JP3257056B2 - Vacuum deposition equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum evaporation apparatus for vacuum-evaporating a thin plate-like member to be continuously passed through a vacuum vessel containing an evaporation crucible.

[0002]

2. Description of the Related Art There is a vacuum vapor deposition apparatus as an apparatus for continuously forming a film on a vapor-deposited member made of a metal on a thin plate-shaped member to be vapor-deposited.

FIG. 3 is a perspective view showing the appearance of a conventional vacuum evaporation apparatus of this type (manufactured by Leybold GmbH, Germany), and FIG. 4 is a schematic view of the main part thereof.

In FIG. 3 and FIG. 4, a vacuum deposition apparatus
A vapor deposition chamber (hereinafter, referred to as a vapor deposition chamber) 1 as a vacuum container, a vacuum pump 2 connected to the vapor deposition chamber 1 to evacuate the vapor deposition chamber 1, and disposed inside the vapor deposition chamber 1 to form a film continuously. Supply roll 4 around which thin plate-like deposition target member 3 is wound
An evaporation crucible (hereinafter, referred to as a crucible) 5 provided in the evaporation chamber 1 and containing an evaporation material to be a film;
And an electron gun 6 for irradiating the vapor deposition material with an electron beam to evaporate the vapor deposition material, and forming a film of the vapor deposition material on the vapor deposition material 3 pulled out from the supply roll 4, and the vapor deposition material 3 Take-up roll 7 for winding and vapor deposition chamber 1
And a crucible exchange chamber 8 for exchanging a used crucible 5a which is provided so as to be able to be inserted and taken out of the crucible.

[0005]

However, the above-mentioned conventional vacuum evaporation apparatus has the following problems.

(1) The vapor deposition chamber must be opened to the atmosphere when the crucible in use is replaced due to breakage or malfunction, or when maintenance is performed. Sometimes it takes a long time.

(2) When the material of the crucible is ceramic or graphite, a new crucible absorbs a large amount of gas, so that if it is directly put into a vapor deposition chamber, it takes a long time to discharge gas.

(3) When a new crucible is heated outside a vapor deposition chamber to perform gas discharge, gas in the atmosphere is absorbed between the time the gas is released and the time when the gas is inserted into the vapor deposition chamber.

(4) In the crucible exchange chamber, since there is no heating means for heating the crucible or a device for supplying a vapor deposition material, gas can not be discharged or an initial molten metal can be prepared.

It is an object of the present invention to solve the above-mentioned problems and to provide a vacuum evaporation apparatus which does not open a vacuum vessel to the atmosphere during replacement and maintenance of an evaporating crucible and has a short downtime.

[0011]

To accomplish the above object means to provide a process, in a vacuum chamber containing the evaporation crucible, the Rutotomoni vacuum vessel is passed continuously lamellar of the deposition member
The electron beam from the electron gun provided
In a vacuum vapor deposition apparatus that irradiates a vapor deposition member to perform vacuum vapor deposition, a space provided in a vacuum vessel via a vacuum shut-off valve to accommodate a replacement vapor crucible,
Heating means for heating the pot and used
A preparation room having a space for accommodating only the evaporation crucible .

Further, the vacuum evaporation apparatus of the present invention, evaporation Ruth
A thin plate-shaped material to be deposited is continuously placed in a vacuum container
From the electron gun provided in the vacuum vessel
Irradiates the material to be deposited in the evaporation crucible with the
In a vacuum deposition apparatus for vapor-deposit, the vacuum container is provided via a vacuum shut-off valve, to yield volume evaporation crucible replacement
Space and heating means for heating the replacement evaporating crucible
A preparation chamber having a vacuum container, provided through another vacuum shut-off valve, in which a take-out chamber having a space for accommodating the spent evaporation crucible used in the vacuum vessel.

[0013]

According to the above construction, since the preparation chamber is provided in the vacuum vessel via the vacuum shut-off valve, the vacuum state of the vacuum vessel is maintained even when the preparation chamber is opened to the atmosphere. Further, since the preparation chamber has a heating means, the replacement crucible can be degassed at the same time during the vacuum deposition operation, and the replacement crucible is used without stopping the vacuum deposition apparatus for degassing. be able to.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below in detail with reference to the accompanying drawings.

FIG. 1 is a schematic plan view of a main part of one embodiment of a vacuum evaporation apparatus according to the present invention.

