社製 粒径0.01μm) 純水 61.8 g IPA 10.0 g ブチルセロソルブ 10.0 g を配合し超音波分散器(セントラル科学貿易社製;ソニ
ファイヤー450)で分散し透明導電塗料を調整した。 〔成膜〕上記透明導電塗料をブラウン管パネル表面にス
ピンコーターを用いて 150rpm− 30 秒の条件で塗布
し、乾燥後、上記調整の低屈折率塗料を同様にスピンコ
ーターを用いて 150rpm− 30 秒の条件で塗布し、乾
燥器により150℃で1時間焼き付けて透明導電膜を形
成することによって、パネル表面に約 200nmの厚みを
もつ反射防止・高導電膜を有する陰極線管を作成した。
この評価結果を表1に示した。
(Example 1) [Preparation of Transparent Conductive Paint] Silver colloid liquid 16.7 g Antimony-doped tin oxide fine powder 1.5 g (Sumitomo Osaka Cement Co., Ltd., particle size: 0.01 μm) Pure water 61.8 g IPA 10.0 g butyl cellosolve 10.0 g was blended and dispersed with an ultrasonic disperser (Central Kagaku Trading Co., Ltd .; Sonifier 450) to prepare a transparent conductive paint. [Film formation] The above-mentioned transparent conductive paint was applied to the surface of a CRT panel using a spin coater under the conditions of 150 rpm-30 seconds, and after drying, the low-refractive-index paint adjusted as above was similarly applied using a spin coater at 150 rpm-30 seconds. Then, a transparent conductive film was formed by baking at 150 ° C. for 1 hour using a drier to form a cathode ray tube having an antireflection / highly conductive film having a thickness of about 200 nm on the panel surface.
Table 1 shows the evaluation results.

【0032】(実施例2) 〔透明導電塗料の調整〕 銀コロイド液 23.3 g アンチモンドープ酸化錫微粉末 1.3 g (住友大阪セメント社製 粒径0.01μm) 純水 55.4 g IPA 10.0 g ブチルセロソルブ 10.0 g を配合し超音波分散器(セントラル科学貿易社製;ソニ
ファイヤー450)で分散し透明導電塗料を調整した。 〔成膜〕上記透明導電塗料をブラウン管パネル表面にス
ピンコーターを用いて 150rpm− 30 秒の条件で塗布
し、乾燥後、上記調整の低屈折率塗料を同様にスピンコ
ーターを用いて 150rpm− 30 秒の条件で塗布し、乾
燥器により150℃で1時間焼き付けて透明導電膜を形
成することによって、パネル表面に約 200nmの厚みを
もつ反射防止・高導電膜を有する陰極線管を作成した。
この評価結果を表1に示した。
(Example 2) [Preparation of transparent conductive paint] Silver colloid liquid 23.3 g Antimony-doped tin oxide fine powder 1.3 g (Sumitomo Osaka Cement Co., Ltd., particle size 0.01 μm) Pure water 55.4 g IPA 10.0 g butyl cellosolve 10.0 g was blended and dispersed with an ultrasonic disperser (Central Kagaku Trading Co., Ltd .; Sonifier 450) to prepare a transparent conductive paint. [Film formation] The above-mentioned transparent conductive paint was applied to the surface of a CRT panel using a spin coater under the conditions of 150 rpm-30 seconds, and after drying, the low-refractive-index paint adjusted as above was similarly applied using a spin coater at 150 rpm-30 seconds. Then, a transparent conductive film was formed by baking at 150 ° C. for 1 hour using a drier to form a cathode ray tube having an antireflection / highly conductive film having a thickness of about 200 nm on the panel surface.
Table 1 shows the evaluation results.

