JPS60165378A - Semicontinuously taking-up type vapor deposition device - Google Patents

Abstract

PURPOSE:To reduce the capacity of a vacuum tank and enhance productivity, by a construction wherein a feeding system for an elongate substrate molded from a high molecular weight substance and a vapor deposition roller are provided in a vacuum tank, a vapor source is provided in an evacuating pipe connected to a lower part of the tank, and is moved vertically by a movable jig. CONSTITUTION:A pay away shaft 8 and a take-up shaft 7 for the elongate substrate 9 molded from a high molecular weight substance and the vapor deposition roller 10 are provided in the vacuum tank 1, and an electron gun 12 for heating a vapor source 14 is provided at a wall of the tank 1. The vapor source 14 is provided in the evacuating pipe 3 connected to a lower part of the tank 1 so that it can be vertically moved by a cylinder 20 through a vacuum shaft seal mechanism 19. In addition, a shielding body 15 is provided for shielding the vapor source 14 and a part or the entire part of the pipe 3 from the roller 10 when the vapor source 14 is located at the lowered position in the pipe 3.

Description

Detailed Description of the Invention: Industrial Field of Application The present invention relates to semi-continuous winding vapor deposition in which metals, metal oxides, etc. are vacuum evaporated onto the surface of a polymer molded substrate while the substrate is continuously moved in a vacuum chamber. It is related to the device.

Conventional Structures and Their Problems Thin film formation techniques by vacuum evaporation have come into widespread use in industry in recent years. semiconductor industry and lenses.

From relatively small vacuum evaporation equipment for applying antireflection coatings and colors to glass, etc., to relatively large vacuum evaporation equipment for forming thin films on paper and polymer film surfaces for decoration, packaging, and capacitors. There are many shapes and configurations. These vacuum evaporation devices, which are used to form a thin film on the surface of a long piece of paper or polymer film, have a running system for the long substrate in a vacuum chamber, a heating source for evaporating the evaporation material, and an evaporation source. This apparatus is generally referred to as a semi-continuous winding type vapor deposition apparatus, which continuously performs vacuum deposition on the surface of a long substrate while running the apparatus.

FIG. 1 shows the configuration of a conventional semi-continuous winding type vapor deposition apparatus.

The vacuum chamber 30 is separated into an upper chamber 42 and a lower chamber 43 by a shielding plate 37. The upper chamber is evacuated through an exhaust pipe 31 and the lower chamber is evacuated through an exhaust pipe 32. The long substrate 35 is set on the unwinding shaft 33 of the upper chamber 42, and the outer periphery of the vapor deposition roller 36 is placed on the vapor deposition roller 3.
6 and is wound onto the winding shaft 34. Evaporation source 4
o is stored in an evaporation material storage container 39 on a base 38 provided at the bottom of the lower chamber 43, heated and evaporated by a heating source 41, and deposited on the surface of the long substrate 36 on the evaporation roller 36 above the evaporation source 40. be done. Although not shown, a shutter that can be opened and closed is provided between the deposition row 236 and the evaporation source 40. In this way, the semi-continuous winding type vapor deposition apparatus that has been used conventionally has a long substrate transport system and a vapor deposition material evaporation source system placed in a vacuum chamber, and each system is evacuated using a vacuum evacuation device. There is.

According to such a conventional configuration, as the outer diameter of the unwinding, two-winding, and the evaporating rollers increase, the volume of the vacuum chamber also increases, and the vacuum evacuation equipment also becomes larger, which requires capital investment in equipment. Along with the increase in price, problems such as an increase in installation floor space and an increase in running costs have arisen.

Purpose of the Invention The purpose of the present invention is to provide an easy-to-use semi-continuous winding type vapor deposition apparatus that reduces the volume of a vacuum chamber in response to the increase in the size of these semi-continuous winding type vapor deposition apparatuses, increases productivity, and improves productivity. That is.

Structure of the Invention The present invention provides a vacuum evacuation system in which a conveyance system for a long substrate made of a polymer molded product and a deposition roller are placed in a vacuum chamber that can be depressurized by a vacuum evacuation device, and an evaporation source is connected to the bottom of the vacuum chamber. It is placed inside the pipe. Furthermore, the evaporation source is configured so that it can be moved up and down within the vacuum exhaust pipe by a movable jig provided within the vacuum exhaust pipe.