In FIG. 1, the vacuum evaporation apparatus continuously passes through the inside of the evaporation chamber 10, a vacuum pump 11 connected to the evaporation chamber 10 to evacuate the evaporation chamber 10, and a vacuum pump 11. In addition, a thin plate-shaped deposition target member 12 on which a coating is to be formed, a replacement crucible 13 provided in the deposition chamber 10 for containing a deposition material on which a coating is to be formed on the deposition target member 12, and a deposition chamber 10 An electron gun 14 for irradiating the deposition material with an electron beam and evaporating the deposition material to form a film of the deposition material on the deposition target member 12;
A vacuum shut-off valve 15 attached to the side surface of the vacuum chamber 0 to open or shut off the vapor deposition chamber 10;
A preparation chamber 16 attached to the crucible 13 for accommodating the replacement crucible 13 and the used crucible 13a; a vacuum pump 17 connected to the preparation chamber 16 to evacuate the preparation chamber 16;
6 comprises a material supply device 18 for supplying the evaporating material into the replacement crucible 13 and a heating means 19 provided in the preparation chamber 16 for heating the replacement crucible 13.

The preparation room 16 is provided with an insertion door for inserting the replacement crucible 13 and an extraction door for extracting the used crucible 13a (both not shown).
Normally, these insertion and removal doors are closed.

The vacuum shut-off valve 15 is used during a vacuum deposition operation, when a replacement crucible 13 is inserted into the preparation chamber 16, the used crucible 13 a is taken out from the preparation chamber 16, or the replacement crucible 13 is filled with gas. When heating for taking out, the space between the vapor deposition chamber 10 and the preparation chamber 16 is shut off, and the replacement crucible 13 is moved from the preparation chamber 16 into the vapor deposition chamber 10,
The used crucible 13 from the vapor deposition chamber 10 to the preparation chamber 16
When moving a, the space between the vapor deposition chamber 10 and the preparation chamber 16 is opened.

The movement of each of the crucibles 13 and 13a between the inside of the vapor deposition chamber 10 and the inside of the preparation chamber 16 is performed by a moving mechanism (not shown).

As the member 12 to be deposited, a thin steel plate, a film or tape made of a material such as metal or resin is used, and is continuously supplied into the deposition chamber 10.

Here, the reason why gas is discharged from the replacement crucible 13 will be described.

For example, Al (aluminum) is used as a vapor deposition material.
When Al is used, the melting point of Al is about 660 ° C., but when the evaporation temperature is about 1500 ° C., a temperature of 1000 ° C. or more is desirable for degassing the crucible 13. Therefore, when a vapor deposition material is contained in the crucible 13 at the time of degassing the crucible 13, the vapor deposition material dissolves and impurities such as water are mixed. Therefore, in order to remove impurities, the crucible 13 is heated while being empty, and gas is discharged.

Next, the operation of the embodiment will be described.

When the crucible 13b in use is replaced or repaired, the replacement crucible 13 is inserted into the preparation chamber 16 with the vacuum shut-off valve 15 shut off, and the vacuum pump 17 evacuates the crucible 13 and heats the crucible 13 by the heating means 19. Gas is discharged in advance by heating the crucible 13. An evaporation material is supplied from the material supply device 18 into the replacement crucible 13 that has been subjected to the degassing process, in an amount required for the preparation of the initial molten metal. After supplying the deposition material to the replacement crucible 13, the vacuum shut-off valve 15 is opened, the used crucible 13 a is moved from the deposition chamber 10 to the preparation chamber 16 in the direction of the arrow, and the replacement crucible 13 is transferred from the preparation chamber 16 to the deposition chamber 10. The crucible 13 is moved in the direction of the arrow. After moving the two crucibles 13 and 13a, the vacuum shutoff valve 15 is shut off, the vacuum pump 11, the electron gun 14 and the like are operated, and the deposition target 12 is continuously transported to perform the deposition process.

Since the preparation chamber 16 is provided in the vapor deposition chamber 10 via the vacuum shut-off valve 15, the preparation chamber 16 is opened to the atmosphere to insert a replacement crucible 13 or to remove the used crucible 13a. Also, the vacuum state in the vapor deposition chamber 10 is maintained. Further, since the preparation chamber 16 has the heating means 19, the replacement crucible 13 can be simultaneously degassed during the vacuum deposition operation, and the vacuum deposition apparatus can be stopped for degassing as in the related art. In addition, the replacement crucible 13 can be used in the vapor deposition chamber 10 in a short time.

FIG. 2 is a schematic plan view of another embodiment of the vacuum evaporation apparatus of the present invention.

1 differs from the embodiment shown in FIG. 1 in that a deposition chamber 23 for accommodating a used crucible 22 is provided in a vapor deposition chamber 20 via a vacuum shut-off valve 21.