【0033】(実施例3) 〔透明導電塗料の調整〕 銀コロイド液 16.7 g スズドープ酸化インジウム微粉末 1.5 g (住友大阪セメント社製 粒径0.01μm) 純水 61.8 g IPA 10.0 g ブチルセロソルブ 10.0 g を配合し超音波分散器(セントラル科学貿易社製;ソニ
ファイヤー450)で分散し透明導電塗料を調整した。 〔成膜〕上記透明導電塗料をブラウン管表面に、スピン
コーターを用いて 150rpm−30 秒の条件で塗布し、
乾燥後、上記低屈折率塗料をスピンコーターによって同
様に 150rpm− 30 秒の条件で塗布し、乾燥器で 150
℃で1時間焼き付けて透明導電膜を形成することによっ
てパネル表面に約 200nmの厚みをもつ反射防止・高導
電膜を有する陰極線管を作成した。この評価結果を表1
に示した。
(Example 3) [Preparation of transparent conductive paint] Silver colloid liquid 16.7 g Tin-doped indium oxide fine powder 1.5 g (Sumitomo Osaka Cement Co., Ltd. particle size: 0.01 μm) Pure water 61.8 g IPA 10 Then, 10.0 g of butyl cellosolve was mixed and dispersed with an ultrasonic disperser (manufactured by Central Science Trading Co .; Sonifire 450) to prepare a transparent conductive paint. [Film formation] The above transparent conductive paint was applied to the surface of a cathode ray tube using a spin coater at 150 rpm for 30 seconds.
After drying, the low-refractive-index paint was applied by a spin coater under the same conditions at 150 rpm for 30 seconds.
C. for 1 hour to form a transparent conductive film, thereby producing a cathode ray tube having an anti-reflection and high conductive film having a thickness of about 200 nm on the panel surface. Table 1 shows the evaluation results.
It was shown to.

【0034】(実施例4) 〔透明導電塗料の調整〕 銀コロイド液 23.3 g スズドープ酸化インジウム微粉末 1.3 g (住友大阪セメント社製 粒径0.01μm) 純水 55.4 g IPA 10.0 g ブチルセロソルブ 10.0 g を配合し超音波分散器(セントラル科学貿易社製;ソニ
ファイヤー450)で分散し透明導電塗料を調整した。 〔成膜〕上記透明導電塗料をブラウン管表面に、スピン
コーターを用いて 150rpm−30 秒の条件で塗布し、
乾燥後、上記低屈折率塗料をスピンコーターによって同
様に 150rpm− 30 秒の条件で塗布し、乾燥器で 150
℃で1時間焼き付けて透明導電膜を形成することによっ
て、パネル表面に約 200nmの厚みをもつ反射防止・高
導電膜を有する陰極線管を作成した。この評価結果を表
1に示した。
(Example 4) [Preparation of transparent conductive paint] Silver colloid liquid 23.3 g Tin-doped indium oxide fine powder 1.3 g (0.01 μm particle size, manufactured by Sumitomo Osaka Cement Co.) 55.4 g IPA 10 Then, 10.0 g of butyl cellosolve was mixed and dispersed with an ultrasonic disperser (manufactured by Central Science Trading Co .; Sonifire 450) to prepare a transparent conductive paint. [Film formation] The above transparent conductive paint was applied to the surface of a cathode ray tube using a spin coater at 150 rpm for 30 seconds.
After drying, the low-refractive-index paint was applied by a spin coater under the same conditions at 150 rpm for 30 seconds.
C. for 1 hour to form a transparent conductive film, thereby producing a cathode ray tube having an antireflection and high conductive film having a thickness of about 200 nm on the panel surface. Table 1 shows the evaluation results.

【0035】(実施例5) 〔透明導電塗料の調整〕 銀コロイド液 33.3 g アンチモンドープ酸化錫微粉末 1.0 g (住友大阪セメント社製 粒径0.01μm) 純水 45.7 g IPA 10.0 g ブチルセロソルブ 10.0 g を配合し超音波分散器(セントラル科学貿易社製;ソニ
ファイヤー450)で分散し透明導電塗料を調整した。 〔成膜〕上記透明導電塗料をブラウン管パネル表面にス
ピンコーターを用いて 150rpm− 30 秒の条件で塗布
し、乾燥後、上記調整の低屈折率塗料を同様にスピンコ
ーターを用いて 150rpm− 30 秒の条件で塗布し、乾
燥器により150℃で1時間焼き付けて透明導電膜を形
成することによって、パネル表面に約 200nmの厚みを
もつ反射防止・高導電膜を有する陰極線管を作成した。
この評価結果を表1に示した。
(Example 5) [Preparation of transparent conductive paint] Silver colloid liquid 33.3 g Antimony-doped tin oxide fine powder 1.0 g (Sumitomo Osaka Cement Co., Ltd., particle size 0.01 μm) Pure water 45.7 g IPA 10.0 g butyl cellosolve 10.0 g was blended and dispersed with an ultrasonic disperser (Central Kagaku Trading Co., Ltd .; Sonifier 450) to prepare a transparent conductive paint. [Film formation] The above-mentioned transparent conductive paint was applied to the surface of a CRT panel using a spin coater under the conditions of 150 rpm-30 seconds, and after drying, the low-refractive-index paint adjusted as above was similarly applied using a spin coater at 150 rpm-30 seconds. Then, a transparent conductive film was formed by baking at 150 ° C. for 1 hour using a drier to form a cathode ray tube having an antireflection / highly conductive film having a thickness of about 200 nm on the panel surface.
Table 1 shows the evaluation results.