DESCRIPTION OF EMBODIMENTS FIG. 2 shows an embodiment of the present invention. The vacuum chamber 1 is separated into an upper chamber 4 and a lower chamber 5 by a shielding plate 6 as in the conventional case, and the upper chamber 4 is evacuated to a predetermined degree of vacuum by the evacuation pipe 2 and the lower chamber 5 by the evacuation pipe 3. Exhausted. The upper chamber 4 has a thickness of 12 μm, a width of 4001111111 and a length of 10,000 mm.
A polyester substrate 9 of m is wound and centered on the unwinding shaft 8, and the substrate is moved by a free roller (not shown),
It travels along the outer periphery of the vapor deposition roller 1o via an expander roller in synchronization with the rotation of the vapor deposition roller, and is again wound onto the winding shaft 7 via a free roller (not shown) and an expander 0-2.

On the other hand, in the evaporation source system, accelerated electrons emitted from an electron gun 12 installed on the wall of a vacuum chamber 1 are used as a heating source, and cobalt 14, which is an evaporation material, is placed in a crucible 13 made of fireproof bricks with a length of 600 mm. It is heated, melted, and evaporated by irradiating it with radiation. After the cobalt 14 has been sufficiently evaporated, the vapor deposition onto the substrate is performed by opening the shutter 11 from the closed state while the substrate 9 is running.The vapor deposition is completed by closing the shutter 11. In the conventional example, the crucible is placed on a fixed base in the vacuum chamber 1, but the crucible 13 in this embodiment is placed on a movable shaft 18 that can be moved up and down by a cylinder 20 via a vacuum shaft sealing mechanism 19. crucible pedestal 2 installed in
It is placed on top of 1.

The position of the crucible 13 is the position indicated by the solid line in FIG. 2 during the heating, melting, and evaporation processes of the evaporation material 14, and when the vacuum chamber is broken after the completion of vacuum evaporation, the movable shaft 18 is moved downward and the crucible 13 is moved to the position indicated by the broken line. Move it to position 13'. In this case, the on-off valve 15, which is fixed at the fulcrum 16, is operated to move from the solid line position to the broken line position (15'), thereby shielding the upper part of the crucible 13'. 17 is an on-off valve 1 installed inside the vacuum exhaust pipe wall.
Furthermore, when the opening/closing valve 15 is moved to the broken line position due to operation, all or part of the cross section of the vacuum exhaust pipe is shielded, and the space between the crucible 13' and the receiver 17 is sealed.
The present invention also includes the function of bringing the material into a vacuum state.

Effects of the Invention The semi-continuous winding type vapor deposition apparatus of the present invention configured as described above has the following features: (1) The evaporation source is disposed within the vacuum exhaust pipe, and the volume of the vacuum chamber can be reduced.

(2) Therefore, the capacity of the vacuum evacuation device can be small.

(3) Both the vacuum chamber and the vacuum evacuation device can be downsized, and the price of the semi-continuous winding type vapor deposition device can be reduced, and running costs can also be reduced.

(4) Due to the reduction in equipment cost and running cost, the price of products with vapor deposited layers also becomes cheaper.

(5) When maintaining or adjusting the evaporation source system, work space and safety can be ensured by lowering the crucible and closing the on-off valve.

In addition to the above effects, the present invention has a great effect of improving the industrial efficiency of semi-continuous winding type vapor deposition apparatus.

[Brief explanation of the drawing]

FIG. 1 is a block diagram of a conventional semi-continuous winding type vapor deposition apparatus, and FIG. 2 is a block diagram of an embodiment of the present invention. 1... Vacuum chamber, 7... Winding shaft, 8...
...Unwinding shaft, 9...Long board, 1o...
...Vapor deposition roller, 12...Electron gun, 14...
...Evaporation source, 15...Opening/closing valve, 18...
...Movable axis, 2o...Cylinder. Name of agent: Patent attorney Toshio Nakao and 1 other person
1711

Claims (3)

[Claims] (1) A transport system for the long polymer molded substrate and a deposition roller were installed in the vacuum chamber, an electron beam generator for heating the evaporation source was installed on the wall of the vacuum chamber, and the evaporation source was connected to the bottom of the vacuum chamber. A semi-continuous winding type vapor deposition device characterized by being placed inside a vacuum exhaust pipe. (2) The evaporation source is a semi-continuous winding type according to claim 1, wherein the vapor deposition source is on a vertically movable support provided in the vacuum exhaust pipe and is configured to move vertically within the vacuum exhaust pipe. Vapor deposition equipment. (3) A patent claim characterized in that, when the evaporation source is at a position moved downward within the vacuum exhaust pipe, a shield is provided to shield a part or most of the vacuum exhaust pipe between the evaporation source and the deposition roller. A semi-continuous winding type vapor deposition apparatus according to scope 1.