The crucible 22 in use in this vacuum evaporation apparatus
When replacing a, the replacement crucible 22b is inserted into the preparatory chamber 25 with the vacuum shut-off valve 24 shut off, and the vacuum pump 26 is operated to evacuate and the heating means 27 as described above. Is operated to discharge gas from the replacement crucible 22b, and a necessary amount of the evaporating material is supplied from the material supply device 28 into the crucible 22b where the gas discharging is completed. The vacuum shut-off valve 21 is opened, the used crucible 22 is moved from the vapor deposition chamber 20 to the unloading chamber 23 in the direction of the arrow, and after the used crucible 22 is moved into the unloading chamber 23, the vacuum shut-off valve 21 is shut off. Then, the vacuum shut-off valve 24 is opened, and the replacement crucible 22b is moved in the direction of the arrow from the preparation chamber 25 to the vapor deposition chamber 20. After the replacement crucible 22b moves into the vapor deposition chamber 20, the vacuum pump 29, the electron gun 30, and the like are operated to start the vapor deposition process. At this time, the vacuum pump 31
Is operated to evacuate the extraction chamber 23.

As described above, according to the present embodiment, the deposition chamber 1
Since the preparation chamber 16 is provided at 0 via the vacuum shut-off valve 15, the vacuum state of the vapor deposition chamber 10 is maintained even when the preparation chamber 16 is opened to the atmosphere. Further, since the preparation chamber 16 has the heating means 19, the replacement crucible 1 can be simultaneously formed during the vacuum deposition operation.
3 can be performed, and the replacement crucible 13 can be used without stopping the vacuum deposition apparatus for degassing.

Although the present embodiment has been described using a crucible, the present invention is not limited to this, and a liner may be used. Further, a supply device for supplying the evaporation material may be provided in the evaporation chamber.

[0031]

In summary, according to the present invention, the following excellent effects are exhibited.

(1) The time for replacing the crucible can be greatly reduced.

(2) It is not necessary to open the vapor deposition chamber to the atmosphere for replacement and maintenance of the crucible, so that unnecessary vacuum evacuation time is eliminated.

(3) Since the preparation chamber has heating means,
The gas in the crucible can be degassed before replacement.

(4) By adding the evaporating material after heating the crucible, it is possible to prevent impurities from being mixed into the evaporating material by the generated gas.

[Brief description of the drawings]

FIG. 1 is a schematic plan view of a main part of one embodiment of a vacuum evaporation apparatus of the present invention.

FIG. 2 is a schematic plan view of another embodiment of the vacuum evaporation apparatus of the present invention.

FIG. 3 is an external perspective view of a conventional vacuum evaporation apparatus.

FIG. 4 is a schematic view of a main part of the vacuum evaporation apparatus shown in FIG.

[Explanation of symbols]

 10, 20 Deposition chamber 11, 17, 26, 29, 31 Vacuum pump 12 Deposition member 13, 22b Crucible 13a, 22 Used crucible 13b, 22a Crucible in use 14, 30, Electron gun 15, 21, 24 vacuum shut-off valve 16 preparation chamber 18, 28 material supply device 19, 27 heating means 23 extraction chamber

──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Kiyoshi Nehashi 3-1-1-15 Toyosu, Koto-ku, Tokyo Ishikawa Shima-Harima Heavy Industries Co., Ltd. In the Toji Technical Center (56) References JP-A-3-207860 (JP, A) JP-A-1-184272 (JP, A) JP-A-4-160147 (JP, A) JP 2-38923 (JP, Y2) (58) Fields investigated (Int. Cl. ⁷ , DB name) ) C23C 14/00-14/58

Claims (2)

(57) [Claims] To 1. A evaporation crucible vacuum vessel containing, Rutotomoni the vacuum passed continuously lamellar of the deposition member
Evaporating the electron beam from the electron gun provided in the container
In a vacuum evaporation apparatus for irradiating a member to be evaporated in a crucible to perform vacuum evaporation, a space provided in the vacuum container via a vacuum shutoff valve and accommodating a replacement evaporation crucible is provided.
Heating means for heating a replacement evaporation crucible, and the vacuum vessel
Space for used evaporative crucibles used in
And a preparation chamber having: 2. A thin container is placed in a vacuum container containing an evaporating crucible.
The plate is continuously passed through the member to be vapor-deposited and the vacuum
Evaporating the electron beam from the electron gun provided in the container
Vacuum deposition equipment that irradiates the material to be deposited in the pot with vacuum deposition
In location, in the vacuum vessel, provided via the vacuum shutoff valve, and a space for yield capacity evaporation crucible replacement intersection
Heating means for heating the replacement evaporation crucible
When, in the vacuum vessel, provided through another vacuum shut-off valve, a vacuum deposition, characterized in that a take-out chamber having a space for accommodating the spent evaporation crucible used in the vacuum chamber apparatus.