【0036】(実施例6) 〔透明導電塗料の調整〕 銀コロイド液 40.0 g アンチモンドープ酸化錫微粉末 0.8 g (住友大阪セメント社製 粒径0.01μm) 純水 39.2 g IPA 10.0 g ブチルセロソルブ 10.0 g を配合し超音波分散器(セントラル科学貿易社製;ソニ
ファイヤー450)で分散し透明導電塗料を調整した。 〔成膜〕上記透明導電塗料をブラウン管パネル表面にス
ピンコーターを用いて 150rpm− 30 秒の条件で塗布
し、乾燥後、上記調整の低屈折率塗料を同様にスピンコ
ーターを用いて 150rpm− 30 秒の条件で塗布し、乾
燥器により150℃で1時間焼き付けて透明導電膜を形
成することによって、パネル表面に約 200nmの厚みを
もつ反射防止・高導電膜を有する陰極線管を作成した。
この評価結果を表1に示した。
(Example 6) [Preparation of transparent conductive paint] Silver colloid solution 40.0 g Antimony-doped tin oxide fine powder 0.8 g (Sumitomo Osaka Cement Co., Ltd., particle size: 0.01 μm) Pure water 39.2 g IPA 10.0 g butyl cellosolve 10.0 g was blended and dispersed with an ultrasonic disperser (Central Kagaku Trading Co., Ltd .; Sonifier 450) to prepare a transparent conductive paint. [Film formation] The above-mentioned transparent conductive paint was applied to the surface of a CRT panel using a spin coater under the conditions of 150 rpm-30 seconds, and after drying, the low-refractive-index paint adjusted as above was similarly applied using a spin coater at 150 rpm-30 seconds. Then, a transparent conductive film was formed by baking at 150 ° C. for 1 hour using a drier to form a cathode ray tube having an antireflection / highly conductive film having a thickness of about 200 nm on the panel surface.
Table 1 shows the evaluation results.

【0037】〔比較例1〕 〔透明導電塗料の調整〕 アンチモンドープ酸化錫微粉末 2.0 g (住友大阪セメント社製 粒径0.01μm) 純水 80.0 g IPA 10.0 g ブチルセロソルブ 10.0 g を配合し超音波分散器(セントラル科学貿易社製;ソニ
ファイヤー450)で分散し透明導電塗料を調整した。 〔成膜〕上記透明導電塗料をブラウン管パネル表面にス
ピンコーターを用いて 150rpm− 30 秒の条件で塗布
し、乾燥後、上記調整の低屈折率塗料を同様にスピンコ
ーターを用いて 150rpm− 30 秒の条件で塗布し、乾
燥器により150℃で1時間焼き付けて透明導電膜を形
成することによって、パネル表面に約 200nmの厚みを
もつ反射防止・高導電膜を有する陰極線管を作成した。
この評価結果を表1に示した。
Comparative Example 1 [Preparation of Transparent Conductive Paint] Antimony-doped tin oxide fine powder 2.0 g (0.01 μm particle size, manufactured by Sumitomo Osaka Cement Co., Ltd.) Pure water 80.0 g IPA 10.0 g butyl cellosolve 0 g was blended and dispersed with an ultrasonic disperser (Central Kagaku Trading Co., Ltd .; Sonifier 450) to prepare a transparent conductive paint. [Film formation] The above-mentioned transparent conductive paint was applied to the surface of a CRT panel using a spin coater under the conditions of 150 rpm-30 seconds, and after drying, the low-refractive-index paint adjusted as above was similarly applied using a spin coater at 150 rpm-30 seconds. Then, a transparent conductive film was formed by baking at 150 ° C. for 1 hour using a drier to form a cathode ray tube having an antireflection / highly conductive film having a thickness of about 200 nm on the panel surface.
Table 1 shows the evaluation results.

【0038】〔比較例2〕 〔透明導電塗料の調整〕 スズドープ酸化インジウム微粉末 2.0 g (住友大阪セメント社製 粒径0.02μm) 純水 80.0 g IPA 10.0 g ブチルセロソルブ 10.0 g を配合し超音波分散器(セントラル科学貿易社製;ソニ
ファイヤー450)で分散し透明導電塗料を調整した。 〔成膜〕上記透明導電塗料をブラウン管表面に、スピン
コーターを用いて 150rpm−30 秒の条件で塗布し、
乾燥後、上記調整の低屈折率塗料を同様にスピンコータ
ーを用いて 150rpm− 30 秒の条件で塗布し、乾燥器
で 150℃で1時間焼き付けて透明導電膜を形成すること
によって、パネル表面に約 200nmの厚みをもつ反射防
止・高導電膜を有する陰極線管を作成した。この評価結
果を表1に示した。
Comparative Example 2 [Preparation of Transparent Conductive Paint] Tin-doped indium oxide fine powder 2.0 g (0.02 μm particle size, manufactured by Sumitomo Osaka Cement Co.) Pure water 80.0 g IPA 10.0 g Butyl cellosolve 10.0 g was mixed and dispersed with an ultrasonic disperser (manufactured by Central Kagaku Trading Co .; Sonifire 450) to prepare a transparent conductive paint. [Film formation] The above transparent conductive paint was applied to the surface of a cathode ray tube using a spin coater at 150 rpm for 30 seconds.
After drying, the low-refractive-index paint adjusted as described above is similarly applied using a spin coater at 150 rpm for 30 seconds, and baked at 150 ° C. for 1 hour in a drier to form a transparent conductive film. A cathode ray tube having an antireflection and high conductive film having a thickness of about 200 nm was prepared. Table 1 shows the evaluation results.

【0039】〔比較例3〕 〔透明導電塗料の調整〕 銀コロイド 液 66.7 g 純水 13.3 g IPA 10.0 g ブチルセロソルブ 10.0 g を配合し超音波分散器(セントラル科学貿易社製;ソニ
ファイヤー450)で分散し透明導電塗料を調整した。 〔成膜〕上記透明導電塗料をブラウン管表面に、スピン
コーターを用いて 150rpm−30 秒の条件で塗布し、
乾燥後、上記調整の低屈折率塗料を同様にスピンコータ
ーを用いて 150rpm− 30 秒の条件で塗布し、乾燥器
で 150℃で1時間焼き付けて透明導電膜を形成すること
によって、パネル表面に約 200nmの厚みをもつ反射防
止・高導電膜を有する陰極線管を作成した。この評価結
果を表1に示した。
[Comparative Example 3] [Preparation of transparent conductive paint] 66.7 g of colloidal silver solution 13.3 g of pure water 10.0 g of IPA 10.0 g of butyl cellosolve were blended and mixed with an ultrasonic disperser (Central Science Trading Co., Ltd.) Manufactured by Sonicifier 450) to prepare a transparent conductive paint. [Film formation] The above transparent conductive paint was applied to the surface of a cathode ray tube using a spin coater at 150 rpm for 30 seconds.
After drying, the low-refractive-index paint adjusted as described above is similarly applied using a spin coater at 150 rpm for 30 seconds, and baked at 150 ° C. for 1 hour in a drier to form a transparent conductive film. A cathode ray tube having an antireflection and high conductive film having a thickness of about 200 nm was prepared. Table 1 shows the evaluation results.

【0040】〔比較例4〕 〔Ag塩溶液の調整〕硝酸銀 3.5gを純水 60 mlに溶
解した後、アンモニア水を沈殿が再溶解するまで添加す
る。次いで、これに水酸化ナトリウム 2.5gを純粋 60
mlに溶解した溶液を添加した後、再度アンモニア水を
沈殿が再溶解するまで添加してAg塩溶液を調整した。 〔還元剤溶液の調整〕ブドウ糖 45 g及び酒石酸 4gを
純水 1000 mlに溶解した後、 10 分間煮沸し、冷却
後、エタノール 100mlを添加して還元剤溶液を調整し
た。 〔成膜〕上記Ag塩溶液 50 ml及び上記還元剤溶液 5
0 mlを混合して得られた混合溶液を、直ちに、ブラウ
ン管表面に、スピンコーターを用いて 150rpm− 30
秒の条件で塗布し、乾燥後、純水シャワーにより得られ
た導電膜表面の洗浄を行った。次いで、上記調整の低屈
折率塗料を同様にスピンコーターを用いて 150rpm−
30 秒の条件で塗布し、乾燥器で 150℃で1時間焼き付
けて透明導電膜を形成することによって、パネル表面に
約 200nmの厚みをもつ反射防止・高導電膜を有する陰
極線管を作成した。この評価結果を表1に示した。
Comparative Example 4 [Preparation of Ag Salt Solution] After dissolving 3.5 g of silver nitrate in 60 ml of pure water, ammonia water was added until the precipitate was redissolved. Then, 2.5 g of sodium hydroxide was added to the pure 60
After adding the solution dissolved in ml, ammonia water was added again until the precipitate was redissolved to prepare an Ag salt solution. [Preparation of reducing agent solution] 45 g of glucose and 4 g of tartaric acid were dissolved in 1000 ml of pure water, boiled for 10 minutes, cooled, and then added with 100 ml of ethanol to prepare a reducing agent solution. [Deposition] 50 ml of the Ag salt solution and 5 of the reducing agent solution
The mixed solution obtained by mixing 0 ml was immediately applied to the surface of a cathode ray tube using a spin coater at 150 rpm-30.
After coating under the condition of seconds and drying, the surface of the conductive film obtained by the pure water shower was washed. Next, the low-refractive-index paint adjusted as described above was similarly coated with a spin coater at 150 rpm.
A cathode ray tube having an anti-reflective and highly conductive film having a thickness of about 200 nm on the panel surface was prepared by applying the film under a condition of 30 seconds and baking it at 150 ° C. for 1 hour in a drier to form a transparent conductive film. Table 1 shows the evaluation results.

【0041】[0041]

【表1】 [Table 1]

【0042】以上のように本発明では、請求項1記載の
透明性電磁波遮蔽膜付き陰極線管では、平均粒径が 0.0
5μm以下の銀微粒子と、可視光の波長領域に透明性を
有する粒径が 0.1μm以下の無機微粒子とを含み、前記
透明導電膜への銀微粒子の配合割合は 10重量%以上で
あり、体積固有抵抗値が 103Ω・cm以下である透明性
電磁波遮蔽膜を表示画面上に備えたことにより、高い透
明性と、優れた帯電防止機能、電磁波遮蔽機能、および
反射防止機能とを有する低価格な陰極線管を実現するこ
とができる。そして、製造時において比較的低い温度で
焼き付けることで、鉛筆硬度が5H〜6Hの透明性電磁
波遮蔽膜が得られ、実用上十分な膜強度を確保すること
ができる。
As described above, in the present invention, the cathode ray tube with the transparent electromagnetic wave shielding film according to the first aspect has an average particle diameter of 0.0
A silver fine particle having a particle size of 5 μm or less and an inorganic fine particle having a particle size of 0.1 μm or less having transparency in a visible light wavelength region; and the compounding ratio of the silver fine particle in the transparent conductive film is 10% by weight or more, By providing a transparent electromagnetic wave shielding film with a specific resistance value of 10 3 Ωcm or less on the display screen, it has high transparency and excellent antistatic function, electromagnetic wave shielding function, and antireflection function. An inexpensive cathode ray tube can be realized. Then, by baking at a relatively low temperature during manufacturing, a transparent electromagnetic wave shielding film having a pencil hardness of 5H to 6H can be obtained, and a practically sufficient film strength can be secured.

【0043】また、請求項2記載の透明性電磁波遮蔽膜
付き陰極線管では、前記透明性電磁波遮蔽膜は、平均粒
径が 0.05μm以下の銀コロイドと、可視光の波長領域
に透明性を有する粒径が 0.1μm以下の無機微粒子とを
少なくとも含有させた塗料を塗布して形成されたことに
より、高い透明性を付与することができる。
Further, in the cathode ray tube with a transparent electromagnetic wave shielding film according to claim 2, the transparent electromagnetic wave shielding film has a silver colloid having an average particle diameter of 0.05 μm or less and has transparency in a visible light wavelength region. High transparency can be imparted by being formed by applying a coating material containing at least inorganic fine particles having a particle size of 0.1 μm or less.

【0044】また、請求項3記載の透明性電磁波遮蔽膜
付き陰極線管では、前記透明性電磁波遮蔽膜上に、前記
透明性電磁波遮蔽膜よりも低屈折率の被膜を被覆させた
ことにより、防眩効果の高い陰極線管を実現することが
できる。
Further, in the cathode ray tube with the transparent electromagnetic wave shielding film according to the third aspect, the transparent electromagnetic wave shielding film is coated with a film having a lower refractive index than the transparent electromagnetic wave shielding film, thereby preventing the cathode ray tube. A cathode ray tube having a high dazzling effect can be realized.

【0045】[0045]

【0046】[0046]

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01J 29/88 H01J 29/89 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) H01J 29/88 H01J 29/89

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】平均粒径が 0.05μm以下の銀微粒子と、
可視光の波長領域に透明性を有する粒径が 0.1μm以下
の無機微粒子とを含み、前記透明導電膜への銀微粒子の
配合割合は 10 重量%以上であり、体積固有抵抗値が 1
0 3 Ω・cm以下である透明性電磁波遮蔽膜を表示画面上
に備えたことを特徴とする透明性電磁波遮蔽膜付き陰極
線管。
(1) silver fine particles having an average particle size of 0.05 μm or less;
Particle size with transparency in the visible wavelength range of 0.1 μm or less
Inorganic fine particles of the silver fine particles to the transparent conductive film
The mixing ratio is 10% by weight or more and the volume resistivity value is 1%.
0 3 Ω · cm or less transparent electromagnetic wave shielding film on the display screen
A cathode ray tube with a transparent electromagnetic wave shielding film, wherein the cathode ray tube is provided with:
【請求項2】前記透明性電磁波遮蔽膜は、平均粒径が
0.05 μm以下のコロイドと、可視光の波長領域に透
明性を有する粒径が 0.1μm以下の無機微粒子とを少な
くとも含有させた塗料を塗布して形成さたことを特徴
とする請求項1記載の透明性電磁波遮蔽膜付き陰極線
管。
2. The transparent electromagnetic wave shielding film has an average particle size.
Silver colloid of 0.05 μm or less and transparent to the wavelength region of visible light
Transparent electromagnetic wave shielding film-coated cathode ray tube according to claim 1, wherein the particle size is characterized by being formed by applying a coating material obtained by containing at least the following inorganic fine particles 0.1μm having Akirasei.
【請求項3】前記透明性電磁波遮蔽膜上に、前記透明性
電磁波遮蔽膜よりも低屈折率の被膜を被覆させたことを
特徴とする請求項1または2記載の透明性電磁波遮蔽
付き陰極線管。
3. The transparent electromagnetic wave shielding film according to claim 1 , wherein
3. The cathode ray tube with a transparent electromagnetic wave shielding film according to claim 1, wherein a coating having a lower refractive index than the electromagnetic wave shielding film is coated .
JP20634795A 1995-08-11 1995-08-11 Cathode ray tube with transparent electromagnetic wave shielding film Expired - Fee Related JP3288557B2 (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
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JP3288557B2 true JP3288557B2 (en) 2002-06-04

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Publication number Priority date Publication date Assignee Title
TW432397B (en) 1997-10-23 2001-05-01 Sumitomo Metal Mining Co Transparent electro-conductive structure, progess for its production, transparent electro-conductive layer forming coating fluid used for its production, and process for preparing the coating fluid
US6447909B1 (en) 1999-01-14 2002-09-10 Sumitomo Metal Mining Co., Ltd. Transparent conductive layered structure and method of producing the same, and coating liquid for forming transparent conductive layer used in production of transparent conductive layered structure and method of producing the same
DE60023614T2 (en) 1999-08-26 2006-07-27 Sumitomo Metal Mining Co. Ltd. Transparent electrolytic structure and process for its preparation, coating fluid therefor and display device having this structure
JP2002083518A (en) 1999-11-25 2002-03-22 Sumitomo Metal Mining Co Ltd Transparent conductive substrate, its manufacturing method, display device using this transparent conductive substrate, coating solution for forming transparent conductive layer, and its manufacturing method
JP4788852B2 (en) 2000-07-25 2011-10-05 住友金属鉱山株式会社 Transparent conductive substrate, manufacturing method thereof, transparent coating layer forming coating solution used in the manufacturing method, and display device to which transparent conductive substrate is applied
JP2002038053A (en) 2000-07-25 2002-02-06 Sumitomo Metal Mining Co Ltd Coating fluid for forming transparent conductive layer
JP3876811B2 (en) 2001-11-02 2007-02-07 住友金属鉱山株式会社 Production method of coating liquid for forming transparent conductive layer
JP4232480B2 (en) 2002-03-25 2009-03-04 住友金属鉱山株式会社 Method for producing noble metal-coated silver fine particle dispersion, coating liquid for forming transparent conductive layer, transparent conductive substrate and display device
US10224126B2 (en) 2014-10-07 2019-03-05 Sharp Kabushiki Kaisha Transparent conductor, method for producing transparent conductor, and touch panel

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